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1. 发明专利

IL223536A Exposure apparatus, exposure method, method for producing device and optical part 未知
公开(公告)号：IL223536A
公开(公告)日：2015-11-30
申请号：IL22353612
申请日：2012-12-09
申请人： NIKON CORP , ISHIZAWA HITOSHI , NAGASAKA HIROYUKI , TAKAIWA HIROAKI , HIRUKAWA SHIGERU , HOSHIKA RYUICHI
发明人： ISHIZAWA HITOSHI , NAGASAKA HIROYUKI , TAKAIWA HIROAKI , HIRUKAWA SHIGERU , HOSHIKA RYUICHI
IPC分类号： G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

2. 发明专利

IL179787A Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL179787A
公开(公告)日：2015-09-24
申请号：IL17978706
申请日：2006-12-03
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , NAGASAKA HIROYUKI , OKUYAMA TAKESHI
发明人： NAGASAKA HIROYUKI , OKUYAMA TAKESHI
IPC分类号： G03B20060101 , G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

3. 发明专利

IL176057A EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING THE DEVICE AND OPTICAL PART 未知
公开(公告)号：IL176057A
公开(公告)日：2013-01-31
申请号：IL17605706
申请日：2006-05-31
申请人： NIKON CORP , ISHIZAWA HITOSHI , NAGASAKA HIROYUKI , TAKAIWA HIROAKI , HIRUKAWA SHIGERU , HOSHIKA RYUICHI
发明人： ISHIZAWA HITOSHI , NAGASAKA HIROYUKI , TAKAIWA HIROAKI , HIRUKAWA SHIGERU , HOSHIKA RYUICHI
IPC分类号： G03F7/20 , H01L21/027
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

4. 发明申请

WO2008091014A3 LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：液体回收系统，浸润曝光装置，浸渍曝光方法和装置制造方法
公开(公告)号：WO2008091014A3
公开(公告)日：2008-11-27
申请号：PCT/JP2008051328
申请日：2008-01-23
申请人： NIPPON KOGAKU KK , NAGASAKA HIROYUKI
发明人： NAGASAKA HIROYUKI
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/52
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening (33); a gap portion (15) that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member (30), at least part of the liquid that flows into the gap portion; and a second opening (34). that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统设有：第一开口（33）; 间隙部分（15），其设置成使得与所述第一开口相对的物体上的液体可以通过所述第一开口流入所述间隙部分; 通过多孔构件（30）吸入至少部分流入间隙部分的液体的液体回收部分; 和第二开口（34）。这与第一次开场不同。间隙部分通过第二开口向大气开放。

5. 发明申请

WO2008117808A1 LIQUID RECOVERY SYSTEM AND IMMERSION EXPOSURE APPARATUS 审中-公开
标题翻译：液体回收系统和浸入式曝光装置
公开(公告)号：WO2008117808A1
公开(公告)日：2008-10-02
申请号：PCT/JP2008/055625
申请日：2008-03-18
申请人： NIKON CORPORATION , NISHII, Yasufumi , NAGASAKA, Hiroyuki , OKUYAMA, Takeshi
发明人： NISHII, Yasufumi , NAGASAKA, Hiroyuki , OKUYAMA, Takeshi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate (14A) that has a first surface (52) and a second surface (51) on the side opposite the first surface; and a liquid recovery part (40), at least part of which opposes the second surface with a first gap (G8) interposed therebetween. The liquid recovery system recovers the liquid on a movable object (P) that opposes the first surface of the plate via the liquid recovery part.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统包括：板（14A），其在与第一表面相对的一侧上具有第一表面（52）和第二表面（51）; 和液体回收部分（40），其中至少一部分与第二表面相对，间隔开第一间隙（G8）。液体回收系统通过液体回收部分将液体回收到与板的第一表面相对的可移动物体（P）上。

6. 发明申请

WO2013027866A1 EXPOSURE APPARATUS AND METHOD OF CONFINING A LIQUID 审中-公开
标题翻译：曝光装置和装配液体的方法
公开(公告)号：WO2013027866A1
公开(公告)日：2013-02-28
申请号：PCT/JP2012/072086
申请日：2012-08-24
申请人： NIKON CORPORATION , NAGASAKA, Hiroyuki
发明人： NAGASAKA, Hiroyuki
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a first member (30) disposed at least in a part of a periphery of an optical path (K) of the exposure light, having a first face (310) facing an upper face of an object through a first gap (Wl) and holding the liquid (LQ) between the up¬ per face of the object and the first face; a second member (60) dis¬ posed at an outer side of the first face with respect to the optical path and having a second face (61) facing the upper face of the ob¬ ject through a second gap; a first supply port (64) disposed at an out¬ er side of the second face for supplying a fluid (LB); and a first suc¬ tion port (33) disposed between the first face and the second face for sucking at least part of gas (Ga) in an outer space of the second member via a gap (W2) between the second face and the upper face of the object.
摘要翻译：曝光装置包括：至少设置在曝光光的光路（K）的周边的一部分中的第一部件（30），具有通过第一间隙面对物体的上表面的第一面（310） W1）并且将物体和第一面之间的液体（LQ）保持在一起; 第二构件（60），其相对于所述光路分布在所述第一面的外侧，并且具有通过第二间隙面对所述物体的上表面的第二面（61）; 设置在所述第二面的外侧以供给流体的第一供给口（64）; 以及设置在所述第一面和所述第二面之间的第一凹部口（33），用于经由所述第二面和所述鞋面之间的间隙（W2）吸附所述第二构件的外部空间中的至少一部分气体（Ga）面对面。

7. 发明申请

WO2009107852A1 SUBSTRATE HOLDING APPARATUS 审中-公开
标题翻译：基板保持装置
公开(公告)号：WO2009107852A1
公开(公告)日：2009-09-03
申请号：PCT/JP2009/054010
申请日：2009-02-25
申请人： NIKON CORPORATION , FUJIWARA, Tomoharu , NAGASAKA, Hiroyuki
发明人： FUJIWARA, Tomoharu , NAGASAKA, Hiroyuki
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： A substrate holding apparatus holds a substrate that is exposed by exposure light that passes through a liquid. The substrate holding apparatus comprises: an opening (21); and a first holding part (23), which has a holding surface for holding the substrate inside the opening. At least part of an edge part (Eg) that defines- the opening has a first surface (41) and a second surface (42), which is provided above and is nonparallel to the first surface. The second surface extends from a boundary part (J) between the first surface and the second surface both upward and toward the outer side with respect to a center of the opening. The boundary part between the first surface and the second surface is substantially the same height as or higher than a front surface of the substrate, which is held by the first holding part.
摘要翻译：基板保持装置保持通过通过液体的曝光光曝光的基板。基板保持装置包括：开口（21）; 以及第一保持部（23），其具有用于将基板保持在开口内的保持面。限定开口的边缘部分（Eg）的至少一部分具有第一表面（41）和第二表面（42），其设置在上方且不平行于第一表面。第二表面从第一表面和第二表面之间的边界部分（J）相对于开口的中心向上和朝向外侧延伸。第一表面和第二表面之间的边界部分基本上与由第一保持部分保持的基板的前表面相同或更高。

8. 发明申请

WO2004047320A1 ULTRA WIDEBAND RADIO TRANSMITTER, ULTRA WIDEBAND RADIO RECEIVER, AND ULTRA WIDEBAND RADIO COMMUNICATION METHOD 审中-公开
标题翻译：超宽带无线电发射机，超宽带无线电接收机和超宽带无线电通信方法
公开(公告)号：WO2004047320A1
公开(公告)日：2004-06-03
申请号：PCT/KR2003/002530
申请日：2003-11-21
申请人： SAMSUNG ELECTRONICS CO., LTD. , NAGASAKA, Hiroyuki
发明人： NAGASAKA, Hiroyuki
IPC分类号： H04B1/04
CPC分类号： H04B1/28 , H04B1/692 , H04B1/71637 , H04B1/7174 , H04L25/03834
摘要： Disclosed are ultra wideband radio transmitter, ultra wideband radio receiver, and ultra wideband radio communication method capable of securing higher transfer rate and communication quality than conventional ones while avoiding a band where communication signals are concentrated, and capable of miniaturizing an antenna. In a transmitter, a delay time controller (12) outputs a periodic pulse to matched filters 11-1 and 11-2 when transmission data is 1, and outputs the periodic pulse to matched filters 11-1 and 11-3 when the transmission data is 0. The matched filter 11-1 outputs reference signal, the matched filter 11-2 outputs first data signal ahead of the reference signal, and the matched filter 11-3 outputs second data signal behind the reference signal. An adder (13) adds up these, a mixer (21) frequency-converts output of the adder using a local signal received from a local oscillator (23), and an antenna (6) radiates output of the mixer (21).
摘要翻译：公开了超宽带无线电发射机，超宽带无线电接收机和超宽带无线电通信方法，其能够确保比常规传输速率和通信质量更高的传输速率和通信质量，同时避免通信信号集中的频带，并且能够使天线小型化。在发送器中，当发送数据为1时，延迟时间控制器（12）向匹配滤波器11-1和11-2输出周期性脉冲，并且当发送数据匹配滤波器11-1输出参考信号，匹配滤波器11-2输出参考信号之前的第一数据信号，匹配滤波器11-3输出参考信号后面的第二数据信号。加法器（13）将这些组合起来，混频器（21）使用从本地振荡器（23）接收的本地信号对加法器的输出进行频率转换，并且天线（6）辐射混频器（21）的输出。

9. 发明申请

WO2010131781A1 LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：液体浸泡会员，曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2010131781A1
公开(公告)日：2010-11-18
申请号：PCT/JP2010/058580
申请日：2010-05-14
申请人： NIKON CORPORATION , NAGASAKA Hiroyuki
发明人： NAGASAKA Hiroyuki
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus comprises: an optical system (PL), which has an emergent surface (11) wherefrom exposure light emerges; a first surface (21), which is disposed at least partly around an optical path of the exposure light from the emergent surface; a second surface (22), which is disposed at least partly around the first surface; a third surface (23), which is disposed at least partly around the second surface; a first supply port (73), which is disposed at least partly around the first surface (21) such that the first supply port is directed in an outward radial direction with respect to an optical axis of the optical system, that supplies a first liquid (Ql) to the second surface (22); and a second supply port (83), which is disposed at least partly around the second surface (22) such that the second supply port (83) is directed in an outward radial direction with respect to the optical axis, that supplies a second liquid (Q2) to the third surface. During at least part of an exposure of the substrate, a front surface of the substrate opposes (P) the emergent surface (11), the first surface (21), the second surface (22), and the third surface (23); and the substrate is exposed with the exposure light that emerges from the emergent surface (11) and transits a third liquid (Q3) between the emergent surface and the front surface of the substrate.
摘要翻译：曝光装置包括：光学系统（PL），其具有从曝光光出射的出射表面（11）; 第一表面（21），其至少部分地围绕来自出射表面的曝光光的光路; 第二表面（22），其至少部分地围绕第一表面设置; 第三表面（23），其至少部分地围绕第二表面设置; 第一供应口（73），其至少部分地设置在第一表面（21）周围，使得第一供应口相对于光学系统的光轴在外径方向上被引导，第一供应口提供第一液体（Q1）到所述第二表面（22）; 以及第二供给口（83），其设置在至少部分地围绕所述第二表面（22），使得所述第二供给口（83）相对于所述光轴向外径向地引导，供给第二液体（Q2）到第三表面。在基板的至少一部分曝光期间，基板的前表面与出射表面（11），第一表面（21），第二表面（22）和第三表面（23）相对（P）。并且用从出射表面（11）出射的曝光光曝光基板，并且在基板的出射表面和前表面之间转移第三液体（Q3）。

10. 发明申请

WO2008091014A2 LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：液体回收系统，浸润曝光装置，浸渍曝光方法和装置制造方法
公开(公告)号：WO2008091014A2
公开(公告)日：2008-07-31
申请号：PCT/JP2008/051328
申请日：2008-01-23
申请人： NIKON CORPORATION , NAGASAKA, Hiroyuki
发明人： NAGASAKA, Hiroyuki
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/52
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统设有：第一开口; 间隙部，其设置成使得与所述第一开口相对的物体上的液体可以通过所述第一开口流入所述间隙部; 通过多孔构件吸入至少部分流入间隙部分的液体的液体回收部分; 以及与第一开口不同的第二开口。间隙部分通过第二开口向大气开放。

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