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    • 1. 发明授权
    • Manufacture of a semiconductor device with an epitaxial semiconductor zone
    • 具有外延半导体区域的半导体器件的制造
    • US06368946B1
    • 2002-04-09
    • US08822747
    • 1997-03-24
    • Ronald DekkerCornelis E. TimmeringDoede TerpstraWiebe B. De Boer
    • Ronald DekkerCornelis E. TimmeringDoede TerpstraWiebe B. De Boer
    • H01L21265
    • H01L29/66287H01L21/02381H01L21/0245H01L21/02532H01L21/02639
    • A method of manufacturing a semiconductor device with an epitaxial semiconductor zone, whereby a first layer of insulating material, a first layer of non-monocrystalline silicon, and a second layer of insulating material are provided in that order on a surface of a silicon wafer, a window with a steep wall is etched through the second layer of insulating material and the first layer of non-monocrystalline silicon, the wall of the window is provided with a protective layer, the first insulating layer is selectively etched away within the window and below an edge of the first layer of non-monocrystalline silicon adjoining the window such that both the edge of the first layer of non-monocrystalline silicon itself and the surface of the wafer become exposed within the window and below said edge, semiconductor material is selectively deposited such that the epitaxial semiconductor zone is formed on the exposed surface of the wafer, and an edge of polycrystalline semiconductor material connected to the epitaxial semiconductor zone is formed on the exposed edge of the first layer of non-monocrystalline silicon, an insulating spacer layer is provided on the proctective layer on the wall of the window, and a second layer of non-monocrystalline silicon is deposited. The provision of a top layer of a material on which non-monocrystalline semiconductor material will grow during the selective deposition of the semiconductor material, which top layer is provided on the second layer of insulating material before the selective deposition of the semiconductor material, achieves that the selective deposition process can be better monitored.
    • 制造具有外延半导体区域的半导体器件的方法,其中第一绝缘材料层,第一非晶硅层和第二绝缘材料层依次设置在硅晶片的表面上, 通过绝缘材料的第二层和非单晶硅的第一层蚀刻具有陡峭壁的窗口,窗口的壁设置有保护层,第一绝缘层被选择性地蚀刻在窗口内并在窗口下方 邻接窗口的非单晶硅第一层的边缘使得第一层非单晶硅本身的边缘和晶片的表面两者都在窗口内部和所述边缘的下方露出,半导体材料被选择性地沉积如 外延半导体区形成在晶片的暴露表面上,并连接多晶半导体材料的边缘 在第一非晶硅单层的暴露边缘上形成外延半导体区,在窗口壁上的保护层上提供绝缘间隔层,并沉积第二层非单晶硅。 在选择性沉积半导体材料的选择性沉积期间,在半导体材料的选择性沉积之前,提供非单晶半导体材料将在其上生长的材料的顶层,该半导体材料在半导体材料的选择性沉积之前设置在第二绝缘材料层上, 可以更好地监测选择性沉积过程。
    • 2. 发明授权
    • Method of manufacturing a semiconductor device with a pn junction
provided through epitaxy
    • 通过外延生产具有pn结的半导体器件的方法
    • US5915187A
    • 1999-06-22
    • US768482
    • 1996-12-18
    • Frederikus R. J. HuismanWiebe B. De BoerOscar J. A. BulikRonald Dekker
    • Frederikus R. J. HuismanWiebe B. De BoerOscar J. A. BulikRonald Dekker
    • H01L21/205H01L21/302H01L21/56H01L21/78H01L29/864H01L29/93H01L21/20
    • H01L21/02381H01L21/0245H01L21/02532H01L21/0262H01L21/02664H01L21/78H01L29/93
    • The invention relates to a method of manufacturing a semiconductor device with a pn junction, whereby an epitaxial layer (2) with a first zone (3) of a first conductivity type and with a second zone (4) of a second conductivity type opposed to the first is provided on a silicon substrate (1), a pn junction (5) being formed between the second and first zones (3, 4, respectively). According to the invention, the method is characterized in that the epitaxial layer (2) is provided by means of a CVD process at a temperature below 800.degree. C., the epitaxial layer (2) being provided in that first the first zone (3) and then the second zone (4) are epitaxially provided on the substrate (1), while no heat treatments at temperatures above 800.degree. C. take place after the epitaxial layer (2) has been provided. The measure according to the invention renders it possible to achieve properties of semiconductor devices manufactured in accordance with the invention, for example the capacitance-voltage (CV) relation of varicap diodes, within wide limits according to specifications. In addition, semiconductor devices manufactured by the method according to the invention require no post-diffusion or measurement steps in order to bring the properties of the semiconductor device up to specifications.
    • 本发明涉及制造具有pn结的半导体器件的方法,由此具有第一导电类型的第一区(3)和与第二导电类型相反的第二导电类型的第二区(4)的外延层(2) 第一设置在硅衬底(1)上,pn结(5)分别形成在第二区和第一区之间(3,4)。 根据本发明,该方法的特征在于外延层(2)通过CVD工艺在低于800℃的温度下提供,外延层(2)设置在第一区域(3) ),然后第二区(4)外延地设置在基板(1)上,而在提供了外延层(2)之后,在高于800℃的温度下不进行热处理。 根据本发明的措施使得可以根据本发明制造的半导体器件的性质,例如变容二极管的电容 - 电压(CV)关系在根据规格的宽范围内。 此外,通过根据本发明的方法制造的半导体器件不需要后扩散或测量步骤,以使半导体器件的性能达到规格。
    • 3. 发明授权
    • Method of manufacturing a semiconductor device having a semiconductor
body with field insulation regions formed by grooves filled with
insulating material
    • 具有半导体本体的半导体器件的制造方法,该半导体器件具有由绝缘材料填充的沟槽形成的场绝缘区域
    • US5554256A
    • 1996-09-10
    • US310824
    • 1994-09-22
    • Armand PruijmboomRonald KosterCornelis E. TimmeringRonald Dekker
    • Armand PruijmboomRonald KosterCornelis E. TimmeringRonald Dekker
    • H01L21/31H01L21/308H01L21/76H01L21/00
    • H01L21/308H01L21/76
    • A method of manufacturing a semiconductor device comprising a semiconductor body (1) with field insulation regions (14) formed by grooves (10; 24) filled with an insulating material (13) is disclosed. The grooves (10; 24) are etched into the semiconductor body (1) with the use of an etching mask (9) formed on an auxiliary layer (6) provided on a surface (5) of the semiconductor body (1). The auxiliary layer (6) is removed from the portion (11) of the surface (5) situated next to the etching mask (9) before the grooves (10; 24) are etched into the semiconductor body (1), and the auxiliary layer (6) is removed from the edge (12) of the surface (5) situated below the etching mask (9) after the grooves (10; 24) have been etched into the semiconductor body. Furthermore, a layer (13) of the insulating material is deposited on the semiconductor body (1), whereby the grooves (10; 24) are filled and the edge (12) of the surface (5) situated below the etching mask (9) is covered. Then the semiconductor body is subjected to a treatment whereby material is taken off parallel to the surface (5) down to the auxiliary layer (6), and finally the remaining portion of the auxiliary layer (6) is removed. Field insulation regions are thus formed which extend over an edge (12) of the active regions (15) surrounded by the field insulation regions (14) with a strip (18) which has no overhanging edge.
    • 公开了一种制造半导体器件的方法,该半导体器件包括具有由绝缘材料(13)填充的沟槽(10; 24)形成的场绝缘区域(14)的半导体本体(1)。 使用形成在设置在半导体本体(1)的表面(5)上的辅助层(6)上的蚀刻掩模(9),将凹槽(10; 24)蚀刻到半导体本体(1)中。 在凹槽(10; 24)被蚀刻到半导体本体(1)中之前,从邻近蚀刻掩模(9)的表面(5)的部分(11)去除辅助层(6),并且辅助层 在凹槽(10; 24)被蚀刻到半导体本体中之后,从位于蚀刻掩模(9)下方的表面(5)的边缘(12)去除层(6)。 此外,绝缘材料的层(13)沉积在半导体本体(1)上,由此填充凹槽(10; 24),并且位于蚀刻掩模(9)下方的表面(5)的边缘(12) )被覆盖。 然后对半导体体进行处理,由此将材料平行于表面(5)取下到辅助层(6),最后除去辅助层(6)的剩余部分。 这样形成了场绝缘区域,该区域由具有不突出边缘的条带(18)在由绝缘区域(14)包围的有源区域(15)的边缘(12)上延伸。
    • 6. 发明申请
    • CARDIOMYOCYTES-CONTAINING DEVICE AND METHOD FOR MANUFACTURING AND USING THE SAME
    • 含有血小板活性的装置及其制造和使用方法
    • US20120094323A1
    • 2012-04-19
    • US13147607
    • 2010-02-02
    • Ronald DekkerAnja Van De Stolpe
    • Ronald DekkerAnja Van De Stolpe
    • C12Q1/18H01B13/00B05D5/00C12M1/34B05D1/36
    • G01N1/30C12N5/0657C12N2503/02C12N2535/10G01N33/5061
    • Disclosed is a device for determining the cardiotoxicity of a chemical compound, comprising a substrate (10) carrying a deformable stack (34), said stack being partially detached from the substrate by a cavity (32) allowing an out-of-plane deformation of the stack, said stack comprising a first deformable layer (16), a second deformable layer (20) and a multi-electrode structure (18) sandwiched between the first and second deformable layers, the second deformable layer carrying a pattern of cardiomyocytes (28) adhered thereto; and a liquid container (26) mounted on the substrate for exposing the cardiomyocytes to the chemical compound. A method of manufacturing such a device is also disclosed. The present invention further relates to the use of the device for drug target discovery and/or drug development and a method for developing a disease model for a disease that is caused by or modified by stretching of cells, in particular a cardiac disease model.
    • 公开了一种用于确定化合物的心脏毒性的装置,包括承载可变形叠层(34)的基底(10),所述叠层通过空腔(32)部分地与基底分离,允许外部变形 所述堆叠包括夹在所述第一和第二可变形层之间的第一可变形层(16),第二可变形层(20)和多电极结构(18),所述第二可变形层承载心肌细胞图案(28 ) 和安装在基板上的用于将心肌细胞暴露于化合物的液体容器(26)。 还公开了制造这种装置的方法。 本发明还涉及该装置用于药物靶发现和/或药物开发的用途,以及用于开发由细胞拉伸,特别是心脏疾病模型引起或改变的疾病的疾病模型的方法。
    • 10. 发明申请
    • DEFORMABLE INTEGRATED CIRCUIT DEVICE
    • 可变电容集成电路
    • US20100270640A1
    • 2010-10-28
    • US12377673
    • 2007-08-07
    • Ronald DekkerAntoon Marie Henrie TombeurTheodoros Zoumpoulidis
    • Ronald DekkerAntoon Marie Henrie TombeurTheodoros Zoumpoulidis
    • H01L23/52H01L21/98
    • H01L23/49833H01L23/5387H01L2924/0002H01L2924/00
    • An integrated-circuit device is provided, which comprises a rigid substrate island having a main substrate surface with a circuit region circuit elements and at least one fold structure. The fold structure is attached to the substrate island and is unfoldable from a relaxed, folded state to a strained unfolded state. The fold structure contains at least one passive electrical component. The fold structure further has in its folded state at least one surface with an area vector that includes a non-vanishing area-vector component in a direction parallel to the main substrate surface, which area-vector component is diminished or vanishes when deforming the fold structure from the folded into the unfolded state. The fold structure provided by the present invention allows fabricating the integrated-circuit device with small lateral extensions and thus takes up a particularly small amount of chip area, which reduces the cost per device.
    • 提供了一种集成电路器件,其包括具有主衬底表面的刚性衬底岛,其具有电路区域电路元件和至少一个折叠结构。 折叠结构附接到基底岛,并且可以从松弛的折叠状态展开到应变展开状态。 折叠结构包含至少一个无源电组件。 折叠结构在其折叠状态下进一步具有面向向的至少一个表面,该区域向量在平行于主衬底表面的方向上包括非消失的面积 - 矢量分量,该区域 - 矢量分量在折叠变形时减少或消失 结构从折叠到展开状态。 由本发明提供的折叠结构允许制造具有小横向延伸的集成电路器件,因此占据特别小量的芯片面积,这降低了每个器件的成本。