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1. 发明专利

JP2012242696A Stripping liquid for photoresist 有权
标题翻译：剥离液
公开(公告)号：JP2012242696A
公开(公告)日：2012-12-10
申请号：JP2011114207
申请日：2011-05-20
申请人： Panasonic Corp , パナソニック株式会社 , Panasonic Liquid Crystal Display Co Ltd , パナソニック液晶ディスプレイ株式会社
发明人： FUCHIGAMI SHINICHIRO , YAMAGUCHI NORIO , AIKO MASAHIKO , SHIMIZU KOJI , TAKEZAWA HIROYOSHI
IPC分类号： G03F7/42 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photoresist stripping liquid which is used for stripping a photoresist which is degenerated to be difficult to strip due to exposure to an etchant for a Cu film while avoiding damages on a Cu film in the process of wet-etching a Cu film or a Cu alloy film on a substrate having a large area to form wiring lines or the like, and which does not decrease in the adhesive strength between the Cu film and a layer to be deposited on the Cu film.SOLUTION: A photoresist stripping liquid comprising 1 to 9 mass% of a tertiary alkanol amine, 10 to 70 mass% of a polar solvent, 10 to 40 mass% of water, and 3000 ppm or less of a resist component gives good adhesiveness to a layer to be deposited on a Cu film and is free of problems for practical use, although the stripping liquid causes some corrosion of copper.
摘要翻译：要解决的问题：提供一种光致抗蚀剂剥离液，其用于剥离由于暴露于Cu膜的蚀刻剂而被退化以难以剥离的光致抗蚀剂，同时避免在Cu膜的损伤过程中对Cu膜的损伤在具有大面积的基板上湿式蚀刻Cu膜或Cu合金膜以形成布线等，并且不会降低Cu膜和要沉积在Cu膜上的层之间的粘合强度。解决方案：包含1至9质量％的叔链烷醇胺，10至70质量％的极性溶剂，10至40质量％的水和3000ppm以下的抗蚀剂组分的光致抗蚀剂剥离液，得到良好的对于沉积在Cu膜上的层的粘合性，并且没有实际应用的问题，尽管剥离液引起铜的一些腐蚀。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012225959A Photoresist stripping liquid 有权
标题翻译： PHOTORESIST剥离液
公开(公告)号：JP2012225959A
公开(公告)日：2012-11-15
申请号：JP2011090546
申请日：2011-04-15
申请人： Panasonic Corp , Panasonic Liquid Crystal Display Co Ltd , パナソニック株式会社 , パナソニック液晶ディスプレイ株式会社
发明人： YAMAGUCHI NORIO , FUCHIGAMI SHINICHIRO , AIKO MASAHIKO , SHIMIZU KOJI , TAKEZAWA HIROYOSHI
IPC分类号： G03F7/42 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photoresist stripping liquid for stripping a photoresist that has been exposed to an etchant for Cu in the process of forming wiring lines by wet-etching a Cu or Cu alloy layer on a substrate having a large area and thereby, that is deteriorated and turned into less strippable, without damaging the Cu layer, as well as the stripping liquid preventing reduction in an adhesive force with a layer to be deposited on the Cu layer.SOLUTION: The photoresist stripping liquid comprises 1 to 9 mass% of a tertiary alkanol amine, 10 to 70 mass% of a polar solvent, and 10 to 40 mass% of water. Although the obtained stripping liquid induces slight corrosion of copper, the liquid gives good adhesiveness with a layer to be deposited on a Cu layer and has no problem for practical use.
摘要翻译：要解决的问题：提供一种光致抗蚀剂剥离液，用于剥离在通过在具有大的基底的基底上湿蚀刻Cu或Cu合金层而在形成布线的过程中暴露于Cu的蚀刻剂的光致抗蚀剂因此，其劣化并变成较少可剥离的，而不损坏Cu层，以及剥离液体，防止与沉积在Cu层上的层的粘合力降低。解决方案：光致抗蚀剂剥离液含有1〜9质量％的叔烷醇胺，10〜70质量％的极性溶剂和10〜40质量％的水。虽然所得到的剥离液引起铜的轻微腐蚀，但是液体与沉积在Cu层上的层具有良好的粘附性，并且在实际应用中没有问题。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2012242697A Stripping liquid recycling system and operation method, and method for recycling stripping liquid 有权
标题翻译：剥离液回收系统及操作方法，以及回收剥离液的方法
公开(公告)号：JP2012242697A
公开(公告)日：2012-12-10
申请号：JP2011114208
申请日：2011-05-20
申请人： Panasonic Corp , パナソニック株式会社 , Panasonic Liquid Crystal Display Co Ltd , パナソニック液晶ディスプレイ株式会社
发明人： FUCHIGAMI SHINICHIRO , YAMAGUCHI NORIO , AIKO MASAHIKO , SHIMIZU KOJI , TAKEZAWA HIROYOSHI
IPC分类号： G03F7/42 , B08B3/02 , H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a recycling system of a stripping liquid using a photoresist stripping liquid, which is used for stripping a photoresist while avoiding damages on a Cu film in the process of wet-etching a Cu film or a Cu alloy film on a substrate having a large area to form wiring lines or the like, and which does not decrease in the adhesion strength between the Cu film and a layer to be deposited on the Cu film.SOLUTION: The system includes: a resist stripping device, which repeatedly uses a stripping liquid comprising a resist component and a mixture liquid of a main agent, a polar solvent and water, discharges a part of the stripping liquid through a discharge pipe when the resist concentration in the stripping liquid reaches a predetermined value, and is supplied with a new stripping liquid; a waste liquid tank; a distillation regeneration apparatus for distilling the stripping liquid in the waste liquid tank; a component inspection device for inspecting composition ratios of the main agent and the polar solvent in a liquid separated by the distillation; a preparation device for preparing the mixture liquid by adding the main agent, the polar solvent and water for the shortfall so as to obtain preliminarily determined ratios of the main agent, the polar solvent and water in the separated liquid; and a supply tank reserving the mixture liquid.
摘要翻译：要解决的问题：为了提供使用光致抗蚀剂剥离液的剥离液的再循环系统，其用于剥离光致抗蚀剂，同时在湿蚀刻Cu膜或Cu的过程中避免在Cu膜上的损伤合金膜在具有大面积的基板上形成布线等，并且不会降低Cu膜和沉积在Cu膜上的层之间的粘附强度。解决方案：该系统包括：抗蚀剂剥离装置，其重复使用包含抗蚀剂成分和主剂，极性溶剂和水的混合液体的剥离液，通过排出管排出一部分汽提液体当剥离液中的抗蚀剂浓度达到预定值时，供给新的剥离液; 废液罐; 用于蒸馏废液罐中的汽提液体的蒸馏再生装置; 用于检查通过蒸馏分离的液体中的主剂和极性溶剂的组成比的成分检查装置; 通过添加主剂，极性溶剂和缺水来制备混合液的制备装置，以获得分离液体中主剂，极性溶剂和水的预定比例; 以及储存混合液体的供给槽。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2013158252A Waste fluid treatment system 有权
标题翻译：废水处理系统
公开(公告)号：JP2013158252A
公开(公告)日：2013-08-19
申请号：JP2012020315
申请日：2012-02-01
申请人： Panasonic Corp , パナソニック株式会社
发明人： YAMAGUCHI NORIO , ARITOMI REIKO
IPC分类号： A01K63/04
CPC分类号： Y02A40/81 , Y02A40/83
摘要： PROBLEM TO BE SOLVED: To solve such a problem that a method for positively using organic substances drained from a factory for producing electric parts has little been discussed, although it has been discussed to degrade and release the organic substances with microorganisms.SOLUTION: Organic substances in a waste fluid are used as a feed to culture phytoplankton, and a fish bank is disposed in a sea close to a factory. The cultured phytoplankton is released in the fish bank. Thus, the waste fluid is used for growing marine resources. More specifically, a waste fluid treatment system is characterized by comprising a culture tank disposed in a factory to store culture water and phytoplankton, a mixing means for mixing an organic substances-containing waste water from the factory with the culture fluid to prepare a mixed waste fluid, a supply means for supplying the mixture waste fluid to the culture tank, a measurement means for counting the number of the phytoplankton in the culture tank, a carrying means for carrying the content of the culture tank to a place of natural water having the same salt degree as that of the culture fluid, and a fish bank containing a fish bank structure having at least one release port for releasing the content into sea.
摘要翻译：要解决的问题为了解决从工厂排出的用于生产电气部件的有机物积极使用的方法的这个问题，尽管已经讨论了用微生物降解和释放有机物质的问题。在废液中用作培养浮游植物的饲料，鱼类被放置在靠近工厂的海中。养殖的浮游植物在鱼群中释放。因此，废液用于种植海洋资源。更具体地说，废液处理系统的特征在于包括一个设置在工厂中以存储培养水和浮游植物的培养罐，用于将来自工厂的含有机物质废水与培养液混合的混合装置，以制备混合废物流体，用于将混合废液提供给培养罐的供给装置，用于计数培养罐中的浮游植物数量的测量装置，用于将培养罐的内容物运送到具有与培养液相同的盐度，以及含有具有至少一个用于将该物质释放到海中的释放口的鱼排结构的鱼群。

5. 发明专利

JP2012184150A Recycling method of phosphorus component-containing waste liquid, and method for manufacturing liquid fertilizer 有权
标题翻译：含磷成分的废液的回收方法及制造液体肥料的方法
公开(公告)号：JP2012184150A
公开(公告)日：2012-09-27
申请号：JP2011050159
申请日：2011-03-08
申请人： Panasonic Corp , パナソニック株式会社
发明人： SHIMADA KAZUYA , YAMAGUCHI NORIO , MORI KEIJI , OKADA NAOMI , HASEGAWA NOBORU
IPC分类号： C05B7/00 , C05F7/00 , C05G5/00
CPC分类号： Y02A40/213
摘要： PROBLEM TO BE SOLVED: To provide a method with which a waste liquid that contains a phosphorus component can be easily recycled to be a fertilizer.SOLUTION: The recycling method of the phosphorus component-containing waste liquid is characterized in that the phosphorus component-containing waste liquid generated from a surface chemically-modifying process of a metal is used as the liquid fertilizer as it is or after being processed. The method for manufacturing the liquid fertilizer includes a process for adjusting the concentration of at least one element selected from the group consisting of nitrogen, phosphorus, and potassium in the phosphorus component-containing waste liquid used for the surface chemically-modifying process of the metal.
摘要翻译：要解决的问题：提供一种可以将含有磷成分的废液容易地再循环到肥料中的方法。解决方案：含磷成分废液的再循环方法的特征在于，将来自金属的表面化学改性方法产生的含磷成分废液作为液体肥料，或者处理。制造液体肥料的方法包括调节用于金属表面化学改性处理的含磷成分废液中的氮，磷和钾中的至少一种元素的浓度的方法。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2010267872A Method of controlling concentration of etchant constituent 有权
标题翻译：控制腐殖质浓度的方法
公开(公告)号：JP2010267872A
公开(公告)日：2010-11-25
申请号：JP2009118911
申请日：2009-05-15
申请人： Panasonic Corp , パナソニック株式会社
发明人： FUJITA TOSHIHIKO , YAMAGUCHI NORIO , TAKEYAMA TAKAO
IPC分类号： H01L21/306
摘要： PROBLEM TO BE SOLVED: To provide a novel technique for a method of controlling concentration of an etchant constituent.
SOLUTION: This method of controlling concentration of an etchant constituent includes: collecting an etchant sample from an etchant tank of a wet etching device; measuring the concentration of an etchant constituent of the etchant sample by ion exchange chromatography; and adding an etchant constituent in the etchant tank to set the concentration of the etchant in the etchant tank in a set range based on information of the measurement; wherein the etchant contains phosphoric acid as an etchant constituent. The method of controlling concentration of an etchant constituent further includes moving a holding time of a peak of the phosphoric acid by changing pH of an eluent when a detected peak waveform of the phosphoric acid overlaps a peak waveform of another etchant constituent after an ion exchange column is used a plurality of times in the concentration measurement of the etchant constituent.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于控制蚀刻剂成分浓度的方法的新技术。控制腐蚀剂成分浓度的方法包括：从湿蚀刻装置的蚀刻槽收集蚀刻剂样品; 通过离子交换色谱法测量蚀刻剂样品的蚀刻剂成分的浓度; 并且在蚀刻槽中添加蚀刻剂成分，基于测量的信息将蚀刻剂槽中的蚀刻剂的浓度设定在设定范围内; 其中蚀刻剂含有作为蚀刻剂成分的磷酸。控制蚀刻剂成分浓度的方法还包括当检测到的磷酸的峰值波形与离子交换柱之后的另一蚀刻剂成分的峰值波形重叠时，通过改变洗脱液的pH来移动磷酸的保留时间在蚀刻剂成分的浓度测定中多次使用。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2009065006A Method of inspecting contamination in slurry for polishing semiconductor 有权
标题翻译：检查抛光半导体浆料污染的方法
公开(公告)号：JP2009065006A
公开(公告)日：2009-03-26
申请号：JP2007232342
申请日：2007-09-07
申请人： Panasonic Corp , パナソニック株式会社
发明人： SHIMAKITA HIROTO , SAWAYAMA SHIGEYUKI , KOBAYASHI YOSHIHISA , YAMAGUCHI NORIO
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To detect contaminations in slurry for polishing a semiconductor with high efficiency. SOLUTION: Slurry is refined chemically, physically or in its combined manner, to collect contaminations contained therein with use of a collector containing fine holes and to detect them. When particles are very small in size but aggregated, it is difficult for the slurry to pass through the fine holes and the aggregates themselves disturb detection of contaminations. By a pretreatment, aggregates in the slurry can be made small in size. As shown by a before-pretreatment solution layer 6, prior to aggregate reduction, there are many aggregated particles 3, which disturb filtering and measurement thereof. Addition of a surfactant 5 causes the particles to be reduced in fine size, so that as shown by an after-pretreatment solution layer 7, fine sized particles 4 become major and thus filtering and measurement thereof become easy. Consequently, contaminations contained in the slurry can be detected stably, easily and efficiently. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：检测用于高效抛光半导体的浆料中的污染物。解决方案：化学，物理或以其组合的方式对浆料进行精炼，以收集含有细孔的收集器并收集污染物，以检测它们。当颗粒尺寸非常小但是聚集时，浆料难以通过细孔，并且聚集体本身妨碍污染的检测。通过预处理，可以使浆料中的聚集体尺寸变小。如前预处理溶液层6所示，在聚集还原之前，存在许多聚集的颗粒3，其干扰其过滤和测量。通过添加表面活性剂5，能够使粒子微细化，如后处理液层7所示，微细尺寸的粒子4变大，因此过滤和测定变得容易。因此，可以稳定，容易且有效地检测浆料中所含的污染物。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2012206940A Oxygen-enriched air utilization system 审中-公开
标题翻译：富氧空气利用系统
公开(公告)号：JP2012206940A
公开(公告)日：2012-10-25
申请号：JP2012168266
申请日：2012-07-30
申请人： Panasonic Corp , パナソニック株式会社
发明人： YAMAGUCHI NORIO , MIYAMOTO HIROYUKI
IPC分类号： C01B13/02
摘要： PROBLEM TO BE SOLVED: To provide an oxygen-enriched air utilization system where oxygen-enriched air secondarily produced in a nitrogen production apparatus for producing gaseous nitrogen can be effectively utilized without exerting adverse influence on the nitrogen production apparatus.SOLUTION: The oxygen-enriched air utilization system comprises: a nitrogen production apparatus 1 where gaseous nitrogen is produced by separating the same from raw material air; a conveying means where oxygen-enriched air secondarily produced in the nitrogen production apparatus 1 is carried; and utilization equipment 6 where oxygen-enriched air is utilized, and, after oxygen-enriched air is discharged from a discharge port 5 in the nitrogen production apparatus 1, the oxygen-enriched air is fed to the utilization equipment 6 by the conveying means, and further, the pressure in the utilization equipment 6 is made into the one which does not suck the air.
摘要翻译：要解决的问题：提供一种富氧空气利用系统，其中可以有效地利用在用于产生氮气的氮气生产装置中二次生产的富氧空气而不会对氮气生产装置产生不利影响。解决方案：富氧空气利用系统包括：氮气生产装置1，其中通过将氮气与原料空气分离而产生气态氮; 输送在氮气制造装置1中二次生成的富氧空气的输送机构。以及使用富氧空气的利用设备6，并且在富氮空气从氮气制备装置1中的排出口5排出之后，富氧空气通过输送装置供给到利用设备6，此外，使用设备6中的压力被制成不吸入空气的压力。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2012143748A Method for suppressing generation of surplus sludge, method for treating organic waste water, and method for producing reformed activated sludge 有权
标题翻译：用于抑制污泥生成的方法，有机废水处理方法，以及生产改性活性污泥的方法
公开(公告)号：JP2012143748A
公开(公告)日：2012-08-02
申请号：JP2011278478
申请日：2011-12-20
申请人： Panasonic Corp , パナソニック株式会社
发明人： KITO HIRONORI , SHIBUYA KAZUAKI , YAMAGUCHI NORIO , SAKAKIBARA TAKASHI
IPC分类号： C02F3/12 , C02F3/00 , C02F3/34 , C12N1/00 , C12N1/20
CPC分类号： Y02W10/15
摘要： PROBLEM TO BE SOLVED: To provide a method for suppressing generation of surplus sludge.SOLUTION: The method for suppressing generation of surplus sludge includes treating organic waste water by using microorganisms in an aeration tank while using activated sludge subjected to reforming treatment by aeration of an oxygen-enriched gas and maintaining 2,000 mg/L to 30,000 mg/L of MLSS concentration in the aeration tank.

10. 发明专利

JP2012020218A Ballast water treatment system and ballast water treatment method 审中-公开
标题翻译： BALLAST水处理系统和BALLAST水处理方法
公开(公告)号：JP2012020218A
公开(公告)日：2012-02-02
申请号：JP2010158994
申请日：2010-07-13
申请人： Panasonic Corp , パナソニック株式会社
发明人： YAMAMOTO HIROSHI , YAMAGUCHI NORIO , ENDO HIROYUKI
IPC分类号： C02F1/46 , B63B13/00
摘要： PROBLEM TO BE SOLVED: To provide a new ballast water treatment system.SOLUTION: The ballast water treatment system includes a first sterilization apparatus 101 for the sterilization treatment of aquatic microorganisms in a liquid supplied to a ballast tank 103, and a second sterilization apparatus 102 for the sterilization treatment of the aquatic microorganisms in ballast water in the ballast tank 103, wherein the first sterilization apparatus 101 is connected with a ballast water supply line 105 for supplying a liquid from a sea chest 104 to the ballast tank 103, and the second sterilization apparatus 102 is provided with an electrolytic cell for generating sodium hypochlorite by electrolysis of the liquid containing a sodium chloride.
摘要翻译：要解决的问题：提供一种新的压载水处理系统。压载水处理系统包括：第一灭菌装置101，其用于灭菌处理供给压载箱103的液体中的水生微生物;以及第二杀菌装置102，用于灭菌处理压载水中的水生微生物在压载箱103中，其中第一灭菌装置101与用于将液体从海底箱104供给到压载箱103的压载水供应管线105连接，第二灭菌装置102设置有用于产生次氯酸钠通过电解含氯化钠的液体。版权所有（C）2012，JPO＆INPIT

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