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1. 发明申请

US20060157528A1 Powered nailing machine 失效
标题翻译：动力打钉机
公开(公告)号：US20060157528A1
公开(公告)日：2006-07-20
申请号：US10563260
申请日：2004-06-22
申请人： Satoshi Osuga , Hiroshi Tanaka , Katsuhiko Murayama
发明人： Satoshi Osuga , Hiroshi Tanaka , Katsuhiko Murayama
IPC分类号： B25C1/04
CPC分类号： B25C1/008 , B25C1/188
摘要： The guide rods 25, 26 extending straight along the discharge port 17 are fixed to the contact member 24, and this contact member 24 is retained slidably on the nose 16 via the guide rods 25, 26. The nose extension 23 is formed at the free end of the discharge port 17 so as to be integral with the nose 16 so that the nose extension covers the outer circumferential surface of the discharge port 17. The contact member 24 is held in the annular space formed between the nose extension 23 and discharge port 17, the contact member 24 being provided so as to project from free end of the nose extension.
摘要翻译：沿着排出口17直线延伸的导杆25,26固定到接触构件24上，并且该接触构件24经由引导杆25,26可滑动地保持在鼻部16上。鼻部延伸部23形成在排出口17的自由端，与鼻部16一体形成，使得鼻部延伸部覆盖排出口17的外周面。接触构件24保持在形成在鼻部延伸部23和排出口17之间的环形空间中，接触构件24设置成从鼻部延伸部的自由端突出。

2. 发明授权

US07175063B2 Powered nailing machine 失效
标题翻译：动力打钉机
公开(公告)号：US07175063B2
公开(公告)日：2007-02-13
申请号：US10563260
申请日：2004-06-22
申请人： Satoshi Osuga , Hiroshi Tanaka , Katsuhiko Murayama
发明人： Satoshi Osuga , Hiroshi Tanaka , Katsuhiko Murayama
IPC分类号： B25C1/04
CPC分类号： B25C1/008 , B25C1/188
摘要： The guide rods 25, 26 extending straight along the discharge port 17 are fixed to the contact member 24, and this contact member 24 is retained slidably on the nose 16 via the guide rods 25, 26. The nose extension 23 is formed at the free end of the discharge port 17 so as to be integral with the nose 16 so that the nose extension covers the outer circumferential surface of the discharge port 17. The contact member 24 is held in the annular space formed between the nose extension 23 and discharge port 17, the contact member 24 being provided so as to project from free end of the nose extension.
摘要翻译：沿着排出口17直线延伸的导杆25,26固定到接触构件24上，并且该接触构件24经由引导杆25,26可滑动地保持在鼻部16上。鼻部延伸部23形成在排出口17的自由端，与鼻部16一体形成，使得鼻部延伸部覆盖排出口17的外周面。接触构件24保持在形成在鼻部延伸部23和排出口17之间的环形空间中，接触构件24设置成从鼻部延伸部的自由端突出。

3. 发明申请

US20100032467A1 GAS COMBUSTION TYPE DRIVING TOOL 有权
标题翻译：气体燃烧式驱动工具
公开(公告)号：US20100032467A1
公开(公告)日：2010-02-11
申请号：US12517647
申请日：2007-12-04
申请人： Hiroshi Tanaka , Hajime Takemura , Junichi Tamura , Katsuhiko Murayama
发明人： Hiroshi Tanaka , Hajime Takemura , Junichi Tamura , Katsuhiko Murayama
IPC分类号： B25C1/08
CPC分类号： B25C1/08
摘要： A gas combustion type driving tool is provided with two modes including: a contact mode in which a contact arm 15 is pressed against a workpiece P into which a nail is to be driven and the nail is driven under a condition that a trigger lever 16 is pulled; and a trigger mode in which the trigger lever 16 is pulled and the nail is driven under a condition that the contact arm 15 is pressed against the workpiece P. In either mode, a nail driving can be continuously executed.
摘要翻译：一种气体燃烧式驱动工具具有两种模式，包括：在触发杆16为触发杆16的状态下，接触臂15压靠在要被驱动的钉的工件P上并且钉被驱动的接触模式拉以及触发杆16被拉动并且在接触臂15被压靠在工件P上的条件下被驱动的触发模式。在任何一种模式中，可以连续执行钉子驱动。

4. 发明授权

US08006880B2 Gas combustion type driving tool 有权
标题翻译：气体燃烧式驱动工具
公开(公告)号：US08006880B2
公开(公告)日：2011-08-30
申请号：US12517647
申请日：2007-12-04
申请人： Hiroshi Tanaka , Hajime Takemura , Junichi Tamura , Katsuhiko Murayama
发明人： Hiroshi Tanaka , Hajime Takemura , Junichi Tamura , Katsuhiko Murayama
IPC分类号： B25C1/08
CPC分类号： B25C1/08
摘要： A gas combustion type driving tool is provided with two modes including: a contact mode in which a contact arm 15 is pressed against a workpiece P into which a nail is to be driven and the nail is driven under a condition that a trigger lever 16 is pulled; and a trigger mode in which the trigger lever 16 is pulled and the nail is driven under a condition that the contact arm 15 is pressed against the workpiece P. In either mode, a nail driving can be continuously executed.
摘要翻译：一种气体燃烧式驱动工具具有两种模式，包括：在触发杆16为触发杆16的状态下，接触臂15压靠在要被驱动的钉的工件P上并且钉被驱动的接触模式拉以及触发杆16被拉动并且在接触臂15被压靠在工件P上的条件下被驱动的触发模式。在任何一种模式中，可以连续执行钉子驱动。

5. 发明申请

US20090071999A1 GAS COMBUSTION TYPE DRIVING TOOL 审中-公开
标题翻译：气体燃烧式驱动工具
公开(公告)号：US20090071999A1
公开(公告)日：2009-03-19
申请号：US12282262
申请日：2007-03-07
申请人： Junichi Tamura , Katsuhiko Murayama , Hajime Takemura , Masakazu Konishi
发明人： Junichi Tamura , Katsuhiko Murayama , Hajime Takemura , Masakazu Konishi
IPC分类号： B25C1/14
CPC分类号： B25C1/08
摘要： By moving a movable sleeve 10 provided above a driving cylinder 3 in a vertical direction so as to come into contact with a cylinder head 8 above the driving cylinder 3, a combustion chamber 6 becomes a closed state. When mixed gas obtained by stirring and mixing air and fuel gas by a rotary fan 21 is ignited by a spark plug 20 so as to be burned explosively in the combustion chamber 6, high-pressure combustion gas is applied to a driving piston 4 to impulsively drive the driving piston 4 so that a driver 5 coupled to a lower surface of the driving piston 4 drives a fastener. An upper wall surface on an outer portion of the combustion chamber 6 is disposed at a position far away from the spark plug 20 so that a flow speed of the mixed gas passing the upper wall surface decreases to the extent that an ignition when the mixed gas arrives at the spark plug 20 is not interrupted. An opening groove 22 is formed in the upper wall surface so as to be opened to the combustion chamber 6.
摘要翻译：通过在垂直方向上移动设置在驱动气缸3上方的可动套筒10以与驱动气缸3上方的气缸盖8接触，燃烧室6变为关闭状态。当通过旋转风扇21搅拌和混合空气和燃料气体而获得的混合气体被火花塞20点燃以便在燃烧室6中爆炸地燃烧时，将高压燃烧气体以脉冲方式施加到驱动活塞4 驱动驱动活塞4，使得联接到驱动活塞4的下表面的驱动器5驱动紧固件。燃烧室6的外部的上壁面设置在远离火花塞20的位置，使得通过上壁面的混合气体的流速降低到当混合气体到达火花塞20不会中断。开口槽22形成在上壁面上，以便向燃烧室6敞开。

6. 发明申请

US20090057365A1 Gas Combustion type driving tool 有权
标题翻译：气体燃烧式驱动工具
公开(公告)号：US20090057365A1
公开(公告)日：2009-03-05
申请号：US11919035
申请日：2006-04-28
申请人： Katsuhiko Murayama , Hajime Takemura , Junichi Tamura
发明人： Katsuhiko Murayama , Hajime Takemura , Junichi Tamura
IPC分类号： B25C1/08 , B27F7/09
CPC分类号： B25C1/08
摘要： In a gas combustion type driving tool, on a feed cylinder 21 included in a feed piston/cylinder device 7, there is provided a spring for normally urging a feed piston 22 in a feed direction. A portion of the feed cylinder 21 opposite to the spring is connected to a combustion chamber 5 through a gas conduit 26. In an intermediate portion of the gas conduit 26, there is provided a delay piston/cylinder device A. One end of a delay cylinder 27 is disposed on the combustion chamber 5 side, while the other end thereof is disposed on the feed cylinder 21 side. When a delay piston 28 is slidingly moved from one end of the delay cylinder 27 to the other end thereof by the pressure of combustion gas, air compressed within the delay cylinder 27 is supplied from the other end of the delay cylinder 27 to the feed cylinder 21.
摘要翻译：在气体燃烧式驱动工具中，在进料活塞/气缸装置7中包括的进料缸21上设置有用于在进给方向上正常地推进进料活塞22的弹簧。进料筒21的与弹簧相对的部分通过气体导管26连接到燃烧室5.在气体导管26的中间部分，设置有延迟活塞/气缸装置A.延迟的一端气缸27设置在燃烧室5侧，而另一端设置在进料缸21侧。当延迟活塞28通过燃烧气体的压力从延迟气缸27的一端滑动到另一端时，在延迟气缸27内被压缩的空气从延迟气缸27的另一端供给给进料筒 21。

7. 发明申请

US20090042390A1 ETCHANT FOR SILICON WAFER SURFACE SHAPE CONTROL AND METHOD FOR MANUFACTURING SILICON WAFERS USING THE SAME 审中-公开
标题翻译：用于硅晶片表面形状控制的蚀刻和使用其制造硅波的方法
公开(公告)号：US20090042390A1
公开(公告)日：2009-02-12
申请号：US11836493
申请日：2007-08-09
申请人： Sakae Koyata , Takeo Katoh , Tomohiro Hashii , Katsuhiko Murayama , Kazushige Takaishi
发明人： Sakae Koyata , Takeo Katoh , Tomohiro Hashii , Katsuhiko Murayama , Kazushige Takaishi
IPC分类号： H01L21/302 , C09K13/08
CPC分类号： H01L21/30608 , C09K13/02 , C09K13/08 , H01L21/02019
摘要： It is possible to reduce workloads of a both-side simultaneous polishing process or a single-side polishing process, and to achieve both of the maintenance of the wafer flatness and the reduction in wafer front side roughness upon completing a flattening process. A method for manufacturing silicon wafers according to the present invention includes a flattening process 13 of grinding or lapping front and back sides of a thin disc-shaped silicon wafer obtained by slicing a silicon single crystal ingot, an etching process of immersing the silicon wafer in an etchant for controlling a silicon wafer surface shape in which a fluorochemical surfactant is uniformly mixed in an alkaline aqueous solution to etch the front and back sides of the silicon wafer, and a both-side simultaneous polishing process 16 of simultaneously polishing the front and back sides of the etched silicon wafer or a single-side polishing process of polishing the front and back sides of the etched wafer for every side, in this order.
摘要翻译：可以减少双面同时抛光工艺或单面抛光工艺的工作量，并且在完成平坦化处理时实现晶片平整度的维持和晶片正面粗糙度的降低。根据本发明的硅晶片的制造方法包括：通过对硅单晶锭进行切片而得到的薄片状硅晶片的正面和背面进行研磨或研磨的平坦化工艺13，将硅晶片浸入的蚀刻工艺用于控制硅晶片表面形状的蚀刻剂，其中含氟表面活性剂在碱性水溶液中均匀混合以蚀刻硅晶片的正面和背面;以及双面同时抛光工艺16，同时抛光前后蚀刻的硅晶片的侧面或者对于每一侧抛光蚀刻后的晶片的正面和背面的单面抛光工艺。

8. 发明申请

US20070298614A1 Apparatus for etching wafer by single-wafer process and single wafer type method for etching wafer 失效
标题翻译：用于通过单晶片工艺蚀刻晶片的装置和用于蚀刻晶片的单晶片型方法
公开(公告)号：US20070298614A1
公开(公告)日：2007-12-27
申请号：US11893538
申请日：2007-08-15
申请人： Sakae Koyata , Tomohiro Hashii , Katsuhiko Murayama , Kazushige Takaishi , Takeo Katoh
发明人： Sakae Koyata , Tomohiro Hashii , Katsuhiko Murayama , Kazushige Takaishi , Takeo Katoh
IPC分类号： H01L21/306
CPC分类号： H01L21/6708 , H01L21/67075 , Y10S134/902
摘要： An apparatus for etching a wafer by a single-wafer process comprises a fluid supplying device which feeds an etching fluid on a wafer, and a wafer-chuck for horizontally holding the wafer. The wafer-chuck is equipped with a gas injection device for injecting a gas to the wafer, a first fluid-aspirating device, and a second fluid-aspirating device. The etching fluid supplied on the wafer is spread by a rotation of the wafer. The etching fluid is scattered by a centrifugal force, or flows down over an edge portion of the wafer and is blown-off by the gas injected from the gas injection unit, and is aspirated by the first fluid-aspirating device or the second fluid-aspirating device.
摘要翻译：用于通过单晶片工艺蚀刻晶片的设备包括：向晶片上供给蚀刻流体的流体供应装置和用于水平保持晶片的晶片卡盘。晶片卡盘配备有用于向晶片注入气体的气体注入装置，第一流体抽吸装置和第二流体抽吸装置。提供在晶片上的蚀刻流体通过晶片的旋转而扩展。蚀刻流体通过离心力而被散射，或者向下流过晶片的边缘部分，并且被从气体注入单元注入的气体吹出，并且被第一流体抽吸装置或第二流体吸入装置抽吸，吸气装置

9. 发明申请

US20060169667A1 Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same 有权
标题翻译：用于控制硅晶片表面形状的蚀刻液和使用其制造硅晶片的方法
公开(公告)号：US20060169667A1
公开(公告)日：2006-08-03
申请号：US11345009
申请日：2006-01-31
申请人： Sakae Koyata , Yuichi Kakizono , Tomohiro Hashii , Katsuhiko Murayama
发明人： Sakae Koyata , Yuichi Kakizono , Tomohiro Hashii , Katsuhiko Murayama
IPC分类号： B44C1/22 , H01L21/461 , C09K13/00 , C23F1/00
CPC分类号： H01L21/02008 , C30B33/10
摘要： A method for manufacturing a silicon wafer includes a planarizing process 13 for polishing or lapping the upperside and lowerside surfaces of a thin disk-shaped silicon wafer obtained by slicing a silicon single crystal ingot, an etching process for dipping the silicon wafer into the etching liquid wherein silica powder is dispersed uniformly in an alkali aqueous solution, thereby etching the upperside and lowerside surfaces of the silicon wafer, and a both-side simultaneous polishing process 16 for polishing the upperside and lowerside surfaces of the etched silicon wafer simultaneously or a one-side polishing process for polishing the upperside and lowerside surfaces of the etched silicon wafer one after another, in this order.
摘要翻译：一种硅晶片的制造方法，其特征在于，包括：通过对硅单晶锭进行切片而得到的薄盘状硅晶片的上下表面进行抛光或研磨的平坦化工序13，将硅晶片浸入蚀刻液中的蚀刻工序其中二氧化硅粉末均匀地分散在碱性水溶液中，从而蚀刻硅晶片的上侧和下侧表面，以及用于同时抛光被蚀刻的硅晶片的上侧和下侧表面的双面同时抛光工艺16，按照此顺序一次一个地抛光蚀刻的硅晶片的上侧和下侧表面的侧面抛光工艺。

10. 发明授权

US06834666B2 Apparatus for outputting compressed air in compressor 失效
标题翻译：用于在压缩机中输出压缩空气的装置
公开(公告)号：US06834666B2
公开(公告)日：2004-12-28
申请号：US10092352
申请日：2002-03-07
申请人： Keijiro Murayama , Katsuhiko Murayama , Hiroshi Hanagasaki , Kazuhiko Kuraguchi , Hajime Takemura
发明人： Keijiro Murayama , Katsuhiko Murayama , Hiroshi Hanagasaki , Kazuhiko Kuraguchi , Hajime Takemura
IPC分类号： F04B4102
CPC分类号： F15B11/16 , B25B21/00 , F15B11/028 , F15B2211/20538 , F15B2211/212 , F15B2211/40515 , F15B2211/426 , F15B2211/45 , F15B2211/50554 , F15B2211/5151 , F15B2211/523 , F15B2211/55 , F15B2211/625 , F15B2211/6309 , F15B2211/7052 , F15B2211/71 , Y10T137/5109 , Y10T137/7728 , Y10T137/7869 , Y10T137/8593 , Y10T137/86035 , Y10T137/86051 , Y10T137/87877
摘要： The invention provides an apparatus for outputting compressed air in a compressor to a plurality of pneumatic tools at a plurality of pressures. The apparatus includes: an air tank storing compressed air compressed by the compressor at a high pressure; a pressure adjusting portion connected to said air tank and adjusting a pressure value of the compressed air in a region from the high pressure to zero; a pressure outputting portion connected to a secondary side of said pressure adjusting portion and outputting the adjusted compressed air to at least one of a first pneumatic tool driven at a first pressure and a second pneumatic tool driven at a second pressure. The first pressure is larger than the second pressure, and the adjusted compressed air is not output to the second pneumatic tool at the first pressure.
摘要翻译：本发明提供一种用于在多个压力下将压缩机中的压缩空气输出到多个气动工具的装置。该装置包括：储存由压缩机在高压下压缩的压缩空气的空气罐; 连接到所述空气罐的压力调节部分，并且在从高压到零的区域中调节压缩空气的压力值; 压力输出部分，其连接到所述压力调节部分的次级侧，并且将经调节的压缩空气输送到在第一压力下驱动的第一气动工具和在第二压力下驱动的第二气动工具中的至少一个。第一压力大于第二压力，并且调节的压缩空气在第一压力下不输出到第二气动工具。

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