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热词
    • 2. 发明授权
    • Circuit electrode connected to a pattern formed on an organic substrate and method of forming the same
    • 连接到有机基板上形成的图案的电路电极及其形成方法
    • US06259161B1
    • 2001-07-10
    • US09444825
    • 1999-11-22
    • Qiang WuYoshihiro Tomita
    • Qiang WuYoshihiro Tomita
    • H01L2348
    • H05K3/244H01L23/49811H01L2924/0002H01L2924/00
    • There is described a circuit electrode formed in an integrated circuit package, which imparts sufficient bonding strength to a soldered section and prevents oxidation of the surface of an Ni—P film without fail. A circuit electrode to be electrically connected to a pattern formed on an organic substrate is formed. An electroless high-concentration Ni—P plating film containing phosphorous at a concentration of 7 to 12 wt. % is formed to a thickness of 3 to 10 &mgr;m so as to cover predetermined portions of the pattern. An electroless low-concentration Ni—P plating film containing phosphorous at a concentration of 3 wt. % or less is formed to a thickness of 0.5 to 10 &mgr;m so as to cover the electroless high-concentration Ni—P plating film. An electroless gold plating film is formed, as an oxidation prevention film, to a thickness of 0.05 to 0.5 &mgr;m so as to cover the surface of the electroless low-concentration Ni—P plating film.
    • 描述了一种形成在集成电路封装中的电路电极,其赋予焊接部分足够的接合强度,并且防止Ni-P膜的表面的氧化没有失败。 形成与形成在有机基板上的图案电连接的电路电极。 含有浓度为7〜12重量%的磷的无电解高浓度Ni-P镀膜。 %形成为3〜10μm的厚度,以覆盖图案的预定部分。 含有浓度为3重量%的磷的无电解低浓度Ni-P镀膜 %以下的厚度形成为0.5〜10μm的厚度,以覆盖无电解高浓度Ni-P镀膜。 作为防氧化膜形成厚度为0.05〜0.5μm的无电镀金膜,以覆盖无电解低浓度Ni-P镀膜的表面。