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    • 2. 发明授权
    • Flat field telecentric scanner
    • 平场远心扫描仪
    • US5168386A
    • 1992-12-01
    • US602201
    • 1990-10-22
    • Lee K. Galbraith
    • Lee K. Galbraith
    • G02B13/22G02B26/10
    • G02B13/22G02B26/105
    • Flat-field telecentric scan systems, each having a planar scanning reflector situated in a light path and mounted for movement about a scan axis, a concave spherical mirror fixed in a position in the light path an effective focal length away from the scanning reflector to provide a telecentric scan of the light beam, and a lens or mirror with spherical surfaces placed in the light path for providing a flat-field scan. The concave mirror and the additional lens or mirror element may be placed off of the symmetry axis to avoid light obstruction problems provided the tilt of the scanning reflector and the positions and orientations of the concave mirror and additional optical element are selected for a straight-line scan. The additional lens can be either before or after the concave mirror in the light path. It can also be positioned in the path of both light incident on and reflected from the concave mirrors. The lens and concave mirror can be integrally formed by providing a reflective coating on one lens surface. In several embodiments, astigmatism and coma can also be eliminated or minimized.
    • 平场远心扫描系统,每个具有平面扫描反射器,其位于光路中并被安装用于围绕扫描轴线移动;凹球面镜,其固定在光路中位于远离扫描反射器的有效焦距中以提供 光束的远心扫描,以及放置在光路中的用于提供平场扫描的球面的透镜或反射镜。 如果将扫描反射镜的倾斜以及凹面镜和附加光学元件的位置和取向选择为直线,则凹面镜和附加透镜或反射镜元件可以被放置在对称轴之外以避免光线障碍问题 扫描 附加透镜可以在光路中的凹面镜之前或之后。 它也可以定位在入射在凹面镜上和从凹面镜反射的两个光的路径中。 透镜和凹面镜可以通过在一个透镜表面上提供反射涂层而一体地形成。 在几个实施例中,散光和昏迷也可被消除或最小化。
    • 3. 发明授权
    • Adaptive spatial filter for surface inspection
    • 用于表面检测的自适应空间滤波器
    • US5276498A
    • 1994-01-04
    • US882047
    • 1992-05-12
    • Lee K. GalbraithJohn L. VaughtRalph C. WolfBrian LeslieArmand P. Neukermans
    • Lee K. GalbraithJohn L. VaughtRalph C. WolfBrian LeslieArmand P. Neukermans
    • H01L21/66G01N21/956G02B27/46G02F1/1343G01N21/00
    • G02F1/134309G01N21/95623G02B27/46G01N2201/067
    • An inspection apparatus for a light diffracting surface employs a planar array of individually addressable light valves for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having a stripe geometry corresponding to positions of members of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light directed onto the surface, such as a semiconductor wafer, forms elongated curved diffraction orders from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens. The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects is allowed to pass through the light valves to a detector. Patterns of stripes can be recorded corresponding to the repetitive features of different integrated circuits. Different filters may be rapidly switched electronically in synchronization with a beam scanning a patterned surface inspecting different light diffracting patterns in different positions, allowing scattered or diffracted light from non-repetitive features to pass through the filter to a detector. A logical AND combination of two filters may be used so that two regions may be inspected in a single scan of the beam.
    • 用于光衍射表面的检查装置采用独立寻址光阀的平面阵列,用作衍射图案的成像傅立叶平面中的空间滤光器,其中具有对应于衍射图案的部件的位置的条形几何形状的阀 来自这些成员的光。 剩余的阀条,即不阻挡来自衍射级构件的光的那些条纹是透光的。 指向表面的光,例如半导体晶片,从电路特征的重复图案形成细长的弯曲衍射级。 通过傅里叶变换透镜将弯曲的衍射级变换成线性阶数。 来自电路特征的重复图案的线性衍射顺序被阻止,而来自非重复特征的光(例如污物颗粒或缺陷)允许通过光阀到达检测器。 可以根据不同集成电路的重复特征对条纹进行记录。 不同的滤波器可以与扫描图案化表面的光束同步地电子快速地切换,以在不同位置检查不同的光衍射图案,允许来自非重复特征的散射或衍射光通过滤光器到检测器。 可以使用两个滤波器的逻辑AND组合,使得可以在波束的单次扫描中检查两个区域。
    • 7. 发明授权
    • Dual collector optical flaw detector
    • 双收集器光学缺陷探测器
    • US4597665A
    • 1986-07-01
    • US610101
    • 1984-05-14
    • Lee K. GalbraithKarel Urbanek
    • Lee K. GalbraithKarel Urbanek
    • G01N21/88G01J1/02G01N21/84G01N21/894G01N21/94G01N21/95G01N21/956G01N21/00
    • G01J1/04G01J1/0422G01J1/0455G01N21/894G01N21/94G01N21/9501G01N21/474G01N2201/064G01N2201/112
    • A flaw detector for optically transmissive surfaces having a first light collector above the surface and a second light collector below the surface. A scanning light beam is directed into the first light collector through a beam entrance aperture and only light scattered from the surface is collected. Light specularly reflected from the surface exits the collector through the beam entrance aperture. Similarly, light passing through the surface enters the second collector, but the axial beam component is dumped through an opening in the second collector, while only diffracted light is collected. Preferably, two-stage light collectors are used with the first stage admitting the beam and generating a scattered or diffracted beam component, with the second stage admitting the scattered or diffracted beam component and integrating the component over a collection surface and sampling the integrated portion at a photoelectric detector. An electrical output signal from the detector may be displayed.
    • 一种用于光学透射表面的探伤仪,其具有在表面上方的第一光收集器和在该表面下方的第二光收集器。 扫描光束通过光束入射孔被引导到第一光收集器中,并且仅收集从表面散射的光。 从表面镜面反射的光通过光束入射孔离开收集器。 类似地,穿过表面的光进入第二集电器,但是轴向光束分量通过第二收集器中的开口倾倒,而仅收集衍射光。 优选地,使用两级集光器,其中第一阶段允许光束并产生散射或衍射光束分量,其中第二阶段允许散射或衍射的光束分量并将分量集成在集合表面上,并将集成部分采样 光电探测器。 可以显示来自检测器的电输出信号。
    • 8. 发明授权
    • Apparatus for calibrating a surface scanner
    • 用于校准表面扫描仪的装置
    • US4512659A
    • 1985-04-23
    • US522632
    • 1983-08-10
    • Lee K. GalbraithJiri Pecen
    • Lee K. GalbraithJiri Pecen
    • G01B11/30G01M11/00G01N21/47G01N21/88G01N21/93G01N21/94G01N21/95G01N21/956H01L21/66G01J1/02
    • B82Y15/00G01N21/4785G01N21/93G01N21/94G01N21/9501
    • A test device for calibrating an optical scanner wherein microscopic patterns of light scattering elements simulate the scattering of light from particles or flaws of different sizes. Simulation of different particles sizes is achieved by means of clusters or arrays of these light scattering elements having different areawise densities. Patterns of such clusters or arrays are disposed on a surface with intervening spaces where a random assortment of foreign particles may be expected. In this manner, the foreign particles may be directly compared to a test pattern. The test surface may be a semiconductor wafer having a thin, inert coating with openings therein forming the light scattering elements. The openings may be made by photolithographic techniques, i.e., masking and etching, so that various patterns on a surface may be all created simultaneously by the same process.
    • 用于校准光学扫描器的测试装置,其中光散射元件的微观图案模拟来自不同尺寸的颗粒或缺陷的光的散射。 通过具有不同面积密度的这些光散射元件的簇或阵列来实现不同粒径的模拟。 这种簇或阵列的图案设置在具有中间空间的表面上,其中可以预期随机分类的异物。 以这种方式,外来颗粒可以直接与测试图案进行比较。 测试表面可以是具有薄的惰性涂层的半导体晶片,其中开口形成光散射元件。 开口可以通过光刻技术制成,即掩模和蚀刻,使得表面上的各种图案可以全部通过相同的工艺同时制作。