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1. 发明申请

US20130037406A1 Sputtering apparatus 审中-公开
标题翻译：溅射装置
公开(公告)号：US20130037406A1
公开(公告)日：2013-02-14
申请号：US13506235
申请日：2012-04-04
申请人： Myung-Soo Huh
发明人： Myung-Soo Huh
IPC分类号： C23C14/34 , C23C14/08 , C23C14/35
CPC分类号： C23C14/0042 , C23C14/086 , C23C14/35
摘要： A sputtering device for depositing a deposition material from a deposition source to a deposition target, wherein a sputtering pressure between the deposition source and the deposition target is from about 6.70×10−2 Pa to about 1.34×10−1 Pa.
摘要翻译：一种用于将沉积材料从沉积源沉积到沉积靶的溅射装置，其中沉积源和沉积靶之间的溅射压力为约6.70×10 -2 Pa至约1.34×10 -1 Pa。

2. 发明申请

US20060269671A1 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure 有权
标题翻译：催化增强化学气相沉积装置具有有效的灯丝排列结构
公开(公告)号：US20060269671A1
公开(公告)日：2006-11-30
申请号：US11439350
申请日：2006-05-24
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/44
摘要： The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
摘要翻译：本发明提供一种催化增强化学气相沉积（CVD）装置，其能够将气体使用效率最大化到80％以上，并且通过有效地布置安装在催化增强CVD装置的喷头上的细丝，获得均匀的薄膜，由此均匀分解沉积源气体。本发明还提供一种通过催化增强CVD装置形成无机膜的有机电致发光器件的制造方法。

3. 发明申请

US20060121816A1 Method of manufacturing organic light emitting device by using mirror shaped target sputtering apparatus 审中-公开
标题翻译：使用镜像靶溅射装置制造有机发光器件的方法
公开(公告)号：US20060121816A1
公开(公告)日：2006-06-08
申请号：US11171498
申请日：2005-07-01
申请人： Kyu-Sung Lee , Han-Ki Kim , Do-Geun Kim , Myung-Soo Huh , Seok-Heon Jeong
发明人： Kyu-Sung Lee , Han-Ki Kim , Do-Geun Kim , Myung-Soo Huh , Seok-Heon Jeong
IPC分类号： H01J9/24 , H01J9/00
CPC分类号： H01L51/5203 , C23C14/352 , H01L51/0008 , H01L51/0021
摘要： A method of manufacturing an organic light emitting device by using a facing target sputtering apparatus is provided. The method includes forming a first electrode on a substrate; forming an organic film on the first electrode; and forming a second electrode on the organic film by using a facing target sputtering apparatus. Accordingly, an electrode film is formed on the organic light emitting device at a low temperature without deterioration of the electrode film due to plasma, it is possible to improve light emitting efficiency and electro-optical characteristics of the organic light emitting device.
摘要翻译：提供了一种通过使用面对靶溅射装置制造有机发光器件的方法。该方法包括在基板上形成第一电极; 在第一电极上形成有机膜; 以及通过使用面对靶溅射装置在所述有机膜上形成第二电极。因此，在低温下在有机发光器件上形成电极膜，而不会由于等离子体而导致电极膜的劣化，可以提高有机发光器件的发光效率和电光特性。

4. 发明申请

US20050194475A1 Inductively coupled plasma chemical vapor deposition apparatus 审中-公开
标题翻译：电感耦合等离子体化学气相沉积装置
公开(公告)号：US20050194475A1
公开(公告)日：2005-09-08
申请号：US11070232
申请日：2005-03-03
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee , Seok-Heon Jeong
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee , Seok-Heon Jeong
IPC分类号： C23C16/507 , B05B5/025 , C23C16/455 , H01L21/285 , H01L21/31
CPC分类号： H01J37/3244 , C23C16/042 , C23C16/45563 , C23C16/507 , H01J37/321 , H01J37/3211
摘要： An inductively coupled plasma chemical vapor deposition apparatus comprises a reaction gas spray nozzle capable of evenly spraying reaction gas onto a rectangular substrate, a radio frequency (RF) antenna capable of uniformly forming a plasma source in a rectangular shape, and a rectangular mask maintained at a low temperature so as to uniformly form a thin film on the rectangular substrate used for a flat panel display device.
摘要翻译：电感耦合等离子体化学气相沉积装置包括能够将反应气体均匀地喷射到矩形基板上的反应气体喷嘴，能够均匀地形成矩形形状的等离子体源的射频（RF）天线和维持在低温，以便在用于平板显示装置的矩形基板上均匀地形成薄膜。

5. 发明授权

US09390841B2 Vapor deposition apparatus, method of forming thin film using the same and method of manufacturing organic light-emitting display apparatus 有权
标题翻译：蒸镀装置，使用该薄膜的薄膜的制造方法以及制造有机发光显示装置的方法
公开(公告)号：US09390841B2
公开(公告)日：2016-07-12
申请号：US13795399
申请日：2013-03-12
申请人： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
发明人： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
IPC分类号： C23C16/00 , H01B13/30 , C23C14/24 , C23C14/56 , C23C16/44 , C23C16/455
CPC分类号： H01L51/0021 , C23C14/24 , C23C14/564 , C23C16/4401 , C23C16/4412 , C23C16/45536 , C23C16/45544 , C23C16/45551 , C23C16/50 , H01B13/30 , H01L27/3244 , H01L51/5206 , H01L51/5221 , H01L51/5253 , H01L51/56 , H01L2227/323
摘要： A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
摘要翻译：一种气相沉积装置，其中通过移动基板进行沉积工艺，所述气相沉积设备包括向基板注入至少一种原料气体的供应单元和对应于供应设置的阻塞气体流产生单元并且产生阻挡原料气体流动的气流。

6. 发明授权

US08900662B2 Thin film depositing apparatus and thin film depositing method used by the same 有权
标题翻译：薄膜沉积设备及其使用的薄膜沉积方法
公开(公告)号：US08900662B2
公开(公告)日：2014-12-02
申请号：US13572420
申请日：2012-08-10
申请人： Sung-Yong Lee , Myung-Soo Huh , Choel-Min Jang , Cheol-Rae Jo , In-Kyo Kim , Yong-Suk Lee , Mi-Ra An , Sang-Joon Seo
发明人： Sung-Yong Lee , Myung-Soo Huh , Choel-Min Jang , Cheol-Rae Jo , In-Kyo Kim , Yong-Suk Lee , Mi-Ra An , Sang-Joon Seo
IPC分类号： C23C16/00 , C23C16/44
CPC分类号： C23C16/45551 , C23C16/4583
摘要： A thin film depositing apparatus and a thin film depositing method used by the thin film depositing apparatus. The thin film depositing apparatus includes a deposition chamber through which a process gas outlet of a deposition source is arranged; a transfer shuttle disposed in the deposition chamber, the transfer shuttle comprising a mounting plate for loading a substrate, the transfer shuttle being reciprocal with respect to the process gas outlet; and at least one bendable auxiliary plate installed at one side of the transfer shuttle, the bendable auxiliary plate closing the process gas outlet when opposite the process gas outlet, the bendable auxiliary plate comprising a folding member for placing the bendable auxiliary plate in each of an unbent state and bent state dependent upon the position of the transfer shuttle.
摘要翻译：薄膜沉积设备使用的薄膜沉积设备和薄膜沉积方法。薄膜沉积设备包括沉积室，沉积源的处理气体出口通过其沉积; 设置在所述沉积室中的传送梭，所述传送梭包括用于装载基底的安装板，所述传送梭相对于所述处理气体出口是往复的; 以及安装在所述传送梭的一侧的至少一个可弯曲辅助板，所述可弯曲辅助板在与所述工艺气体出口相对的位置处关闭所述工艺气体出口，所述可弯曲辅助板包括折叠构件，用于将所述可弯曲辅助板放置在取决于转移梭的位置的弯曲状态和弯曲状态。

7. 发明授权

US08883267B2 Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus 有权
标题翻译：蒸镀装置，气相沉积法和制造有机发光显示装置的方法
公开(公告)号：US08883267B2
公开(公告)日：2014-11-11
申请号：US13431880
申请日：2012-03-27
申请人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Seung-Yong Song
发明人： Sang-Joon Seo , Myung-Soo Huh , Seung-Hun Kim , Jin-Kwang Kim , Seung-Yong Song
IPC分类号： C23C16/04 , C23C16/50 , C23C16/458 , C23C16/455
CPC分类号： C23C16/45542 , C23C16/45551 , C23C16/4587
摘要： A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.
摘要翻译：一种用于有效地执行沉积工艺以形成具有改善的基板特性的薄膜的蒸镀装置和方法，以及制造有机发光显示装置的方法。该蒸镀装置具备包括排气口的室，设置在所述室中的台，并且包括将要设置所述基板的安装表面; 注射部分，其包括至少一个注射开口，气体在与要形成所述薄膜的所述基底的表面平行的方向上被注入; 以及等离子体发生器，其与衬底分离设置以面对衬底。

8. 发明申请

US20130171335A1 THIN FILM DEPOSITING APPARATUS AND THE THIN FILM DEPOSITING METHOD USING THE SAME 审中-公开
标题翻译：薄膜沉积装置和使用其的薄膜沉积方法
公开(公告)号：US20130171335A1
公开(公告)日：2013-07-04
申请号：US13535268
申请日：2012-06-27
申请人： Yong-Suk Lee , Myung-Soo Huh , Cheol-Rae Jo , Sang-Hyuk Hong , Jeong-Ho Yi , Suk-Won Jung , Sun-Ho Kim , Mi-Ra An
发明人： Yong-Suk Lee , Myung-Soo Huh , Cheol-Rae Jo , Sang-Hyuk Hong , Jeong-Ho Yi , Suk-Won Jung , Sun-Ho Kim , Mi-Ra An
IPC分类号： C23C16/458 , C23C16/52 , C23C16/50 , C23C16/448
CPC分类号： C23C14/12 , C23C14/228 , C23C14/246 , C23C14/58 , C23C14/584
摘要： A thin film depositing apparatus and a thin film deposition method using the apparatus. The thin film depositing apparatus includes a chamber configured to have a substrate mounted therein, an ejection unit configured to move in the chamber and to eject a deposition vapor to the substrate, and a source supply unit configured to supply a source of the deposition vapor to the ejection unit.
摘要翻译：一种薄膜沉积设备和使用该设备的薄膜沉积方法。该薄膜沉积设备包括：一个被配置为具有安装在其中的基板的腔室;喷射单元，被配置为在腔室中移动并将沉积蒸气喷射到基底;以及源供应单元，其构造成将沉积蒸气源供应到喷射单元。

9. 发明授权

US08383208B2 Method of fabricating organic light emitting device 有权
标题翻译：制造有机发光装置的方法
公开(公告)号：US08383208B2
公开(公告)日：2013-02-26
申请号：US11400474
申请日：2006-04-06
申请人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
发明人： Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
IPC分类号： H05H1/24 , C23C16/00 , H05B3/00
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/5096 , H01L51/5253
摘要： Methods of fabricating an organic light emitting device using plasma and/or thermal decomposition are provided. An insulating layer is formed by reacting first and second radicals. The first radical is formed by passing a first gas through a plasma generating region and a heating body, and the second radical is formed by passing a second gas through the heating body. The methods improve the characteristics of the resulting insulating layer and increase the use efficiency of the source gas by substantially decomposing the source gas. The insulating layer can be a passivation layer formed on an organic light emitting device. The methods use plasma apparatuses such as an inductively coupled plasma chemical vapor deposition (ICP-CVD) apparatuses or plasma enhanced chemical vapor deposition (PECVD) apparatuses.
摘要翻译：提供了使用等离子体和/或热分解制造有机发光器件的方法。通过使第一和第二自由基反应形成绝缘层。通过使第一气体通过等离子体生成区域和加热体而形成第一基团，通过使第二气体通过加热体而形成第二自由基。该方法通过基本分解源气体来改善所得绝缘层的特性并提高源气体的使用效率。绝缘层可以是形成在有机发光器件上的钝化层。该方法使用诸如感应耦合等离子体化学气相沉积（ICP-CVD）装置或等离子体增强化学气相沉积（PECVD）装置之类的等离子体装置。

10. 发明申请

US20130026035A1 SPUTTER DEVICE 有权
标题翻译：喷头装置
公开(公告)号：US20130026035A1
公开(公告)日：2013-01-31
申请号：US13446873
申请日：2012-04-13
申请人： Yong-Sup CHOI , Myung-Soo Huh
发明人： Yong-Sup CHOI , Myung-Soo Huh
IPC分类号： C23C14/35
CPC分类号： H01J37/32229 , C23C14/352 , C23C14/357 , H01J37/32275 , H01J37/3405
摘要： A sputter device including a plurality of targets having magnetism; a reflector having magnetism and arranged between neighboring targets of the plurality of targets; a wave guide having magnetism and arranged adjacent the targets, the wave guide forming a guide space for guiding microwaves; and a limiter having magnetism and arranged adjacent the wave guide, the limiter forming an electron cyclotron resonance area together with the targets, the reflector, and the wave guide.
摘要翻译：一种包括具有磁性的多个靶的溅射装置; 具有磁性并布置在所述多个靶的相邻靶之间的反射器; 具有磁性并布置成邻近靶的波导，波导形成用于引导微波的引导空间; 以及具有磁性并且布置成邻近波导的限幅器，限制器与靶，反射器和波导一起形成电子回旋共振区域。

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