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1. 发明授权

US5345397A Optimal composite curing system and method 失效
标题翻译：最佳复合固化体系及方法
公开(公告)号：US5345397A
公开(公告)日：1994-09-06
申请号：US796933
申请日：1991-11-25
申请人： Paul I. Handel , Matthew J. Patterson , Daniel Guerin , Nicholas C. Strauss , Steven B. Helton , Thomas M. Barrett , Lisa K. Koelewyn , James D. Waterman
发明人： Paul I. Handel , Matthew J. Patterson , Daniel Guerin , Nicholas C. Strauss , Steven B. Helton , Thomas M. Barrett , Lisa K. Koelewyn , James D. Waterman
IPC分类号： B29C35/02
CPC分类号： B29C35/0288 , B29C2037/903 , B29K2105/06
摘要： An intelligent control system for directing a process for curing parts made of fiber-reinforced composite material in an autoclave. The system uses data gathered during the curing processing to calculate repetitively the temperature of the autoclave required to establish and maintain a predetermined cure temperature. The system accounts for heat generated by the exothermal reaction of the resin during polymerization. The control recalculates an optimal autoclave temperature at periodic intervals during the cure cycle on the basis of temperature data from the part being cured and temperature within the autoclave. The optimal autoclave temperature is determined from calculated values representing resin heat, maximum offset, lag time and degree of cure of the resin. Control signals produced by a computer that executes control algorithms stored in electronic memory accessible to the processor cause corresponding changes in the temperature of the autoclave needed to cure the part without overheating and in less time than with a conventional autoclave temperature control.
摘要翻译：一种智能控制系统，用于引导在高压釜中固化由纤维增强复合材料制成的部件的工艺。该系统使用在固化处理期间收集的数据来重复地计算建立并保持预定固化温度所需的高压釜的温度。该系统考虑到聚合期间树脂的放热反应产生的热量。基于来自固化部分的温度数据和高压釜内的温度，该控制在固化循环期间以周期性间隔重新计算最佳高压釜温度。最佳的高压釜温度由表示树脂热量，最大偏移，滞后时间和树脂固化程度的计算值确定。由执行存储在处理器可访问的电子存储器中的控制算法的计算机产生的控制信号导致固化部件所需的高压釜温度的相应变化而不会过热，并且在比常规的高压釜温度控制下更短的时间内。

2. 发明授权

US5799031A Device for feeding a gas-mixture laser apparatus, and laser apparatus equipped with such a device 失效
标题翻译：用于供给气体混合激光装置的装置以及配备有这种装置的激光装置
公开(公告)号：US5799031A
公开(公告)日：1998-08-25
申请号：US592509
申请日：1996-01-26
申请人： Bruno Marie , Daniel Guerin , Christian Larquet , Antoine Willemot
发明人： Bruno Marie , Daniel Guerin , Christian Larquet , Antoine Willemot
IPC分类号： H01S3/036 , H01S3/22 , H01S3/223
CPC分类号： H01S3/036
摘要： The gas mixture leaving the laser apparatus (1) is recycled to a permeator (45) which separates it into two flows. The discharge from the permeator is expanded in an expansion turbine (27) coupled to a compressor (35) for exerting suction on the recycled mixture, which makes it possible to obtain the desired reduced pressure in the laser apparatus. Applications to power laser apparatuses with nitrogen/carbon dioxide mixture, intended for cutting materials.
摘要翻译：离开激光装置（1）的气体混合物被再循环到渗透器（45），其将其分成两个流。来自渗透器的排放物在耦合到压缩机（35）的膨胀涡轮机（27）中膨胀，用于在再循环混合物上施加吸力，这使得可以在激光设备中获得期望的减压。应用于用于切割材料的氮/二氧化碳混合物的激光设备。

3. 发明申请

US20100155222A1 APPLICATION OF DENSE PLASMAS GENERATED AT ATMOSPHERIC PRESSURE FOR TREATING GAS EFFLUENTS 审中-公开
标题翻译：在大气压力下生成的渗透等离子体在气体处理中的应用
公开(公告)号：US20100155222A1
公开(公告)日：2010-06-24
申请号：US12719346
申请日：2010-03-08
申请人： Jean-Christophe ROSTAING , Daniel Guerin , Christian Larquet , Chun-Hao Ly , Michel Moisan , Hervé Dulphy
发明人： Jean-Christophe ROSTAING , Daniel Guerin , Christian Larquet , Chun-Hao Ly , Michel Moisan , Hervé Dulphy
IPC分类号： B01J19/08
CPC分类号： B01D53/70 , B01D53/323 , B01D2259/818 , B01J2219/0875 , B01J2219/0894 , C23C16/4412 , Y02C20/30
摘要： The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.
摘要翻译：本发明涉及用于用等离子体处理诸如PFC或HFC的气体的系统，包括：（6）泵出装置（6），其出口压力基本上等于大气压，等离子体发生器（8），在泵输出处，以在大气压下产生等离子体。

4. 发明申请

US20080234530A1 Atmospheric Pressure Plasma Treatment of Gaseous Effluents 审中-公开
标题翻译：大气压等离子体处理气体流出物
公开(公告)号：US20080234530A1
公开(公告)日：2008-09-25
申请号：US11571652
申请日：2005-07-08
申请人： Yassine Kabouzi , Michel Moisan , Jean-Christophe Rostaing , Daniel Guerin , Herve Dulphy , Pascal Moine , Valere Laurent , Bruno Depert
发明人： Yassine Kabouzi , Michel Moisan , Jean-Christophe Rostaing , Daniel Guerin , Herve Dulphy , Pascal Moine , Valere Laurent , Bruno Depert
IPC分类号： A62D3/17 , B01J19/08
CPC分类号： B01J19/087 , B01D53/323 , B01D2257/2066 , B01J19/126 , B01J2219/0869 , B01J2219/0875 , B01J2219/089 , B01J2219/0894 , Y02C20/30
摘要： The invention relates to a method for the conversion of a gas or gas mixture and, in particular, a fluorinated gaseous effluent. According to the invention, at least one bond between two atoms of at least one molecule of the gas or gas mixture is broken under the influence of an electric and/or magnetic field to which the gas or gas mixture is subjected. The gas or gas mixture stream is injected through the electric and/or magnetic field in a non-rectilinear manner in order to increase the distance travelled by the gas molecules through the field and, in this way, increase the effectiveness of the conversion of the gas or gas mixture molecules.
摘要翻译：本发明涉及一种用于转化气体或气体混合物，特别是氟化气体流出物的方法。根据本发明，气体或气体混合物的至少一个分子的两个原子之间的至少一个键在气体或气体混合物所经受的电场和/或磁场的影响下被破坏。气体或气体混合物流以非直线方式通过电场和/或磁场注入，以增加气体分子通过场传播的距离，并且以这种方式增加了转化的有效性气体或气体混合物分子。

5. 发明授权

US5505913A Process for preparing disilane from monosilane by electric discharge and cryogenic trapping and new reactor for carrying it out 失效
标题翻译：通过放电和低温捕获从甲硅烷制备乙硅烷的方法和用于进行甲醇的新反应器
公开(公告)号：US5505913A
公开(公告)日：1996-04-09
申请号：US462677
申请日：1995-06-05
申请人： Frederic Bernard , Valerie Borg , Pierre Didier , Daniel Guerin , Michel Gastiger , Pierre Karinthi , Alain Villermet , Antoine Willemot
发明人： Frederic Bernard , Valerie Borg , Pierre Didier , Daniel Guerin , Michel Gastiger , Pierre Karinthi , Alain Villermet , Antoine Willemot
IPC分类号： B01J19/08 , C01B33/04 , B01J19/12
CPC分类号： C01B33/04 , B01J19/088 , Y10S422/906
摘要： The invention relates to a process for producing disilane from monosilane, according to which gaseous monosilane is passed into a reaction zone where it is subject to an electric discharge generated by a high-frequency current.
摘要翻译：本发明涉及从甲硅烷制备乙硅烷的方法，根据该方法，气态单硅烷进入反应区，在该反应区经受由高频电流产生的放电。

6. 发明申请

US20110045205A1 Device and Process for Very High-Frequency Plasma-Assisted CVD under Atmospheric Pressure, and Applications Thereof 审中-公开
标题翻译：在大气压下进行超高频等离子体辅助CVD的器件和工艺及其应用
公开(公告)号：US20110045205A1
公开(公告)日：2011-02-24
申请号：US12679239
申请日：2008-09-16
申请人： Jean-Christophe Rostaing , Daniel Guerin , Frederic Noel , Helene Daniel
发明人： Jean-Christophe Rostaing , Daniel Guerin , Frederic Noel , Helene Daniel
IPC分类号： C23C16/511 , C23C16/50 , C23C16/42 , C23C16/00 , C23C16/40
CPC分类号： C23C16/511 , H05H1/46 , H05H2001/463
摘要： The invention relates to a method for CVD on a substrate under atmospheric pressure, characterized in that it is assisted by a very-high-frequency plasma generated by a field applicator with an elongated conductor of the micro-ribbon or hollow conducting line type. The invention also relates to the use thereof for applying an electrically conductive inorganic layer on elements of vehicle bodywork, particularly the bumpers.
摘要翻译：本发明涉及一种在大气压下的基板上CVD的方法，其特征在于，其由具有微带或中空导线类型的细长导体的场施加器产生的非常高频等离子体辅助。本发明还涉及其用于将导电无机层施加在车辆车体的元件上，特别是保险杠上的用途。

7. 发明授权

US06541917B1 Section of pipe for a gas treatment device and device incorporating such a section of pipe 失效
标题翻译：用于气体处理装置和装有这种管道的装置的管道部分
公开(公告)号：US06541917B1
公开(公告)日：2003-04-01
申请号：US09461044
申请日：1999-12-15
申请人： Jean-Christophe Rostaing , Michel Moisan , Roxane Etemadi , Daniel Guerin
发明人： Jean-Christophe Rostaing , Michel Moisan , Roxane Etemadi , Daniel Guerin
IPC分类号： H01J724
CPC分类号： H01J37/32192 , H01J37/32522 , H05H1/46
摘要： A section of pipe, for a device for treating a gas by exciting the latter by way of incident microwave radiation suitable for producing a surface-wave plasma in the gas, including a discharge tube made of dielectric material intended to pass through the device in a region for concentrating the incident radiation. The tube comprises, over at least part of its length, a double wall.
摘要翻译：管道的一部分，用于通过用于在气体中产生表面波等离子体的入射微波辐射来激励气体的装置，包括由介电材料制成的放电管，该放电管旨在通过装置用于集中事件辐射的区域。该管在其至少部分长度上包括双壁。

8. 发明授权

US6007637A Process and apparatus for the dry treatment of metal surfaces 失效
标题翻译：用于干式处理金属表面的工艺和设备
公开(公告)号：US6007637A
公开(公告)日：1999-12-28
申请号：US746876
申请日：1996-11-18
申请人： Thierry Sindzingre , Stephane Rabia , Daniel Guerin , Christian Larquet
发明人： Thierry Sindzingre , Stephane Rabia , Daniel Guerin , Christian Larquet
IPC分类号： C23G5/00 , B08B7/04
CPC分类号： C23G5/00
摘要： The invention relates to a process for the dry surface treatment of at least one metal surface portion, according to which the portion is treated at a pressure close to atmospheric pressure by a gaseous treatment atmosphere comprising excited or unstable species and substantially devoid of electrically charged species, obtained from a primary gaseous mixture and if necessary an adjacent gaseous mixture, the primary gaseous mixture being obtained at the gas outlet of at least one device for the production of excited or unstable gaseous species, in which an initial gaseous mixture comprising an inert gas and/or a reducing gas and/or an oxidizing gas has been converted, the adjacent mixture not having passed through the device.
摘要翻译：本发明涉及一种用于干表面处理至少一个金属表面部分的方法，根据该方法，该部分在接近于大气压的压力下通过包含激发或不稳定物质的气体处理气氛进行处理，并且基本上没有带电荷的物质从主要气体混合物获得，如果需要的话，相邻的气体混合物，在至少一个装置的气体出口处获得主要气体混合物，用于产生激发或不稳定的气态物质，其中包含惰性气体的初始气体混合物和/或还原气体和/或氧化气体已经被转化，相邻的混合物没有通过该装置。

9. 发明申请

US20120018410A1 Microwave Plasma Generating Plasma and Plasma Torches 审中-公开
标题翻译：微波等离子体发生等离子体和等离子体手电筒
公开(公告)号：US20120018410A1
公开(公告)日：2012-01-26
申请号：US12679231
申请日：2008-09-16
申请人： Zenon Zakrzewski , Michel Moisan , Daniel Guerin , Jean-Christophe Rostaing
发明人： Zenon Zakrzewski , Michel Moisan , Daniel Guerin , Jean-Christophe Rostaing
IPC分类号： B23K9/00 , H05H1/46
CPC分类号： B23K10/00 , H01P5/085 , H05H1/2406 , H05H1/46 , H05H2001/4607
摘要： The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supply in the vicinity of the dielectric substrate on a side opposite to that bearing the conductor. The invention also relates to plasma torches using said device.
摘要翻译：本发明涉及一种等离子体产生装置，其包括至少一个通过阻抗适配装置连接到连接在电介质基底上的细长导体的非常高频源（> 100MHz），至少一个用于冷却所述导体的装置，至少在与承载导体的那一侧相反的一侧在电介质基板附近的一个气体供应。本发明还涉及使用所述装置的等离子体炬。

10. 发明授权

US07799119B2 Microwave plasma exciters 失效
标题翻译：微波等离子体激发器
公开(公告)号：US07799119B2
公开(公告)日：2010-09-21
申请号：US11766875
申请日：2007-06-22
申请人： Zenon Zakrzewski , Dariusz Czylkowski , Mariusz Jasinski , Michel Moisan , Daniel Guerin , Christian Larquet , Jean-Christophe Rostaing
发明人： Zenon Zakrzewski , Dariusz Czylkowski , Mariusz Jasinski , Michel Moisan , Daniel Guerin , Christian Larquet , Jean-Christophe Rostaing
IPC分类号： B03C3/016
CPC分类号： H05H1/46 , H05H2001/4622 , Y02C20/30
摘要： The invention relates to a microwave plasma exciter device which includes a waveguide (23) for concentrating the microwaves; and a plasma generator (110, 120) for forming a plasma, which are disposed in a microwave concentration zone.
摘要翻译：本发明涉及一种微波等离子体激励装置，其包括用于浓缩微波的波导（23）; 以及用于形成等离子体的等离子体发生器（110,120），其设置在微波浓缩区中。

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