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    • 3. 发明申请
    • Reflection-Controllable Electrochromic Device Using A Base Metal As A Transparent Conductor
    • 使用基础金属作为透明导体的可反射控制电致变色装置
    • US20100079845A1
    • 2010-04-01
    • US12242917
    • 2008-10-01
    • Zhongchun WangPaul P. Nguyen
    • Zhongchun WangPaul P. Nguyen
    • G02F1/153
    • G02F1/155G02F1/19
    • An all-solid-state electrochromic device comprises a transparent base material, and an electrochromic multilayer-stack structure formed on the transparent base material. The electrochromic multilayer-stack structure comprises a first transparent-conductive film formed on the transparent base material, an ion-storage layer formed on the first transparent-conductive film, a solid-electrolyte layer formed on the ion-storage layer, and an electrochromic layer formed on the solid-electrolyte layer. The electrochromic layer comprises a reflection-controllable electrochromic layer. In one exemplary embodiment, the electrochromic layer comprises a reflection-controllable layer that comprises at least one of antimony and an antimony-based alloy. A second transparent-conductive film can be formed on the reflection-controllable layer, or between the reflection-controllable layer and the solid-electrolyte layer. In one exemplary embodiment, the second transparent-conductive layer comprises a base metal and/or a base metal alloy.
    • 全固体电致变色装置包括透明基材和形成在透明基材上的电致变色多层堆叠结构。 电致变色多层堆叠结构包括形成在透明基材上的第一透明导电膜,形成在第一透明导电膜上的离子存储层,形成在离子保存层上的固体电解质层和电致变色 层,形成在固体电解质层上。 电致变色层包括反射可控电致变色层。 在一个示例性实施例中,电致变色层包括反射可控层,其包含锑和锑基合金中的至少一种。 第二透明导电膜可以形成在反射可控层上,或反射可控层和固体电解质层之间。 在一个示例性实施例中,第二透明导电层包括贱金属和/或贱金属合金。
    • 5. 发明申请
    • SPIN TORQUE TRANSFER MAGNETIC MEMORY CELL
    • 旋转转矩磁记忆细胞
    • US20090302403A1
    • 2009-12-10
    • US12176295
    • 2008-07-18
    • Paul P. Nguyen
    • Paul P. Nguyen
    • H01L29/82
    • H01L43/08G11C11/16G11C11/161
    • A spin-torque magnetic memory element comprises a large magnetic volume, and a thick magnetic layer. The magnetic layer comprises a nearly round shape, a small intrinsic anisotropy and a uniaxial anisotropy that is substantially based on the shape. In one exemplary embodiment, the nearly round shape substantially comprises about a 60 nm by about a 40 nm ellipse shape, and the thick magnetic layer comprises a thickness of about 20 nm to about 100 nm, preferably about 40 nm. In another exemplary embodiment, the thick magnetic layer comprises a first layer of magnetic material that comprises a reasonably high unaxial magnetic anisotropy; and a second layer of magnetic material comprises between about no anisotropy (i.e., 0 anisotropy) and a much lower unaxial magnetic anisotropy than the first layer of magnetic material.
    • 自旋扭矩磁存储元件包括大的磁体积和厚的磁性层。 磁性层包括基本上基于形状的近似圆形,小的本征各向异性和单轴各向异性。 在一个示例性实施例中,近似圆形基本上包括约60nm至约40nm的椭圆形状,厚磁层包括约20nm至约100nm,优选约40nm的厚度。 在另一示例性实施例中,厚磁性层包括第一层磁性材料,其包含相当高的单轴磁各向异性; 并且第二层磁性材料包括与第一层磁性材料相比几乎不具有各向异性(即,各向异性)和低的单轴磁各向异性。
    • 8. 发明授权
    • Methods for providing a sub .15 micron magnetic memory structure
    • 提供15微米磁记忆体结构的方法
    • US06933155B2
    • 2005-08-23
    • US10443936
    • 2003-05-21
    • Frank AlbertYiming HuaiPaul P. Nguyen
    • Frank AlbertYiming HuaiPaul P. Nguyen
    • H01L21/00H01L43/12
    • H01L43/12
    • A method for providing a magnetic element is disclosed. The method includes providing at least one magnetic element layer and providing a hard mask structure for masking a portion of the at least one magnetic element layer. The hard mask structure is made from hard mask material(s) that are etchable for defining the hard mask structure. The hard mask structure also acts as a mask during definition of a width of the magnetic element. The method also includes defining the width of the magnetic element by removing a portion of the at least one magnetic element layer using the hard mask structure as a mask. The hard mask structure preferably acts as a polishing stop for a planarization step, such as a chemical mechanical polish, polishing resistant structures might be provided to improve planarization of a magnetic memory incorporating the magnetic element.
    • 公开了一种用于提供磁性元件的方法。 该方法包括提供至少一个磁性元件层并提供用于掩蔽该至少一个磁性元件层的一部分的硬掩模结构。 硬掩模结构由可刻蚀硬掩模结构的硬掩模材料制成。 在确定磁性元件的宽度的同时,硬掩模结构还用作掩模。 该方法还包括通过使用硬掩模结构作为掩模去除至少一个磁性元件层的一部分来限定磁性元件的宽度。 硬掩模结构优选地用作平面化步骤的抛光停止,例如化学机械抛光,可以提供抛光抗蚀结构以改善结合有磁性元件的磁性存储器的平坦化。
    • 9. 发明授权
    • Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element
    • 使用自旋转移的磁静电耦合磁性元件和使用该磁性元件的MRAM器件
    • US06847547B2
    • 2005-01-25
    • US10377689
    • 2003-02-28
    • Frank AlbertYiming HuaiPaul P. Nguyen
    • Frank AlbertYiming HuaiPaul P. Nguyen
    • G11C11/16G11C11/15
    • G11C11/16
    • A method and system for providing a magnetic element and a corresponding memory are disclosed. In one aspect, the method and system include providing a dual spin tunnel/valve structure and at least one spin valve. The dual spin tunnel/valve structure includes a nonmagnetic spacer layer between a pinned layer and a free layer, another pinned layer and a barrier layer between the free layer and the other pinned layer. The free layers of the dual spin tunnel/valve structure and the spin valve are magnetostatically coupled. In one embodiment a separation layer resides between the dual spin tunnel/valve structure and the spin valve. In another aspect, the method and system include providing two dual spin valves, a spin tunneling junction there between and, in one embodiment, the separation layer. In both aspects, the magnetic element is configured to write to the free layers using spin transfer when a write current is passed through the magnetic element.
    • 公开了一种用于提供磁性元件和相应的存储器的方法和系统。 在一个方面,该方法和系统包括提供双自旋隧道/阀结构和至少一个自旋阀。 双自旋隧道/阀结构包括在被钉扎层和自由层之间的非磁性间隔层,在自由层和另一个钉扎层之间的另一个钉扎层和阻挡层。 双自旋隧道/阀结构和自旋阀的自由层是静磁耦合的。 在一个实施例中,分离层位于双自旋隧道/阀结构和自旋阀之间。 在另一方面,该方法和系统包括提供两个双自旋阀,其间的自旋隧道结,在一个实施例中,分离层。 在两个方面,磁性元件配置成当写入电流通过磁性元件时,使用自旋转移来写入自由层。