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    • 1. 发明授权
    • High molecular weight silicone compounds, resist compositions, and patterning method
    • 高分子量硅氧烷化合物,抗蚀剂组合物和图案化方法
    • US06730453B2
    • 2004-05-04
    • US09887320
    • 2001-06-25
    • Mutsuo NakashimaIchiro KanekoToshinobu IshiharaJunji TsuchiyaJun HatakeyamaShigehiro Nagura
    • Mutsuo NakashimaIchiro KanekoToshinobu IshiharaJunji TsuchiyaJun HatakeyamaShigehiro Nagura
    • G03F7075
    • G03F7/0045C08G77/14C08G77/38C08G77/388C08G77/50G03F7/0392G03F7/0757
    • The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is a di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′—OH or —NHCHR—R′—OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
    • 本发明提供了包含式(1)的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。 硅氧烷化合物中的羧基或羧基和羟基的一些或全部氢原子可被酸不稳定基团取代.Z为二价至六价,非芳香族,单环或多环烃或桥环状烃基; Z是二价至六价,正或支链烃基或非芳香族单环或多环烃或桥环状烃基; x,y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R 2是烷基或烯基或单价,非芳族,多环烃或桥连环烃基; p1,p2,p3和p4为0或正数。 包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感,并且具有高灵敏度和分辨率,使得它适合于用电子束或深紫外线的微细加工。 由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收,因此可以容易地形成具有垂直于衬底的壁的精细限定图案。
    • 2. 发明授权
    • High molecular weight silicone compounds resist compositions, and patterning method
    • 高分子量硅氧烷化合物抵抗组合物和图案化方法
    • US06309796B1
    • 2001-10-30
    • US09129950
    • 1998-08-06
    • Mutsuo NakashimaIchiro KanekoToshinobu IshiharaJunji TsuchiyaJun HatakeyamaShigehiro Nagura
    • Mutsuo NakashimaIchiro KanekoToshinobu IshiharaJunji TsuchiyaJun HatakeyamaShigehiro Nagura
    • G03F7075
    • G03F7/0045C08G77/14C08G77/38C08G77/388C08G77/50G03F7/0392G03F7/0757
    • The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z′ is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′ —OH or —NHCHR—R′ —OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
    • 本发明提供了包含式(1)的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。 硅烷化合物中的羧基或羧基和羟基的一部分或全部氢原子可被酸不稳定基团取代.Z为二价至六价,非芳香族,单环或多环烃基或桥环状烃基; Z'是二价至六价,正或支链烃基或非芳香族单环或多环烃或桥连环烃基; x,y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R2是烷基或链烯基或单价,非芳族,多环烃或桥连环烃基; p1,p2,p3和p4为0或正数。 包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感,并且具有高灵敏度和分辨率,使得它适合于用电子束或深紫外线的微细加工。 由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收,因此可以容易地形成具有垂直于衬底的壁的精细限定图案。