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1. 发明授权

US06964839B1 Photosensitive polymer having cyclic backbone and resist composition containing the same 失效
标题翻译：具有环状骨架的光敏性聚合物和含有它们的抗蚀剂组合物
公开(公告)号：US06964839B1
公开(公告)日：2005-11-15
申请号：US09715041
申请日：2000-11-20
申请人： Sang-jun Choi , Hyun-woo Kim , Sang-gyun Woo , Joo-tae Moon
发明人： Sang-jun Choi , Hyun-woo Kim , Sang-gyun Woo , Joo-tae Moon
IPC分类号： C08F220/18 , C08F222/06 , C08K5/00 , C08L33/06 , C08L35/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A photosensitive copolymer has a weight-average molecular weight of 3,000 to 100,000 and is represented by the following formula: wherein R1 is a hydrogen atom or methyl, R2 is an acid-labile tertiary alkyl group, and m/(m+n) is 0.5 to 0.8.
摘要翻译：光敏共聚物的重均分子量为3,000〜100,000，由下式表示：其中R 1是氢原子或甲基，R 2是酸不稳定叔烷基，m /（m + n）为0.5〜0.8。

2. 发明授权

US07241552B2 Resist composition comprising photosensitive polymer having lactone in its backbone 失效
标题翻译：抗蚀剂组合物包含其主链中具有内酯的光敏聚合物
公开(公告)号：US07241552B2
公开(公告)日：2007-07-10
申请号：US10909384
申请日：2004-08-03
申请人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
发明人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.
摘要翻译：抗蚀剂组合物包括光致酸产生剂（PAG）和光敏聚合物。光敏聚合物与（a）至少一种具有以下各式的单体聚合：其中R 1和R 2独立地为氢原子，烷基，羟基烷基，烷氧基，羰基或酯，x和y独立地为1至 6，和（b）至少一种（甲基）丙烯酸酯单体，马来酸酐单体和降冰片烯单体。

3. 发明申请

US20050008975A1 Resist composition comprising photosensitive polymer having lactone in its backbone 失效
标题翻译：抗蚀剂组合物包含其主链中具有内酯的光敏聚合物
公开(公告)号：US20050008975A1
公开(公告)日：2005-01-13
申请号：US10909384
申请日：2004-08-03
申请人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
发明人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
IPC分类号： C08F220/18 , C08F222/06 , C08F232/04 , C08F234/02 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.
摘要翻译：抗蚀剂组合物包括光致酸产生剂（PAG）和光敏聚合物。光敏聚合物与（a）至少一种具有以下各式的单体聚合：其中R 1和R 2独立地为氢原子，烷基，羟基烷基，烷氧基，羰基或酯，x和y独立地为1至 6，和（b）至少一种（甲基）丙烯酸酯单体，马来酸酐单体和降冰片烯单体。

4. 发明授权

US06596459B1 Photosensitive polymer and resist composition containing the same 失效
标题翻译：含有它们的光敏聚合物和抗蚀剂组合物
公开(公告)号：US06596459B1
公开(公告)日：2003-07-22
申请号：US09716269
申请日：2000-11-21
申请人： Hyun-woo Kim , Ki-young Kwon , Si-hyeung Lee , Dong-won Jung , Sook Lee , Kwang-sub Yoon , Sang-jun Choi , Sang-gyun Woo
发明人： Hyun-woo Kim , Ki-young Kwon , Si-hyeung Lee , Dong-won Jung , Sook Lee , Kwang-sub Yoon , Sang-jun Choi , Sang-gyun Woo
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0397
摘要： There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, &ggr;-butyrolactone-2-yl ester, &ggr;-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-&ggr;-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1˜0.7, b/(a+b+c) is 0.1˜0.8, c/(a+b+c) is 0.0˜0.8, and n is an integer in the range of 0 to 2.
摘要翻译：提供光敏聚合物和含有它的光致抗蚀剂复合物。光敏聚合物由下式表示：其中R1是酸不稳定的叔烷基酯基，R2是氢原子，甲基，乙基，羧基，γ-丁内酯-2-基酯，γ-丁内酯-3-基酯，泛酸内酯-2-基酯，甲羟戊酸内酯，3-四氢呋喃基酯，2,3-亚丙基碳酸酯-1-基酯，3-甲基-γ-丁内酯-3-基酯或C 3至C 20脂环族烃，a /（ a + b + c）为0.1〜0.7，b /（a + b + c）为0.1〜0.8，c /（a + b + c）为0.0〜0.8，n为0〜 2。

5. 发明授权

US07045267B2 Resist composition comprising photosensitive polymer having lactone in its backbone 有权
标题翻译：抗蚀剂组合物包含其主链中具有内酯的光敏聚合物
公开(公告)号：US07045267B2
公开(公告)日：2006-05-16
申请号：US10349917
申请日：2003-01-24
申请人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
发明人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
IPC分类号： G03F7/038 , C07D307/00
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： This invention is directed to a coating composition used for original equipment manufacturing or refinishing uses in the automotive industry, which coating composition utilizes an acrylic polymer which contains substituted or unsubstituted exomethylene lactones or lactams as a comonomer.
摘要翻译：本发明涉及用于汽车工业的原始设备制造或修补用途的涂料组合物，该涂料组合物使用含有取代或未取代的异亚丙基内酯或内酰胺作为共聚单体的丙烯酸类聚合物。

6. 发明授权

US06642336B1 Photosensitive polymer 有权
标题翻译：光敏聚合物
公开(公告)号：US06642336B1
公开(公告)日：2003-11-04
申请号：US09644101
申请日：2000-08-23
申请人： Sook Lee , Ki-young Kwon , Si-hyeung Lee , Kwang-sub Yoon , Hyun-woo Kim , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
发明人： Sook Lee , Ki-young Kwon , Si-hyeung Lee , Kwang-sub Yoon , Hyun-woo Kim , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
IPC分类号： C08F1000
CPC分类号： G03F7/039 , C08G61/08 , G03F7/0045
摘要： A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.
摘要翻译：即使暴露于193nm以下的短波长光源也能够保持透明性的光敏性聚合物表现出改善的对基材的粘合性，改善的对比度和改善的耐干蚀刻性。感光性高分子包括具有酸不稳定性C6〜C20叔脂环族烃基作为取代基的脂环式羧酸酯的第一单体和能够进行自由基聚合的第二单体。

7. 发明授权

US06537727B2 Resist composition comprising photosensitive polymer having loctone in its backbone 有权
标题翻译：抗蚀剂组合物包含其主链中具有洛酮的光敏聚合物
公开(公告)号：US06537727B2
公开(公告)日：2003-03-25
申请号：US09901569
申请日：2001-07-11
申请人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
发明人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
IPC分类号： G03F7038
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.
摘要翻译：抗蚀剂组合物包括在其主链中具有内酯的光敏聚合物。抗蚀剂组合物的光敏聚合物包含至少一种具有下式的单体：其中R 1和R 2独立地为氢原子，烷基，羟烷基，烷氧基，羰基或酯，x，y，v和w独立地为 1〜6。

8. 发明授权

US06503687B2 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition 失效
标题翻译：脂环族光敏聚合物，含有它们的抗蚀剂组合物和制备抗蚀剂组合物的方法
公开(公告)号：US06503687B2
公开(公告)日：2003-01-07
申请号：US09731896
申请日：2000-12-08
申请人： Hyun-woo Kim , Si-hyueng Lee , Ki-young Kwon , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
发明人： Hyun-woo Kim , Si-hyueng Lee , Ki-young Kwon , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/039
摘要： A photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units, a resist composition containing the photosensitive polymer and a preparation method thereof, wherein the photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl group, R2 is &ggr;-butyrolactone-2-yl, &ggr;-butyrolactone-3-yl, pantolactone-2-yl, mevalonic lactone, 3-tetrahydrofuranyl, 2,3-propylenecarbonate-1-yl or 3-methyl-&ggr;-butyrolactone-3-yl, R3 is a hydrogen atom, methyl, ethyl or C3 to C20 alicyclic hydrocarbon, and p/(p+q+r) is 0.1˜0.8, q/(p+q+r) is 0.2˜0.8, and r/(p+q+r) is 0.0˜0.4. To prepare the photosensitive polymer, at least two different norbornene-type compounds having an ester group as a substituent are reacted in the presence of an initiator at a temperature of about 120 to about 150 ° C. without a reaction catalyst.
摘要翻译：具有仅由降冰片烯型脂环族单元构成的主链的光敏性聚合物，含有感光性高分子的抗蚀剂组合物及其制备方法，其中，所述感光性聚合物由下式表示：式中，R1为酸不稳定的叔烷基 R2是γ-丁内酯-2-基，γ-丁内酯-3-基，泛酸内酯-2-基，甲羟戊酸内酯，3-四氢呋喃基，2,3-亚丙基碳酸酯-1-基或3-甲基-γ-丁内酯 - R 3为氢原子，甲基，乙基或C 3〜C 20脂环族烃，p /（p + q + r）为0.1〜0.8，q /（p + q + r）为0.2〜0.8， r /（p + q + r）为0.0〜0.4。为了制备感光性聚合物，在引发剂的存在下，在没有反应催化剂的情况下，在约120〜约150℃的温度下，使具有酯基作为取代基的至少两种不同的降冰片烯型化合物进行反应。

9. 发明申请

US20060063384A1 Mask patterns for semiconductor device fabrication and related methods and structures 失效
标题翻译：半导体器件制造的掩模图案及相关方法和结构
公开(公告)号：US20060063384A1
公开(公告)日：2006-03-23
申请号：US11232703
申请日：2005-09-22
申请人： Jung-hwan Hah , Hyun-woo Kim , Mitsuhiro Hata , Sang-gyun Woo
发明人： Jung-hwan Hah , Hyun-woo Kim , Mitsuhiro Hata , Sang-gyun Woo
IPC分类号： G03F1/00 , H01L21/302
CPC分类号： H01L21/0274 , G03F7/405 , H01L21/0273 , H01L21/31144
摘要： Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the layer exposed through the resist pattern and the organic-inorganic hybrid siloxane network film may then be removed. Related structures are also discussed.
摘要翻译：形成集成电路器件的方法可以包括在集成电路器件的层上形成抗蚀剂图案，其中该层的部分通过抗蚀剂图案的开口露出。可以在抗蚀剂图案上形成有机 - 无机杂化硅氧烷网膜。然后可以去除通过抗蚀剂图案暴露的层的部分和有机 - 无机杂化硅氧烷网膜。还讨论了相关结构。

10. 发明授权

US06787287B2 Photosensitive polymers and resist compositions comprising the photosensitive polymers 失效
标题翻译：包含光敏聚合物的光敏聚合物和抗蚀剂组合物
公开(公告)号：US06787287B2
公开(公告)日：2004-09-07
申请号：US10103756
申请日：2002-03-25
申请人： Hyun-woo Kim , Sang-gyun Woo , Yool Kang
发明人： Hyun-woo Kim , Sang-gyun Woo , Yool Kang
IPC分类号： G03F7075
CPC分类号： G03F7/0758 , G03F7/0045 , Y10S430/106 , Y10S430/115
摘要： A photosensitive polymer of a resist composition includes a copolymer of alkyl vinyl ether containing silicon and maleic anhydride, represented by the following formula: where R1 is —H, —OSi(CH3)2C(CH3)3 or —OSi(CH3)3; R2 is —H, —OH, —OCOCH3, —OSi(CH3)2C(CH3)3 or —OSi(CH(CH3)2)3; R3 is —H, —OH or —OCOCH3; R4 is —H, —OSi(CH3)2C(CH3)3, —CH2OSi(CH3)2C(CH3)3 or —CH2OSi(CH(CH3)2)3; and at least one of R1, R2, R3 and R4 is a Si-containing group.
摘要翻译：抗蚀剂组合物的光敏聚合物包括由下式表示的含硅烷基乙烯基醚和马来酸酐的共聚物：其中R1是-H，-OSi（CH3）2C（CH3）3或-OSi（CH3）3; R2是-H，-OH，-OCOCH3，-OSi（CH3）2C（CH3）3或-OSi（CH（CH3）2）3; R3是-H，-OH或-OCOCH3; R4是-H，-OSi（CH3）2C（CH3）3，-CH2OSi（CH3）2C（CH3）3或-CH2OSi（CH（CH3）2）3; R 1，R 2，R 3和R 4中的至少一个为含Si基团。

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