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    • 9. 发明授权
    • Method of fabricating organic light emitting device
    • 制造有机发光装置的方法
    • US08383208B2
    • 2013-02-26
    • US11400474
    • 2006-04-06
    • Han-Ki KimMyung-Soo HuhMyoung-Soo KimKyu-Sung Lee
    • Han-Ki KimMyung-Soo HuhMyoung-Soo KimKyu-Sung Lee
    • H05H1/24C23C16/00H05B3/00
    • C23C16/45565C23C16/45574C23C16/5096H01L51/5253
    • Methods of fabricating an organic light emitting device using plasma and/or thermal decomposition are provided. An insulating layer is formed by reacting first and second radicals. The first radical is formed by passing a first gas through a plasma generating region and a heating body, and the second radical is formed by passing a second gas through the heating body. The methods improve the characteristics of the resulting insulating layer and increase the use efficiency of the source gas by substantially decomposing the source gas. The insulating layer can be a passivation layer formed on an organic light emitting device. The methods use plasma apparatuses such as an inductively coupled plasma chemical vapor deposition (ICP-CVD) apparatuses or plasma enhanced chemical vapor deposition (PECVD) apparatuses.
    • 提供了使用等离子体和/或热分解制造有机发光器件的方法。 通过使第一和第二自由基反应形成绝缘层。 通过使第一气体通过等离子体生成区域和加热体而形成第一基团,通过使第二气体通过加热体而形成第二自由基。 该方法通过基本分解源气体来改善所得绝缘层的特性并提高源气体的使用效率。 绝缘层可以是形成在有机发光器件上的钝化层。 该方法使用诸如感应耦合等离子体化学气相沉积(ICP-CVD)装置或等离子体增强化学气相沉积(PECVD)装置之类的等离子体装置。