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JP2009065006A Method of inspecting contamination in slurry for polishing semiconductor 有权
标题翻译：检查抛光半导体浆料污染的方法
公开(公告)号：JP2009065006A
公开(公告)日：2009-03-26
申请号：JP2007232342
申请日：2007-09-07
申请人： Panasonic Corp , パナソニック株式会社
发明人： SHIMAKITA HIROTO , SAWAYAMA SHIGEYUKI , KOBAYASHI YOSHIHISA , YAMAGUCHI NORIO
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To detect contaminations in slurry for polishing a semiconductor with high efficiency. SOLUTION: Slurry is refined chemically, physically or in its combined manner, to collect contaminations contained therein with use of a collector containing fine holes and to detect them. When particles are very small in size but aggregated, it is difficult for the slurry to pass through the fine holes and the aggregates themselves disturb detection of contaminations. By a pretreatment, aggregates in the slurry can be made small in size. As shown by a before-pretreatment solution layer 6, prior to aggregate reduction, there are many aggregated particles 3, which disturb filtering and measurement thereof. Addition of a surfactant 5 causes the particles to be reduced in fine size, so that as shown by an after-pretreatment solution layer 7, fine sized particles 4 become major and thus filtering and measurement thereof become easy. Consequently, contaminations contained in the slurry can be detected stably, easily and efficiently. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：检测用于高效抛光半导体的浆料中的污染物。解决方案：化学，物理或以其组合的方式对浆料进行精炼，以收集含有细孔的收集器并收集污染物，以检测它们。当颗粒尺寸非常小但是聚集时，浆料难以通过细孔，并且聚集体本身妨碍污染的检测。通过预处理，可以使浆料中的聚集体尺寸变小。如前预处理溶液层6所示，在聚集还原之前，存在许多聚集的颗粒3，其干扰其过滤和测量。通过添加表面活性剂5，能够使粒子微细化，如后处理液层7所示，微细尺寸的粒子4变大，因此过滤和测定变得容易。因此，可以稳定，容易且有效地检测浆料中所含的污染物。版权所有（C）2009，JPO＆INPIT

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