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    • 1. 发明申请
    • ULTRA WIDEBAND RADIO TRANSMITTER, ULTRA WIDEBAND RADIO RECEIVER, AND ULTRA WIDEBAND RADIO COMMUNICATION METHOD
    • 超宽带无线电发射机,超宽带无线电接收机和超宽带无线电通信方法
    • WO2004047320A1
    • 2004-06-03
    • PCT/KR2003/002530
    • 2003-11-21
    • SAMSUNG ELECTRONICS CO., LTD.NAGASAKA, Hiroyuki
    • NAGASAKA, Hiroyuki
    • H04B1/04
    • H04B1/28H04B1/692H04B1/71637H04B1/7174H04L25/03834
    • Disclosed are ultra wideband radio transmitter, ultra wideband radio receiver, and ultra wideband radio communication method capable of securing higher transfer rate and communication quality than conventional ones while avoiding a band where communication signals are concentrated, and capable of miniaturizing an antenna. In a transmitter, a delay time controller (12) outputs a periodic pulse to matched filters 11-1 and 11-2 when transmission data is 1, and outputs the periodic pulse to matched filters 11-1 and 11-3 when the transmission data is 0. The matched filter 11-1 outputs reference signal, the matched filter 11-2 outputs first data signal ahead of the reference signal, and the matched filter 11-3 outputs second data signal behind the reference signal. An adder (13) adds up these, a mixer (21) frequency-converts output of the adder using a local signal received from a local oscillator (23), and an antenna (6) radiates output of the mixer (21).
    • 公开了超宽带无线电发射机,超宽带无线电接收机和超宽带无线电通信方法,其能够确保比常规传输速率和通信质量更高的传输速率和通信质量,同时避免通信信号集中的频带,并且能够使天线小型化。 在发送器中,当发送数据为1时,延迟时间控制器(12)向匹配滤波器11-1和11-2输出周期性脉冲,并且当发送数据 匹配滤波器11-1输出参考信号,匹配滤波器11-2输出参考信号之前的第一数据信号,匹配滤波器11-3输出参考信号后面的第二数据信号。 加法器(13)将这些组合起来,混频器(21)使用从本地振荡器(23)接收的本地信号对加法器的输出进行频率转换,并且天线(6)辐射混频器(21)的输出。
    • 4. 发明申请
    • EXPOSURE APPARATUS AND METHOD OF CONFINING A LIQUID
    • 曝光装置和装配液体的方法
    • WO2013027866A1
    • 2013-02-28
    • PCT/JP2012/072086
    • 2012-08-24
    • NIKON CORPORATIONNAGASAKA, Hiroyuki
    • NAGASAKA, Hiroyuki
    • G03F7/20
    • G03F7/70341
    • An exposure apparatus includes a first member (30) disposed at least in a part of a periphery of an optical path (K) of the exposure light, having a first face (310) facing an upper face of an object through a first gap (Wl) and holding the liquid (LQ) between the up¬ per face of the object and the first face; a second member (60) dis¬ posed at an outer side of the first face with respect to the optical path and having a second face (61) facing the upper face of the ob¬ ject through a second gap; a first supply port (64) disposed at an out¬ er side of the second face for supplying a fluid (LB); and a first suc¬ tion port (33) disposed between the first face and the second face for sucking at least part of gas (Ga) in an outer space of the second member via a gap (W2) between the second face and the upper face of the object.
    • 曝光装置包括:至少设置在曝光光的光路(K)的周边的一部分中的第一部件(30),具有通过第一间隙面对物体的上表面的第一面(310) W1)并且将物体和第一面之间的液体(LQ)保持在一起; 第二构件(60),其相对于所述光路分布在所述第一面的外侧,并且具有通过第二间隙面对所述物体的上表面的第二面(61); 设置在所述第二面的外侧以供给流体的第一供给口(64); 以及设置在所述第一面和所述第二面之间的第一凹部口(33),用于经由所述第二面和所述鞋面之间的间隙(W2)吸附所述第二构件的外部空间中的至少一部分气体(Ga) 面对面。
    • 5. 发明申请
    • SUBSTRATE HOLDING APPARATUS
    • 基板保持装置
    • WO2009107852A1
    • 2009-09-03
    • PCT/JP2009/054010
    • 2009-02-25
    • NIKON CORPORATIONFUJIWARA, TomoharuNAGASAKA, Hiroyuki
    • FUJIWARA, TomoharuNAGASAKA, Hiroyuki
    • G03F7/20
    • G03F7/70341G03F7/707
    • A substrate holding apparatus holds a substrate that is exposed by exposure light that passes through a liquid. The substrate holding apparatus comprises: an opening (21); and a first holding part (23), which has a holding surface for holding the substrate inside the opening. At least part of an edge part (Eg) that defines- the opening has a first surface (41) and a second surface (42), which is provided above and is nonparallel to the first surface. The second surface extends from a boundary part (J) between the first surface and the second surface both upward and toward the outer side with respect to a center of the opening. The boundary part between the first surface and the second surface is substantially the same height as or higher than a front surface of the substrate, which is held by the first holding part.
    • 基板保持装置保持通过通过液体的曝光光曝光的基板。 基板保持装置包括:开口(21); 以及第一保持部(23),其具有用于将基板保持在开口内的保持面。 限定开口的边缘部分(Eg)的至少一部分具有第一表面(41)和第二表面(42),其设置在上方且不平行于第一表面。 第二表面从第一表面和第二表面之间的边界部分(J)相对于开口的中心向上和朝向外侧延伸。 第一表面和第二表面之间的边界部分基本上与由第一保持部分保持的基板的前表面相同或更高。
    • 6. 发明申请
    • EXPOSURE APPARATUS, LIQUID HOLDING METHOD, AND DEVICE MANUFACTURING METHOD
    • 曝光装置,液体保持方法和装置制造方法
    • WO2013031928A1
    • 2013-03-07
    • PCT/JP2012/072087
    • 2012-08-24
    • NIKON CORPORATIONNAGASAKA, Hiroyuki
    • NAGASAKA, Hiroyuki
    • G03F7/20
    • G03F7/70341
    • An exposure apparatus exposes a substrate (P) to exposure light- through liquid (LQ). The exposure apparatus includes: a first member (30) which is disposed in at least a portion of the periphery of a light path (K) of the exposure light, and has a first surface (31) that faces an upper surface of an object (P) via a first gap (W1) interposed therebetween and holds the liquid (LQ) between the upper surface of the object and the first surface; a second member (60) which is disposed at the outside of the first surface with respect to the light path, and has a second surface (61) that faces the upper surface of the object via a second gap (W2) interposed therebetween; and a suction port (33) which is disposed between the first surface (31) and the second surface (61), and suctions at least a portion of gas (Ga) in a space located outside the second member with respect to the light path, through the second gap (W2). The size of the second gap (W2) is smaller than the size of the first gap (W1).
    • 曝光装置将衬底(P)暴露于通过液体(LQ)的曝光光。 曝光装置包括:第一构件(30),设置在曝光光的光路(K)的周边的至少一部分中,并且具有面对物体的上表面的第一表面(31) (P)经由插入其间的第一间隙(W1),并将液体(LQ)保持在物体的上表面和第一表面之间; 第二构件(60),其相对于光路布置在第一表面的外侧,并且具有经由第二间隙(W2)相对于物体的上表面的第二表面(61); 以及设置在所述第一表面和所述第二表面之间的吸入口(33),并且相对于所述光路吸入位于所述第二构件外部的空间中的气体(Ga)的至少一部分 通过第二间隙(W2)。 第二间隙(W2)的尺寸小于第一间隙(W1)的尺寸。
    • 7. 发明申请
    • EXPOSURE APPARATUS AND EXPOSING METHOD
    • 曝光装置和曝光方法
    • WO2010087504A1
    • 2010-08-05
    • PCT/JP2010/051545
    • 2010-01-28
    • NIKON CORPORATIONNAGASAKA, Hiroyuki
    • NAGASAKA, Hiroyuki
    • G03F7/20
    • G03F7/70341
    • An exposure apparatus (EX) comprises: an optical system (PL), which has an emergent surface (11) wherefrom exposure light (EL) emerges; a first surface (21), which is disposed at least partly around an optical path of the exposure light from the emergent surface; and a second surface (22), which is disposed at least partly around the first surface; and a first supply port (51), which is disposed at least partly around the first surface such that it faces in an outward radial direction with respect to an optical axis (AX) of the projection optical system, that supplies a first liquid (LQ1) to the second surface; wherein, during at least part of an exposure of a substrate, a front surface of the substrate (P) opposes the emergent surface, the first surface, and the second surface; and the substrate is exposed with the exposure light that emerges from the emergent surface and transits a second liquid between the emergent surface and the front surface of the substrate.
    • 曝光装置(EX)包括:光学系统(PL),其具有出现曝光光(EL)的出射表面(11); 第一表面(21),其至少部分地围绕来自出射表面的曝光光的光路; 以及至少部分地围绕所述第一表面设置的第二表面(22); 以及第一供给口(51),其设置在所述第一面的至少一部分周围,使得所述第一供给口相对于所述投影光学系统的光轴(AX)向外侧方向配置,供给第一液体(LQ1 )到第二表面; 其特征在于,在基板的至少一部分曝光期间,所述基板(P)的前表面与所述出射表面,所述第一表面和所述第二表面相对; 并且用从出射表面出来的曝光光曝光基板,并在基板的出射表面和前表面之间转移第二液体。