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1. 发明授权

EP0592790B1 Negative photoresist composition 无效
标题翻译：负光致抗蚀剂成分
公开(公告)号：EP0592790B1
公开(公告)日：1998-03-11
申请号：EP93113271.6
申请日：1993-08-19
申请人： SUMITOMO CHEMICAL COMPANY LIMITED
发明人： Ueda, Yuji , Takeyama, Naoki , Ueki, Hiromi , Kusumoto, Takehiro , Nakano, Yuko
IPC分类号： G03F7/004 , G03F7/029 , G03F7/038
CPC分类号： G03F7/038 , G03F7/0045

2. 发明授权

EP0564997B1 Positive photoresist composition 失效
标题翻译：所述的正性光刻胶组合物
公开(公告)号：EP0564997B1
公开(公告)日：1996-07-17
申请号：EP93105500.8
申请日：1993-04-02
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Ueda, Yuji , Takeyama, Naoki , Ueki, Hiromi , Kusumoto, Takehiro
IPC分类号： G03F7/023 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0236

3. 发明公开

EP0592790A1 Negative photoresist composition 无效
标题翻译： Negativ arbeitende Photoresistzusammensetzung。
公开(公告)号：EP0592790A1
公开(公告)日：1994-04-20
申请号：EP93113271.6
申请日：1993-08-19
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Ueda, Yuji , Takeyama, Naoki , Ueki, Hiromi , Kusumoto, Takehiro , Nakano, Yuko
IPC分类号： G03F7/004 , G03F7/029 , G03F7/038
CPC分类号： G03F7/038 , G03F7/0045
摘要： A negative photoresist composition suitable for use in far ultraviolet lithographies and particularly KrF excimer laser lithography, excellent in properties such as resolution, sensitivity, film thickness retention, profile, heat resistance, etc., and small in standing wave, which comprises a resin obtainable through a copolymerization of p-hydroxystyrene and styrene, a crosslinking agent, which is a melamine derivative, represented by the general formula (II):

wherein Z represents -NRR' and the like and R, R' and R₁ to R₄ each represents -CH₂OR a and the like in which R a is lower alkyl group, and a photo-induced acid precursor represented by the general formula (III):

wherein Y₃ to Y₅ each represents mono-, di- or tri-halogen-substituted alkyl group or the like.
摘要翻译：适用于远紫外光刻，特别是KrF准分子激光光刻的负性光致抗蚀剂组合物，其特性如分辨率，灵敏度，膜厚保持性，轮廓，耐热性等优异，驻波小，包括可获得的树脂通过对羟基苯乙烯和苯乙烯的共聚合，由通式（II）表示的三聚氰胺衍生物的交联剂：其中Z表示-NRR'等，且R，R'和R 1至R 4表示的各自表示其中R a为低级烷基的-CH 2 OR a等，和由通式（III）表示的光诱导酸前体：其中Y 3〜Y 5各自表示一，二或三 - 取代的烷基等。

4. 发明公开

EP0569707A3 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same 失效
标题翻译：环状碳酸酯化合物，其制造方法以及使用其的正型光致抗蚀剂组合物
公开(公告)号：EP0569707A3
公开(公告)日：1994-01-05
申请号：EP93105822.6
申请日：1993-04-08
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Ueda, Yuji , Takeyama, Naoki , Ueki, Hiromi , Kusumoto, Takehiro
IPC分类号： C07C69/96 , C07C68/06 , G03F7/039
CPC分类号： C07C69/96 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/121 , Y10S430/122
摘要： This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5):
or related compounds which are useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
摘要翻译：本发明提供了用于制备由下式（5）表示的环状碳酸酯化合物的方法：或用作用于化学放大正型光致抗蚀剂的溶解抑制剂的相关化合物，以及包含所述环状碳酸酯化合物，碱溶性树脂和光致酸前体。该组合物提供了性能优异的正性光刻胶，如分辨率，分布，灵敏度等。

5. 发明公开

EP0339599A2 Process for producing acylaromatic compounds 失效
标题翻译： Verfahren zur Herstellung von acylaromatischen Verbindungen。
公开(公告)号：EP0339599A2
公开(公告)日：1989-11-02
申请号：EP89107541.8
申请日：1989-04-26
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Minai, Masayoshi , Kondo, Michitada , Ueda, Yuji , Kai, Seiichi , Higashii, Takayuki
IPC分类号： C07D333/22 , C07D333/24 , C07D333/28 , C07C45/46 , C07D207/32 , C07D409/06 , C07D307/46 , C07D307/54 , C07D307/80 , C07D333/56
CPC分类号： C07D207/333 , C07C45/46 , C07D307/46 , C07D307/54 , C07D307/80 , C07D333/22 , C07D333/24 , C07D333/28 , C07D333/56 , C07D409/06
摘要： Acylaromatic compounds

Q - - R
(Q: aromatic compound residue; R: straight, branched or cyclic aliphatic group, aromatic group or araliphatic group) are prepared in high yield by a reaction, in the presence of a boron trifluoride complex catalyst, of an aromatic compound with

R - O - CHXY (X: H, Cl, Br; Y: Cl, Br) or with RCOOH in the presence of (XYCHCO)₂O.
摘要翻译：通过在三氟化硼配合物催化剂的存在下，通过反应以高产率制备酰基芳族化合物Q-R-R（Q：芳族化合物残基; R：直链，支链或环状脂族基团，芳族基团或芳脂族基团）在（XYCHCO）2 O存在下，使用R 1 -O-（CH 3）（X：H，Cl，Br; Y：Cl，Br）或RCOOH的芳族化合物。

6. 发明公开

EP0155779A1 A method for the optical purification of an optically active 2,2-dimethylcyclopropanecarboxylic acid amide 失效
标题翻译：维他命Zur optischen Reinigung eines optisch aktiven 2,2-二甲基环丙烷甲酰胺。
公开(公告)号：EP0155779A1
公开(公告)日：1985-09-25
申请号：EP85301285.4
申请日：1985-02-26
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Minai, Masayoshi , Katsura, Tadashi , Ueda, Yuji
IPC分类号： C07C103/19 , C07C102/00
CPC分类号： C07C233/00
摘要： A method for the optical purification of an optically active 2,2-dimethylcyclopropanecarboxamide, a very useful compound as an intermediate for dehydropeptidase I inhibitor, comprises dissolving an optically active mixture of 2,2-dimethylcyclopropanecarboxamide in which either one of the optically active isomers is present in excess, in a solvent with heating, cooling the solution to deposit the racemate, filtering off the racemate and then recovering said optically active isomer from the filtrate. The amount of the solvent used is in the range of from 0.75 to 1.3 times as much as that required for the excess optically active isomer present in said optically active mixture to form a saturated solution at. a temperature at which the racemate crystal is filtered off.
摘要翻译：用于光学纯化光学活性的2,2-二甲基环丙烷甲酰胺的方法，作为脱水肽酶1抑制剂的中间体的非常有用的化合物包括溶解其中光学活性异构体之一的旋光活性的2,2-二甲基环丙烷甲酰胺存在于过量的溶剂中，冷却溶液以沉积外消旋体，过滤掉外消旋物，然后从滤液中回收所述光学活性异构体。使用的溶剂的量在存在于所述光学活性混合物中的过量光学活性异构体所需的量的0.75至1.3倍的范围内，以在消除外消旋体晶体的温度下形成饱和溶液。

7. 发明授权

EP0589451B1 Photoresist Compositiom 失效
标题翻译：光刻胶组合
公开(公告)号：EP0589451B1
公开(公告)日：1998-12-02
申请号：EP93115350.6
申请日：1993-09-23
申请人： Sumitomo Chemical Company, Limited
发明人： Kusumoto, Takehiro , Takeyama, Naoki , Ueda, Yuji , Ueki, Hiromi , Nakano, Yuko
IPC分类号： G03F7/004
CPC分类号： G03F7/0045

8. 发明公开

EP0742488A3 Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：EP0742488A3
公开(公告)日：1997-07-02
申请号：EP96107446.5
申请日：1996-05-10
申请人： SUMITOMO CHEMICAL COMPANY LIMITED
发明人： Fukui, Nobuhito , Yako, Yuko , Ueda, Yuji , Takeyama, Naoki , Kusumoto, Takehiro , Yamamoto, Shigeki
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/121
摘要： A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile;
which comprises an alkali-soluble resin comprising a polyvinylphenol resin which is polyvinylphenol and/or its partially hydrogenated product in which the phenolic hydroxyl groups are partially alkyletherified and partially protected;
and a sulfonate of a N-hydroxyimide compound as an acid generator.
摘要翻译：除了优异的特性例如耐热性，膜保持率，可涂布性和轮廓外，还显示出高灵敏度和高分辨率的正型光刻胶组合物; 其包含碱溶性树脂，所述碱溶性树脂包含聚乙烯基苯酚树脂和/或其部分氢化的产物，所述聚乙烯基苯酚树脂是聚乙烯基苯酚和/ 和作为产酸剂的N-羟基酰亚胺化合物的磺酸盐。

9. 发明授权

EP0569707B1 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same 失效
标题翻译：环状碳酸酯化合物，它们的制备方法和含有正性工作光致抗蚀剂组合物
公开(公告)号：EP0569707B1
公开(公告)日：1996-08-14
申请号：EP93105822.6
申请日：1993-04-08
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Ueda, Yuji , Takeyama, Naoki , Ueki, Hiromi , Kusumoto, Takehiro
IPC分类号： C07C69/96 , C07C68/06 , G03F7/039
CPC分类号： C07C69/96 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/121 , Y10S430/122

10. 发明授权

EP0588092B1 Negtive photoresist composition 失效
标题翻译：负光致抗蚀剂成分
公开(公告)号：EP0588092B1
公开(公告)日：1996-03-27
申请号：EP93113272.4
申请日：1993-08-19
申请人： SUMITOMO CHEMICAL COMPANY, LIMITED
发明人： Ueda, Yuji , Takeyama, Naoki , Ueki, Hiromi , Kusumoto, Takehiro , Nakano, Yuko
IPC分类号： G03F7/038 , G03F7/004 , G03F7/029
CPC分类号： G03F7/038 , G03F7/0045

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