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1. 发明申请

WO2011081368A2 VAPORIZATION APPARATUS AND METHOD FOR CONTROLLING THE SAME 审中-公开
标题翻译：蒸发装置及其控制方法
公开(公告)号：WO2011081368A2
公开(公告)日：2011-07-07
申请号：PCT/KR2010009316
申请日：2010-12-24
申请人： SNU PRECISION CO LTD , SEO SEUNG CHEOL , GONG DOO WON , LEE JONG HA , LEE KYUNG BUM , JUNG SUNG JAE , CHO WHANG SIN
发明人： SEO SEUNG CHEOL , GONG DOO WON , LEE JONG HA , LEE KYUNG BUM , JUNG SUNG JAE , CHO WHANG SIN
IPC分类号： C23C14/24
CPC分类号： C23C16/4485 , B01D1/0017 , B01D1/0082 , C23C14/24 , C23C14/543 , C23C16/52
摘要： Disclosed are a vaporization apparatus and a control method for the same. The vaporization apparatus includes a vaporization crucible adapted to receive a raw material; a vaporization heating unit adapted to vaporize the raw material by heating the vaporization crucible; a temperature measuring unit adapted to measure temperature of the vaporization crucible; a power measuring unit adapted to measure an applied power of the vaporization heating unit; and a control unit adapted to control a vaporization quantity of the raw material based on any one of a temperature variation value of the temperature measuring unit and a power variation value of the power measuring unit. The vaporization apparatus uses a non-contact/electronic method which measures a vaporization quantity through a temperature variation value and a power variation value during vaporization of a raw material. Therefore, since, differently from a contact method, a vaporization quantity measuring unit does not directly contact a raw material gas, various raw materials can be supplied and large quantity raw material supply or long time raw material supply can be achieved without deterioration of the function. In addition, preciseness of the raw material supply may be enhanced since the electronic method is capable of precise measurement of the vaporization quantity.
摘要翻译：公开了一种蒸发装置及其控制方法。蒸发装置包括适于容纳原料的蒸发坩埚; 蒸发加热单元，其适于通过加热所述蒸发坩埚来蒸发所述原料; 适于测量蒸发坩埚的温度的温度测量单元; 功率测量单元，适于测量蒸发加热单元的施加功率; 以及控制单元，其适于基于所述温度测量单元的温度变化值和所述功率测量单元的功率变化值中的任一个来控制所述原材料的蒸发量。蒸发装置使用在原料蒸发期间通过温度变化值和功率变化值来测量蒸发量的非接触/电子方法。因此，与接触方法不同的是，蒸发量测量单元不直接接触原料气体，可以供给各种原料，并且可以实现大量的原料供给或长时间的原料供应而不会降低功能。此外，由于电子方法能够精确地测量蒸发量，所以可以提高原料供应的精度。

2. 发明申请

WO2011093617A3 VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：真空沉积装置
公开(公告)号：WO2011093617A3
公开(公告)日：2011-12-08
申请号：PCT/KR2011000423
申请日：2011-01-21
申请人： SNU PRECISION CO LTD , BAK BYEONG MIN , GONG DOO WON , KWON JIN HAON , JUNG YONG BEOM , CHO WHANG SIN , JUNG SUNG JAE
发明人： BAK BYEONG MIN , GONG DOO WON , KWON JIN HAON , JUNG YONG BEOM , CHO WHANG SIN , JUNG SUNG JAE
IPC分类号： H01L21/205
CPC分类号： C23C14/56 , C23C16/4412 , C23C16/54
摘要： Disclosed is a vacuum deposition apparatus, which comprises: a chamber mounted with a source for jetting an application material in the gaseous state for deposition onto a substrate; heaters formed to the inner wall of the chamber and internal parts; a pump for aspirating air out of the chamber; and a plurality of cold traps interposed between the chamber and the pump for cooling the air aspirated by the pump to remove the application material from the air. According to the vacuum deposition apparatus, it is possible to prevent direct damage to the internal parts or the inner wall of the chamber by application materials accumulated thereon. Additionally, the plurality of cold traps prevent pollution and stoppage in continuous production which allows substitution to be carried out without stoppage. Therefore, productivity may be improved compared to other equipment with similar specifications.
摘要翻译：公开了一种真空沉积设备，其包括：腔室，其安装有用于喷射处于气态的涂覆材料以沉积到基板上的源; 形成在腔室内壁和内部部件上的加热器; 用于将空气抽出腔室的泵; 以及置于腔室和泵之间的多个冷阱，用于冷却由泵吸入的空气以从空气中除去涂敷材料。根据该真空蒸镀装置，能够防止堆积的涂布材料直接损伤腔室内部或内壁。此外，多个冷阱在连续生产中防止污染和停止，这允许在不停止的情况下进行替代。因此，与具有类似规格的其他设备相比，生产率可能会提高。

3. 发明申请

WO2011043566A3 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE 审中-公开
标题翻译：装置和处理基板的方法
公开(公告)号：WO2011043566A3
公开(公告)日：2011-11-03
申请号：PCT/KR2010006749
申请日：2010-10-04
申请人： SNU PRECISION CO LTD , BAK BYEONG-MIN , GONG DOO WON , SON SUNG KWAN , CHO WHANG SIN , JUNG SUNG JAE , PAHK HEUI JAE
发明人： BAK BYEONG-MIN , GONG DOO WON , SON SUNG KWAN , CHO WHANG SIN , JUNG SUNG JAE , PAHK HEUI JAE
IPC分类号： H01L21/20 , H01L31/042
CPC分类号： H01L21/6776 , C23C16/4401 , C23C16/4411 , C23C16/45563 , C23C16/4557 , C23C16/54 , H01L21/6715
摘要： There is provided a substrate processing apparatus and method capable of preventing the substrate from being heated and efficiently collecting residual deposition material. The substrate processing apparatus includes a chamber unit including an inner space divided into an introduction section, a film formation section, and a discharge section, at least one material injection nozzle unit disposed in the film formation section of the chamber unit to inject a deposition material to a substrate being transferred, and a cooling plate unit disposed to surround the film formation section of the chamber unit and adapted to cool inside of the film formation section. In addition, the substrate processing apparatus further includes at least one cold trap unit disposed at a lower part of the material injection nozzle unit to collect residual deposition material not deposited on the substrate but left from the whole deposition material injected from the material injection nozzle unit.
摘要翻译：提供了能够防止基板被加热并有效地收集残留沉积材料的基板处理装置和方法。基板处理装置包括：室单元，包括分为导入部，成膜部和排出部的内部空间;至少一个注入喷嘴单元，设置在室单元的成膜部中，以将沉积材料到被转印的基板，以及冷却板单元，设置成围绕室单元的成膜部分并且适于在成膜部分内部冷却。此外，基板处理装置还包括至少一个冷阱单元，其设置在材料注入喷嘴单元的下部，以收集未沉积在基板上但留在从材料注入喷嘴单元注入的整个沉积材料的残留沉积材料。

4. 发明公开

EP2519656A4 VAPORIZATION APPARATUS AND METHOD FOR CONTROLLING THE SAME 有权
标题翻译： VERDAMPFUNGSVORRICHTUNG UND VERFAHREN ZU IHRER STEUERUNG
公开(公告)号：EP2519656A4
公开(公告)日：2014-08-20
申请号：EP10841200
申请日：2010-12-24
申请人： SNU PRECISION CO LTD
发明人： SEO SEUNG CHEOL , GONG DOO WON , LEE JONG HA , LEE KYUNG BUM , JUNG SUNG JAE , CHO WHANG SIN
IPC分类号： C23C14/24 , B01D1/00 , C23C14/54 , C23C16/448 , C23C16/52
CPC分类号： C23C16/4485 , B01D1/0017 , B01D1/0082 , C23C14/24 , C23C14/543 , C23C16/52

5. 发明公开

EP2530705A4 VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：真空蒸发
公开(公告)号：EP2530705A4
公开(公告)日：2014-07-02
申请号：EP11737256
申请日：2011-01-21
申请人： SNU PRECISION CO LTD
发明人： BAK BYEONG MIN , GONG DOO WON , KWON JIN HAON , JUNG YONG BEOM , CHO WHANG SIN , JUNG SUNG JAE
IPC分类号： H01L21/205 , C23C14/56 , C23C16/44 , C23C16/54
CPC分类号： C23C14/56 , C23C16/4412 , C23C16/54

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