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    • 5. 依法登记的发明
    • Laser-assisted fabrication of bipolar transistors in silicon-on-sapphire
(SOS)
    • 激光辅助制造蓝宝石(SOS)中的双极晶体管,
    • USH1637H
    • 1997-03-04
    • US762538
    • 1991-09-18
    • Bruce W. OffordStephen D. RussellKurt H. Weiner
    • Bruce W. OffordStephen D. RussellKurt H. Weiner
    • H01L21/265H01L21/268H01L21/331H01L21/86
    • H01L29/66265H01L21/26513H01L21/268H01L21/86
    • The fabrication of bipolar junction transistors in silicon-on-sapphire (SOS) relies upon the laser-assisted dopant activation in SOS. A patterned 100% aluminum mask whose function is to reflect laser light from regions where melting of the silicon is undesirable is provided on an SOS wafer to be processed. The wafer is placed within a wafer carrier that is evacuated and backfilled with an inert atmosphere and that is provided with a window transparent to the wavelength of the laser beam to allow illumination of the masked wafer when the carrier is inserted into a laser processing system. A pulsed laser (typically an excimer laser) beam is appropriately shaped and homogenized and one or more pulses are directed onto the wafer. The laser beam pulse energy and pulse duration are set to obtain the optimal fluence impinging on the wafer in order to achieve the desired melt duration and corresponding junction depth. Care must be taken since activation and rapid dopant redistribution occurs when the laser fluence is above the melt threshold and below the ablation threshold. Thus, bipolar junction transistors in SOS utilize a pulsed laser activation of ion implanted dopant atoms. Appropriate masking and pulsed laser illumination assures the electrical activation of the dopant without allowing undesirable diffusion either vertically along crystallographic defects (diffusion pipes) or laterally.
    • 硅蓝宝石(SOS)中双极结晶体管的制造依赖于SOS中激光辅助的掺杂剂激活。 在要处理的SOS晶片上设置图案化的100%铝掩模,其功能是反射来自硅熔化区域的激光。 将晶片放置在被惰性气氛中抽真空并回填的晶片载体中,并且其具有对激光束的波长透明的窗口,以允许当载体插入激光加工系统时照射被屏蔽的晶片。 脉冲激光(通常是准分子激光器)光束被适当地成形并均匀化,并且一个或多个脉冲被引导到晶片上。 设置激光束脉冲能量和脉冲持续时间以获得撞击晶片的最佳注量,以获得所需的熔融持续时间和对应的结深度。 必须小心,因为当激光能量密度高于熔融阈值并低于消融阈值时,激活和快速掺杂剂再分配发生。 因此,SOS中的双极结晶体管利用离子注入掺杂原子的脉冲激光激活。 合适的掩蔽和脉冲激光照射确保掺杂剂的电活化,而不会沿着结晶缺陷(扩散管)或横向垂直地不期望地扩散。
    • 7. 发明授权
    • Method for fabricating an electrically addressable silicon-on-sapphire light valve
    • 用于制造电可寻址硅蓝宝石光阀的方法
    • US06617187B1
    • 2003-09-09
    • US09880660
    • 2001-08-03
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2100
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A method for fabricating a monolithically integrated liquid crystal array display and control circuitry on a silicon-on-sapphire structure comprises the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry which is used to control the operation of the pixels.
    • 一种用于制造蓝宝石结构上的单片集成液晶阵列显示和控制电路的方法,包括以下步骤:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石结构; b)离子注入外延硅层; c)退火硅蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持用于控制像素的操作的器件质量电路的制造。
    • 8. 发明授权
    • Method for fabricating an electrically addressable silicon-on-sapphire light valve
    • 用于制造电可寻址硅蓝宝石光阀的方法
    • US06312968B1
    • 2001-11-06
    • US09047658
    • 1998-03-25
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2100
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A method for fabricating a monolithically integrated liquid crystal array display and control circuitry on a silicon-on-sapphire structure comprises the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry which is used to control the operation of the pixels.
    • 一种用于制造蓝宝石结构上的单片集成液晶阵列显示和控制电路的方法,包括以下步骤:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石结构; b)离子注入外延硅层; c)退火硅蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持用于控制像素的操作的器件质量电路的制造。
    • 9. 发明授权
    • Ultra-high resolution liquid crystal display on silicon-on-sapphire
    • 硅蓝宝石上的超高分辨率液晶显示器
    • US06190933B1
    • 2001-02-20
    • US09047813
    • 1998-03-25
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2100
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A liquid crystal array and associated drive circuitry are monolithically formed on a silicon-on-sapphire structure, and are fabricated by a method comprising the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from a portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer wherein each of the pixels includes a liquid crystal capacitor; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry on the silicon-on-sapphire structure which is used to control the operation of the pixels.
    • 液晶阵列和相关联的驱动电路单片地形成在蓝宝石结构上,并且通过包括以下步骤的方法制造:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石上的硅 结构体; b)离子注入外延硅层; c)退火硅蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列,其中每个像素包括液晶电容器; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持在蓝宝石结构上的器件质量电路的制造,其用于控制​​像素的操作。