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    • 3. 发明申请
    • METHOD OF FORMING DEPOSITED PATTERNS ON A SURFACE
    • 在表面形成沉积图案的方法
    • WO2015088771A1
    • 2015-06-18
    • PCT/US2014/067285
    • 2014-11-25
    • RAYTHEON COMPANY
    • GOOCH, RolandKOCIAN, Thomas, AllanDIEP, BuuKENNEDY, Adam, M.BLACK, Stephen, H.
    • B81C1/00
    • H01L31/18B81C1/00373B81C2201/0188H01L31/02327
    • A method for forming a coating of material on selected portions of a surface of a substrate having a plurality of cavities (11) includes: providing a structure (16) having a release agent (18) thereon; contacting a top surface (17) of the wafer (10) with the release agent to transfer portions of the release agent to the top surface of the wafer while bottom portions of the cavities remain spaced from the release agent to produce an intermediate structure (24); the release agent disposed on the top surface of the wafer and with the bottom portions of the cavities void of the release agent; exposing the intermediate structure to the material (27) to blanket coat the material on both the release agent and the bottom portions of the cavities; and selectively removing the release agent together with the coating material while leaving the coating material on the bottom portions of the cavities.
    • 在具有多个空腔(11)的基板的表面的选定部分上形成材料涂层的方法包括:提供在其上具有脱模剂(18)的结构(16); 使所述晶片(10)的顶表面(17)与所述脱模剂接触以将所述脱模剂的部分转移到所述晶片的顶表面,同时所述空腔的底部保持与所述脱模剂间隔开以产生中间结构(24 ); 所述脱模剂设置在所述晶片的顶表面上,并且所述空腔的底部部分脱离所述脱模剂; 将所述中间结构暴露于所述材料(27)以将所述材料涂覆在所述空腔的所述脱模剂和所述底部两者上; 并且与涂料一起选择性地除去脱模剂,同时将涂料留在空腔的底部。