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1. 发明专利

SK277795B6 METHOD OF PRODUCTION OF VINYLCHLORIDE POLYMER 未知
公开(公告)号：SK277795B6
公开(公告)日：1995-03-08
申请号：SK544185
申请日：1985-07-23
申请人： SHUNICHI KOYANAGI , HAJIME KITAMURA , TOSHIHIDE SCHIMIZU , ICHIRO KANEKO
发明人： SHUNICHI KOYANAGI , HAJIME KITAMURA , TOSHIHIDE SCHIMIZU , ICHIRO KANEKO
IPC分类号： C08F2/00 , C08F20060101 , C08F2/16 , C08F2/18 , C08F2/22 , C08F14/00 , C08F14/06
摘要： Polymerization is realized in polymerization vessel, which internal walls and components of auxiliary equipment coming into contact with monomer at polymerization are beforehand covered with agent for prevention against incrustation. Agent contains at least one matter chosen from collection which comprises azo dyes and pigments, antraquinone dyesand pigments, phthalocyamine dyes and pigments, carbony dyes and pigments quinonemine dyes, nitrodyes, benzoquinone and naphthoquinone dyes, naphthalimide dyes and pigments, perinone dyes, fluoroscence dyes, sulfide dyes, dissoluble azodyes and reactive dyes and incidentally additives, at which concentration of chloride ion in reaction mixture is kept on value maximum 100 ppm. Agent for prevention of incrustation cam contains azine dye and as additive inorganic compound, as silicate, colloid silicate acid or colloid hydroxide ferric. Next can agent contain fixating component for support of adhering of agent for incrustation preventing, as olefin, diene and acetylene polymers, alfatic vinyle or vinyldiene polymers, aromatic vinyl polymers, heterocyclic vinyl polymers, acryle or metacryle polymers, polyeters, polysulfides, polyesters, polyamides, condensated polymers, nature polymers, or modified, polysiloxanes, organometal and inorganic polymers.

2. 发明专利

JPS5920494A Bronzing method on metallic surface 失效
标题翻译：金属表面烧结方法
公开(公告)号：JPS5920494A
公开(公告)日：1984-02-02
申请号：JP12825582
申请日：1982-07-22
申请人： Ichiro Kaneko
发明人： KANEKO ICHIROU
IPC分类号： C25D7/00 , C23C22/52 , C25D5/48
摘要： PURPOSE: To obtain a film having the non-monochromatic unique appearance and high rust preventive power, by blackening the surface of the copper plating applied on a metallic surface with a sulfide or selenious acid compd. soln. and exposing partially the copper base by polishing.
CONSTITUTION: For example, steel scissors are cleaned with trichloroethylene, whereafter the scissors are degreased with an alkali and is subjected to copper plating with a copper cyanide plating soln. or the like. The scissors are thoroughly rinsed and are then dipped for about 30sec in about 5% sulfuric acid in order to activate the surface of the copper plating, and the rinsing is repeated about 3 times. Such scissors are dipped for 30W60sec at an ordinary temp. in a mixed liquid contg. specified amts. of Na
2 S, NaOH, NH
4 OH and water for about 30W60sec at an ordinary temp.; thereafter, the rinsing is repeated about twice and the scissors are dipped for about 60sec in hot water. The scissors are put into a dryer immediately thereafter to remove thoroughly the water. The fine black powder stuck to the scissors is lightly wiped away, and a soft polishing cloth is applied lightly thereon to expose the copper surface in desired parts.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了获得具有非单色独特外观和高防锈力的薄膜，通过用硫化物或亚硒酸组合物将施加在金属表面上的铜镀层的表面变黑。 SOLN。并通过抛光部分曝光铜基底。构成：例如，用三氯乙烯清洗钢剪刀，然后用碱对剪刀进行脱脂，并用氰化铜镀液进行镀铜。或类似物。将剪刀彻底冲洗，然后在约5％硫酸中浸渍约30秒，以活化铜镀层的表面，并且冲洗重复约3次。这种剪刀在普通温度下浸泡30-60秒。在混合液体中指定的amts。的Na 2 S，NaOH，NH 4 OH和水在常温下约30-60秒。此后，将冲洗重复约两次，并将剪刀在热水中浸渍约60秒。剪刀立即放入干燥机中，彻底清除水分。粘在剪刀上的细黑色粉末轻轻地擦去，轻轻地涂抹柔软的抛光布，使铜表面露出所需的部分。

3. 发明授权

US06730453B2 High molecular weight silicone compounds, resist compositions, and patterning method 有权
标题翻译：高分子量硅氧烷化合物，抗蚀剂组合物和图案化方法
公开(公告)号：US06730453B2
公开(公告)日：2004-05-04
申请号：US09887320
申请日：2001-06-25
申请人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： G03F7075
CPC分类号： G03F7/0045 , C08G77/14 , C08G77/38 , C08G77/388 , C08G77/50 , G03F7/0392 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is a di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′—OH or —NHCHR—R′—OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
摘要翻译：本发明提供了包含式（1）的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。硅氧烷化合物中的羧基或羧基和羟基的一些或全部氢原子可被酸不稳定基团取代.Z为二价至六价，非芳香族，单环或多环烃或桥环状烃基; Z是二价至六价，正或支链烃基或非芳香族单环或多环烃或桥环状烃基; x，y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R 2是烷基或烯基或单价，非芳族，多环烃或桥连环烃基; p1，p2，p3和p4为0或正数。包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感，并且具有高灵敏度和分辨率，使得它适合于用电子束或深紫外线的微细加工。由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收，因此可以容易地形成具有垂直于衬底的壁的精细限定图案。

4. 发明授权

US06309796B1 High molecular weight silicone compounds resist compositions, and patterning method 有权
标题翻译：高分子量硅氧烷化合物抵抗组合物和图案化方法
公开(公告)号：US06309796B1
公开(公告)日：2001-10-30
申请号：US09129950
申请日：1998-08-06
申请人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
发明人： Mutsuo Nakashima , Ichiro Kaneko , Toshinobu Ishihara , Junji Tsuchiya , Jun Hatakeyama , Shigehiro Nagura
IPC分类号： G03F7075
CPC分类号： G03F7/0045 , C08G77/14 , C08G77/38 , C08G77/388 , C08G77/50 , G03F7/0392 , G03F7/0757
摘要： The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z′ is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′ —OH or —NHCHR—R′ —OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers. A resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for microfabrication with electron beams or deep UV. Since the composition has low absorption at the exposure wavelength of an ArF or KrF excimer laser, a finely defined pattern having walls perpendicular to the substrate can be readily formed.
摘要翻译：本发明提供了包含式（1）的重复单元并且具有1,000-50,000重均分子量的高分子量硅氧烷化合物。硅烷化合物中的羧基或羧基和羟基的一部分或全部氢原子可被酸不稳定基团取代.Z为二价至六价，非芳香族，单环或多环烃基或桥环状烃基; Z'是二价至六价，正或支链烃基或非芳香族单环或多环烃或桥连环烃基; x，y和z是对应于Z和Z'的化合价的1-5的整数; R 1是-OCHR-R'-OH或-NHCHR-R'-OH; R2是烷基或链烯基或单价，非芳族，多环烃或桥连环烃基; p1，p2，p3和p4为0或正数。包含作为基础树脂的高分子量硅氧烷化合物的抗蚀剂组合物对光化辐射敏感，并且具有高灵敏度和分辨率，使得它适合于用电子束或深紫外线的微细加工。由于组成在ArF或KrF准分子激光器的曝光波长处具有低吸收，因此可以容易地形成具有垂直于衬底的壁的精细限定图案。

5. 发明授权

US6066433A High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method 失效
标题翻译：高分子量硅氧烷化合物，化学放大正性抗蚀剂组合物和图案化方法
公开(公告)号：US6066433A
公开(公告)日：2000-05-23
申请号：US37023
申请日：1998-03-09
申请人： Katsuya Takemura , Junji Tsuchiya , Ichiro Kaneko , Toshinobu Ishihara
发明人： Katsuya Takemura , Junji Tsuchiya , Ichiro Kaneko , Toshinobu Ishihara
IPC分类号： C08G77/14 , G03F7/004 , G03F7/075
CPC分类号： C08G77/14 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： In a silicone polymer having phenolic hydroxyl groups, the hydrogen atoms of some of the phenolic hydroxyl groups are replaced by acid labile groups of at least one type. The silicone polymer is crosslinked at some of the remaining phenolic hydroxyl groups with crosslinking groups having C--O--C linkages within a molecule and/or between molecules. The silicone polymer has a Mw of 5,000 to 50,000. A chemically amplified positive resist composition comprising the silicone polymer as a base resin has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV. Because of improved oxygen plasma etching resistance, the composition is suitable for use in the two-layer resist technique.
摘要翻译：在具有酚羟基的硅氧烷聚合物中，一些酚羟基的氢原子被至少一种类型的酸不稳定基团取代。硅氧烷聚合物在一些剩余的酚羟基上与在分子内和/或分子之间具有C-O-C键的交联基团交联。有机硅聚合物的Mw为5,000至50,000。包含作为基础树脂的硅氧烷聚合物的化学放大型正性抗蚀剂组合物具有高灵敏度和分辨率，使其适用于用电子束或深紫外线精细构图。由于氧等离子体抗蚀刻性能的改善，组合物适用于双层抗蚀剂技术。

6. 发明授权

US5494991A Polyimides and processes for preparing the same 失效
标题翻译：聚酰亚胺及其制备方法
公开(公告)号：US5494991A
公开(公告)日：1996-02-27
申请号：US262318
申请日：1994-06-17
申请人： Ichiro Kaneko , Atushi Sugitani , Masahiro Yuyama , Kiyoshi Motomi
发明人： Ichiro Kaneko , Atushi Sugitani , Masahiro Yuyama , Kiyoshi Motomi
IPC分类号： C08G73/10 , C08G73/22 , H05K1/03 , C08G69/26
CPC分类号： C08G73/22 , C08G73/1085 , H05K1/0346
摘要： Polyimides comprising recurring units of the following general formula (1) ##STR1## wherein Ar.sub.1 represents a tetravalent aromatic group and each Ar.sub.2 represents a divalent aromatic group. Polyimide copolymers and preparations of the polyimides and the polyimide copolymers are also described.
摘要翻译：包含以下通式（1）的重复单元的聚酰亚胺其中Ar 1表示四价芳族基团，并且每个Ar 2表示二价芳族基团。还描述了聚酰亚胺共聚物和聚酰亚胺和聚酰亚胺共聚物的制备方法。

7. 发明授权

US5253303A Character recognizing method and apparatus thereof 失效
标题翻译：字符识别方法及其装置
公开(公告)号：US5253303A
公开(公告)日：1993-10-12
申请号：US799744
申请日：1991-11-22
申请人： J. Warren Whitesel , Ichiro Kaneko
发明人： J. Warren Whitesel , Ichiro Kaneko
IPC分类号： G06K9/34 , G06K9/36
CPC分类号： G06K9/342 , G06K2209/01
摘要： A character recognizing method includes steps of detecting a character using an end of the character line as a start point, normalizing the detected character, comparing the normalized value with a predetermined standard pattern, and detecting a point having a minimum distance difference from the standard pattern as a segmentation point between neighboring characters.
摘要翻译：字符识别方法包括以下步骤：使用字符行的结尾来检测字符作为起始点，归一化检测到的字符，将标准化值与预定的标准图案进行比较，并且从标准图案检测具有最小距离差的点作为相邻字符之间的分割点。

8. 发明授权

US5214113A Method of preventing polymer scale deposition and polymer scale preventive agent 失效
标题翻译：防止聚合物垢沉积的方法和聚合物防垢剂
公开(公告)号：US5214113A
公开(公告)日：1993-05-25
申请号：US578349
申请日：1990-09-06
申请人： Toshihide Shimizu , Susumu Ueno , Ichiro Kaneko , Mikio Watanabe
发明人： Toshihide Shimizu , Susumu Ueno , Ichiro Kaneko , Mikio Watanabe
IPC分类号： C08F2/00
CPC分类号： C08F2/004
摘要： A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising:(A) a lignin, and(B) a cellulose derivative; and a polymer scale preventive agent comprising said components (A) and (B).Deposition of polymer scale can be effectively prevented; polymers with high whiteness can be prepared; the scale preventive agent used has no poisonousness and are highly safe, therefore this method can be performed with high safe.
摘要翻译：一种防止在聚合容器中具有烯键式双键的单体聚合期间的聚合物垢沉积的方法，包括在其内壁表面具有包含以下物质的聚合容器中进行所述聚合的步骤：（A）木质素，（B）纤维素衍生物; 和包含所述组分（A）和（B））的聚合物防垢剂。可有效防止聚合物垢的沉积; 高白度聚合物可以制备; 所用的防垢剂无毒，安全性高，因此该方法可以安全使用。

9. 发明授权

US5214112A Method of preventing polymer deposition and polymer scale preventive agent 失效
标题翻译：防止聚合物沉积和聚合物垢防止剂的方法
公开(公告)号：US5214112A
公开(公告)日：1993-05-25
申请号：US578342
申请日：1990-09-06
申请人： Toshihide Shimizu , Susumu Ueno , Ichiro Kaneko , Mikio Watanabe
发明人： Toshihide Shimizu , Susumu Ueno , Ichiro Kaneko , Mikio Watanabe
IPC分类号： C08F2/00
CPC分类号： C08F2/004
摘要： A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising:(A) a water-soluble nitrogen-containing cationic polymeric compound, and(B) a water-soluble anionic polymeric compound; and a polymer scale preventive agent comprising said (A) and (B). Polymer scale deposition is effectively prevented, and polymers with high whiteness can be prepared.
摘要翻译：一种防止在聚合容器中具有烯键式双键的单体聚合期间的聚合物垢沉积的方法，包括在聚合容器中进行所述聚合的步骤，其内壁表面具有包含：（A）水 - 可溶性含氮阳离子聚合物，和（B）水溶性阴离子聚合物; 和包含所述（A）和（B）的聚合物防垢剂。可以有效地防止聚合物垢沉积，可以制备高白度的聚合物。

10. 发明授权

US5034477A Method of preventing polymer scale formation 失效
标题翻译：防止聚合物垢形成的方法
公开(公告)号：US5034477A
公开(公告)日：1991-07-23
申请号：US512595
申请日：1990-04-24
申请人： Toshihide Shimizu , Ichiro Kaneko , Mikio Watanabe
发明人： Toshihide Shimizu , Ichiro Kaneko , Mikio Watanabe
IPC分类号： C08F2/00 , C08F2/44 , C23F15/00
CPC分类号： C08F2/004
摘要： A method of preventing polymer scale formation in a polymerization vessel during the polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel in which its inner wall surface has been previously coated with a coating solution containing (A) at least one member selected from the group consisting of particular anionic dyes, and alkali metal salts and ammonium salts of a sulfonated product obtained by sulfonation of a condensate of a particular aromatic amine compound with a particular aromatic nitro compound, and (B) a particular cationic dye and having a pH of more than 7, and then dried to form a coating. This method can effectively prevent scale formation in the polymerization of extensive monomers having an ethylenically double bond, so that 100 or more polymerization runs can be repeated without formation of polymer scale.

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