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1. 发明申请

WO2008117808A1 LIQUID RECOVERY SYSTEM AND IMMERSION EXPOSURE APPARATUS 审中-公开
标题翻译：液体回收系统和浸入式曝光装置
公开(公告)号：WO2008117808A1
公开(公告)日：2008-10-02
申请号：PCT/JP2008/055625
申请日：2008-03-18
申请人： NIKON CORPORATION , NISHII, Yasufumi , NAGASAKA, Hiroyuki , OKUYAMA, Takeshi
发明人： NISHII, Yasufumi , NAGASAKA, Hiroyuki , OKUYAMA, Takeshi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate (14A) that has a first surface (52) and a second surface (51) on the side opposite the first surface; and a liquid recovery part (40), at least part of which opposes the second surface with a first gap (G8) interposed therebetween. The liquid recovery system recovers the liquid on a movable object (P) that opposes the first surface of the plate via the liquid recovery part.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统包括：板（14A），其在与第一表面相对的一侧上具有第一表面（52）和第二表面（51）; 和液体回收部分（40），其中至少一部分与第二表面相对，间隔开第一间隙（G8）。液体回收系统通过液体回收部分将液体回收到与板的第一表面相对的可移动物体（P）上。

2. 发明申请

WO2008143357A1 EXPOSURE APPARATUS AND LIQUID IMMERSION SYSTEM 审中-公开
标题翻译：曝光装置和液体浸没系统
公开(公告)号：WO2008143357A1
公开(公告)日：2008-11-27
申请号：PCT/JP2008/059613
申请日：2008-05-20
申请人： NIKON CORPORATION , NISHII, Yasufumi
发明人： NISHII, Yasufumi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a first surface (21), which is disposed around an optical path of the exposure light; a second surface (22), which is disposed adjacent to an outer edge of the first surface, that includes a first area (25), which is inclined with respect to the first surface; and a liquid recovery surface (23), which is disposed at an outer side of the second surface with respect to the optical path of the exposure light; wherein, when an object is disposed at a position at which it opposes at least part of the first surface and at least part of the liquid recovery surface, a spacing between the second surface and the object is larger than a spacing between the first surface and the object, and a spacing between the object and at least part of the liquid recovery surface is larger than the spacing between the first surface and the object in a prescribed direction that is substantially perpendicular to a front surface of the object.
摘要翻译：曝光装置通过液体曝光具有曝光光的基板。曝光装置包括：围绕曝光光的光路设置的第一表面（21）; 与所述第一表面的外边缘相邻设置的第二表面（22），所述第二表面包括相对于所述第一表面倾斜的第一区域（25）; 和液体回收面（23），其相对于曝光光的光路配置在第二面的外侧; 其中，当物体设置在与所述第一表面的至少一部分和所述液体回收表面的至少一部分相对的位置时，所述第二表面和所述物体之间的间隔大于所述第一表面和所述第二表面之间的间隔，物体和液体回收表面的至少一部分之间的间隔大于在与物体的前表面大致垂直的规定方向上的第一表面和物体之间的间隔。

3. 发明申请

WO2009119898A1 IMMERSION SYSTEM, EXPOSURE APPARATUS, EXPOSING METHOD AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：曝光系统，曝光装置，曝光方法和装置制作方法
公开(公告)号：WO2009119898A1
公开(公告)日：2009-10-01
申请号：PCT/JP2009/056843
申请日：2009-03-26
申请人： NIKON CORPORATION , NISHII, Yasufumi
发明人： NISHII, Yasufumi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion system is used in an immersion exposure, wherein a substrate is exposed with an exposure light through an optical member and a liquid, and that fills an optical path of the exposure light between the optical member and the substrate with the liquid. The immersion system comprises: a first member, which is disposed around the optical path of the exposure light and has a first surface that faces in a first direction; a second member that has a liquid recovery port, which is disposed on the outer side of the first surface with respect to the optical path of the exposure light; a first drive apparatus that is capable of moving the first member parallel to the first direction; and a second drive apparatus that is capable of moving the second member parallel to the first direction independently of the first member; wherein, a space between the first surface and a front surface of an object can hold the liquid; and a liquid between the liquid recovery port and the front surface of the object is recovered via the liquid recovery port.
摘要翻译：在浸没曝光中使用浸没系统，其中通过光学构件和液体以曝光光使衬底曝光，并用液体填充光学构件和衬底之间的曝光光的光路。浸没系统包括：第一构件，其设置在曝光光的光路周围，并具有面向第一方向的第一表面; 具有液体回收口的第二构件，其相对于曝光光的光路设置在所述第一表面的外侧; 能够使第一构件平行于第一方向移动的第一驱动装置; 以及第二驱动装置，其能够独立于所述第一构件而使所述第二构件平行于所述第一方向移动; 其中，所述第一表面和所述物体的前表面之间的空间可以容纳所述液体; 通过液体回收口回收液体回收口与物体前表面之间的液体。

4. 发明申请

WO2008143266A1 EXPOSURE APPARATUS AND EXPOSING METHOD 审中-公开
标题翻译：曝光装置和曝光方法
公开(公告)号：WO2008143266A1
公开(公告)日：2008-11-27
申请号：PCT/JP2008/059290
申请日：2008-05-14
申请人： NIKON CORPORATIOIN , NISHII, Yasufumi
发明人： NISHII, Yasufumi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus (EX) exposes a substrate (P) with exposure light through a liquid (LQ). The exposure apparatus comprises: a liquid immersion member (6), which has a liquid contact surface (7) that includes a liquid recovery- area (17); and a porous member (50), which are disposed at a first side of the liquid contact surface; wherein, the liquid on an object, which is disposed at the first side of the liquid contact surface, is recovered from the liquid recovery area.
摘要翻译：曝光装置（EX）通过液体（LQ）曝光具有曝光光的基板（P）。曝光装置包括：具有包括液体回收区域（17）的液体接触表面（7）的液浸部件（6）; 和多孔构件（50），其设置在所述液体接触表面的第一侧; 其中，设置在液体接触表面的第一侧的物体上的液体从液体回收区域回收。

5. 发明授权

EP1768169B9 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 有权
标题翻译：曝光装置，曝光方法和手段的用于制造部件
公开(公告)号：EP1768169B9
公开(公告)日：2013-03-06
申请号：EP05745697.2
申请日：2005-06-03
申请人： NIKON CORPORATION
发明人： NISHII, Yasufumi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70916
摘要： An exposure apparatus includes a projection optical system having a plurality of optical elements. A first space K1, which is disposed on a side of a lower surface 2S of an optical element 2G closest to an image plane of the projection optical system, is filled with a liquid LQ1. A second space K2, which is disposed on a side of an upper surface 2T of the optical element 2G and which is independent from the first space K1, is filled with a liquid LQ2. An exposure light beam is radiated onto a substrate P through the liquid LQ1 in the first space K1 and the liquid LQ2 in the second space K2 to expose the substrate P. An optical element 2F, which is next closest to the image plane with respect to the optical element 2G, is prevented from any pollution with the liquid LQ2.

6. 发明授权

EP1641028B1 EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE 有权
标题翻译： BELICHTUNGSVERFAHREN，SUBSTRATSTUFE，BELICHTUNGSVORRICHTUNG UND VERFAHREN ZUR BAUELEMENTEHERSTELLUNG
公开(公告)号：EP1641028B1
公开(公告)日：2015-08-05
申请号：EP04746086.0
申请日：2004-06-11
申请人： NIKON CORPORATION
发明人： OWA, Soichi , MAGOME, Nobutaka , HIRUKAWA, Shigeru , KUDO, Yoshihiko , INOUE, Jiro , KOHNO, Hirotaka , NEI, Masahiro , IMAI, Motokatsu , NAGASAKA, Hiroyuki , SHIRAISHI, Kenichi , NISHII, Yasufumi , TAKAIWA, Hiroaki
IPC分类号： G03B27/58 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
摘要翻译：通过经由投影光学系统PL和液体1将图案的图像投影到基板P上来曝光基板P，在基板P的侧表面PB和下表面PC上进行拒液处理。通过这样的结构，可以防止曝光在基板的边缘区域曝光的曝光方法，其中，可以防止在液浸区域形成良好并从液体流出到基板台外部的状态下进行曝光被提供。

7. 发明授权

EP1753016B1 EXPOSURE APPARATUS AND DEVICE PRODUCING METHOD 有权
标题翻译：曝光装置及元件制造工艺
公开(公告)号：EP1753016B1
公开(公告)日：2012-06-20
申请号：EP05730580.7
申请日：2005-04-14
申请人： NIKON CORPORATION
发明人： NAGASAKA, Hiroyuki , KOHNO, Hirotaka , NISHII, Yasufumi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041
摘要： An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired state, thereby allowing high exposure accuracy and high measurement accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a liquid (LQ), and includes a liquid supply mechanism (10) that has a supply port (13) capable of supplying the liquid (LQ) substantially in parallel with a surface of the substrate (P).

8. 发明授权

EP2023378B1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置及方法制造器件
公开(公告)号：EP2023378B1
公开(公告)日：2013-03-13
申请号：EP07743109.6
申请日：2007-05-10
申请人： Nikon Corporation
发明人： NISHII, Yasufumi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus comprises a first member, which is arranged so as to oppose a surface of a substrate, and between which and the surface of the substrate a liquid immersion space is formed; and a second member, which traps liquid that is present at the surface of the substrate. A distance between the second member and the substrate is smaller than a distance between the first member and the substrate.

9. 发明授权

EP1768169B1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 有权
标题翻译：曝光装置，曝光方法和手段的用于制造部件
公开(公告)号：EP1768169B1
公开(公告)日：2012-10-24
申请号：EP05745697.2
申请日：2005-06-03
申请人： NIKON CORPORATION
发明人： NISHII, Yasufumi
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70916
摘要： An exposure apparatus includes a projection optical system having a plurality of optical elements. A first space K1, which is disposed on a side of a lower surface 2S of an optical element 2G closest to an image plane of the projection optical system, is filled with a liquid LQ1. A second space K2, which is disposed on a side of an upper surface 2T of the optical element 2G and which is independent from the first space K1, is filled with a liquid LQ2. An exposure light beam is radiated onto a substrate P through the liquid LQ1 in the first space K1 and the liquid LQ2 in the second space K2 to expose the substrate P. An optical element 2F, which is next closest to the image plane with respect to the optical element 2G, is prevented from any pollution with the liquid LQ2.

10. 发明授权

EP1699073B1 STAGE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD 有权
标题翻译：平台系统，曝光装置，以及曝光方法
公开(公告)号：EP1699073B1
公开(公告)日：2010-12-08
申请号：EP04807061.9
申请日：2004-12-15
申请人： NIKON CORPORATION
发明人： NISHII, Yasufumi , SHIRAISHI, Kenichi , KOHNO, Hirotaka
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

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