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1. 发明申请

US20070222956A1 Contamination barrier with expandable lamellas 失效
标题翻译：可扩展薄片的污染屏障
公开(公告)号：US20070222956A1
公开(公告)日：2007-09-27
申请号：US11798710
申请日：2007-05-16
申请人： Levinus Bakker , Marcel Marie Dierichs , Johannes Freriks , Frank Schuurmans , Jakob Vijfvinkel , Wilhelmus Box
发明人： Levinus Bakker , Marcel Marie Dierichs , Johannes Freriks , Frank Schuurmans , Jakob Vijfvinkel , Wilhelmus Box
IPC分类号： G03B27/52
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
摘要翻译：被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽或来自辐射源的碎片。

2. 发明申请

US20050098741A1 Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，其中使用的粒子屏障，一体化结构制造方法以及由此制造的器件
公开(公告)号：US20050098741A1
公开(公告)日：2005-05-12
申请号：US11000381
申请日：2004-12-01
申请人： Levinus Bakker , Frank Schuurmans , Vadim Banine
发明人： Levinus Bakker , Frank Schuurmans , Vadim Banine
IPC分类号： G03F7/20 , H01L21/027 , H01L21/425
CPC分类号： G03F7/70166 , G03F7/70058 , G03F7/708 , G03F7/70825 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.
摘要翻译：用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。箔捕获器被配置为围绕光轴可旋转。通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。这个碎片不会通过箔片陷阱。以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

3. 发明申请

US20050253091A1 Lithographic apparatus, device manufacturing method and radiation system 有权
标题翻译：光刻设备，设备制造方法和辐射系统
公开(公告)号：US20050253091A1
公开(公告)日：2005-11-17
申请号：US10844577
申请日：2004-05-13
申请人： Ralph Kurt , Levinus Bakker , Frank Schuurmans , Jan Van Der Werf
发明人： Ralph Kurt , Levinus Bakker , Frank Schuurmans , Jan Van Der Werf
IPC分类号： G03B27/52 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/02 , H01L21/027
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/7005 , G21K1/06
摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.
摘要翻译：光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜。照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。辐射源可以可操作地发射EUV波长范围内的辐射。

4. 发明申请

US20050111080A1 Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：用于光刻设备的镜子，光刻设备，器件制造方法和由此制造的器件
公开(公告)号：US20050111080A1
公开(公告)日：2005-05-26
申请号：US10968471
申请日：2004-10-20
申请人： Levinus Bakker , Frank Schuurmans
发明人： Levinus Bakker , Frank Schuurmans
IPC分类号： G02B1/00 , G02B1/10 , G02B5/08 , G03F1/24 , G03F7/20 , G21K1/06 , G21K5/00 , H01L21/00 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70166 , G03F7/70316 , G03F7/70916 , G03F7/70958 , G21K1/06
摘要： A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer may interdiffuse in a predetermined temperature range with nuclei of the metal deposition. An additional layer of an alloy of the metal particles and the metal of the top layer is formed that has a higher reflectivity than a layer only comprising the metal particles would have.
摘要翻译：预定金属的顶层设置在用于具有源以提供期望波长的辐射的光刻设备的反射镜上。源产生不想要的金属颗粒流，其沉积以在反射镜上形成更小和更大的核。顶层可以在与金属沉积的核的预定温度范围内相互扩散。形成金属颗粒和顶层金属的合金的附加层，其具有比仅包含金属颗粒将具有的层更高的反射率。

5. 发明申请

US20060250599A1 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method 有权
标题翻译：光刻投影装置，其中使用的反射器组件和装置制造方法
公开(公告)号：US20060250599A1
公开(公告)日：2006-11-09
申请号：US11482147
申请日：2006-07-07
申请人： Levinus Bakker , Jeroen Jonkers , Frank Schuurmans , Hugo Visser
发明人： Levinus Bakker , Jeroen Jonkers , Frank Schuurmans , Hugo Visser
IPC分类号： G03B27/54
CPC分类号： B82Y10/00 , G02B17/004 , G02B17/006 , G02B27/0043 , G03F7/70166 , G03F7/70175 , G03F7/70891 , G03F7/70916
摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.
摘要翻译：光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

6. 发明申请

US20060138354A1 Method for the protection of an optical element, lithographic apparatus, and device manufacturing method 有权
标题翻译：保护光学元件的方法，光刻设备和器件制造方法
公开(公告)号：US20060138354A1
公开(公告)日：2006-06-29
申请号：US11024011
申请日：2004-12-29
申请人： Levinus Bakker , Frank Schuurmans
发明人： Levinus Bakker , Frank Schuurmans
IPC分类号： H01J37/08
CPC分类号： G03F7/70958 , G03F7/70033 , G03F7/70916
摘要： A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes removal of at least part of the material, thereby providing depositable material, and such that at least part of the depositable material deposits on the optical element.
摘要翻译：一种用于保护包括光学元件和辐射源的光刻设备的光学元件的方法包括提供包括选自B，C，Si，Ge和/或Sn中的一种或多种元素的材料，并且将材料使用中的源使得至少部分材料的去除，从而提供可沉积材料，并且使得至少部分可沉积材料沉积在光学元件上。

7. 发明申请

US20050077483A1 Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：辐射系统，污染屏障，光刻设备，器件制造方法和由此制造的器件
公开(公告)号：US20050077483A1
公开(公告)日：2005-04-14
申请号：US10873646
申请日：2004-06-23
申请人： Levinus Bakker , Vadim Banine , Ralph Kurt , Frank Schuurmans , Yurii Sidelnikov
发明人： Levinus Bakker , Vadim Banine , Ralph Kurt , Frank Schuurmans , Yurii Sidelnikov
IPC分类号： G21K1/00 , G03F7/20 , G21K1/06 , G21K5/02 , H01L21/027 , H05H1/24 , G21G5/00
CPC分类号： G03F7/70916
摘要： A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.
摘要翻译：辐射系统包括在收集器例如正入射收集器和辐射源之间的污染屏障，例如箔阱，使得来自源的辐射通过箔阱两次。辐射在撞击收集器之前通过污染屏障一次，并在收集器反射之后经过第二次。箔捕获器包括平行于来自光源的辐射和由收集器反射的辐射的片层。因此辐射不被箔陷阱阻挡。以这种方式，可以保护与等离子体产生的源一起使用的正常入射收集器免受来自EUV源的碎片。

8. 发明申请

US20070105253A1 Method of producing a plurality of bodies 审中-公开
标题翻译：制造多个体的方法
公开(公告)号：US20070105253A1
公开(公告)日：2007-05-10
申请号：US10556245
申请日：2004-05-10
申请人： Robert Hendriks , Sjoerd Stallinga , Hendrik Goossens , Gert 'T Hooft , Alexander Van Der Lee , Frank Schuurmans , Rudolf Vullers , Ralph Kurt , Bernardus Hendrikus Hendriks , Levinus Bakker
发明人： Robert Hendriks , Sjoerd Stallinga , Hendrik Goossens , Gert 'T Hooft , Alexander Van Der Lee , Frank Schuurmans , Rudolf Vullers , Ralph Kurt , Bernardus Hendrikus Hendriks , Levinus Bakker
IPC分类号： H01L21/00
CPC分类号： B29C59/022 , B29C2059/023 , B29D17/005 , B29L2017/003 , G11B7/00736 , G11B7/263
摘要： In the described method of producing a plurality of bodies bearing equal imprints of a stamp as optical structures, a stamp (13) is initially produced, by attaching particles (14) to a surface (15) of an auxiliary body (16); than, the stamp (13) is used to produce an imprint (11) on a plurality of bodies (10). Optical structures can be irradiated, producing on a screen a speckle pattern indicative of a key. It is substantially impossible to clone a given optical structure with current technological means. Optical structures represent physical One-Way Functions, easy to compute in the forward sense but unfeasible to reverse. Thus, they can be used to build an access/copy protection system of user information contained in an information carrier associated with the body 10. The reproducibility of the optical structures makes this method suitable for optical disks.
摘要翻译：在所述制造多个具有作为光学结构的印模的印记的物体的方法中，通过将颗粒（14）附着在辅助体（16）的表面（15）上，最初产生印模（13）。使用印模（13）在多个主体（10）上产生印记（11）。可以照射光学结构，在屏幕上产生指示关键的斑点图案。以目前的技术手段克隆给定的光学结构是完全不可能的。光学结构表示物理单向函数，容易在正向方面计算，但不可逆转。因此，它们可以用于构建包含在与主体10相关联的信息载体中的用户信息的访问/复制保护系统。光学结构的再现性使得该方法适用于光盘。

9. 发明申请

US20060219950A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060219950A1
公开(公告)日：2006-10-05
申请号：US11094490
申请日：2005-03-31
申请人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
发明人： Levinus Bakker , Vadim Banine , Vladimir Ivanov , Konstantin Koshelev , Bastiaan Mertens , Johannes Moors , Frank Schuurmans , Givi Zukavishvili , Bastiaan Wolschrijn , Marc Van Der Velden
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
摘要翻译：光刻设备被布置成将来自辐射源的光束投影到基底上。该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合到用于供应气体的气体入口。气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

10. 发明申请

US20060158734A1 Optical analysis system 失效
标题翻译：光学分析系统
公开(公告)号：US20060158734A1
公开(公告)日：2006-07-20
申请号：US10539540
申请日：2003-12-19
申请人： Frank Schuurmans , Michael Van Beek , Levinus Bakker , Wouter Rensen , Bernardus Hendrikus Hendriks , Robert Hendriks , Thomas Steffen
发明人： Frank Schuurmans , Michael Van Beek , Levinus Bakker , Wouter Rensen , Bernardus Hendrikus Hendriks , Robert Hendriks , Thomas Steffen
IPC分类号： G02B27/28
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/021 , G01J3/10 , G01J3/28 , G01J3/36 , G01N21/274 , G01N21/31 , G01N2021/3196 , G01N2201/129
摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.
摘要翻译：用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。血液分析系统（40）包括根据本发明的光学分析系统（20）。

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