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1. 发明专利

DE60028634T2 未知
公开(公告)号：DE60028634T2
公开(公告)日：2007-05-31
申请号：DE60028634
申请日：2000-03-17
申请人： ORGANO CORP , KURITA WATER IND LTD , NOMURA MICRO SCIENCE KK , OHMI TADAHIRO , HITACHI PLANT TECHNOLOGIES LTD , KUMAGAI GUMI CO LTD , TAISEI CORP
发明人： IMAOKA TAKASHI , HIROSHI MORITA , SUGIYAMA ISAMU , TADAHIRO OHMI , HIRAYAMA MASAKI
IPC分类号： C02F1/20 , C02F1/70 , C02F5/00 , C09K5/08 , F28F19/00

2. 发明专利

DE60028634D1 未知
公开(公告)号：DE60028634D1
公开(公告)日：2006-07-27
申请号：DE60028634
申请日：2000-03-17
申请人： ORGANO CORP , KURITA WATER IND LTD , NOMURA MICRO SCIENCE KK , OHMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , TAKASAGO THERMAL ENGINEERING
发明人： IMAOKA TAKASHI , HIROSHI MORITA , SUGIYAMA ISAMU , TADAHIRO OHMI , HIRAYAMA MASAKI
IPC分类号： C02F1/20 , C02F1/70 , C02F5/00 , C09K5/08 , F28F19/00

3. 发明专利

JP2000336351A WATER FOR HEAT EXCHANGE AND DEVICE FOR SUPPLYING THE SAME 失效
公开(公告)号：JP2000336351A
公开(公告)日：2000-12-05
申请号：JP33966599
申请日：1999-11-30
申请人： ORGANO KK , KURITA WATER IND LTD , NOMURA MICRO SCIENCE KK , OMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , TAKASAGO THERMAL ENGINEERING
发明人： IMAOKA TAKAYUKI , MORITA HIROSHI , SUGIYAMA ISAMU , OMI TADAHIRO , HIRAYAMA MASAKI
IPC分类号： C02F1/20 , C02F1/70 , C02F5/00 , C09K5/08 , F28F19/00
摘要： PROBLEM TO BE SOLVED: To obtain water which is used for heat exchange, can prevent the oxidative deterioration of a piping for supplying/circulating the water for the heat exchange or the oxidative deterioration of metal materials in the liquid contact portion of the heat exchanger, and can further control the proliferation of algae and microorganisms, by using specific reducing water as the water for heat exchange. SOLUTION: This water for exchanging the heat of a material to be subjected to the heat exchange, such as a machine installation, air or a liquid, comprises reducing water whose standard oxidation-reduction potential is zero or negative, when a standard hydrogen electrode is used as a standard electrode. The reducing water preferably comprises hydrogen- dissolved water obtained by dissolving hydrogen gas in water, and preferably has a standard oxidation-reduction potential of =>0.1 mg/L. The reducing water also preferably comprises water obtained by dissolving a reducing agent in deaerated water, and has a standard oxidation-reduction potential of =3 mg/L. Thereby, water which is used for heat exchange and can highly efficiently be subjected to a heat exchange with a material whose heat is exchanged can be expected.

4. 发明公开

EP1221576A4 HIGH-EFFICIENCY GAS TEMPERATURE/HUMIDITY CONTROLLING DEVICE AND CONTROLLING METHOD 审中-公开
标题翻译：一种用于控制气体微水/气体温度和过程控制
公开(公告)号：EP1221576A4
公开(公告)日：2007-05-23
申请号：EP00957088
申请日：2000-09-11
申请人： HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , OHMI TADAHIRO
发明人： OHMI TADAHIRO , SHIRAI YASUYUKI , HIRAYAMA MASAKI , HANAOKA HIDEO , HONMA TAKESHI , SUZUKI HIROKAZU , YAMAZAKI YOSHIO , OHKUBO YOSHINORI
IPC分类号： F24F1/00 , F24F3/14 , F24F13/22 , F25D21/14
CPC分类号： F24F13/222 , F24F11/41 , F25D21/14
摘要： The present invention has an object to comprise an apparatus for high efficiency gas temperature and humidity adjustment and an adjustment method allowing to elevate the heat exchange efficiency of a cooling coil, reduce the cooling water quantity, lower also the pipe arrangement diameter and water supply pump power, making possible to cut the initial cost and running cost of the air-conditioning system. The apparatus for high efficiency gas temperature and humidity adjustment is characterized by that means for removing condensate water deposited on the cooling coil.

5. 发明专利

JP2001241818A HIGH EFFICIENT DEVICE COOLING SYSTEM AND COOLING METHOD 失效
公开(公告)号：JP2001241818A
公开(公告)日：2001-09-07
申请号：JP2000049933
申请日：2000-02-25
申请人： OMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , TAKASAGO THERMAL ENGINEERING
发明人： OMI TADAHIRO , HIRAYAMA MASAKI , SHIRAI YASUYUKI , HANAOKA HIDEO , SUZUKI HIROKAZU , YAMAZAKI YOSHIO , OKUBO YOSHINORI
IPC分类号： F25D17/02 , C02F1/20 , C02F5/08 , F25D9/00
摘要： PROBLEM TO BE SOLVED: To provide an energy saving type high efficient device cooling system and a cooling method in which the cooling system is made compact in size. SOLUTION: Each of a plurality of cooled items 111a, 111b and 111c is divided into groups 102, 103 and 104 for every cooling temperature regions. There is provided each of independent primary cooling water supplying pipes 110a, 110b and 110c for every group. Each of the primary cooling water supplying pipes is provided with heat exchangers 108a, 108b, 108c. A secondary cooling water supplying pipe 107 separate from the primary cooling water supplying pipe is arranged to pass in sequence through each of heat exchangers in an order of low temperature in the cooling temperature region.

6. 发明专利

JP2001147096A APPARATUS AND METHOD FOR HIGHLY EFFICIENTLY CONTROLLING TEMPERATURE AND HUMIDITY OF GAS 失效
公开(公告)号：JP2001147096A
公开(公告)日：2001-05-29
申请号：JP2000275584
申请日：2000-09-11
申请人： OMI TADAHIRO , HITACHI PLANT ENG & CONSTR CO , KUMAGAI GUMI CO LTD , TAISEI CORP , TAKASAGO THERMAL ENGINEERING
发明人： OMI TADAHIRO , HIRAYAMA MASAKI , SHIRAI YASUYUKI , HANAOKA HIDEO , HONMA TAKESHI , SUZUKI HIROKAZU , YAMAZAKI YOSHIO , OKUBO YOSHINORI
IPC分类号： F24F13/22 , F28F13/18 , F28F17/00
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method of highly efficiently controlling gas temperature and humidity, in which a heat exchange efficiency of a cooling coil can be increased, an amount of the cooling water amount can be reduced, a piping diameter, and a power of a water-supply pump can also be reduced, and the initial cost, and the running cost for the air conditioning system can be reduced. SOLUTION: This apparatus for highly efficiently controlling temperature and humidity of gas is equipped with a means for removing condensate attached on the cooling coil to improve the efficiency of the heat exchange of the coil.

7. 发明申请

WO2009151009A3 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体加工设备
公开(公告)号：WO2009151009A3
公开(公告)日：2010-01-28
申请号：PCT/JP2009060345
申请日：2009-06-05
申请人： TOKYO ELECTRON LTD , UNIV TOHOKU , HIRAYAMA MASAKI , OHMI TADAHIRO
发明人： HIRAYAMA MASAKI , OHMI TADAHIRO
IPC分类号： H05H1/46 , H01L21/265 , H01L21/3065 , H01L21/31
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/3222 , H01J37/32238
摘要： The objective is to improve the processing uniformity for a substrate. Disclosed is a plasma processing apparatus equipped with a metallic processing chamber (4) which houses a substrate (G) being processed with plasma, an electromagnetic source (85) which supplies the electromagnetic waves required to excite a plasma in processing chamber (4), and multiple dielectric bodies (25), which transmit the electromagnetic waves supplied by electromagnetic source (85) into the interior of processing chamber (85) and a portion of which are exposed to the interior of processing chamber (4), on the underside of the cover (3) of processing chamber (4). A metal electrode (27) which is electrically connected to the cover (3) is provided on the underside of the dielectric bodies (25). The portion of dielectric bodies (25) exposed between metal electrode (27) and cover (3) form an essentially polygonal shape when viewed from the interior of processing chamber (4). In addition, the multiple dielectric bodies (25) are disposed with the apex angles of the polygonal shapes adjacent to each other, and surface wave propagation parts which propagate electromagnetic waves are arranged on the underside of cover (3) and the underside of metal electrode (27) exposed to the interior of processing chamber (4).
摘要翻译：目的是提高基材的加工均匀性。公开了一种配备有容纳用等离子体处理的基板（G）的金属处理室（4）的等离子体处理装置，提供在处理室（4）中激发等离子体所需的电磁波的电磁源（85）以及多个电介质体（25），其将由电磁源（85）提供的电磁波传送到处理室（85）的内部并且其一部分暴露于处理室（4）的内部，位于处理室（4）的盖（3）。在电介质体（25）的下侧设置与盖（3）电连接的金属电极（27）。当从处理室（4）的内部观察时，暴露在金属电极（27）和盖（3）之间的电介质体（25）的部分形成基本上多边形的形状。此外，多个电介质体（25）以多边形的顶角彼此相邻地设置，并且传播电磁波的表面波传播部分布置在盖（3）的下侧和金属电极的下侧（27）暴露于处理室（4）的内部。

8. 发明专利

DE60013934T2 未知
公开(公告)号：DE60013934T2
公开(公告)日：2005-09-22
申请号：DE60013934
申请日：2000-02-25
申请人： OHMI TADAHIRO , CANON KK
发明人： OHMI TADAHIRO , SUZUKI NOBUMASA , SHINOHARA TOSHIKUNI , OHSAWA HIROSHI , HIRAYAMA MASAKI , TANAKA NOBUYOSHI
IPC分类号： H01L21/027 , G03F7/20 , H01S3/03 , H01S3/0973 , H01S3/0975 , H01S3/225
摘要： In a slot array structure, electromagnetic wave emission which is uniform as a whole over the length of a laser tube is realized to allow uniform laser emission with minimum energy loss. Slots (10) are formed at a predetermined pitch in a long end face (H plane) of each waveguide (1) along a central line (m) in the longitudinal direction of the H plane to be alternately located on the left and right sides of the central line (m) and spaced apart from the central line (m) by a distance (d).

9. 发明专利

DE60013934D1 未知
公开(公告)号：DE60013934D1
公开(公告)日：2004-10-28
申请号：DE60013934
申请日：2000-02-25
申请人： OHMI TADAHIRO , CANON KK
发明人： OHMI TADAHIRO , SUZUKI NOBUMASA , SHINOHARA TOSHIKUNI , OHSAWA HIROSHI , HIRAYAMA MASAKI , TANAKA NOBUYOSHI
IPC分类号： H01L21/027 , G03F7/20 , H01S3/03 , H01S3/0973 , H01S3/0975 , H01S3/225
摘要： In a slot array structure, electromagnetic wave emission which is uniform as a whole over the length of a laser tube is realized to allow uniform laser emission with minimum energy loss. Slots (10) are formed at a predetermined pitch in a long end face (H plane) of each waveguide (1) along a central line (m) in the longitudinal direction of the H plane to be alternately located on the left and right sides of the central line (m) and spaced apart from the central line (m) by a distance (d).

10. 发明专利

DE60011322D1 未知
公开(公告)号：DE60011322D1
公开(公告)日：2004-07-15
申请号：DE60011322
申请日：2000-02-25
申请人： OHMI TADAHIRO , CANON KK
发明人： OHMI TADAHIRO , SUZUKI NOBUMASA , SHINOHARA TOSHIKUNI , OHSAWA HIROSHI , HIRAYAMA MASAKI , TANAKA NOBUYOSHI
IPC分类号： H01L21/027 , G03F7/20 , H01S3/03 , H01S3/0973 , H01S3/0975 , H01S3/225

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