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2. 发明公开

EP0632327A1 Photoresist composition 失效
标题翻译： Photoresistzusammensetzung。
公开(公告)号：EP0632327A1
公开(公告)日：1995-01-04
申请号：EP94108468.3
申请日：1994-06-01
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Nakano, Yuko , Takeyama, Naoki , Ueda, Yuji , Kusumoto, Takehiro , Oka, Hiromi
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/121 , Y10S430/122 , Y10S430/125
摘要： A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and a crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer lasers are used as the light source. It also hardly cause a scam during the developing process.
摘要翻译：一种负性或正性光致抗蚀剂组合物，其包含含有至少一种选自部分烷基醚化的聚乙烯基苯酚和部分烷基醚化的氢化聚乙烯基苯酚的碱溶性树脂，光致酸性前体，其含有至少一种磺酸酯 N-羟基酰亚胺化合物和交联剂或溶解抑制剂，该光致抗蚀剂组合物在耐热性，膜厚保持性，涂布性，轮廓等各种性能方面优异，并且当远紫外线时还具有高灵敏度和高分辨率包括准分子激光器被用作光源。在开发过程中也不会造成骗局。

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