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    • 10. 发明申请
    • ROTATING TYPE THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION METHOD USED BY THE SAME
    • 旋转式薄膜沉积装置及其使用的薄膜沉积方法
    • US20130115373A1
    • 2013-05-09
    • US13443268
    • 2012-04-10
    • Jin-Kwang KimSang-Joon SeoSeung-Hun Kim
    • Jin-Kwang KimSang-Joon SeoSeung-Hun Kim
    • C23C16/458
    • C23C16/458B01J19/1887B01J19/22C23C14/50C23C16/45551
    • A rotating type thin film deposition apparatus having an improved structure that allows continuous deposition, and a thin film deposition method used by the rotating type thin film deposition apparatus are provided. The rotating type thin film deposition apparatus includes a deposition device; a circulation running unit that runs a deposition target on a circulation track via a deposition region of the deposition device; and a support unit that supports the deposition target and moves along the circulation track. Thin layers can be precisely and uniformly formed on the entire surface of a deposition target, and since deposition is performed while a plurality of deposition targets move along a caterpillar track, a working speed is faster compared to a method involving a general reciprocating motion, and the size of the thin film deposition apparatus can be reduced.
    • 提供一种旋转型薄膜沉积设备,其具有能够连续沉积的改进的结构,以及由旋转型薄膜沉积设备使用的薄膜沉积方法。 旋转型薄膜沉积设备包括沉积设备; 循环运行单元,其经由沉积装置的沉积区域在循环轨道上运行沉积靶; 以及支撑单元,其支撑沉积靶并沿着循环轨迹移动。 可以在沉积靶的整个表面上精确均匀地形成薄层,并且由于在多个沉积靶沿着履带轨道移动时进行沉积,与涉及一般往复运动的方法相比,加工速度更快, 可以减小薄膜沉积装置的尺寸。