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    • 4. 发明申请
    • APPARATUS AND METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
    • 用于使用散射检测来检测重叠错误的装置和方法
    • WO2004076963A2
    • 2004-09-10
    • PCT/US2004/005419
    • 2004-02-23
    • KLA-TENCOR TECHNOLOGIES CORPORATIONMIEHER, Walter, D.LEVY, AdyGOLOVANEVSKY, BorisFRIEDMANN, MichaelSMITH, IanADEL, MichaelFABRIKANT, AnatolyBEVIS, Christopher, F.FIELDEN, JohnBAREKET, NoahGROSS, KenZALICKI, PiotrWACK, DanDECECCO, PaolaDZIURA, Thaddeus, G.GHINOVKER, Mark
    • MIEHER, Walter, D.LEVY, AdyGOLOVANEVSKY, BorisFRIEDMANN, MichaelSMITH, IanADEL, MichaelFABRIKANT, AnatolyBEVIS, Christopher, F.FIELDEN, JohnBAREKET, NoahGROSS, KenZALICKI, PiotrWACK, DanDECECCO, PaolaDZIURA, Thaddeus, G.GHINOVKER, Mark
    • G01B
    • G03F9/7088G01N21/956G01N2021/213G03F7/70625G03F7/70633G03F7/70683G03F9/7049G03F9/7084
    • Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatus: an imaging reflectometer, an imaging spectroscopic reflectometer, a polarized spectroscopic imaging reflectometer, a scanning reflectometer system, a system with two or more reflectometers capable of parallel data acquisition, a system with two or more spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the reflectometer stage, imaging spectrometers, imaging system with wavelength filter, imaging system with long-pass wavelength filter, imaging system with short-pass wavelength filter, imaging system without wavelength filter, interferometric imaging system, imaging ellipsometer, a spectroscopic ellipsometer, a laser ellipsometer having a photoelastic modulator, an imaging spectroscopic ellipsometer, a scanning ellipsometer system, a system with two or more ellipsometers capable of parallel data acquisition, a system with two or more ellipsometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the ellipsometer stage, a Michelson interferometer, and a Mach-Zehnder interferometer, a Sagnac interferometer, a scanning angle of incidence system, a scanning azimuth angle system, a +/- first order differential reflectometer, a +/- first order differential polarized reflectometer.
    • 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标,采用光学系统,从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号,在第一和第二结构之间确定覆盖误差。 光学系统包括以下装置中的任何一个或多个:成像反射计,成像光谱反射计,偏振光谱成像反射计,扫描反射计系统,具有两个或更多个能够并行数据采集的反射计的系统,具有两个 具有能够并行数据采集的两个或更多个偏振分光反射计的系统,具有两个或更多个偏振光谱反射计的系统,其能够进行串行数据采集而不移动晶片台或移动任何光学元件或 反射计阶段,成像光谱仪,波长滤波器成像系统,长波长滤波器成像系统,短波长滤波器成像系统,无波长滤波器成像系统,干涉成像系统,成像椭偏仪,光谱椭偏仪,激光 椭偏仪具有 光弹性调制器,成像光谱椭偏仪,扫描椭偏仪系统,具有能够并行数据采集的两个或更多个椭偏仪的系统,具有两个或更多个椭圆计的系统,能够进行串行数据采集而不移动晶片台或移动任何光学元件或 椭圆偏振台,迈克尔逊干涉仪和马赫 - 策德尔干涉仪,Sagnac干涉仪,入射系统的扫描角度,扫描方位角系统,+/-一阶微分反射计,+/-一阶差分偏振反射计 。
    • 5. 发明申请
    • SUBSTRATE PROCESSING APPARATUS AND METHOD
    • 基板处理装置和方法
    • WO2008077048A2
    • 2008-06-26
    • PCT/US2007/087953
    • 2007-12-18
    • KLA-TENCOR CORPORATIONZYWNO, MarekBAREKET, Noah
    • ZYWNO, MarekBAREKET, Noah
    • G03F7/20F16C39/06G01N21/95H01L21/68
    • G03F7/70775F16C32/044G01N21/9501G03F7/704G03F7/70733G03F7/70816H01L21/67265H01L21/68714H01L21/68771
    • Substrate processing methods and apparatus are disclosed. In some embodiments a substrate processing apparatus may comprise a support structure and a moveable stage including first and second stages. The moveable stage has one or more maglev units attached to the first stage and/or second stage proximate an edge of the first stage. The first stage retains one or more substrates and moves with respect to a first axis that is substantially fixed with respect to the second stage. The second stage translates along a second axis with respect to the support structure. In other embodiments, a primary motor may maintain a rotary stage at an angular speed and/or accelerate or decelerate the stage from a first angular speed to a second angular speed. A secondary motor may accelerate the stage from rest to the first angular speed and/or decelerate the stage from a non-zero angular speed.
    • 公开了衬底处理方法和装置。 在一些实施例中,衬底处理设备可以包括支撑结构和包括第一和第二级的可移动台。 可移动平台具有一个或多个靠近第一平台的边缘附接到第一平台和/或第二平台的磁悬浮单元。 第一阶段保持一个或多个衬底并相对于基本上相对于第二阶段固定的第一轴线移动。 第二阶段相对于支撑结构沿第二轴线平移。 在其他实施例中,主电机可以以角速度保持旋转台和/或将台从第一角速度加速或减速至第二角速度。 辅助电机可以将舞台从静止状态加速到第一角速度和/或从非零角速度减速舞台。
    • 7. 发明申请
    • APPARATUS AND METHOD FOR MEASURING POSITION AND/OR MOTION USING SURFACE MICRO-STRUCTURE
    • 使用表面微结构测量位置和/或运动的装置和方法
    • WO2011056318A2
    • 2011-05-12
    • PCT/US2010/050045
    • 2010-09-23
    • KLA-TENCOR CORPORATIONUMMETHALA, UpendraBAREKET, NoahBEVIS, Christopher
    • UMMETHALA, UpendraBAREKET, NoahBEVIS, Christopher
    • G01B11/00H01L21/66
    • G01B11/0691B82Y10/00B82Y40/00G01P3/806H01J37/3174
    • One embodiment relates to a method in which a measuring apparatus is used to collect a first set of wave form data which depends on micro-structure of a moving surface. A correspondence is identified between the first set of wave form data and actual position data. Calibrated wave form data is stored which indicates said correspondence between the first set of wave form data and actual position data. In addition, the measuring apparatus may be used to collect a second set of wave form data which depends on micro-structure of the moving surface, a cross-correlation may be computed between the second set of wave form data and the calibrated wave form data. Another embodiment relates to an apparatus for measuring position and/or motion using surface micro-structure of a moving surface. Another embodiment relates to method for measuring motion using surface micro-structure. Other embodiments and features are also disclosed.
    • 一个实施例涉及一种方法,其中使用测量装置来收集取决于移动表面的微结构的第一组波形数据。 在第一组波形数据和实际位置数据之间识别对应关系。 校准波形数据被存储,其指示第一组波形数据与实际位置数据之间的所述对应关系。 另外,测量装置可以用于收集取决于运动表面的微结构的第二组波形数据,可以计算第二组波形数据与校准波形数据之间的互相关 。 另一个实施例涉及一种使用移动表面的表面微观结构来测量位置和/或运动的设备。 另一个实施例涉及使用表面微结构测量运动的方法。 其他实施例和特征也被公开。