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    • 1. 发明授权
    • Method of conditioning electrochemical baths in plating technology
    • 电镀技术中电化学浴的调理方法
    • US06893548B2
    • 2005-05-17
    • US09882208
    • 2001-06-13
    • Robin CheungDaniel A. CarlLiang-Yuh ChenYezdi DordiPaul F. SmithRatson MoradPeter HeyAshok Sinha
    • Robin CheungDaniel A. CarlLiang-Yuh ChenYezdi DordiPaul F. SmithRatson MoradPeter HeyAshok Sinha
    • C23C18/16C25D7/12C25D21/12C25D21/18C25D5/00
    • C25D21/18C23C18/1617C23C18/1683C25D21/12
    • An apparatus and method is provided for analyzing or conditioning an electrochemical bath. One aspect of the invention provides a method for analyzing an electrochemical bath in an electrochemical deposition process including providing a first electrochemical bath having a first bath composition, utilizing the first electrochemical bath in an electrochemical deposition process to form a second electrochemical bath having a second bath composition and analyzing the first and second compositions to identify one or more constituents generated in the electrochemical deposition process. Additive material having a composition that is substantially the same as all or at least some of the one or more constituents generated in the electrochemical deposition process may be added to another electrochemical bath to produce a desired chemical composition. The constituents may be added at the beginning of the use of the bath to initially condition the electrochemical bath or may be added, preferably either continuously or periodically, during the electrochemical deposition process.
    • 提供了一种用于分析或调理电化学浴的装置和方法。 本发明的一个方面提供了一种用于在电化学沉积方法中分析电化学浴的方法,包括提供具有第一浴组成的第一电化学浴,利用电化学沉积工艺中的第一电化学浴形成具有第二浴的第二电化学浴 组合和分析第一和第二组合物以鉴定在电化学沉积过程中产生的一种或多种成分。 具有与在电化学沉积工艺中产生的一种或多种成分中的全部或至少一些基本上相同的组成的添加剂材料可以加入到另一电化学浴中以产生所需的化学组成。 可以在使用浴的开始时添加组分以最初调节电化学浴,或者可以在电化学沉积过程期间连续地或周期性地添加。