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    • 2. 发明专利
    • Vacuum deposition device and vacuum deposition method
    • 真空沉积装置和真空沉积方法
    • JP2013204129A
    • 2013-10-07
    • JP2012076834
    • 2012-03-29
    • Hitachi High-Technologies Corp株式会社日立ハイテクノロジーズSamsung Display Co Ltd三星ディスプレイ株式會社Samsung Display Co.,Ltd.
    • KITANI YUKAIZAKI MAKOTOTAKEI TETSUYAJUNG JAE HOONLEE SANG-WOO
    • C23C14/24H01L51/50H05B33/10H05B33/14
    • PROBLEM TO BE SOLVED: To provide an excellent vacuum deposition device and an excellent vacuum deposition method, capable of preventing degradation in the productivity even when the size of a panel is increased.SOLUTION: A vacuum vapor deposition device for executing the vapor deposition of a luminescent material layer on a surface of a substrate to be vapor-deposited includes in a vacuum chamber 10: a cooling plate 13 in which a substrate to be vapor-deposited is mounted on its surface and held; a mask 30 to be mounted on a surface of a substrate 100 held by the cooling plate; and an evaporation source device 20 for supplying evaporated EL material in a moving mode via the mask on the surface of the substrate held by the cooling plate. The mask is fixed to a frame 33 while a mask sheet 31 formed of magnetic metal with a plurality of patterns being formed thereon is subjected to the tension. The cooling plate has a magnet 200 which attracts a part of the mask sheet to the surface of the substrate, and is moved synchronously with the movement of the evaporation source device.
    • 要解决的问题:提供一种优异的真空沉积装置和优异的真空沉积方法,即使当面板的尺寸增加时也能够防止生产率的降低。解决方案:一种用于执行气相沉积的真空气相沉积装置 将要蒸镀的基板的表面上的发光材料层包括在真空室10中,在其表面上安装有被蒸镀的基板被保持的冷却板13; 安装在由冷却板保持的基板100的表面上的掩模30; 以及蒸发源装置20,用于通过在由冷却板保持的基板的表面上的掩模以移动模式供应蒸发的EL材料。 掩模固定在框架33上,同时由形成有多个图案的磁性金属形成的掩模片31受到张力。 冷却板具有磁体200,其将掩模片的一部分吸引到基板的表面,并与蒸发源装置的运动同步地移动。
    • 5. 发明专利
    • Vacuum deposition device and vapor deposition source of the same
    • 真空沉积装置和蒸气沉积源
    • JP2013209696A
    • 2013-10-10
    • JP2012079799
    • 2012-03-30
    • Samsung Display Co Ltd三星ディスプレイ株式会社
    • IZAKI MAKOTOTAKEI TETSUYAKITANI YUKAJUNG JAE HOONLEE SANG-WOO
    • C23C14/24
    • PROBLEM TO BE SOLVED: To provide a vapor deposition source which suppresses a film in a slope state generated when forming a vapor deposition film in a vacuum deposition device.SOLUTION: In a vacuum deposition device, a vapor deposition film with a predetermined pattern is formed on a substrate via a mask. A vapor deposition source is arranged opposite to the substrate. The vapor deposition source includes a crucible, and a plurality of injection nozzles 33 which introduce a vaporized material contained in the crucible to the substrate. The injection nozzles are aligned. An upper diffusion prevention plate 31 and a lower diffusion prevention plate 32 are arranged on both sides of the row of the injection nozzles, and side diffusion prevention plates 34 are arranged between the respective injection nozzles. The vapor deposition source is moved in the vertical direction by a moving means.
    • 要解决的问题:提供一种蒸镀源,其抑制在真空蒸镀装置中形成蒸镀膜时产生的倾斜状态的膜。解决方案:在真空蒸镀装置中,形成具有规定图案的蒸镀膜 通过掩模在衬底上。 蒸镀源与衬底相对配置。 气相沉积源包括坩埚和将坩埚中包含的汽化材料引入基板的多个喷嘴33。 注射喷嘴对齐。 在喷射喷嘴列的两侧设置有上部扩散防止板31和下部扩散防止板32,在各喷射喷嘴之间配置有防侧壁扩散板34。 气相沉积源通过移动装置在垂直方向上移动。