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1. 发明专利

DE60028634T2 未知
公开(公告)号：DE60028634T2
公开(公告)日：2007-05-31
申请号：DE60028634
申请日：2000-03-17
申请人： ORGANO CORP , KURITA WATER IND LTD , NOMURA MICRO SCIENCE KK , OHMI TADAHIRO , HITACHI PLANT TECHNOLOGIES LTD , KUMAGAI GUMI CO LTD , TAISEI CORP
发明人： IMAOKA TAKASHI , HIROSHI MORITA , SUGIYAMA ISAMU , TADAHIRO OHMI , HIRAYAMA MASAKI
IPC分类号： C02F1/20 , C02F1/70 , C02F5/00 , C09K5/08 , F28F19/00

2. 发明专利

DE60028634D1 未知
公开(公告)号：DE60028634D1
公开(公告)日：2006-07-27
申请号：DE60028634
申请日：2000-03-17
申请人： ORGANO CORP , KURITA WATER IND LTD , NOMURA MICRO SCIENCE KK , OHMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , TAKASAGO THERMAL ENGINEERING
发明人： IMAOKA TAKASHI , HIROSHI MORITA , SUGIYAMA ISAMU , TADAHIRO OHMI , HIRAYAMA MASAKI
IPC分类号： C02F1/20 , C02F1/70 , C02F5/00 , C09K5/08 , F28F19/00

3. 发明专利

JP2000336351A WATER FOR HEAT EXCHANGE AND DEVICE FOR SUPPLYING THE SAME 失效
公开(公告)号：JP2000336351A
公开(公告)日：2000-12-05
申请号：JP33966599
申请日：1999-11-30
申请人： ORGANO KK , KURITA WATER IND LTD , NOMURA MICRO SCIENCE KK , OMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , TAKASAGO THERMAL ENGINEERING
发明人： IMAOKA TAKAYUKI , MORITA HIROSHI , SUGIYAMA ISAMU , OMI TADAHIRO , HIRAYAMA MASAKI
IPC分类号： C02F1/20 , C02F1/70 , C02F5/00 , C09K5/08 , F28F19/00
摘要： PROBLEM TO BE SOLVED: To obtain water which is used for heat exchange, can prevent the oxidative deterioration of a piping for supplying/circulating the water for the heat exchange or the oxidative deterioration of metal materials in the liquid contact portion of the heat exchanger, and can further control the proliferation of algae and microorganisms, by using specific reducing water as the water for heat exchange. SOLUTION: This water for exchanging the heat of a material to be subjected to the heat exchange, such as a machine installation, air or a liquid, comprises reducing water whose standard oxidation-reduction potential is zero or negative, when a standard hydrogen electrode is used as a standard electrode. The reducing water preferably comprises hydrogen- dissolved water obtained by dissolving hydrogen gas in water, and preferably has a standard oxidation-reduction potential of =>0.1 mg/L. The reducing water also preferably comprises water obtained by dissolving a reducing agent in deaerated water, and has a standard oxidation-reduction potential of =3 mg/L. Thereby, water which is used for heat exchange and can highly efficiently be subjected to a heat exchange with a material whose heat is exchanged can be expected.

4. 发明专利

JPH10180254A METHOD AND DEVICE FOR PRODUCING PURE WATER 失效
公开(公告)号：JPH10180254A
公开(公告)日：1998-07-07
申请号：JP34375496
申请日：1996-12-24
申请人： NOMURA MICRO SCIENCE KK , NIPPON OXYGEN CO LTD
发明人： SUGIYAMA ISAMU , ISHIHARA YOSHIO , YONEKAWA NAOMICHI , AIKAWA REIKO , KOJIMA SENRI
IPC分类号： C02F1/44 , C02F1/32 , C02F1/42
摘要： PROBLEM TO BE SOLVED: To suppress variation of a transmitted water quantity due to variation of water temp. by measuring a flow rate of water to be treated and controlling pressure pressurized to the water to be treated to increase or decrease the flow rate of the water to be treated, in a filtering operation performed by feeding the water to be treated to a reverse osmotic membrane device or an ultrafiltration membrane device under pressure. SOLUTION: Raw water stored in a first storage tank 1 is pressurized with a first alternate current pump 2, produced pure water via the reverse osmotic membrane device 3, a vacuum deaeration tower 6, an U.V. irradiation device 7, and an ion- exchange device 8, and then is stored in a second storage tank 9. Next, the pure water is fed to a use point 18 by second alternate current pump 3 via an U.V. irradiation device 15, an ion-exchange device 16, and an ultrafiltration device 17. At this time, a flow rate signal of a first flow rate meter 4 is fed to a first inverter control device 5 and a revolution number of the alternate current pump 2 is controlled to become a flow rate in accordance with a necessary quantity, and to become a flow rate in accordance with a use quantity at a use point 18 by a water level meter 11 at the water storage tank 9 while a revolution number of the second pump 13 is made constant.

5. 发明专利

JP2000039410A SAMPLE CASE FOR ANALYSIS 失效
公开(公告)号：JP2000039410A
公开(公告)日：2000-02-08
申请号：JP25334698
申请日：1998-07-17
申请人： PYUAREKKUSU KK , NOMURA MICRO SCIENCE KK
发明人： MURAOKA HISASHI , NOZAKI TADASHI , IIDA MITSUO , OTA YOSHIHARU , SUGIYAMA ISAMU
IPC分类号： G01N23/221 , H01J37/20 , H01L21/673 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To securely eliminate the degree of risk of organic contamination from environment from an analysis sample by allowing the top flat surface of a dish-shaped body for accepting the analysis sample and aluminum foil for covering a cover chip to adhere to the outer surface of the dish-shaped body. SOLUTION: A recess 13 surrounded by a side wall 12 of a dish-shaped body 10 is at a depth where the upper surface is nearly as high as an upper surface 14 of the side wall top part of the dish-shaped body 10 when two overlapped chips are loaded. The sample case consists of the dish-shaped body 10, aluminum foil 21 for covering the upper surface 14 and the side surface, and a rubber ring 22 for clamping it to the side surface of the dish-shaped body 10. In this case, a sample chip 19 is placed in the recess 13 while a surface to be analyzed of the sample chip 19 faces upward and a cover chip 20 is overlapped. Further, the circular aluminum foil 21 is overlapped onto the dish-shaped body 10 while both centers nearly match. Then, a rubber ring 22 is fixed to a groove 15 at the outer periphery of the dish-shaped body 10, the aluminum foil 21 is clamped to the outer periphery of the dish-shaped body 10, and the overlapping chips 19 and 20 are accommodated airtightly between the aluminum foil 21 and the dish-shaped body 10.

6. 发明专利

JPH11188329A TREATMENT APPARATUS 失效
公开(公告)号：JPH11188329A
公开(公告)日：1999-07-13
申请号：JP35966097
申请日：1997-12-26
申请人： UMS KK , NOMURA MICRO SCIENCE KK , NISSO ENGINEERING KK
发明人： MURAOKA HISASHI , OTA YOSHIHARU , SUGIYAMA ISAMU , YONETANI AKIRA
IPC分类号： B08B15/02 , B08B3/08 , C23C14/00 , C23F4/00 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To prevent pollution by various kinds of gases and mist by housing a dry treatment mechanism for carrying out dry treatment for a substrate, etc., in a closed space formed between mutually separable two cases and passing gases through a first and a second flow pipes to the closed space. SOLUTION: After a case 10 is parted from a case 9 and gas evacuation through flow pipes 15, 21 is started for forming an oxide film on the surface of a silicon wafer 16, a wafer 16 is housed in the case 10. Then, after the case 10 is moved and joined to the case 9, filtered high purity air is sent through a flow pipe 15. Next, while the silicon wafer 16 being rotated at a low speed, a mercury lamp 14 is lighted to generate ozone, and remove organic matter polluting the surface of the silicon wafer 16 to form an oxide film. After that, the mercury lamp 14 is turned off, suction is reinforced, and at the same time pure air is supplied. Following that, the wafer 16 is stopped rotating, gas supply is stopped, and the case 10 is parted to take out the wafer 16.

7. 发明专利

JPH03288583A METHOD FOR WASHING PIPING IN PURE WATER MAKING APPARATUS 失效
公开(公告)号：JPH03288583A
公开(公告)日：1991-12-18
申请号：JP8864590
申请日：1990-04-03
申请人： NOMURA MICRO SCIENCE KK
发明人： OTA YOSHIHARU , SUGIYAMA ISAMU
IPC分类号： B08B9/027
摘要： PURPOSE:To wash the inner surfaces of pipings within a short time by passing ultra-pure water through the pipings while ultrasonic vibration is applied to the pipings. CONSTITUTION:The fine particles bonded to the inner surfaces of pipings 2 are separated by the mechanical energy due to ultrasonic vibration and carried away from a system outlet 2 by the ultra-pure water passed through the pipings from a pure water making apparatus 1 to be removed by various filters. Since ultrasonic vibration is applied to the pipings 2, the fine particles suspended in the ultra-pure water are prevented from again adhering, to the pipings 2.

8. 发明专利

JPH11191548A TREATMENT APPARATUS 失效
公开(公告)号：JPH11191548A
公开(公告)日：1999-07-13
申请号：JP35966197
申请日：1997-12-26
申请人： NOMURA MICRO SCIENCE KK , NISSO ENGINEERING KK
发明人： OTA YOSHIHARU , SUGIYAMA ISAMU , YONETANI AKIRA
IPC分类号： B08B15/02 , B08B3/08 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To obtain a treatment apparatus which prevents an atmosphere inside a clean draft from being contaminated with various generated gases, by a method wherein a substrate which is immersed in an immersion tank is housed so as to be exposed through a second opening which can be brought into close contact with a first opening, and an enclosure which is provided with a circulation pipe into which a gas is made to flow is arranged and installed in a region in which the substrate is housed. SOLUTION: An air which is highly purified is introduced from a ventilation pipe 19, and it is always sucked from a ventilation pipe 20. When an enclosure 13 and an enclosure 15 are united, a cleaning solution (an aqueous cleaning solution composed of ammonium hydroxide and of hydrogen peroxide) is introduced into an immersion tank 11. After a silicon wafer 9 is cleaned, the cleaning solution is discharged from the same conveyance system. As a result, an atmosphere in an environment in which a treatment apparatus is arranged and installed is not contaminated with ammonia when the silicon wafer 9 is cleaned. In this execution state, a shielding plate 36 and a shielding plate 37 which can be opened and shut are installed at an opening 16 of the enclosure 13 and at an opening 17 of the enclosure 15. As a result, the productivity and the economy of the silicon wafer 9 can be enhanced.

9. 发明专利

JPH06130007A ANALYZING AND DETERMINING METHOD FOR NOVOLATILE IMPURITY IN ULTRA-PURE WATER 失效
公开(公告)号：JPH06130007A
公开(公告)日：1994-05-13
申请号：JP1690892
申请日：1992-01-31
申请人： NOMURA MICRO SCIENCE KK , NIPPON CHEMICAL IND
发明人： MIZUTA TAKASHI , SUGIYAMA ISAMU
IPC分类号： G01N1/28 , G01N23/227 , G01N33/18
摘要： PURPOSE:To analyze and determine constituents and concentration with improved sensitivity and accuracy by condensing an extremely small amount of nonvolatile impurity in ultra-pure water without being affected by contamination from the surrounding. CONSTITUTION:Ultra-pure water 1 sampled continuously from a supply line 8 is supplied to an atomizer quantitatively and is atomized into a clean air 2 to become multiple dispersion liquid drops 3. Then, the generated liquid drops 3 are sent to an evaporation drying pipe 6 and water contents are evaporated completely by a clean hot air 5 at a high temperature (120 deg.C) in the pipe, thus causing a non-volatile impurity which is a residue after evaporation to become a dried particle 7. Then, after the dried particle 7 is captured by a membrane filter installed at the exit of the evaporation drying pipe 6, the surface of the membrane filter capturing he dried particle 7 is subjected to spectral analysis using a spectral analyzer such as a scanning micro auger electron spectroscope, thus analyzing and determining the constituent of non-volatile impurities in ultra-pure water.

10. 发明专利

JP2005079138A Draft chamber and cleaning device 审中-公开
标题翻译：厨房和清洁装置
公开(公告)号：JP2005079138A
公开(公告)日：2005-03-24
申请号：JP2003304408
申请日：2003-08-28
申请人： Nichias Corp , Nomura Micro Sci Co Ltd , Tadahiro Omi , Taisei Corp , Tokyo Electron Ltd , ニチアス株式会社 , 大成建設株式会社 , 忠弘大見 , 東京エレクトロン株式会社 , 野村マイクロ・サイエンス株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KOBAYASHI SADAO , TERADA ISAO , MINOBE SATOSHI , OKABE TOSHIHISA , MORI NAOKI , ITO HIROSHI , WAKAYAMA YOSHIHIDE , SUENAGA OSAMU , KOGURE MASAHIKO , SUGIYAMA ISAMU
IPC分类号： H01L21/306 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a draft chamber that can clean exhaust from a draft chamber body and has high energy efficiency, without discharging harmful gas inside a clean room. SOLUTION: In the draft chamber having the draft chamber body, and a gas-liquid contacting apparatus connected to the exhaust section of the draft chamber body, the gas-liquid contacting apparatus uses an oblique honeycomb. A cleaning device comprises a turntable that uses the draft chamber and places an object to be treated in a treatment chamber for rotation, and a nozzle for supplying a chemical liquid to the object to be treated. COPYRIGHT: (C)2005,JPO&NCIPI

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