专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2014140826A Ultrapure water production method 有权
标题翻译：超声水生产方法
公开(公告)号：JP2014140826A
公开(公告)日：2014-08-07
申请号：JP2013011832
申请日：2013-01-25
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： NOGUCHI YUKIO
IPC分类号： C02F9/00 , B01D61/14 , B01J20/02 , B01J20/06 , C01B5/00 , C02F1/32 , C02F1/42 , C02F1/44 , C02F1/70
摘要： PROBLEM TO BE SOLVED: To provide an ultrapure water production method that enables ultrapure water with lower hydrogen peroxide concentration and lower dissolved oxygen concentration to be produced, and also enables the ultrapure water to be produced stably for the long term.SOLUTION: In an ultrapure water production method, primary pure water is fed to an ultraviolet oxidation device, and the outlet water of the ultraviolet oxidation device is brought into contact with a reducing resin and then a metal catalyst having hydrogen adsorption in this order.
摘要翻译：要解决的问题：提供一种超纯水生产方法，其能够生产具有较低的过氧化氢浓度和较低的溶解氧浓度的超纯水，并且还能够使长期稳定地生产超纯水。解决方案：在超纯水的制造方法中，将一次纯水供给至紫外线氧化装置，使紫外线氧化装置的出口水与还原性树脂接触，然后与依次吸氢的金属催化剂接触。

2. 发明专利

JP2014094350A Vacuum deaeration apparatus 审中-公开
标题翻译：真空装置
公开(公告)号：JP2014094350A
公开(公告)日：2014-05-22
申请号：JP2012247622
申请日：2012-11-09
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： YAMAMOTO KATSUMI
IPC分类号： C02F1/20
摘要： PROBLEM TO BE SOLVED: To provide a vacuum deaeration apparatus allowing reduction of installation and apparatus costs in installing a vacuum deaeration apparatus.SOLUTION: A vacuum deaeration apparatus utilizing a water head pressure includes a deaeration tower body which is provided with a packed layer of a gas-liquid contact material in its gas-tight inside, supplies to-be-treated water from above the packed layer and discharges treated water from a treated water discharge outlet under the packed layer and also discharges the inside gas by evacuating means, a connection pipe discharging the treated water from the treated water discharge outlet and a treated water tank having a water level of stored water lower than the lower part of the packed layer by a height H corresponding to the height or higher at which the vacuum of the deaeration tower body is kept with respect to the atmospheric pressure, with the water level set constant above the lower end of the connection pipe.
摘要翻译：要解决的问题：提供一种能够减少安装真空脱气装置的安装和设备成本的真空脱气装置。解决方案：利用水头压力的真空脱气装置包括脱气塔体，该脱气塔体设置有在气密内部的气液接触材料，从填充层的上方供给待处理的水，并从经填充层的处理水出口排出处理水，并通过排气装置排出内部气体，连接将经处理的排水口排出的处理水和处理水箱的水位低于填充层的下部的处理水箱，高度为对应于脱气塔的真空高度的高度H 主体相对于大气压保持，水位设定在连接管下端的上方。

3. 发明专利

JP2013128870A Gas dissolved water producing apparatus and method thereof 有权
标题翻译：气体溶解水生产设备及其方法
公开(公告)号：JP2013128870A
公开(公告)日：2013-07-04
申请号：JP2011278394
申请日：2011-12-20
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： SAKUMA KOICHI , SHINOZAKI HIROYUKI , UENISHI MITSUHIKO
IPC分类号： B01F1/00 , B01F3/04 , B01F5/00 , B01F15/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a gas dissolved water producing apparatus in which gas solubility directly after the start of feed, and further, specific resistance value are stable even if an operation is intermittently performed.SOLUTION: The gas dissolved water producing apparatus 1 is provided with: a pure water feed pipe 3 of intermittently feeding pure water by a water feed valve 2; a gas dissolution part 4 connected with the pure water feed pipe 3 and inserted with a gas feed pipe 7; and a gas flow rate regulation apparatus 6 of regulating the feed amount of the gas; wherein the gas is injected into the pure water via the gas feed pipe 7 to produce gas dissolved water in which the gas is dissolved at a fixed concentration. The apparatus includes a controller 11 of stopping the injection of the gas upon the closing of the water feed valve 2, and making the setting of the feed amount of the gas to the setting in which the feed amount of the gas is larger than that in the ordinary case for a fixed time and thereafter making the setting into the setting in which the feed amount is ordinary upon the release of the water feed valve 2.
摘要翻译：要解决的问题：提供一种气体溶解水生产装置，其中气体溶解度直接在开始进料之后，而且即使间歇地进行操作，电阻值也是稳定的。解决方案：气体溶解水生成装置1是具有：通过给水阀2间歇地供给纯水的纯水供给管3; 与纯水供给管3连接并插入气体供给管7的气体溶解部4; 以及调节气体供给量的气体流量调节装置6。其中气体通过气体供给管7注入纯水中，以产生气体溶解的水，其中气体以固定浓度溶解。该装置包括控制器11，其在关闭给水阀2时停止气体的注入，并且使气体进料量的设定为气体进料量大于常规情况下固定时间，然后在进给阀2释放之后使设置进入进给量是普通的设置。

4. 发明专利

JP2013128869A Gas dissolved water producing apparatus and method thereof 有权
标题翻译：气体溶解水生产设备及其方法
公开(公告)号：JP2013128869A
公开(公告)日：2013-07-04
申请号：JP2011278393
申请日：2011-12-20
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： SAKUMA KOICHI , SHINOZAKI HIROYUKI , UENISHI MITSUHIKO
IPC分类号： B01F5/02 , B01F1/00 , B01F3/04 , B01F15/02 , C02F1/68
摘要： PROBLEM TO BE SOLVED: To provide an apparatus which perfectly dissolves a gas fed to pure water of a small flow rate, and produces gas dissolved water having a stable specific resistance value of ≤1 MΩ cm.SOLUTION: In the gas dissolved water producing apparatus 11, a gas is injected into a pure water inflow pipe of feeding pure water to produce gas dissolved water in which the gas is dissolved at a fixed concentration. The apparatus includes: a T-type conduit 12; a gas feed pipe 15 which is inserted from one socket of the T-type conduit to the position of the center of a T-type joining part and in which a base part is sealed; a pure water inflow pipe 13 of feeding pure water vertically in a direction to be fed with the gas from the other one socket of the T-type conduit; and a pure water outflow pipe 14 composed of a first pure water outflow pipe 14a connected to one socket not provided by both of the gas feed pipe 15 and pure water inflow pipe 13 of the T-type conduit, and the second pure water outflow pipe 14c connected to the downstream of the first pure water outflow pipe 14a.
摘要翻译：要解决的问题：提供一种完全溶解供给到小流量的纯水的气体的装置，并产生具有稳定的电阻率值≤1M＆OHgr的气体溶解水; cm。解决方案：在气体溶解水生成装置11中，将气体注入纯水供给纯水的流入管中，生成气体以固定浓度溶解的溶解水。该装置包括：T型导管12; 从T型导管的一个插座插入到T型接合部的中心的位置并且密封有基部的气体供给管15; 纯水进入管13，其从与T型导管的另一个插座供给气体的方向垂直地供给纯水; 以及与由T型导管的气体供给管15和纯水流入管13两者不设置的一个插座连接的第一纯水流出管14a构成的纯水流出管14，以及第二纯水流出管 14c连接到第一纯水流出管14a的下游。

5. 发明专利

JP2011147911A Purified water producing method and purified water producing apparatus 有权
标题翻译：纯化水生产方法和纯化水生产设备
公开(公告)号：JP2011147911A
公开(公告)日：2011-08-04
申请号：JP2010013049
申请日：2010-01-25
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： AMAYA TORU , NUNOME ATSUSHI , ABE TOSHIKAZU
IPC分类号： C02F1/44 , A61L2/04 , A61L2/26 , B01D61/02 , B01D61/44 , B01D61/48 , B01D65/02 , C02F1/02 , C02F1/28 , C02F1/42 , C02F1/469 , C02F9/00
摘要： PROBLEM TO BE SOLVED: To provide a producing method and a producing apparatus capable of producing purified water easily and at low cost.
SOLUTION: After being supplied from a storage tank to at least either an inactive processing means or a reverse osmosis processing device, non-heated raw water is supplied to a heating means to produce hot water. Then, the hot water is provided to the discharge side of the storage tank, and at the same time, sterilization of the system is carried out by circulating the hot water inside the system including at least the reverse osmosis processing device. Thereafter, the non-heated raw water is provided from the storage tank to at least the reverse osmosis processing device to produce the purified water.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供能够容易且低成本地生产净化水的制造方法和制造装置。解决方案：在从储罐供给到至少一种非活性处理装置或反渗透处理装置之后，将未加热的原水供应到加热装置以产生热水。然后，将热水提供到储罐的排放侧，同时通过使包括至少反渗透处理装置的系统内的热水循环来进行系统的灭菌。此后，从储罐向至少反渗透处理装置提供未加热的原水，以产生净化水。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2011103355A Method for cleaning wafer 审中-公开
标题翻译：清洗方法
公开(公告)号：JP2011103355A
公开(公告)日：2011-05-26
申请号：JP2009257427
申请日：2009-11-10
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： SAKUMA KOICHI , YANAGI MOTONORI , SAHO TOMOHIDE
IPC分类号： H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for easily removing a resist film formed on a surface of the wafer inexpensively.
SOLUTION: A plurality of wafers each having a resist film formed on a surface are arranged parallel with prescribed intervals, and ozone water is supplied into a cleaning tank. Then upward and downward streams of the ozone water are formed in the cleaning tank along surfaces of the wafers to clean the wafers by removing the resist films. Then the ozone water after the cleaning is discharged.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种便利地去除在晶片表面上形成的抗蚀剂膜的方法和装置。解决方案：具有形成在表面上的抗蚀剂膜的多个晶片以规定的间隔平行布置，臭氧水被供应到清洗槽中。然后在清洁槽中沿着晶片的表面形成臭氧水的向上和向下的流，以通过除去抗蚀剂膜来清洁晶片。然后清洁后的臭氧水排出。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2011051833A Method for purification of alkaline aqueous solution 审中-公开
标题翻译：碱性水溶液的净化方法
公开(公告)号：JP2011051833A
公开(公告)日：2011-03-17
申请号：JP2009202257
申请日：2009-09-02
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： IIYAMA MASAMITSU , NAKANO KAZUNORI
IPC分类号： C01D1/32
摘要： PROBLEM TO BE SOLVED: To provide a method for purification of an alkaline aqueous solution, which can remove metal impurities contained in an alkaline solution simply at a high rate, and sufficiently reduce residual metal impurities.
SOLUTION: The metal impurities are removed from the alkaline aqueous solution by making the alkaline aqueous solution containing metal impurities contact with a material to which at least either one selected from a N-methyl-glucamine group reacting as a chelating material to a fiber base material and an iminodiethanol group reacting as a weakly anion exchanger and a chelating material is introduced.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种碱性水溶液的纯化方法，其可以简单地高速地除去碱溶液中所含的金属杂质，并充分降低残留的金属杂质。解决方案：通过使含有金属杂质的碱性水溶液与选自N-甲基 - 葡糖胺基团中的至少一种作为螯合材料反应的材料与碱性水溶液中的金属杂质相接触，纤维基材和作为弱阴离子交换剂反应的亚氨基二乙醇基团和螯合材料。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2010156619A Pretreatment method and pretreatment apparatus for metal analysis 审中-公开
标题翻译：金属分析预处理方法与预处理装置
公开(公告)号：JP2010156619A
公开(公告)日：2010-07-15
申请号：JP2008335316
申请日：2008-12-26
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： IIYAMA MASAMITSU , KOSAKA KENGO
IPC分类号： G01N1/10 , B01D15/00 , B01J45/00 , B01J49/00 , C02F1/28 , C02F1/42 , C02F1/44
摘要： PROBLEM TO BE SOLVED: To provide a pretreatment method for metal analysis, measuring a metal concentration more easily, safely and accurately without any interruption of a metal analysis by a silicon component. SOLUTION: A pretreatment apparatus for metal analysis 1 and the pretreatment method using the same has: a pH adjustment means 2 for adding acid to an alkali solution sampled from an alkali solution tank 50 housing the alkali solution containing the silicon component; a solid phase extraction means 3 capable of bringing a solution pH-adjusted by the pH adjustment means 2 into contact with a chelate resin or a chelate fiber to eliminate a metal from the solution; an alkali cleaning means 4 for supplying an alkali cleaning liquid to the solid phase extraction means 3, which has captured the metal, to clean the chelate resin or the chelate fiber; and a metal eluting means 5 for supplying an eluting agent to the alkali-cleaned chelate resin or chelate fiber to elute the metal from the solid phase. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供金属分析的预处理方法，更容易，安全，准确地测量金属浓度，而不会中断通过硅组分的金属分析。解决方案：用于金属分析的预处理装置1及其预处理方法具有：pH调节装置2，用于向容纳含有硅成分的碱溶液的碱性溶液罐50取样的碱溶液中添加酸; 固相萃取装置3，其能够使由pH调节装置2 pH调节的溶液与螯合树脂或螯合纤维接触以从溶液中除去金属; 用于向已经捕获金属的固相萃取装置3供给碱性清洗液以清洁螯合树脂或螯合纤维的碱性清洗装置4; 以及金属洗脱装置5，用于向碱洗净的螯合树脂或螯合纤维提供洗脱剂，以从固相中洗脱金属。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2009250746A Electrode for electrochemical sensor, electrochemical sensor, electrochemical detector and electrochemical detection method 审中-公开
标题翻译：电化学传感器电极，电化学传感器，电化学检测器和电化学检测方法
公开(公告)号：JP2009250746A
公开(公告)日：2009-10-29
申请号：JP2008097991
申请日：2008-04-04
申请人： Nomura Micro Sci Co Ltd , 野村マイクロ・サイエンス株式会社
发明人： MIZUGUCHI HITOSHI , HAMADA TOMOKO , FUSE AZUMI , IIYAMA MASAMITSU
IPC分类号： G01N27/30 , G01N27/28 , G01N27/48
摘要： PROBLEM TO BE SOLVED: To provide an electrochemical sensor capable of detecting that a detection target is contained while keeping conventional detection sensitivity and made possible to especially detect even a chemically unstable reaction intermediate, an electrochemical detector and an electrochemical detection method.
SOLUTION: The electrochemical detector 21 has: the electrochemical sensor 11 constituted by superposing an electrode 11A for the electrochemical sensor for an acting pole, wherein a conductive membrane is formed on the surface of a filter film having pore passages each of which is formed into a cylindrical shape, straight and has a uniform pore diameter, and an electrode 11B for the electrochemical sensor for a counter pole, wherein the conductive membrane is formed on the surface of the filter film having pore passages each of which is formed into the cylindrical shape, straight and has the uniform pore diameter, one upon another so as not to short-circuit both electrodes; a potential control means 22 for making the potential difference between the acting pole and the counter pole constant; and a current measuring means 23 for measuring the change of a current value caused by the oxidation or reduction of the detection target in the electrodes of the electrochemical sensor.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够检测检测对象被包含在同时保持常规检测灵敏度的电化学传感器，并且使得甚至可以特别地检测化学不稳定的反应中间体，电化学检测器和电化学检测方法。电解质检测器21具有电化学传感器11，该电化学传感器11通过叠加用于作用极的电化学传感器的电极11A构成，其中导电膜形成在具有孔通道的过滤膜的表面上，形成为圆柱形，直径均匀的孔径，以及用于对电极的电化学传感器的电极11B，其中导电膜形成在具有孔通道的过滤膜的表面上，每个孔形成为圆柱形，直的并具有均匀的孔径，一个接一个地使两个电极不短路; 用于使作用极和对极之间的电位差恒定的电位控制装置22; 以及电流测量装置23，用于测量由电化学传感器的电极中的检测对象的氧化或还原引起的电流值的变化。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2009233548A Water treatment apparatus and method 有权
标题翻译：水处理设备和方法
公开(公告)号：JP2009233548A
公开(公告)日：2009-10-15
申请号：JP2008081644
申请日：2008-03-26
申请人： Nomura Micro Sci Co Ltd , Sharp Corp , シャープ株式会社 , 野村マイクロ・サイエンス株式会社
发明人： YAMAZAKI KAZUYUKI , NAKAJO KAZUMI , IWATA KOJI , AIZAWA TOMIO , TOKUYASU MASAHIKO
IPC分类号： C02F3/08 , B01D63/02 , C02F1/44 , C02F3/10 , C02F3/20 , C02F3/30
CPC分类号： Y02W10/15
摘要： PROBLEM TO BE SOLVED: To provide a water treatment technology which can efficiently clean a filter for filtering treated water. SOLUTION: A water treatment apparatus is used which includes a bubble generating means (a bubble generating portion 42) which generates micro-nano bubbles or nanobubbles in the treated water, a treatment tank (a second tank 15) into which the treated water after generating the micro-nano bubbles or nanobubbles is introduced, carriers 16 which have pores, are made of polyvinyl alcohol, and provided contactably with the treated water introduced into the treatment tank, a filter 25 which is installed in the treatment tank and filters the treated water in the treatment tank to prepare water to be treated, and a fluidizing means (a second aeration means 19 and a submerged agitator 58) which is installed in the treatment tank and fluidizes the carriers 16 so that the carriers 16 flow while contacting the filter 25. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供可以有效地清洁用于过滤处理水的过滤器的水处理技术。解决方案：使用水处理装置，其包括在处理水中产生微纳米气泡或纳米气泡的气泡生成装置（气泡产生部分42），处理槽（第二罐15）引入产生微纳米气泡或纳米气泡之后的水，具有孔隙的载体16由聚乙烯醇制成，并且与被引入处理槽的经处理的水接触地提供，安装在处理槽中的过滤器25和过滤器处理槽中的处理水以制备待处理的水，以及流化装置（第二曝气装置19和浸没搅拌器58），其安装在处理槽中并使载体16流化，使得载体16在接触的同时流动过滤器25.版权所有（C）2010，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式