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1. 发明授权

US09202674B2 Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements 有权
标题翻译：具有天花板电极供应导管的等离子体反应器具有一系列电压降元件
公开(公告)号：US09202674B2
公开(公告)日：2015-12-01
申请号：US12255492
申请日：2008-10-21
申请人： Olkan Cuvalci , Yu Chang , William Kuang , Anqing Cui , Seshadri Ganguli
发明人： Olkan Cuvalci , Yu Chang , William Kuang , Anqing Cui , Seshadri Ganguli
IPC分类号： H01J37/32 , C23C16/455
CPC分类号： H01J37/3244 , C23C16/455 , H01J37/32091 , H01J37/32541
摘要： A bridge assembly includes an electrically insulating hollow tube or bridge having a pair of ends, the bridge being supported at one of the ends over the cylindrical side wall and being supported at the other of the ends over the electrode. The bridge assembly further includes a set of conductive rings surrounding the hollow tube and spaced from one another along the length of the bridge, and plural electrically resistive elements. Each of the resistive elements has a pair of flexible connectors, respective ones the resistive elements connected at their flexible connectors between respective pairs of the rings to form a series resistor assembly.
摘要翻译：桥组件包括具有一对端部的电绝缘中空管或桥，所述桥被支撑在所述圆柱形侧壁上的一端，并且在所述电极的另一端支撑。桥接组件还包括围绕中空管并且沿着桥的长度彼此间隔开的一组导电环，以及多个电阻元件。每个电阻元件具有一对柔性连接器，相应的电阻元件在相应的成对环之间的柔性连接器处连接以形成串联电阻器组件。

2. 发明申请

US20100096085A1 PLASMA REACTOR WITH A CEILING ELECTRODE SUPPLY CONDUIT HAVING A SUCCESSION OF VOLTAGE DROP ELEMENTS 有权
标题翻译：具有带电压下降元件继电器的天花板电极管的等离子体反应器
公开(公告)号：US20100096085A1
公开(公告)日：2010-04-22
申请号：US12255492
申请日：2008-10-21
申请人： OLKAN CUVALCI , Yu Chang , William Kuang , Anqing Cui , Seshadri Ganguli
发明人： OLKAN CUVALCI , Yu Chang , William Kuang , Anqing Cui , Seshadri Ganguli
IPC分类号： C23F1/08 , C23C16/44
CPC分类号： H01J37/3244 , C23C16/455 , H01J37/32091 , H01J37/32541
摘要： A bridge assembly includes an electrically insulating hollow tube or bridge having a pair of ends, the bridge being supported at one of the ends over the cylindrical side wall and being supported at the other of the ends over the electrode. The bridge assembly further includes a set of conductive rings surrounding the hollow tube and spaced from one another along the length of the bridge, and plural electrically resistive elements. Each of the resistive elements has a pair of flexible connectors, respective ones the resistive elements connected at their flexible connectors between respective pairs of the rings to form a series resistor assembly.
摘要翻译：桥组件包括具有一对端部的电绝缘中空管或桥，所述桥被支撑在所述圆柱形侧壁上的一端，并且在所述电极的另一端支撑。桥接组件还包括围绕中空管并且沿着桥的长度彼此间隔开的一组导电环，以及多个电阻元件。每个电阻元件具有一对柔性连接器，相应的电阻元件在相应的成对环之间的柔性连接器处连接以形成串联电阻器组件。

3. 发明授权

US08618446B2 Substrate support with substrate heater and symmetric RF return 有权
标题翻译：衬底支撑与衬底加热器和对称RF返回
公开(公告)号：US08618446B2
公开(公告)日：2013-12-31
申请号：US13173471
申请日：2011-06-30
申请人： Yu Chang , Gwo-Chuan Tzu , Anqing Cui , William W. Kuang , Olkan Cuvalci
发明人： Yu Chang , Gwo-Chuan Tzu , Anqing Cui , William W. Kuang , Olkan Cuvalci
IPC分类号： A21B1/00 , C23C16/00
CPC分类号： F27B17/0025 , H01J37/32091 , H01J37/32715 , H01L21/67103 , H01L21/67248
摘要： Apparatus for processing a substrate are provided herein. In some embodiments, a substrate support includes a substrate support surface and a shaft; an RF electrode disposed in the substrate support proximate the substrate support surface to receive RF current from an RF source; a heater disposed proximate the substrate support surface to provide heat to a substrate when disposed on the substrate support surface, the heater having one or more conductive lines to provide power to the heater; a thermocouple to measure the temperature of a substrate when disposed on the substrate support surface; and a conductive element having an interior volume with the one or more conductive lines and the thermocouple disposed through the interior volume, the conductive element coupled to the RF electrode and having an electric field of about zero in the interior volume when RF current is flowed through the conductive element.
摘要翻译：本文提供了用于处理基板的装置。在一些实施例中，衬底支撑件包括衬底支撑表面和轴; 设置在所述衬底支撑件中的RF电极，靠近所述衬底支撑表面以从RF源接收RF电流; 设置在所述基板支撑表面附近的加热器，以在设置在所述基板支撑表面上时向所述基板提供热量，所述加热器具有一个或多个导线以向所述加热器提供电力; 当设置在基板支撑表面上时测量基板的温度的热电偶; 以及具有内部体积的导电元件，所述一个或多个导电线和所述热电偶设置穿过所述内部体积，所述导电元件耦合到所述RF电极，并且当RF电流流过所述内部体积时具有约零的电场导电元件。

4. 发明授权

US09490150B2 Substrate support for substrate backside contamination control 有权
标题翻译：底物支撑底物污染控制
公开(公告)号：US09490150B2
公开(公告)日：2016-11-08
申请号：US13540710
申请日：2012-07-03
申请人： Gwo-Chuan Tzu , Olkan Cuvalci , Yu Chang , Xiaoxiong Yuan
发明人： Gwo-Chuan Tzu , Olkan Cuvalci , Yu Chang , Xiaoxiong Yuan
IPC分类号： H01L21/67 , H05B3/14 , H01L21/687
CPC分类号： H01L21/67109 , H01L21/67103 , H01L21/6875 , H05B3/143
摘要： Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a first aluminum plate for supporting a substrate, the first aluminum plate having a plurality of heating elements embedded therein to provide a plurality of heating zones; a second aluminum plate disposed beneath and supporting the first aluminum plate; a third aluminum plate disposed beneath and supporting the second aluminum plate; a non-metallic ring disposed atop the first aluminum plate; and a plurality of spacers having an upper portion disposed above a surface of the first aluminum plate, wherein the non-metallic ring and the plurality of spacers support the substrate above the first aluminum plate.
摘要翻译：本文提供了基板支撑件的实施例。在一些实施例中，衬底支撑件可以包括用于支撑衬底的第一铝板，所述第一铝板具有嵌入其中的多个加热元件以提供多个加热区域; 设置在第一铝板下方并支撑第一铝板的第二铝板; 设置在第二铝板下方并支撑第二铝板的第三铝板; 设置在第一铝板顶上的非金属环; 以及多个间隔件，其具有设置在所述第一铝板的表面上方的上部，其中所述非金属环和所述多个间隔件将所述基板支撑在所述第一铝板的上方。

5. 发明申请

US20090139854A1 CONTROL OF ARBITRARY SCAN PATH OF A ROTATING MAGNETRON 有权
标题翻译：控制旋转磁铁的横向扫描路径
公开(公告)号：US20090139854A1
公开(公告)日：2009-06-04
申请号：US11948118
申请日：2007-11-30
申请人： Yu Chang , William Kuang , Ronald D. Dedore , Jitendra R. Bhimjiyani , Wesley W. Zhang
发明人： Yu Chang , William Kuang , Ronald D. Dedore , Jitendra R. Bhimjiyani , Wesley W. Zhang
IPC分类号： C23C14/54 , C23C14/35
CPC分类号： C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A control system and method for controlling two motors determining the azimuthal and circumferential position of a magnetron rotating about the central axis of the sputter chamber in back of its target sputtering and capable of a nearly arbitrary scan path, e.g., with a planetary gear mechanism. A system controller periodically sends commands to the motion controller which closely controls the motors. Each command includes a command ticket, which may be one of several values. The motion controller accepts only commands having a command ticket of a different value from the immediately preceding command. One command selects a scan profile stored in the motion controller, which calculates motor signals from the selected profile. Another command instructs a dynamic homing command which interrogates sensors of the position of two rotating arms to determine if the arms in the expected positions. If not, the arms are rehomed.
摘要翻译：一种用于控制两个电动机的控制系统和方法，所述两个电动机确定围绕其目标溅射背面的溅射室的中心轴线旋转的磁控管的方位角和圆周位置，并且能够以几乎任意的扫描路径，例如用行星齿轮机构。系统控制器周期性地向控制电机的运动控制器发送命令。每个命令包括一个命令票证，它可以是几个值之一。运动控制器仅接受具有与前一个命令不同的命令票证的命令。一个命令选择存储在运动控制器中的扫描轮廓，其从所选轮廓计算马达信号。另一个命令指示动态归位命令，其询问两个旋转臂的位置的传感器以确定臂在预期位置。如果没有，武器被重新安置。

6. 发明申请

US20090218324A1 DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPUT FOR WAFER PROCESSING 有权
标题翻译： RF等离子体输出的直接实时监控和反馈控制
公开(公告)号：US20090218324A1
公开(公告)日：2009-09-03
申请号：US12039514
申请日：2008-02-28
申请人： David T. Or , Yu Chang , William Kuang , Joel M. Huston , Chien-Teh Kao , Mei Chang
发明人： David T. Or , Yu Chang , William Kuang , Joel M. Huston , Chien-Teh Kao , Mei Chang
IPC分类号： H05H1/36 , C23C16/505
CPC分类号： H05H1/0081 , C23C16/5096 , C23C16/52 , H01J37/32082 , H01J37/32935 , H01J37/3299
摘要： A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect fluctuations in power output to the electrode. The detector is coupled to a signal generator, which converts the RF input signal to a constant control signal. A controller adjusts power input to the RF generator by comparing the control signal to a reference.
摘要翻译：提供一种用于控制电容耦合等离子体的功率输出的方法和装置。检测器设置在电力输送管道上，该电力输送管道承载一个电极的功率，以检测输出到电极的功率的波动。检测器耦合到信号发生器，其将RF输入信号转换成恒定的控制信号。控制器通过将控制信号与参考值进行比较来调节对RF发生器的功率输入。

7. 发明申请

US20120103800A1 Homing of arbitrary scan path of a rotating magnetron 有权
标题翻译：回旋磁控管的任意扫描路径
公开(公告)号：US20120103800A1
公开(公告)日：2012-05-03
申请号：US13347030
申请日：2012-01-10
申请人： Yu Chang , William Kuang , Ronald D. DeDore , Jitendra R. Bhimjiyani , Wesley W. Zhang
发明人： Yu Chang , William Kuang , Ronald D. DeDore , Jitendra R. Bhimjiyani , Wesley W. Zhang
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A control system and method for controlling two motors determining the azimuthal and circumferential position of a magnetron rotating about the central axis of the sputter chamber in back of its target sputtering and capable of a nearly arbitrary scan path, e.g., with a planetary gear mechanism. A system controller periodically sends commands to the motion controller which closely controls the motors. Each command includes a command ticket, which may be one of several values. The motion controller accepts only commands having a command ticket of a different value from the immediately preceding command. One command selects a scan profile stored in the motion controller, which calculates motor signals from the selected profile. Another command instructs a dynamic homing command which interrogates sensors of the position of two rotating arms to determine if the arms in the expected positions. If not, the arms are rehomed.
摘要翻译：一种用于控制两个电动机的控制系统和方法，所述两个电动机确定围绕其目标溅射背面的溅射室的中心轴线旋转的磁控管的方位角和圆周位置，并且能够以几乎任意的扫描路径，例如用行星齿轮机构。系统控制器周期性地向运动控制器发送命令，该运动控制器紧密地控制电机。每个命令包括一个命令票证，它可以是几个值之一。运动控制器仅接受具有与前一个命令不同的命令票证的命令。一个命令选择存储在运动控制器中的扫描轮廓，其从所选轮廓计算马达信号。另一个命令指示动态归位命令，其询问两个旋转臂的位置的传感器以确定臂在预期位置。如果没有，武器被重新安置。

8. 发明授权

US08721847B2 Homing of arbitrary scan path of a rotating magnetron 有权
标题翻译：回旋磁控管的任意扫描路径
公开(公告)号：US08721847B2
公开(公告)日：2014-05-13
申请号：US13347030
申请日：2012-01-10
申请人： Yu Chang , William Kuang , Ronald D. DeDore , Jitendra R. Bhimjiyani , Wesley W. Zhang
发明人： Yu Chang , William Kuang , Ronald D. DeDore , Jitendra R. Bhimjiyani , Wesley W. Zhang
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A control system and method for controlling two motors determining the azimuthal and circumferential position of a magnetron rotating about the central axis of the sputter chamber in back of its target sputtering and capable of a nearly arbitrary scan path, e.g., with a planetary gear mechanism. A system controller periodically sends commands to the motion controller which closely controls the motors. Each command includes a command ticket, which may be one of several values. The motion controller accepts only commands having a command ticket of a different value from the immediately preceding command. One command selects a scan profile stored in the motion controller, which calculates motor signals from the selected profile. Another command instructs a dynamic homing command which interrogates sensors of the position of two rotating arms to determine if the arms in the expected positions. If not, the arms are rehomed.
摘要翻译：一种用于控制两个电动机的控制系统和方法，所述两个电动机确定围绕其目标溅射背面的溅射室的中心轴线旋转的磁控管的方位角和圆周位置，并且能够以几乎任意的扫描路径，例如用行星齿轮机构。系统控制器周期性地向控制电机的运动控制器发送命令。每个命令包括一个命令票证，它可以是几个值之一。运动控制器仅接受具有与前一个命令不同的命令票证的命令。一个命令选择存储在运动控制器中的扫描轮廓，其从所选轮廓计算马达信号。另一个命令指示动态归位命令，其询问两个旋转臂的位置的传感器以确定臂在预期位置。如果没有，武器被重新安置。

9. 发明申请

US20060130971A1 Apparatus for generating plasma by RF power 审中-公开
标题翻译：用于通过RF功率产生等离子体的装置
公开(公告)号：US20060130971A1
公开(公告)日：2006-06-22
申请号：US11137200
申请日：2005-05-24
申请人： Yu Chang , Gwo-Chuan Tzu , Salvador Umotoy , Chien-Teh Kao , William Kuang , Xiaoxiong Yuan , Mei Chang
发明人： Yu Chang , Gwo-Chuan Tzu , Salvador Umotoy , Chien-Teh Kao , William Kuang , Xiaoxiong Yuan , Mei Chang
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/31116 , H01J37/32082 , H01J37/32357 , H01J37/32541 , H01L21/28247 , H01L21/67069 , H01L29/665
摘要： A method and apparatus for processing a substrate is provided. In one aspect, the chamber comprises a chamber body and a support assembly at least partially disposed within the chamber body adapted to support a substrate thereon. The chamber further comprises a lid assembly disposed on an upper surface of the chamber body. The lid assembly includes a top plate and a gas delivery assembly which define a plasma cavity therebetween, wherein the gas delivery assembly is adapted to heat the substrate. A remote plasma source having a U-shaped plasma region is connected to the gas delivery assembly.
摘要翻译：提供了一种用于处理衬底的方法和设备。在一个方面，所述腔室包括室主体和至少部分地设置在所述腔体内的适于在其上支撑衬底的支撑组件。所述室还包括设置在所述室主体的上表面上的盖组件。盖组件包括顶板和在其间限定等离子体腔的气体输送组件，其中气体输送组件适于加热衬底。具有U形等离子体区域的远程等离子体源连接到气体输送组件。

10. 发明授权

US08114256B2 Control of arbitrary scan path of a rotating magnetron 有权
标题翻译：控制旋转磁控管的任意扫描路径
公开(公告)号：US08114256B2
公开(公告)日：2012-02-14
申请号：US11948118
申请日：2007-11-30
申请人： Yu Chang , William Kuang , Ronald D Dedore , Jitendra R. Bhimjiyani , Wesley W Zhang
发明人： Yu Chang , William Kuang , Ronald D Dedore , Jitendra R. Bhimjiyani , Wesley W Zhang
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A control system and method for controlling two motors determining the azimuthal and circumferential position of a magnetron rotating about the central axis of the sputter chamber in back of its target sputtering and capable of a nearly arbitrary scan path, e.g., with a planetary gear mechanism. A system controller periodically sends commands to the motion controller which closely controls the motors. Each command includes a command ticket, which may be one of several values. The motion controller accepts only commands having a command ticket of a different value from the immediately preceding command. One command selects a scan profile stored in the motion controller, which calculates motor signals from the selected profile. Another command instructs a dynamic homing command which interrogates sensors of the position of two rotating arms to determine if the arms in the expected positions. If not, the arms are rehomed.
摘要翻译：一种用于控制两个电动机的控制系统和方法，所述两个电动机确定围绕其目标溅射背面的溅射室的中心轴线旋转的磁控管的方位角和圆周位置，并且能够以几乎任意的扫描路径，例如用行星齿轮机构。系统控制器周期性地向控制电机的运动控制器发送命令。每个命令包括一个命令票证，它可以是几个值之一。运动控制器仅接受具有与前一个命令不同的命令票证的命令。一个命令选择存储在运动控制器中的扫描轮廓，其从所选轮廓计算马达信号。另一个命令指示动态归位命令，其询问两个旋转臂的位置的传感器以确定臂在预期位置。如果没有，武器被重新安置。

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