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1. 发明授权

US09647415B2 Laser apparatus and method of controlling laser apparatus 有权
公开(公告)号：US09647415B2
公开(公告)日：2017-05-09
申请号：US14602208
申请日：2015-01-21
申请人： Hiroaki Tsushima , Osamu Wakabayashi , Takashi Matsunaga
发明人： Hiroaki Tsushima , Osamu Wakabayashi , Takashi Matsunaga
IPC分类号： H01S3/10 , H01S3/00 , H01S3/097 , H01S3/08 , H01S3/0971 , H01S3/23
CPC分类号： H01S3/09702 , H01S3/0014 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/2366
摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

2. 发明授权

US09257809B2 Laser device for exposure apparatus 有权
标题翻译：用于曝光设备的激光装置
公开(公告)号：US09257809B2
公开(公告)日：2016-02-09
申请号：US13401734
申请日：2012-02-21
申请人： Hidenori Watanabe , Hiroshi Tanaka , Osamu Wakabayashi
发明人： Hidenori Watanabe , Hiroshi Tanaka , Osamu Wakabayashi
IPC分类号： H01S3/223 , H01S3/03 , H01S3/134 , H01S3/23 , H01S3/036 , G03F7/20
CPC分类号： H01S3/03 , G03F7/70025 , H01S3/036 , H01S3/134 , H01S3/2316 , H01S3/2366
摘要： A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.
摘要翻译：用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光，并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。

3. 发明授权

US09046651B2 Mirror device 有权
标题翻译：镜像设备
公开(公告)号：US09046651B2
公开(公告)日：2015-06-02
申请号：US13696528
申请日：2011-12-29
申请人： Hiroshi Someya , Yukio Watanabe , Katsuhiko Wakana , Osamu Wakabayashi
发明人： Hiroshi Someya , Yukio Watanabe , Katsuhiko Wakana , Osamu Wakabayashi
IPC分类号： G02B7/182 , G02B7/18 , G03F7/20
CPC分类号： G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
摘要翻译：反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。

4. 发明授权

US08811436B2 Laser apparatus, extreme ultraviolet light generation system including the laser apparatus, and method for controlling the laser apparatus 有权
标题翻译：激光装置，包括激光装置的极紫外光发生系统和用于控制激光装置的方法
公开(公告)号：US08811436B2
公开(公告)日：2014-08-19
申请号：US13696497
申请日：2012-02-08
申请人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
发明人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
IPC分类号： H01S3/13
CPC分类号： H01S3/10046 , G03F7/70025 , G03F7/70033 , H01S3/0085 , H01S3/09702 , H01S3/10007 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4025 , H05G2/005 , H05G2/008
摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.
摘要翻译：激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

5. 发明授权

US08804780B2 Method for adjusting spectral line width of narrow-band laser 有权
标题翻译：调整窄带激光光谱线宽度的方法
公开(公告)号：US08804780B2
公开(公告)日：2014-08-12
申请号：US11822126
申请日：2007-07-02
申请人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
发明人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
IPC分类号： H01S3/13 , H01S3/137
CPC分类号： G03F7/2006 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/139 , H01S3/225
摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.
摘要翻译：对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量曝光工具可以稳定。

6. 发明授权

US08587863B2 Wavelength conversion device, solid-state laser apparatus, and laser system 有权
标题翻译：波长转换装置，固体激光装置和激光系统
公开(公告)号：US08587863B2
公开(公告)日：2013-11-19
申请号：US13568232
申请日：2012-08-07
申请人： Osamu Wakabayashi , Takashi Onose
发明人： Osamu Wakabayashi , Takashi Onose
IPC分类号： G02F1/35 , G02F2/02 , H01S3/04
CPC分类号： H01S3/2251 , G02F1/353 , G02F2001/3505 , G02F2001/3546 , G02F2203/60 , H01S3/0092 , H01S3/0401 , H01S3/1625 , H01S3/1636 , H01S3/2316 , H01S3/2325 , H01S3/2375
摘要： A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element.
摘要翻译：波长转换装置可以包括通过波长转换将进入的第一激光束转换成第二激光束的波长转换元件，以及从波长转换元件的至少一个表面冷却波长转换元件的冷却机构。

7. 发明授权

US08536551B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08536551B2
公开(公告)日：2013-09-17
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

8. 发明申请

US20130208742A1 OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：光学装置，激光装置和超极紫外光发生系统
公开(公告)号：US20130208742A1
公开(公告)日：2013-08-15
申请号：US13817818
申请日：2012-02-17
申请人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
发明人： Hakaru Mizoguchi , Takashi Suganuma , Hideo Hoshino , Osamu Wakabayashi
IPC分类号： H01S3/10
CPC分类号： H01S3/0071 , H01S3/0014 , H01S3/10061 , H01S3/1305 , H05G2/008
摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.
摘要翻译：光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

9. 发明授权

US08455850B2 Extreme ultraviolet light source apparatus and method of generating extreme ultraviolet light 有权
标题翻译：极紫外光源装置和产生极紫外光的方法
公开(公告)号：US08455850B2
公开(公告)日：2013-06-04
申请号：US13416884
申请日：2012-03-09
申请人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
发明人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： G21K5/00 , G03F7/70033 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
摘要翻译：一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶，在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

10. 发明申请

US20130099140A1 LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR GENERATING LASER BEAM 有权
标题翻译：激光装置，极光紫外线发光系统及其生成激光束的方法
公开(公告)号：US20130099140A1
公开(公告)日：2013-04-25
申请号：US13805300
申请日：2012-03-05
申请人： Hiroaki Nakarai , Osamu Wakabayashi , Hideo Hoshino
发明人： Hiroaki Nakarai , Osamu Wakabayashi , Hideo Hoshino
IPC分类号： H01S3/00
CPC分类号： H01S3/0057 , H01S3/107 , H01S3/1305 , H01S3/134 , H01S3/2232 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S3/2391 , H05G2/008
摘要： A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.
摘要翻译：激光装置可以包括配置成输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲到脉冲基准控制所述脉冲能量调节单元，用于脉冲激光束通过其中并且控制所述至少一个电源的一组多脉冲脉冲激光束。

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