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1. 发明授权

US09045826B2 Thin film deposition apparatus and thin film deposition method using the same 有权
标题翻译：薄膜沉积装置和使用其的薄膜沉积方法
公开(公告)号：US09045826B2
公开(公告)日：2015-06-02
申请号：US13613804
申请日：2012-09-13
申请人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Cheol-Rae Jo , Choel-Min Jang , Jeong-Ho Yi
发明人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Cheol-Rae Jo , Choel-Min Jang , Jeong-Ho Yi
IPC分类号： C23C16/455
CPC分类号： C23C16/45551
摘要： In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.
摘要翻译：在使用其的薄膜沉积装置和薄膜沉积方法中，制备分别驱动的第一喷射单元和第二喷射单元，驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到衬底，腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源，驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上，并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。当使用薄膜沉积方法时，在沉积期间非常期望的微粒的产生被充分地抑制。

2. 发明申请

US20130189433A1 Vapor Deposition Apparatus and Vapor Deposition Method 有权
标题翻译：气相沉积装置和气相沉积法
公开(公告)号：US20130189433A1
公开(公告)日：2013-07-25
申请号：US13530924
申请日：2012-06-22
申请人： Choel-Min Jang , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Sang-Joon Seo , Seung-Hun Kim , Jin-Kwang Kim
发明人： Choel-Min Jang , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Sang-Joon Seo , Seung-Hun Kim , Jin-Kwang Kim
IPC分类号： C23C16/458 , C23C16/455
CPC分类号： C23C16/46 , C23C16/45551 , C23C16/45563 , C23C16/4583
摘要： A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.
摘要翻译：蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。

3. 发明授权

US08940368B2 Vapor deposition apparatus and vapor deposition method 有权
标题翻译：蒸镀装置及气相沉积法
公开(公告)号：US08940368B2
公开(公告)日：2015-01-27
申请号：US13530924
申请日：2012-06-22
申请人： Choel-Min Jang , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Sang-Joon Seo , Seung-Hun Kim , Jin-Kwang Kim
发明人： Choel-Min Jang , Myung-Soo Huh , Jeong-Ho Yi , Cheol-Rae Jo , Sang-Joon Seo , Seung-Hun Kim , Jin-Kwang Kim
IPC分类号： C23C16/458 , C23C16/455
CPC分类号： C23C16/46 , C23C16/45551 , C23C16/45563 , C23C16/4583
摘要： A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.
摘要翻译：蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。

4. 发明申请

US20130266728A1 THIN FILM DEPOSITING APPARATUS AND THIN FILM DEPOSITING METHOD USING THE SAME 有权
标题翻译：薄膜沉积装置和薄膜沉积方法
公开(公告)号：US20130266728A1
公开(公告)日：2013-10-10
申请号：US13613804
申请日：2012-09-13
申请人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Cheol-Rae Jo , Choel-Min Jang , Jeong-Ho Yi
发明人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Cheol-Rae Jo , Choel-Min Jang , Jeong-Ho Yi
IPC分类号： C23C16/455
CPC分类号： C23C16/45551
摘要： In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.
摘要翻译：在使用其的薄膜沉积装置和薄膜沉积方法中，制备分别驱动的第一喷射单元和第二喷射单元，驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到衬底，腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源，驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上，并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。当使用薄膜沉积方法时，在沉积期间非常期望的微粒的产生被充分地抑制。

5. 发明授权

US08900662B2 Thin film depositing apparatus and thin film depositing method used by the same 有权
标题翻译：薄膜沉积设备及其使用的薄膜沉积方法
公开(公告)号：US08900662B2
公开(公告)日：2014-12-02
申请号：US13572420
申请日：2012-08-10
申请人： Sung-Yong Lee , Myung-Soo Huh , Choel-Min Jang , Cheol-Rae Jo , In-Kyo Kim , Yong-Suk Lee , Mi-Ra An , Sang-Joon Seo
发明人： Sung-Yong Lee , Myung-Soo Huh , Choel-Min Jang , Cheol-Rae Jo , In-Kyo Kim , Yong-Suk Lee , Mi-Ra An , Sang-Joon Seo
IPC分类号： C23C16/00 , C23C16/44
CPC分类号： C23C16/45551 , C23C16/4583
摘要： A thin film depositing apparatus and a thin film depositing method used by the thin film depositing apparatus. The thin film depositing apparatus includes a deposition chamber through which a process gas outlet of a deposition source is arranged; a transfer shuttle disposed in the deposition chamber, the transfer shuttle comprising a mounting plate for loading a substrate, the transfer shuttle being reciprocal with respect to the process gas outlet; and at least one bendable auxiliary plate installed at one side of the transfer shuttle, the bendable auxiliary plate closing the process gas outlet when opposite the process gas outlet, the bendable auxiliary plate comprising a folding member for placing the bendable auxiliary plate in each of an unbent state and bent state dependent upon the position of the transfer shuttle.
摘要翻译：薄膜沉积设备使用的薄膜沉积设备和薄膜沉积方法。薄膜沉积设备包括沉积室，沉积源的处理气体出口通过其沉积; 设置在所述沉积室中的传送梭，所述传送梭包括用于装载基底的安装板，所述传送梭相对于所述处理气体出口是往复的; 以及安装在所述传送梭的一侧的至少一个可弯曲辅助板，所述可弯曲辅助板在与所述工艺气体出口相对的位置处关闭所述工艺气体出口，所述可弯曲辅助板包括折叠构件，用于将所述可弯曲辅助板放置在取决于转移梭的位置的弯曲状态和弯曲状态。

6. 发明申请

US20130251902A1 Thin Film Depositing Apparatus and Thin Film Depositing Method Used by the Same 有权
标题翻译：薄膜沉积设备及其使用的薄膜沉积方法
公开(公告)号：US20130251902A1
公开(公告)日：2013-09-26
申请号：US13572420
申请日：2012-08-10
申请人： Sung-Yong Lee , Myung-Soo Huh , Choel-Min Jang , Cheol-Rae Jo , In-Kyo Kim , Yong-Suk Lee , Mi-Ra An , Sang-Joon Seo
发明人： Sung-Yong Lee , Myung-Soo Huh , Choel-Min Jang , Cheol-Rae Jo , In-Kyo Kim , Yong-Suk Lee , Mi-Ra An , Sang-Joon Seo
IPC分类号： C23C16/44 , C23C16/00
CPC分类号： C23C16/45551 , C23C16/4583
摘要： A thin film depositing apparatus and a thin film depositing method used by the thin film depositing apparatus. The thin film depositing apparatus includes a deposition chamber through which a process gas outlet of a deposition source is arranged; a transfer shuttle disposed in the deposition chamber, the transfer shuttle comprising a mounting plate for loading a substrate, the transfer shuttle being reciprocal with respect to the process gas outlet; and at least one bendable auxiliary plate installed at one side of the transfer shuttle, the bendable auxiliary plate closing the process gas outlet when opposite the process gas outlet, the bendable auxiliary plate comprising a folding member for placing the bendable auxiliary plate in each of an unbent state and bent state dependent upon the position of the transfer shuttle.
摘要翻译：薄膜沉积设备使用的薄膜沉积设备和薄膜沉积方法。薄膜沉积设备包括沉积室，沉积源的处理气体出口通过其沉积; 设置在所述沉积室中的传送梭，所述传送梭包括用于装载基底的安装板，所述传送梭相对于所述处理气体出口是往复的; 以及安装在所述传送梭的一侧的至少一个可弯曲辅助板，所述可弯曲辅助板在与所述工艺气体出口相对的位置处关闭所述工艺气体出口，所述可弯曲辅助板包括折叠构件，用于将所述可弯曲辅助板放置在取决于转移梭的位置的弯曲状态和弯曲状态。

7. 发明授权

US08883267B2 Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus 有权
标题翻译：蒸镀装置，气相沉积法和制造有机发光显示装置的方法
公开(公告)号：US08883267B2
公开(公告)日：2014-11-11
申请号：US13431880
申请日：2012-03-27
申请人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Seung-Yong Song
发明人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Seung-Yong Song
IPC分类号： C23C16/04 , C23C16/50 , C23C16/458 , C23C16/455
CPC分类号： C23C16/45542 , C23C16/45551 , C23C16/4587
摘要： A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.
摘要翻译：一种用于有效地执行沉积工艺以形成具有改善的基板特性的薄膜的蒸镀装置和方法，以及制造有机发光显示装置的方法。该蒸镀装置具备包括排气口的室，设置在所述室中的台，并且包括将要设置所述基板的安装表面; 注射部分，其包括至少一个注射开口，气体在与要形成所述薄膜的所述基底的表面平行的方向上被注入; 以及等离子体发生器，其与衬底分离设置以面对衬底。

8. 发明申请

US20130017343A1 VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 有权
标题翻译：蒸气沉积装置，蒸发沉积方法和制造有机发光显示装置的方法
公开(公告)号：US20130017343A1
公开(公告)日：2013-01-17
申请号：US13431880
申请日：2012-03-27
申请人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Seung-Yong Song
发明人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Seung-Yong Song
IPC分类号： H05B33/10 , H05H1/24 , C23C16/04 , C23C16/50
CPC分类号： C23C16/45542 , C23C16/45551 , C23C16/4587
摘要： A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.
摘要翻译：一种用于有效地执行沉积工艺以形成具有改善的基板特性的薄膜的蒸镀装置和方法，以及制造有机发光显示装置的方法。该蒸镀装置具备包括排气口的室，设置在所述室中的台，并且包括将要设置所述基板的安装表面; 注射部分，其包括至少一个注射开口，气体在与要形成所述薄膜的所述基底的表面平行的方向上被注入; 以及等离子体发生器，其与衬底分离设置以面对衬底。

9. 发明授权

US08957583B2 Method of fabricating organic light-emitting display and organic light-emitting display fabricated by the method 有权
标题翻译：通过该方法制造有机发光显示器和有机发光显示器的方法
公开(公告)号：US08957583B2
公开(公告)日：2015-02-17
申请号：US13297586
申请日：2011-11-16
申请人： Jin-Kwang Kim , Sang-Joon Seo , Seung-Hun Kim , Jun-Hyuk Cheon
发明人： Jin-Kwang Kim , Sang-Joon Seo , Seung-Hun Kim , Jun-Hyuk Cheon
IPC分类号： H01J1/62 , H01J63/04 , H01L51/52
CPC分类号： H01L51/5253
摘要： A method of fabricating an organic light-emitting display includes forming an organic light-emitting device (OLED) on a substrate, forming a first encapsulation layer, which has a first thin-film density and contains a first inorganic material, on the substrate, and forming a second encapsulation layer, which has a second thin-film density higher than the first thin-film density and contains a second inorganic material, on the first encapsulation layer.
摘要翻译：一种制造有机发光显示器的方法包括在衬底上形成有机发光器件（OLED），在衬底上形成具有第一薄膜密度并包含第一无机材料的第一封装层，以及在所述第一封装层上形成具有比所述第一薄膜密度高的第二薄膜密度并且包含第二无机材料的第二封装层。

10. 发明申请

US20130115373A1 ROTATING TYPE THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION METHOD USED BY THE SAME 有权
标题翻译：旋转式薄膜沉积装置及其使用的薄膜沉积方法
公开(公告)号：US20130115373A1
公开(公告)日：2013-05-09
申请号：US13443268
申请日：2012-04-10
申请人： Jin-Kwang Kim , Sang-Joon Seo , Seung-Hun Kim
发明人： Jin-Kwang Kim , Sang-Joon Seo , Seung-Hun Kim
IPC分类号： C23C16/458
CPC分类号： C23C16/458 , B01J19/1887 , B01J19/22 , C23C14/50 , C23C16/45551
摘要： A rotating type thin film deposition apparatus having an improved structure that allows continuous deposition, and a thin film deposition method used by the rotating type thin film deposition apparatus are provided. The rotating type thin film deposition apparatus includes a deposition device; a circulation running unit that runs a deposition target on a circulation track via a deposition region of the deposition device; and a support unit that supports the deposition target and moves along the circulation track. Thin layers can be precisely and uniformly formed on the entire surface of a deposition target, and since deposition is performed while a plurality of deposition targets move along a caterpillar track, a working speed is faster compared to a method involving a general reciprocating motion, and the size of the thin film deposition apparatus can be reduced.
摘要翻译：提供一种旋转型薄膜沉积设备，其具有能够连续沉积的改进的结构，以及由旋转型薄膜沉积设备使用的薄膜沉积方法。旋转型薄膜沉积设备包括沉积设备; 循环运行单元，其经由沉积装置的沉积区域在循环轨道上运行沉积靶; 以及支撑单元，其支撑沉积靶并沿着循环轨迹移动。可以在沉积靶的整个表面上精确均匀地形成薄层，并且由于在多个沉积靶沿着履带轨道移动时进行沉积，与涉及一般往复运动的方法相比，加工速度更快，可以减小薄膜沉积装置的尺寸。

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