会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Method for fabricating an electrically addressable silicon-on-sapphire light valve
    • 用于制造电可寻址硅蓝宝石光阀的方法
    • US06617187B1
    • 2003-09-09
    • US09880660
    • 2001-08-03
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2100
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A method for fabricating a monolithically integrated liquid crystal array display and control circuitry on a silicon-on-sapphire structure comprises the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry which is used to control the operation of the pixels.
    • 一种用于制造蓝宝石结构上的单片集成液晶阵列显示和控制电路的方法,包括以下步骤:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石结构; b)离子注入外延硅层; c)退火硅蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持用于控制像素的操作的器件质量电路的制造。
    • 3. 发明授权
    • Method for fabricating an electrically addressable silicon-on-sapphire light valve
    • 用于制造电可寻址硅蓝宝石光阀的方法
    • US06312968B1
    • 2001-11-06
    • US09047658
    • 1998-03-25
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2100
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A method for fabricating a monolithically integrated liquid crystal array display and control circuitry on a silicon-on-sapphire structure comprises the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry which is used to control the operation of the pixels.
    • 一种用于制造蓝宝石结构上的单片集成液晶阵列显示和控制电路的方法,包括以下步骤:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石结构; b)离子注入外延硅层; c)退火硅蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持用于控制像素的操作的器件质量电路的制造。
    • 4. 发明授权
    • Ultra-high resolution liquid crystal display on silicon-on-sapphire
    • 硅蓝宝石上的超高分辨率液晶显示器
    • US06190933B1
    • 2001-02-20
    • US09047813
    • 1998-03-25
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2100
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A liquid crystal array and associated drive circuitry are monolithically formed on a silicon-on-sapphire structure, and are fabricated by a method comprising the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from a portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer wherein each of the pixels includes a liquid crystal capacitor; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry on the silicon-on-sapphire structure which is used to control the operation of the pixels.
    • 液晶阵列和相关联的驱动电路单片地形成在蓝宝石结构上,并且通过包括以下步骤的方法制造:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石上的硅 结构体; b)离子注入外延硅层; c)退火硅蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列,其中每个像素包括液晶电容器; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持在蓝宝石结构上的器件质量电路的制造,其用于控制​​像素的操作。
    • 9. 发明授权
    • Ultra-high resolution liquid crystal display on silicon-on-sapphire
    • 硅蓝宝石上的超高分辨率液晶显示器
    • US06365936B1
    • 2002-04-02
    • US09607438
    • 2000-06-29
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • Randy L. ShimabukuroStephen D. RussellBruce W. Offord
    • H01L2701
    • H01L29/6678G02F1/13454H01L21/8238H01L21/86H01L27/1214H01L29/78657
    • A liquid crystal array and associated drive circuitry are monolithically formed on a silicon-on-sapphire structure, and are fabricated by a method comprising the steps of: a) forming an epitaxial silicon layer on a sapphire substrate to create a silicon-on-sapphire structure; b) ion implanting the epitaxial silicon layer; c) annealing the silicon-on-sapphire structure; d) oxidizing the epitaxial silicon layer to form a silicon dioxide layer from a portion of the epitaxial silicon layer so that a thinned epitaxial silicon layer remains; e) removing the silicon dioxide layer to expose the thinned epitaxial silicon layer; f) fabricating an array of pixels from the thinned epitaxial silicon layer wherein each of the pixels includes a liquid crystal capacitor; and g) fabricating integrated circuitry from the thinned epitaxial silicon layer which is operably coupled to modulate the pixels. The thinned epitaxial silicon supports the fabrication of device quality circuitry on the silicon-on-sapphire structure which is used to control the operation of the pixels.
    • 液晶阵列和相关联的驱动电路单片地形成在蓝宝石结构上,并且通过包括以下步骤的方法制造:a)在蓝宝石衬底上形成外延硅层以产生蓝宝石上的硅 结构体; b)离子注入外延硅层; c)退火蓝宝石结构; d)氧化所述外延硅层以从所述外延硅层的一部分形成二氧化硅层,从而保留减薄的外延硅层; e)去除二氧化硅层以暴露变薄的外延硅层; f)从所述变薄的外延硅层制造像素阵列,其中每个像素包括液晶电容器; 以及g)从所述变薄的外延硅层制造集成电路,其可操作地耦合以调制像素。 减薄的外延硅支持在蓝宝石结构上的器件质量电路的制造,其用于控制​​像素的操作。