专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5734519A Contact magnetic recording disk file with improved head assembly 失效
标题翻译：接触磁记录磁盘文件，改进头组件
公开(公告)号：US5734519A
公开(公告)日：1998-03-31
申请号：US37064
申请日：1993-03-25
申请人： Robert Edward Fontana, Jr. , Cherngye Hwang , Vlad Joseph Novotny , Timothy Clark Reiley , Celia Elizabeth Yeack-Scranton , Clinton David Snyder
发明人： Robert Edward Fontana, Jr. , Cherngye Hwang , Vlad Joseph Novotny , Timothy Clark Reiley , Celia Elizabeth Yeack-Scranton , Clinton David Snyder
IPC分类号： G11B5/31 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/39 , G11B5/48
CPC分类号： G11B5/484 , G11B5/10 , G11B5/255
摘要： A contact recording disk file uses an integrated head-suspension assembly having a head carrier with a dual-layer wear pad for contacting the disk during read and write operations. The outer wear layer of the pad is relatively soft and wear prone compared to a harder and more wear-resistant inner layer. The outer wear layer wears away at a relatively rapid rate during initial wear-in of the head carrier. In this manner the head pole pieces, which extend into the wear pad, are rapidly put into contact with the disk, thereby compensating for initial misalignment of the wear pad with the surface of the disk. The inner wear layer then provides wear resistance over the life of the disk file. In the preferred embodiment, both the outer and inner wear layers are formed of essentially amorphous carbon doped with different amounts of hydrogen.
摘要翻译：接触式记录磁盘文件使用集成的头悬挂组件，其具有带有双层磨损垫的头部托架，用于在读取和写入操作期间接触盘。相对于较硬和更耐磨的内层，该垫的外部耐磨层相对较软并且容易发生倾向。在头托架的初始磨损期间，外磨损层以相对较快的速度磨损。以这种方式，延伸到耐磨垫中的头部极片迅速地与盘接触，从而补偿磨损垫与盘表面的初始不对准。然后，内部磨损层在磁盘文件的使用寿命内提供耐磨性。在优选实施例中，外耐磨层和内耐磨层均由掺杂有不同量氢的基本无定形碳形成。

2. 发明授权

US07191508B2 Method for manufacturing thin-film magnetic head sliders 有权
标题翻译：制造薄膜磁头滑块的方法
公开(公告)号：US07191508B2
公开(公告)日：2007-03-20
申请号：US10917591
申请日：2004-08-13
申请人： Cherngye Hwang , Kim Y. Lee , Gary McClelland , Dennis Richard McKean , Timothy Clark Reiley
发明人： Cherngye Hwang , Kim Y. Lee , Gary McClelland , Dennis Richard McKean , Timothy Clark Reiley
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3173 , G11B5/102 , G11B5/105 , G11B5/3106 , G11B5/3163 , Y10T29/49032 , Y10T29/49041
摘要： A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.
摘要翻译：公开了一种制造薄膜磁头滑块的方法。最初，可以由聚二甲基硅氧烷（PDMS）制成的弹性层在晶片上旋转并被热固化。然后，在弹性层上旋转抗蚀剂层。抗蚀剂层和弹性层随后从晶片一起剥离。接下来，将剥离的抗蚀剂层/弹性层施加到一组磁头上，其中抗蚀剂层与磁头直接接触。最后，弹性层从抗蚀剂层剥离，使得抗蚀剂层保持附着在磁头上。

3. 发明授权

US06346183B1 Use of thin carbon films as a bottom anti-reflective coating in manufacturing magnetic heads 失效
标题翻译：在制造磁头时使用薄碳膜作为底部抗反射涂层
公开(公告)号：US06346183B1
公开(公告)日：2002-02-12
申请号：US09632501
申请日：2000-08-03
申请人： Amanda Baer , Richard Hsiao , Cherngye Hwang , Clinton David Snyder , Hong Xu
发明人： Amanda Baer , Richard Hsiao , Cherngye Hwang , Clinton David Snyder , Hong Xu
IPC分类号： C25C1434
CPC分类号： G11B5/3163 , G03F7/091 , G11B5/3133 , G11B5/3166
摘要： A fabrication method using a bottom anti-reflective coating (BARC) eliminating deleterious effects of unwanted reflected light during the photo exposure step of a photolithographic process. The BARC coating comprises a carbon coating having a thickness of 300 angstroms, deposited by a carbon ion beam deposition tool, and an initial silicon BARC coating layer having thickness of 20 angstroms deposited before the carbon coating. Where the BARC layer is utilized in a photolithographic NiFe pole tip fabrication process, a NiFe seed layer is first deposited upon a substrate. The BARC layer is then formed on the NiFe seed layer and the pole tip trench is then photolithographically created. Thereafter, the BARC layer is removed from the bottom of the trench, utilizing a reactive ion etch process, exposing the NiFe seed layer. The NiFe pole tip is then fabricated into the trench, and any remaining photoresist and BARC layer are removed.
摘要翻译：使用底部抗反射涂层（BARC）的制造方法，其消除光刻工艺的光曝光步骤期间不期望的反射光的有害影响。 BARC涂层包括通过碳离子束沉积工具沉积的具有300埃厚度的碳涂层，以及在碳涂覆之前淀积厚度为20埃的初始硅BARC涂层。在光刻NiFe极尖制造工艺中使用BARC层的情况下，首先将NiFe种子层沉积在衬底上。然后在NiFe种子层上形成BARC层，然后光刻形成极尖沟槽。此后，利用反应离子蚀刻工艺将BARC层从沟槽的底部移除，暴露出NiFe种子层。然后将NiFe极尖制成沟槽，并且去除任何剩余的光致抗蚀剂和BARC层。

4. 发明授权

US09349395B2 System and method for differential etching 有权
标题翻译：差分蚀刻的系统和方法
公开(公告)号：US09349395B2
公开(公告)日：2016-05-24
申请号：US13601739
申请日：2012-08-31
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
IPC分类号： G11B5/31 , H01J37/32
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译：根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。

5. 发明申请

US20140061033A1 SYSTEM AND METHOD FOR DIFFERENTIAL ETCHING 有权
标题翻译：用于差异蚀刻的系统和方法
公开(公告)号：US20140061033A1
公开(公告)日：2014-03-06
申请号：US13601739
申请日：2012-08-31
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译：根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。

6. 发明授权

US08611049B2 Magnetic heads having magnetic films that are more recessed than insulating films, and systems having such heads 失效
标题翻译：具有比绝缘膜更凹陷的磁性膜的磁头以及具有这种磁头的系统
公开(公告)号：US08611049B2
公开(公告)日：2013-12-17
申请号：US12975208
申请日：2010-12-21
申请人： Robert Glenn Biskeborn , Cherngye Hwang , Calvin Shyhjong Lo , Andrew C. Ting
发明人： Robert Glenn Biskeborn , Cherngye Hwang , Calvin Shyhjong Lo , Andrew C. Ting
IPC分类号： G11B5/127
CPC分类号： G11B5/00826 , G11B5/3116 , G11B5/3163
摘要： A structure according to one embodiment includes a substrate having a media facing side; and a thin film stack formed on the substrate, the thin film stack including magnetic films and insulating films, wherein the thin film stack is recessed from a plane extending along the media facing side of the substrate, wherein the magnetic films are recessed more than the insulating films, wherein the magnetic films each have a substantially flat media facing surface, wherein the insulating films each have a substantially flat media facing surface.
摘要翻译：根据一个实施例的结构包括具有介质面向侧的基板; 以及形成在所述基板上的薄膜叠层，所述薄膜叠层包括磁性膜和绝缘膜，其中所述薄膜叠层从沿着所述基板的面向介质侧延伸的平面凹陷，其中所述磁性膜比所述绝缘膜，其中所述磁性膜各自具有基本上平坦的介质面向表面，其中所述绝缘膜各自具有基本平坦的介质面向表面。

7. 发明授权

US08220136B2 Forming a planarized surface for at least one bar of sliders 有权
标题翻译：形成用于至少一个滑块的平坦化表面
公开(公告)号：US08220136B2
公开(公告)日：2012-07-17
申请号：US11800127
申请日：2007-05-03
申请人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
发明人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/4853 , G11B5/102 , G11B5/3163 , G11B5/3173 , Y10T29/49027 , Y10T29/49039 , Y10T29/49041 , Y10T29/49055 , Y10T29/53165 , Y10T156/10
摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.
摘要翻译：公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。通常，将至少一个滑杆放置在粘合剂层上。然后在至少一个滑杆上方设置单个热塑性层。然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

8. 发明授权

US08191234B2 Method of manufacturing a magnetic head with reinforcing islands 失效
标题翻译：制造具有加强岛的磁头的方法
公开(公告)号：US08191234B2
公开(公告)日：2012-06-05
申请号：US12184357
申请日：2008-08-01
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang
IPC分类号： G11B5/23 , B44C1/22
CPC分类号： G11B5/3106 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49041 , Y10T29/49048
摘要： A method for protecting a thin film structure including fabricating a plurality of island structures in a recording gap of a magnetic recording head, exposing a substantial portion of the plurality of island structures by removing at least a portion of the surrounding recording gap material via at least one etching process, including ion milling, coating the magnetic recording head containing the plurality of island structures with a coating material, including silicon nitride or aluminum oxide, and removing at least a portion of the coating material via a removal process, including chemical-mechanical polishing or lapping, to expose an uppermost region of at least a portion of said plurality of island structures.
摘要翻译：一种用于保护薄膜结构的方法，包括在磁记录头的记录间隙中制造多个岛状结构，通过至少除去周围的记录间隙材料的至少一部分而暴露多个岛结构的大部分一个蚀刻工艺，包括离子铣削，用包括氮化硅或氧化铝的涂层材料涂覆包含多个岛状结构的磁记录头，以及通过去除工艺去除至少一部分涂层材料，包括化学机械抛光或研磨，以暴露所述多个岛结构的至少一部分的最上部区域。

9. 发明申请

US20110256423A1 HEAD COMPRISING A CRYSTALLINE ALUMINA LAYER 有权
标题翻译：包括结晶铝氧化铝层的头
公开(公告)号：US20110256423A1
公开(公告)日：2011-10-20
申请号：US12761394
申请日：2010-04-16
申请人： Robert G. Biskeborn , Cherngye Hwang , Calvin S. Lo , Andrew C. Ting
发明人： Robert G. Biskeborn , Cherngye Hwang , Calvin S. Lo , Andrew C. Ting
IPC分类号： G11B5/33 , C23C14/00 , B05D5/00
CPC分类号： G11B5/255 , G11B5/127 , G11B5/3106 , G11B5/3133
摘要： A magnetic head produced at low ambient temperatures that comprise a crystalline alumina layer for increasing the durability of the head is provided. According to one embodiment, a magnetic head for at least one of reading and writing data on to a magnetic data storage media. The magnetic head comprises a substrate, an at least partially crystalline alumina layer formed on the substrate, at least one of a write transducer and a read transducer formed on the substrate, and a surface for engaging the magnetic data storage media. In another embodiment, a method for forming an at least partially crystalline alumina film. The method comprises providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
摘要翻译：提供了一种在低环境温度下产生的包含结晶氧化铝层以提高头部耐久性的磁头。根据一个实施例，一种用于读取和写入数据到磁数据存储介质中的至少一个的磁头。磁头包括衬底，形成在衬底上的至少部分结晶的氧化铝层，形成在衬底上的写换能器和读换能器中的至少一个以及用于接合磁数据存储介质的表面。在另一个实施方案中，形成至少部分结晶的氧化铝膜的方法。该方法包括在环境温度下提供衬底和将氧化铝沉积到衬底上以形成至少部分结晶的氧化铝膜。

10. 发明授权

US06969625B2 CMP assisted liftoff micropatterning 失效
标题翻译： CMP辅助提升微图案
公开(公告)号：US06969625B2
公开(公告)日：2005-11-29
申请号：US10949433
申请日：2004-09-24
申请人： Marie-Claire Cyrille , Frederick H. Dill , Cherngye Hwang , Jui-Lung Li
发明人： Marie-Claire Cyrille , Frederick H. Dill , Cherngye Hwang , Jui-Lung Li
IPC分类号： G11B5/39 , G11B5/31 , H01L21/304 , H01L43/08 , H01L21/00 , H01L21/44
CPC分类号： G11B5/313
摘要： A method and structure for a microelectronic device comprises a first film over a substrate, a first polish resistant layer over the first film, a second film over the first polish resistant layer, a second polish resistant layer over the second film, wherein the first and second polish resistant layers comprise diamond-like carbon. The first film comprises an electrically resistive material, while the second film comprises low resistance conductive material. The first film is an electrical resistor embodied as a magnetic read sensor. The electrically resistive material is sensitive to magnetic fields. The device further comprises a generally vertical junction between the first and second films and a dielectric film abutted to the electrically resistive material.
摘要翻译：微电子器件的方法和结构包括：衬底上的第一膜，第一膜上的第一耐抛光层，第一耐抛光层上的第二膜，第二膜上的第二耐光层，其中第一和第二膜第二耐光层包括类金刚石碳。第一膜包括电阻材料，而第二膜包括低电阻导电材料。第一个胶片是一个实现为磁读取传感器的电阻器。电阻材料对磁场敏感。该装置还包括在第一和第二膜之间的大致垂直的接合点和邻接于电阻材料的电介质膜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式