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1. 发明授权

US4783153A Variable-focus optical device 失效
标题翻译：可变焦光学装置
公开(公告)号：US4783153A
公开(公告)日：1988-11-08
申请号：US942791
申请日：1986-12-17
申请人： Nobuo Kushibiki , Noriyuki Nose , Takeshi Baba , Toshiyuki Nakajima , Masahiro Okuda
发明人： Nobuo Kushibiki , Noriyuki Nose , Takeshi Baba , Toshiyuki Nakajima , Masahiro Okuda
IPC分类号： G02B3/00 , G02B1/00 , G02B3/12 , G02B3/14 , G02B26/08 , G02B1/06 , G02B15/00
CPC分类号： G02B1/00 , G02B26/0875 , G02B3/14
摘要： A variable-focus optical device comprises an elastomeric member having a gradient of shear modulus along its optical axis, and a deforming member having an aperture adapted for causing projection or sinking of the elastomeric member therethrough or thereat to deform the surface of the elastomeric member. The gradient of shear modulus is preferably one of continuously decreasing from the surface toward the inside of the elastomeric member. The gradient of shear modulus is provided by a concentration gradient of an inorganic substance such as silica dispersed in an elastomeric substance such as polysilioxane.
摘要翻译：可变焦光学装置包括具有沿其光轴的剪切模量梯度的弹性体构件，以及具有孔的变形构件，其适于使弹性构件穿过其中或在其上突出或下沉以使弹性体构件的表面变形。剪切模量的梯度优选是从弹性体构件的表面向内部连续减小的梯度。剪切模量的梯度由分散在诸如聚硅氧烷的弹性体物质中的无机物质如二氧化硅的浓度梯度提供。

2. 发明授权

US4985186A Process for producing optical element 失效
标题翻译：光学元件制造工艺
公开(公告)号：US4985186A
公开(公告)日：1991-01-15
申请号：US35773
申请日：1987-04-08
申请人： Noriyuki Nose , Toshiyuki Nakajima , Eigo Kawakami , Takeshi Baba , Nobuo Kushibiki , Masakazu Matsugu , Yukichi Niwa
发明人： Noriyuki Nose , Toshiyuki Nakajima , Eigo Kawakami , Takeshi Baba , Nobuo Kushibiki , Masakazu Matsugu , Yukichi Niwa
IPC分类号： B29C33/46 , B29C37/00 , B29C43/50 , B29D11/00
CPC分类号： B29D11/00855 , B29C33/46 , B29C37/0007 , B29C43/50 , B29D11/00432 , B29D11/00548 , B29L2011/0016 , Y10S425/808
摘要： A process for producing an optical element wherein an optical molding is formed by using a mold and thereafter released from the mold by supplying a gas to the boundary between the mold surface and the optical molding. In the process, no localized external force is applied to the optical molding during the release thereof, and therefore undesirable deformation or flaws of the optical molding are not caused.
摘要翻译：一种光学元件的制造方法，其中通过使用模具形成光学模制件，然后通过向模具表面和光学模制件之间的边界提供气体从模具中释放。在该过程中，在光学成型件的释放过程中不会施加局部的外力，因此不会引起不期望的光学成型的变形或缺陷。

3. 发明授权

US4802746A Variable-focus optical element and focus detecting device utilizing the same 失效
标题翻译：可变焦光学元件和利用其的焦点检测装置
公开(公告)号：US4802746A
公开(公告)日：1989-02-07
申请号：US832649
申请日：1986-02-25
申请人： Takeshi Baba , Shigeyuki Suda , Noriyuki Nose , Eigo Kawakami , Toshiyuki Nakajima , Nobuo Kushibiki
发明人： Takeshi Baba , Shigeyuki Suda , Noriyuki Nose , Eigo Kawakami , Toshiyuki Nakajima , Nobuo Kushibiki
IPC分类号： G02B3/14 , G02B7/36
CPC分类号： G02B7/36 , G02B3/14
摘要： A variable focus optical element comprises plural elastic members superposed in the axial direction and a deforming member having an aperture to cause the elastic member to protrude therefrom or descend therein thereby deforming the surface of the elastic members, and the modulus of elasticity of an elastic member at the protruding side is selected larger than that of another elastic member adjacent to first-mentioned elastic member at the protruding side. A focus detecting device comprises an imaging optical system having a variable-focus optical element, an image sensor provided at a determined image plane of the imaging optical system or an optically equivalent position, a sharpness detecting device for detecting the sharpness of the image from image signals obtained from the image sensor, and a device for varying the refractive power of the variable-focus optical element, and the focus state of the image on the image sensor is detected by comparing the sharpnesses detected by the sharpness detecting device at plural refractive powers of the variable-focus optical element.
摘要翻译：可变焦距光学元件包括沿轴向重叠的多个弹性构件和具有孔的变形构件，以使弹性构件从其突出或下降，从而使弹性构件的表面变形，并且弹性构件的弹性模量在突出侧的突出侧被选择为大于在突出侧与第一弹性构件相邻的另一个弹性构件的突出侧。焦点检测装置包括具有可变焦点光学元件的成像光学系统，设置在成像光学系统的确定的图像平面上的图像传感器或光学等效位置，用于从图像中检测图像的清晰度的锐度检测装置通过将由锐度检测装置检测的锐度与多个折射力进行比较来检测从图像传感器获得的信号和用于改变可变焦点光学元件的折射力的装置和图像在图像传感器上的聚焦状态的可变焦光学元件。

4. 发明授权

US4840473A Optical device 失效
标题翻译：光学装置
公开(公告)号：US4840473A
公开(公告)日：1989-06-20
申请号：US908725
申请日：1986-09-18
申请人： Nobuo Kushibiki , Noriyuki Nose , Toshiyuki Nakajima , Takeshi Baba , Masakazu Matsugu , Yukichi Niwa
发明人： Nobuo Kushibiki , Noriyuki Nose , Toshiyuki Nakajima , Takeshi Baba , Masakazu Matsugu , Yukichi Niwa
IPC分类号： G02B3/12 , G02B3/14 , G02B26/08 , G11B7/09
CPC分类号： G02B26/0875 , G11B7/09
摘要： An optical device is composed by sandwiching a deformable member between sandwiching members. The deformable member has a shear modulus decreasing toward the inside. The deformable member may be a combination of a core and a coating with different shear moduli or a single body having a continuoudly decreasing shear modulus. The sandwiching members may be a flat plate either transparent or opaque or a lens with or without reflecting film. Because of inner soft and outer hard elastic nature of the deformable member, the sandwiching members can easily change their relative position to change an optical path and an imaging position of the optical device with good durability.
摘要翻译：光学装置通过将可变形构件夹在夹层构件之间而构成。可变形构件的剪切模量向内侧减小。可变形构件可以是具有不同剪切模量的芯和涂层的组合，或者具有连续降低的剪切模量的单体。夹层构件可以是透明或不透明的平板或具有或不具有反射膜的透镜。由于可变形构件的内部软和外部的硬弹性，因此夹持构件可以容易地改变其相对位置，以改变具有良好耐用性的光学装置的光路和成像位置。

5. 发明授权

US5116369A Composition for intraocular lens 失效
标题翻译：内镜镜片组成
公开(公告)号：US5116369A
公开(公告)日：1992-05-26
申请号：US582117
申请日：1990-09-14
申请人： Nobuo Kushibiki , Noriyuki Nose , Yukichi Niwa , Norio Kaneko
发明人： Nobuo Kushibiki , Noriyuki Nose , Yukichi Niwa , Norio Kaneko
IPC分类号： A61L27/00 , A61L27/26 , C08L83/04
CPC分类号： A61L27/14 , A61F2/16 , A61L27/26 , C08L83/04 , A61L2430/16 , C08G77/12 , C08G77/20
摘要： A composition for an intraocular lens comprising, an organopolysiloxane (A) having a viscosity of 10,000 cp or below and comprising at least one unsaturated aliphatic group, an organopolysiloxane (B) comprising at least three hydrogenated silyl units and a platinum compound; wherein the platinum compound based on its platinum content constitutes 10-200 ppm by weight of the composition. The composition provides a homogeneous intraocular lens even when it is injected into a crystalline capsule through a slender tube such as an injection needle.

6. 发明授权

US4523801A Scanning optical system subjected to a moisture proof treatment 失效
标题翻译：经防潮处理的扫描光学系统
公开(公告)号：US4523801A
公开(公告)日：1985-06-18
申请号：US351936
申请日：1982-02-24
申请人： Takeshi Baba , Noriyuki Nose , Hideo Yoshikawa , Kazuo Minoura , Akinori Hasu , Setsuo Minami , Kazuhiko Matsuoka
发明人： Takeshi Baba , Noriyuki Nose , Hideo Yoshikawa , Kazuo Minoura , Akinori Hasu , Setsuo Minami , Kazuhiko Matsuoka
IPC分类号： G02B1/04 , G02B1/10 , G02B1/14 , G02B3/00 , G02B13/18 , G02B26/12 , G02B27/17
CPC分类号： G02B26/12 , G02B1/10 , G02B3/00
摘要： An optical system for scanning a medium with a beam spot includes a light beam generator, a deflector for deflecting the light beam in a predetermined direction and in deflection plane, and an imaging optical system between the deflector and the medium for imaging the light beam from the deflector on the medium as a beam spot, the imaging optical system having at least one lens element mode of a moisture absorbing material. The lens element has a shape in which the dimension in a direction parallel to the deflection plane of the light beam is greater than the dimension in a direction perpendicular to the deflection plane of the light beam. A device mitigates any influence on the imaged condition of the light beam on the medium caused by the lens element being subjected to moisture.
摘要翻译：用于扫描具有束斑的介质的光学系统包括光束发生器，用于沿预定方向和偏转平面偏转光束的偏转器，以及偏转器和介质之间的成像光学系统，用于对来自介质上的偏转器作为光束点，成像光学系统具有至少一种吸湿材料的透镜元件模式。透镜元件具有与光束的偏转平面平行的方向上的尺寸大于垂直于光束的偏转平面的方向上的尺寸的形状。一种装置减轻由透镜元件受到湿气导致的介质上的光束的成像状态的任何影响。

7. 发明授权

US5861952A Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
标题翻译：包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置
公开(公告)号：US5861952A
公开(公告)日：1999-01-19
申请号：US984509
申请日：1992-12-02
申请人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
发明人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
IPC分类号： G01N21/94 , G01B9/02 , G01N21/88
CPC分类号： G01N21/94
摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要翻译：具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。激光束随后被半反射镜分开。其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

8. 发明授权

US5486919A Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 失效
标题翻译：用于在具有图案的基板上检查颗粒（如果有的话）的检查方法和装置
公开(公告)号：US5486919A
公开(公告)日：1996-01-23
申请号：US76951
申请日：1993-06-15
申请人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
发明人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
IPC分类号： G01J9/02 , G01J9/04 , G01N21/88 , G01N21/94 , G03F7/20 , G01B9/02
CPC分类号： G03F7/70616 , G01N21/88 , G01N21/94 , G03F7/7065 , G03F7/70916 , G01J2009/0261 , G01J9/04 , G01N2021/4792 , G01N21/8806
摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要翻译：公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

9. 发明授权

US5465148A Apparatus and method for detecting the relative positional deviation between two diffraction gratings 失效
$Apparatus and method for detecting the relative positional deviation between two diffraction gratings$
标题翻译：用于检测两个衍射光栅之间的相对位置偏差的装置和方法
公开(公告)号：US5465148A
公开(公告)日：1995-11-07
申请号：US139143
申请日：1993-10-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
IPC分类号： G01B9/02 , G01B11/24 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70633 , G03F9/70
摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.
摘要翻译：第一萨瓦特板和待测对象被布置在塞曼光源的光路上。要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。这里，萨瓦特板将光分成两束。衍射由衍射光栅引起之后，光束由Savart板重新合成。两个光束在相同的光路上行进，从而提高测量精度。

10. 发明授权

US5432603A Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
标题翻译：光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差
公开(公告)号：US5432603A
公开(公告)日：1995-07-11
申请号：US153038
申请日：1993-11-17
申请人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/70
摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.
摘要翻译：在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

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