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    • 8. 发明授权
    • Method for the production of aqueous polymer dispersions containing very few residual monomers and use thereof
    • 制备含有非常少的残留单体的聚合物水分散体的方法及其用途
    • US07244812B2
    • 2007-07-17
    • US10527178
    • 2003-07-26
    • Harmin MüllerMartin JakobCarsten HeldmannThomas Wirth
    • Harmin MüllerMartin JakobCarsten HeldmannThomas Wirth
    • C08F6/00
    • C08F6/006
    • The invention relates to a method for reducing the amount of residual monomers in aqueous polymer dispersions means of chemical post-treatment. Post-treatment in the aqueous polymer dispersion is carried out by adding a redox system which contains a) 0.005-5 wt. % of an oxidation agent which contains an organic peroxide. and b) 0.005-5 wt. % of a reduction agent which contains sulfinic acids or salts thereof. Additionally the redox system can, optionally, contain catalytic amounts of a polyvalent metallic ion which can be treated in several valent stages. Post-treatment can be carried out at a temperature ranging from 20-100.degree. C. and at a PH-value ranging from 2-9. The invention also relates to the use of the inventive post-treated polymer dispersion for producing adhesives, coatings, powders, constructive chemical products or for refining textiles or paper.
    • 本发明涉及减少聚合物水分散体中化学后处理方法中残余单体量的方法。 在聚合物水分散体中的后处理是通过加入氧化还原体系进行的,所述氧化还原体系含有:a)0.005-5wt。 含有有机过氧化物的氧化剂的%。 和b)0.005-5wt。 %的还原剂含有亚磺酸或其盐。 此外,氧化还原体系可以任选地含有催化量的多价金属离子,其可以以数个阶段处理。 后处理可以在20-100度的温度范围内进行。 且PH值范围为2-9。 本发明还涉及本发明的后处理聚合物分散体用于生产粘合剂,涂料,粉末,建构性化学产品或用于精制纺织品或纸的用途。