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1. 发明授权

US07514682B2 Electron anti-fogging baffle used as a detector 失效
标题翻译：电子防雾挡板用作检测器
公开(公告)号：US07514682B2
公开(公告)日：2009-04-07
申请号：US11537062
申请日：2006-09-29
申请人： Benyamin Buller , William J. Devore , Juergen Frosien , Richard L. Lozes , Henry Pearce-Percy , Dieter Winkler
发明人： Benyamin Buller , William J. Devore , Juergen Frosien , Richard L. Lozes , Henry Pearce-Percy , Dieter Winkler
IPC分类号： H01J37/09 , G01N23/00 , G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/244 , H01J2237/004 , H01J2237/0213 , H01J2237/0262 , H01J2237/2448 , H01J2237/24571
摘要： Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.
摘要翻译：提供了有助于测量由防雾挡板装置收集的散射电子量的方法和装置。对于一些实施例，通过将导线附接到挡板装置的电隔离（浮动）部分，由此收集的散射电子的量可以例如被读取为电流信号。因此，对于这样的实施例，挡板装置可以作为检测器加倍，从而允许产生表面（例如，掩模或衬底表面）的图像。

2. 发明授权

US07498591B2 Critical dimension effects correction in raster pattern generator 失效
标题翻译：光栅图案发生器中的关键尺寸效应校正
公开(公告)号：US07498591B2
公开(公告)日：2009-03-03
申请号：US11241792
申请日：2005-09-30
申请人： Richard L. Lozes , Benyamin Buller
发明人： Richard L. Lozes , Benyamin Buller
IPC分类号： G21G5/00 , H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31769 , Y10S430/143
摘要： A method for generating a flash. The method includes computing dose correction multipliers taking into account fogging scattering effects, backscattering effects and fast secondary scattering effects; and using the dose correction multipliers to generate the flash.
摘要翻译：一种产生带电粒子束闪光的方法。该方法包括至少部分地基于抗蚀剂敏感度校正因子计算剂量校正乘数的阵列; 并且使用剂量校正乘数阵列来调制带电粒子束闪光的曝光剂量。

3. 发明授权

US07800075B2 Multi-function module for an electron beam column 有权
标题翻译：电子束柱多功能模块
公开(公告)号：US07800075B2
公开(公告)日：2010-09-21
申请号：US12194220
申请日：2008-08-19
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
摘要翻译：用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

4. 发明申请

US20080308751A1 MULTI-FUNCTION MODULE FOR AN ELECTRON BEAM COLUMN 有权
标题翻译：电子束柱的多功能模块
公开(公告)号：US20080308751A1
公开(公告)日：2008-12-18
申请号：US12194220
申请日：2008-08-19
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
摘要翻译：用于电子束柱的多功能模块包括上电极和下电极以及中心环电极。上电极和下电极具有多极并且能够偏转或校正通过电极的电子束的像差。可以独立于施加到上电极和下电极的电压而将电压施加到中心环电极，以将电子束聚焦在衬底上。

5. 发明授权

US07427765B2 Electron beam column for writing shaped electron beams 有权
标题翻译：用于写入成形电子束的电子束柱
公开(公告)号：US07427765B2
公开(公告)日：2008-09-23
申请号：US11243363
申请日：2005-10-03
申请人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
发明人： Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是一半在写平面处电子束对着的角度。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

6. 发明授权

US07476880B2 Writing a circuit design pattern with shaped particle beam flashes 失效
标题翻译：编写具有成形粒子束闪光的电路设计图案
公开(公告)号：US07476880B2
公开(公告)日：2009-01-13
申请号：US11243299
申请日：2005-10-03
申请人： Benyamin Buller , Richard L. Lozes , Robert M. Sills
发明人： Benyamin Buller , Richard L. Lozes , Robert M. Sills
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/302 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776 , Y10S430/143
摘要： A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary polygons. The writing strategy comprises transforming and fracturing the arbitrary polygons into a plurality of restricted polygons, each restricted polygon being represented by a location coordinate, at least two dimension coordinates, and at least one external edge indicator. Thereafter, the restricted polygons are tiled into a set of tiles comprising interior tiles and external edge tiles. Flash data is assigned for each tile such that the interior tiles are assigned a first flash area and the external edge tiles are assigned a second flash area that is smaller than the first flash area. The flash data is arranged in a selected order to write the pattern with a modulated particle beam, such as an electron beam, on a substrate.
摘要翻译：可以使用成形的粒子束写入策略来将具有粒子束的图案写入到衬底上。该图案包括断裂成多个任意多边形的电路设计。写入策略包括将任意多边形变换和压缩成多个受限多边形，每个受限多边形由位置坐标，至少两个维度坐标以及至少一个外部边缘指示符表示。此后，将限制的多边形平铺成包括内部瓦片和外部边缘瓦片的一组瓦片。为每个瓦片指定闪存数据，使得内部瓦片被分配第一闪光区域，并且外部边缘瓦片被分配比第一闪光区域小的第二闪光区域。闪光数据以选定的顺序排列，以便在衬底上用诸如电子束的调制的粒子束来写入图案。

7. 发明授权

US07476879B2 Placement effects correction in raster pattern generator 失效
标题翻译：栅格图案生成器中的放置效果校正
公开(公告)号：US07476879B2
公开(公告)日：2009-01-13
申请号：US11241887
申请日：2005-09-30
申请人： Richard L. Lozes , Benyamin Buller
发明人： Richard L. Lozes , Benyamin Buller
IPC分类号： G21G5/00 , H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31769 , H01J2237/31796 , Y10S430/143
摘要： A method for generating a charged particle beam flash. The method includes computing an array of dose correction multipliers, based, at least in part, on a resist sensitivity correction factor, and computing a displacement vector to account for placement effects, such as resist charging. The displacement vector is defined as {right arrow over (δ)}c=dP{circle around (×)}{right arrow over (K)} , where {right arrow over (δ)}c—represents the displacement vector, d represents the array of dose correction multipliers, P represents pattern exposure data, {circle around (×)} represents a mathematical convolution operation, and {right arrow over (K)} represents a Poisson kernel converted to a spatial domain. The method further includes using the displacement vector to modify position of the charged particle beam flash.
摘要翻译：一种产生带电粒子束闪光的方法。该方法包括至少部分地基于抗蚀剂敏感度校正因子来计算剂量校正乘数的阵列，以及计算位移矢量以考虑诸如抗蚀剂充电的放置效应。位移矢量被定义为{右箭头（delta）} c = dP {（x）周围的圆（{K}}右箭头}），其中{右箭头（（delta）} c-表示位移矢量，d 表示剂量校正乘数的阵列，P表示图案曝光数据，{circle around（x）}表示数学卷积运算，{right arrow over（K）}表示转换为空间域的泊松核。该方法还包括使用位移矢量来修改带电粒子束闪光的位置。

8. 发明授权

US07244953B2 Beam exposure writing strategy system and method 失效
标题翻译：光束曝光写作策略系统及方法
公开(公告)号：US07244953B2
公开(公告)日：2007-07-17
申请号：US11243304
申请日：2005-10-03
申请人： Benyamin Buller , Richard L. Lozes
发明人： Benyamin Buller , Richard L. Lozes
IPC分类号： H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/30488 , H01J2237/30494
摘要： A beam exposure writing strategy method and system are disclosed for exposing a desired pattern on a substrate, by raster scanning a beam such as a particle beam, across a major field on the substrate. The beam is also vector scanned across a minor field of the substrate superimposed along the major field raster scan. The beam is selectively blanked and unblanked as the beam is being scanned. The unblanked flashes of the beam are modulated in coordination with the raster and vector scanning to expose the desired pattern on the substrate. The disclosed system and method generating an adjustable length microvector having a maximum range of at least about M times a nominal length λ, where M is equal to at least four and λ is substantially equal to a dimension of a nominal flash area, the nominal flash location dimension being substantially greater than a field cell dimension.
摘要翻译：公开了一种束曝光写入策略方法和系统，用于通过在衬底上的主场上光栅扫描诸如粒子束的光束来在衬底上暴露期望的图案。光束也沿着主场光栅扫描叠加的衬底的次视场矢量扫描。当光束被扫描时，光束被选择性地消隐并且被清除。与光栅和矢量扫描协调地调制光束的未闪烁闪光以暴露衬底上的期望图案。所公开的系统和方法产生可调长度的微向量，其具有至少约公称长度λ的M倍的最大范围，其中M等于至少四个，并且λ基本上等于标称闪光区域的尺寸，标称闪光位置尺寸基本上大于场单元尺寸。

9. 发明授权

US09640679B2 Photovoltaic device with oxide layer 有权
公开(公告)号：US09640679B2
公开(公告)日：2017-05-02
申请号：US13208118
申请日：2011-08-11
申请人： Benyamin Buller , Markus Gloeckler , Rui Shao , Yu Yang , Zhibo Zhao , Chungho Lee
发明人： Benyamin Buller , Markus Gloeckler , Rui Shao , Yu Yang , Zhibo Zhao , Chungho Lee
IPC分类号： H01L31/0224 , H01L31/0296 , H01L31/073 , H01L31/18 , C23C14/08 , C23C14/58 , C23C16/40 , C03C17/245 , C03C17/34
CPC分类号： H01L31/022466 , C03C17/2453 , C03C17/3417 , C03C2217/232 , C03C2217/94 , C23C14/086 , C23C14/5806 , C23C16/407 , H01L31/0296 , H01L31/073 , H01L31/1828 , H01L31/1884 , Y02E10/543 , Y02P70/521
摘要： A method of manufacturing a photovoltaic device may include concurrently transforming a transparent conductive oxide layer from a substantially amorphous state to a substantially crystalline state and forming one or more semiconductor layers.

10. 发明授权

US09209096B2 Photoluminescence measurement 有权
标题翻译：光致发光测量
公开(公告)号：US09209096B2
公开(公告)日：2015-12-08
申请号：US13195163
申请日：2011-08-01
申请人： Arnold Allenic , Douglas Bacon , Benyamin Buller , John Christiansen , Erel Milshtein , Avner Regev , Igor Sankin
发明人： Arnold Allenic , Douglas Bacon , Benyamin Buller , John Christiansen , Erel Milshtein , Avner Regev , Igor Sankin
IPC分类号： G01J1/58 , H01L21/66 , G01N21/64 , G01N21/95 , G01N21/84
CPC分类号： H01L22/12 , G01N21/6489 , G01N21/9501 , G01N2021/6419 , G01N2021/6421 , G01N2021/646 , G01N2021/8411 , G01N2021/845
摘要： A photoluminescence measurement system can include an optical source.
摘要翻译：光致发光测量系统可以包括光源。

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