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1. 发明授权

US06969305B2 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US06969305B2
公开(公告)日：2005-11-29
申请号：US10357473
申请日：2003-02-04
申请人： Norio Kimura , Tadakazu Sone , Tomohiko Akatsuka , Tatsuya Sasaki
发明人： Norio Kimura , Tadakazu Sone , Tomohiko Akatsuka , Tatsuya Sasaki
IPC分类号： B24B49/16 , B24B53/007 , B24B53/017 , B24B1/00
CPC分类号： B24B53/017 , B24B49/16
摘要： A polishing apparatus for polishing a substrate comprises a turntable having a polishing surface, a substrate holder for holding a substrate and bringing the substrate into contact under pressure with the polishing surface, a dresser including a dresser tool adapted to be brought into contact under a pressure with the polishing surface to dress or condition the polishing surface and a pressure device connected to the dresser for moving the dresser between a raised position where the dresser is spaced away from the polishing surface and a dressing position where the dresser rests on the polishing surface such that the dresser tool is in contact with the polishing surface under a pressure exerted by the weight of the dresser itself, the dresser comprising a follow-up mechanism allowing each one of dressing element to move up and down relative to a flange portion so as to follow a contour of the polishing surface of the turntable.
摘要翻译：用于抛光衬底的抛光装置包括具有抛光表面的转盘，用于保持衬底并使衬底在压力下与抛光表面接触的衬底保持器，包括修整器工具的修整器，其适于在压力下接触抛光表面用于打磨或调理抛光表面，以及连接到修整器的压力装置，用于在修整器与抛光表面间隔开的升高位置和修整器搁置在抛光表面上的修整位置之间移动修整器，修整器工具在由修整器本身的重量施加的压力下与抛光表面接触，该修整器包括随动装置，其允许每个修整元件相对于凸缘部分上下移动，以便遵循转盘抛光表面的轮廓。

2. 发明申请

US20050054267A1 Polishing method 审中-公开
标题翻译：抛光方法
公开(公告)号：US20050054267A1
公开(公告)日：2005-03-10
申请号：US10958248
申请日：2004-10-06
申请人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
发明人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
IPC分类号： B24B7/22 , B24B53/007 , B24B53/095 , H01L21/3105 , B24B49/00
CPC分类号： B24B53/017 , B24B7/228 , B24B53/095 , H01L21/31053
摘要： A wafer is pressed against a fixed abrasive and brought into sliding contact with the fixed abrasive. Thus, the wafer is polished. A surface of the fixed abrasive is dressed so as to generate free abrasive particles thereon. A liquid or a gas, composed of a mixture of liquid or inert gas and pure water or chemical liquid, is ejected onto the surface of the fixed abrasive during or after the dressing process.
摘要翻译：将晶片压靠固定的磨料并与固定的磨料滑动接触。因此，晶片被抛光。修整固定磨料的表面以在其上产生游离的磨料颗粒。由液体或惰性气体与纯水或化学液体的混合物组成的液体或气体在修整过程中或之后被喷射到固定磨料的表面上。

3. 发明授权

US06827633B2 Polishing method 有权
标题翻译：抛光方法
公开(公告)号：US06827633B2
公开(公告)日：2004-12-07
申请号：US10330189
申请日：2002-12-30
申请人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
发明人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B7/228 , B24B53/095 , H01L21/31053
摘要： A wafer is pressed against a fixed abrasive and brought into sliding contact with the fixed abrasive. Thus, the wafer is polished. A surface of the fixed abrasive is dressed so as to generate free abrasive particles thereon. A liquid or a gas, composed of a mixture of liquid or inert gas and pure water or chemical liquid, is ejected onto the surface of the fixed abrasive during or after the dressing process.
摘要翻译：将晶片压靠固定的磨料并与固定的磨料滑动接触。因此，晶片被抛光。修整固定磨料的表面以在其上产生游离的磨料颗粒。由液体或惰性气体与纯水或化学液体的混合物组成的液体或气体在修整过程中或之后被喷射到固定磨料的表面上。

4. 发明授权

US07108579B2 Method and device for polishing 失效
标题翻译：抛光方法和装置
公开(公告)号：US07108579B2
公开(公告)日：2006-09-19
申请号：US10485273
申请日：2003-02-20
申请人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
发明人： Yutaka Wada , Tomohiko Akatsuka , Tatsuya Sasaki
IPC分类号： B24B49/00 , B24B1/00
CPC分类号： B24B53/017 , B24B7/228 , B24B37/04 , B24B37/044 , B24B49/12 , B24B53/02 , C09G1/00 , H01L21/31053
摘要： The present invention relates to a polishing method for polishing a workpiece by pressing the workpiece, to be polished, against a fixed abrasive and bringing the workpiece into sliding contact with the fixed abrasive. The polishing method includes a first step of polishing the workpiece while supplying a polishing liquid which contains an anionic surface-active agent and does not contain abrasive particles, and a second step of polishing the workpiece while supplying a polishing liquid which contains a cationic surface-active agent and does not contain abrasive particles.
摘要翻译：抛光方法技术领域本发明涉及一种用于通过将待磨削的工件压在固定磨料上并使工件与固定磨料滑动接触来抛光工件的抛光方法。抛光方法包括：在提供含有阴离子表面活性剂并且不含磨料颗粒的抛光液的同时抛光工件的第一步骤;以及第二步骤，在提供包含阳离子表面活性剂的抛光液的同时抛光工件，活性剂，不含磨料颗粒。

5. 发明申请

US20050009456A1 Polishing apparatus 审中-公开
标题翻译：抛光设备
公开(公告)号：US20050009456A1
公开(公告)日：2005-01-13
申请号：US10491539
申请日：2002-11-01
申请人： Tatsuya Sasaki , Tomohiko Akatsuka , Kazuto Hirokawa
发明人： Tatsuya Sasaki , Tomohiko Akatsuka , Kazuto Hirokawa
IPC分类号： B24B37/24 , B24B5/00
CPC分类号： B24B37/245
摘要： A polishing apparatus polishes a workpiece such as a semiconductor wafer. The polishing apparatus comprises a table (30) which makes a motion, a base (20) placed on the table, a polishing tool (10) fixed to the base and having a polishing surface for polishing a surface of the workpiece (W), a plurality of transmission members (41) provided along a circumferential direction of the table, and a plurality of holes (22) formed in the base. The transmission members are inserted into the holes, respectively, for transmitting the motion of the table to the base.
摘要翻译：抛光装置抛光诸如半导体晶片的工件。抛光装置包括：移动台（30），放在工作台上的基座（20），固定到基座上的抛光工具（10），并具有用于抛光工件（W）表面的抛光表面; 沿台面的圆周方向设置的多个传动构件（41），以及形成在基座中的多个孔（22）。传输构件分别插入孔中，用于将工作台的运动传递到底座。

6. 发明授权

US09458849B2 Vane compressor that suppresses the wear at the tip of the vane 有权
标题翻译：叶片压缩机抑制叶片尖端的磨损
公开(公告)号：US09458849B2
公开(公告)日：2016-10-04
申请号：US14350937
申请日：2012-01-11
申请人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
发明人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
IPC分类号： F03C2/00 , F03C4/00 , F04C2/00 , F04C18/08 , F04C18/344 , F04C29/02 , F01C21/08 , F04C18/32 , F04C18/352 , F04C23/00
CPC分类号： F04C18/08 , F01C21/0809 , F01C21/0836 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C23/008 , F04C29/025 , F04C2240/603 , F04C2240/809
摘要： A gap between a vane tip and a cylinder inner circumferential surface is denoted by δ. If rv is set as in an Expression (1), a first vane rotates with the vane tip thereof being out of contact with the cylinder inner circumferential surface. In the vane compressor, wear at the tip of a vane is suppressed, loss due to sliding on bearings is reduced by supporting a rotating shaft portion with a small diameter, and accuracy in an outside diameter and center of rotation of a rotor portion is increased.
摘要翻译：叶片尖端和气缸内周面之间的间隙由δ表示。如果如式（1）那样设定rv，则第一叶片随其叶片端部与气缸内周面不接触而旋转。在叶片式压缩机中，抑制叶片尖端的磨损，通过支撑小直径的旋转轴部来减小由于轴承上的滑动造成的损失，并且转子部的外径和旋转中心的精度提高。

7. 发明授权

US09115716B2 Vane compressor with vane aligners 有权
标题翻译：叶片式压缩机
公开(公告)号：US09115716B2
公开(公告)日：2015-08-25
申请号：US13700634
申请日：2011-08-02
申请人： Shin Sekiya , Hideaki Maeyama , Shinichi Takahashi , Tetsuhide Yokoyama , Tatsuya Sasaki , Hideto Nakao , Hirotsugu Hayashi
发明人： Shin Sekiya , Hideaki Maeyama , Shinichi Takahashi , Masahiro Hayashi , Tetsuhide Yokoyama , Tatsuya Sasaki , Hideto Nakao
IPC分类号： F01C21/08 , F04C18/32 , F04C18/344 , F04C18/352 , F04C23/00 , F04C27/00
CPC分类号： F04C18/3442 , F01C21/0809 , F01C21/0836 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C23/008 , F04C27/001 , F04C2240/20
摘要： There is provided a vane compressor with a plurality of vanes having a structure in which a rotor portion and a rotary shaft are unitarily formed so as to reduce bearing sliding loss of the rotary shaft and reduce gas leakage loss by narrowing a space formed between the rotor portion and the inner peripheral surface of a cylinder. In the vane compressor with the plurality of vanes according to the present invention, an angle α of a circular arc constituting the partial ring shape of each vane aligner satisfies a relationship of [ Equation ⁢ ⁢ 9 ] ⁢ α
摘要翻译：提供了具有多个叶片的叶片式压缩机，其具有转子部分和旋转轴一体形成的结构，以便减少旋转轴的轴承滑动损失，并通过使形成在转子之间的空间变窄来减少气体泄漏损失部分和圆筒的内周面。在根据本发明的具有多个叶片的叶片式压缩机中，构成每个叶片对准器的部分环形的圆弧的角度α满足[等式9]α<2 tan -1 （1）其中R是每个衬套的旋转中心轴线和转子部分的旋转中心轴线之间的距离， e是圆筒的内周面的中心轴与转子部的旋转中心轴之间的距离，N（自然数为2以上）是叶片的数量。

8. 发明申请

US20110134498A1 Headup display device and method for controlling the same 有权
标题翻译：前置显示装置及其控制方法
公开(公告)号：US20110134498A1
公开(公告)日：2011-06-09
申请号：US12928020
申请日：2010-12-01
申请人： Kazuhide Ohta , Tatsuya Sasaki
发明人： Kazuhide Ohta , Tatsuya Sasaki
IPC分类号： G02B27/01 , G02B26/10
CPC分类号： G02B26/0816 , G02B7/1827 , G02B27/0093 , G02B27/01 , G02B2027/014 , G02B2027/0181
摘要： A reflection unit reflects an image indicated on an indicator and projects the image on a combiner to indicate a virtual image of the image at a position viewable for a user. A stepping motor rotates the reflection unit to move the virtual image continuously in a predetermined section of the combiner. A control unit controls a driving power of the stepping motor such that a smoothness parameter becomes less than a predetermined value. The smoothness parameter is defined by a division of a difference between the maximum speed of the virtual image and an average speed of the virtual image, when the virtual image moves continuously in the predetermined section, by the average speed.
摘要翻译：反射单元反映指示符上指示的图像，并将图像投影在组合器上，以在可以为用户可见的位置处指示图像的虚拟图像。步进电机旋转反射单元以在组合器的预定部分中连续移动虚像。控制单元控制步进电动机的驱动力，使得平滑度参数变得小于预定值。平滑度参数是通过虚拟图像的最大速度与虚拟图像的平均速度之间的差的除法来定义的，当虚拟图像在预定部分中连续移动平均速度时。

9. 发明申请

US20100200863A1 ELECTRODE STRUCTURE, SEMICONDUCTOR DEVICE, AND METHODS FOR MANUFACTURING THOSE 审中-公开
标题翻译：电极结构，半导体器件及其制造方法
公开(公告)号：US20100200863A1
公开(公告)日：2010-08-12
申请号：US11917124
申请日：2006-07-06
申请人： Tatsuya Sasaki , Kazuhiro Shiba , Shigeru Koumoto , Masayoshi Sumino
发明人： Tatsuya Sasaki , Kazuhiro Shiba , Shigeru Koumoto , Masayoshi Sumino
IPC分类号： H01L29/40 , H01L21/20 , H01L21/28
CPC分类号： H01S5/32341 , H01L21/28575 , H01L29/2003 , H01L29/452 , H01L33/0095 , H01L33/32 , H01L33/40 , H01S5/0421 , H01S5/0425 , H01S5/22
摘要： A first layer containing Ti as a constituent element, a second layer containing Nb as a constituent element, and a third layer containing Au as a constituent element are formed on a GaN substrate 11. Thereafter, the GaN substrate 11 and the first to third layers are kept at 700° C. or higher and at 1300° C. or lower. This allows a metal oxide of Ti to be distributed to extend from the interface between the GaN substrate 11 and the electrode 14 over to the inside of the electrode 14. Further, a metal nitride of Nb is formed in the inside of the GaN substrate 11. The metal nitride of Nb will be distributed to extend from the inside of the electrode 14 over to the inside of the GaN substrate 11.
摘要翻译：在GaN衬底11上形成包含Ti作为构成元素的第一层，含有Nb作为构成元素的第二层和含有Au作为构成元素的第三层。此后，GaN衬底11和第一至第三层保持在700℃以上且1300℃以下。这允许Ti的金属氧化物从GaN衬底11和电极14之间的界面延伸到电极14的内部。此外，在GaN衬底11的内部形成Nb的金属氮化物 Nb的金属氮化物将从电极14的内部扩散到GaN衬底11的内部。

10. 发明申请

US20100032839A1 ELECTRODE STRUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译：电极结构，半导体元件及其制造方法
公开(公告)号：US20100032839A1
公开(公告)日：2010-02-11
申请号：US12519698
申请日：2007-12-11
申请人： Shigeru Koumoto , Tatsuya Sasaki , Kazuhiro Shiba , Masayoshi Sumino
发明人： Shigeru Koumoto , Tatsuya Sasaki , Kazuhiro Shiba , Masayoshi Sumino
IPC分类号： H01L23/48 , H01L21/28
CPC分类号： H01L33/40 , H01L21/28575 , H01L33/32 , H01S5/0421 , H01S5/0425 , H01S5/2009 , H01S5/22 , H01S5/32341
摘要： According to the present invention, there is provided an electrode structure which includes: a nitride semiconductor layer; an electrode provided over the nitride semiconductor layer; and an electrode protective film provided over the electrode, wherein the nitride semiconductor layer contains a metal nitride containing Hb, Hf or Zr as a constitutive element, the electrode has a portion having a metal oxide containing Ti or V as a constitutive element formed therein, and the electrode protective film covers at least a portion of the electrode, and contains a protective layer having Au or Pt as a constitutive element.
摘要翻译：根据本发明，提供了一种电极结构，其包括：氮化物半导体层; 设置在氮化物半导体层上的电极; 以及设置在所述电极上的电极保护膜，其中所述氮化物半导体层包含含有Hb，Hf或Zr作为构成元素的金属氮化物，所述电极具有含有作为其中形成的构成元素的Ti或V的金属氧化物的部分，并且所述电极保护膜覆盖所述电极的至少一部分，并且包含具有Au或Pt作为构成要素的保护层。

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