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1. 发明授权

US5200536A Fluorine-containing vitamin D3 analogues 失效
标题翻译：含氟维生素D3类似物
公开(公告)号：US5200536A
公开(公告)日：1993-04-06
申请号：US832888
申请日：1992-02-10
申请人： Nobuo Ikekawa , Takeo Taguchi , Yoko Tanaka , Yoshiro Kobayashi , Yutaka Ohira
发明人： Nobuo Ikekawa , Takeo Taguchi , Yoko Tanaka , Yoshiro Kobayashi , Yutaka Ohira
IPC分类号： A61K31/59 , A61P35/00 , A61P35/02 , C07C35/52 , C07C401/00 , C07F7/18
CPC分类号： C07F7/1856 , C07C35/52 , C07C401/00 , Y02P20/55
摘要： Fluorine-containing vitamin D.sub.3 analogues of the formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are independently hydrogen atom, a hydroxy-protecting group, having excellent pharmacological activities, such as tumor cell differentiation-inducing activity, which are useful as a medicament.
摘要翻译：含有下式的含氟维生素D 3类似物：其中R 1，R 2和R 3独立地为氢原子，具有优异的药理活性，例如肿瘤细胞分化诱导活性的羟基保护基，其可用于作为药物。

2. 发明授权

US5206230A Fluorine-containing vitamin D3 analogues and pharmaceutical composition containing the same 失效
标题翻译：含氟维生素D3类似物和含有相同的药物组合物
公开(公告)号：US5206230A
公开(公告)日：1993-04-27
申请号：US710396
申请日：1991-06-05
申请人： Nobuo Ikekawa , Yoshiro Kobayashi , Takeo Taguchi , Yoko Tanaka , Yutaka Ohira
发明人： Nobuo Ikekawa , Yoshiro Kobayashi , Takeo Taguchi , Yoko Tanaka , Yutaka Ohira
IPC分类号： A61K31/59 , A61P35/00 , C07C401/00 , C07F7/18
CPC分类号： C07C401/00 , C07F7/1856 , Y02P20/55
摘要： Fluorine-containing vitamin D.sub.3 analogues of the formula[I]: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are independently hydrogen atom, a chemically inactive hydroxy-protecting group, an acyl having 2 to 8 carbon atoms, or an alkyl having 1 to 8 carbon atoms, X is a straight carbon chain having 4 to 6 carbon atoms which contains at least one double or triple bond, which have excellent vitamin D.sub.3 -like activities, particularly anti-tumor activity owing to differentiation-inducing activity and are useful for the prophylaxis and treatment of various tumors, and intermediates therefor.
摘要翻译：具有式[I]的含氟维生素D3类似物：其中R 1，R 2和R 3独立地是氢原子，化学惰性的羟基保护基，具有2-8个碳原子的酰基或烷基具有1至8个碳原子，X是含有至少一个双键或三键的具有4-6个碳原子的直链碳链，其具有优异的维生素D3样活性，特别是由于分化诱导活性而导致的抗肿瘤活性，可用于预防和治疗各种肿瘤及其中间体。

3. 发明授权

US07996858B2 Disk device 失效
标题翻译：磁盘设备
公开(公告)号：US07996858B2
公开(公告)日：2011-08-09
申请号：US12233132
申请日：2008-09-18
申请人： Yutaka Ohira
发明人： Yutaka Ohira
IPC分类号： G11B33/02
CPC分类号： G11B33/027
摘要： A disk device includes: a front panel; a bottom chassis, including: a bottom plate, having a first end and a second end; and a side plate, formed on the first end, the side plate formed with a first through hole; a connecting member, having a first wall formed with a second through hole and a second wall coupled with the front panel; a hook portion, formed on the first wall so as to extend in a first direction and engaging with the side plate; a screw, fitted into the first through hole and the second through hole thereby coupling the first wall and the side plate; a first engaging member, formed on the side plate; and a second engaging member, formed on the connecting member, and engaging with the first engaging member such that movement thereof in at least the first direction is restricted.
摘要翻译：磁盘装置包括：前面板; 底部底盘，包括：底板，具有第一端和第二端; 以及侧板，形成在所述第一端上，所述侧板形成有第一通孔; 连接构件，具有形成有第二通孔的第一壁和与前面板连接的第二壁; 钩部，形成在第一壁上，以沿第一方向延伸并与侧板接合; 安装在第一通孔和第二通孔中的螺钉，由此联接第一壁和侧板; 形成在所述侧板上的第一接合构件; 以及第二接合构件，其形成在所述连接构件上，并且与所述第一接合构件接合，使得在至少所述第一方向上的移动受到限制。

4. 发明申请

US20090083775A1 Disk Device 失效
标题翻译：磁盘设备
公开(公告)号：US20090083775A1
公开(公告)日：2009-03-26
申请号：US12233132
申请日：2008-09-18
申请人： Yutaka Ohira
发明人： Yutaka Ohira
IPC分类号： G11B33/02
CPC分类号： G11B33/027
摘要： A disk device includes: a front panel; a bottom chassis, including: a bottom plate, having a first end and a second end; and a side plate, formed on the first end, the side plate formed with a first through hole; a connecting member, having a first wall formed with a second through hole and a second wall coupled with the front panel; a hook portion, formed on the first wall so as to extend in a first direction and engaging with the side plate; a screw, fitted into the first through hole and the second through hole thereby coupling the first wall and the side plate; a first engaging member, formed on the side plate; and a second engaging member, formed on the connecting member, and engaging with the first engaging member such that movement thereof in at least the first direction is restricted.
摘要翻译：磁盘装置包括：前面板; 底部底盘，包括：底板，具有第一端和第二端; 以及侧板，形成在所述第一端上，所述侧板形成有第一通孔; 连接构件，具有形成有第二通孔的第一壁和与前面板连接的第二壁; 钩部，形成在第一壁上，以沿第一方向延伸并与侧板接合; 安装在第一通孔和第二通孔中的螺钉，由此联接第一壁和侧板; 形成在所述侧板上的第一接合构件; 以及第二接合构件，其形成在所述连接构件上，并且与所述第一接合构件接合，使得在至少所述第一方向上的移动受到限制。

5. 发明授权

US5948816A 4-substituted-2,7-dideoxy-7-fluoro-2,3-didehydro-sialic acid compounds 失效
标题翻译： 4-取代-2,7-二脱氧-7-氟-2,3-二脱氢唾液酸化合物
公开(公告)号：US5948816A
公开(公告)日：1999-09-07
申请号：US68646
申请日：1998-05-06
申请人： Yutaka Ohira
发明人： Yutaka Ohira
IPC分类号： C07D209/28 , C07D309/28 , C07D498/04 , A61K31/35 , C07D413/02
CPC分类号： C07D209/28 , C07D309/28
摘要： Compounds represented by general formula (I) and salts thereof useful as non-tolerance-inducing antiviral agents, wherein A is O, CH.sub.2 or S; R.sup.1 is lower alkoxycarbonyl, or the like; R.sup.2 is H, OR.sup.6, F, Cl, Br, CN, NHR.sup.6 or SR.sup.6 (wherein R is H, C.sub.1 -C.sub.6 lower alkyl and the like; one of R.sup.3 and R.sup.3' is H and the other thereof is H, CN, anitrogenous group such as amino or the like; R.sup.4 is NHR.sup.6 or N.dbd.CHR.sup.6 ; and R.sup.5 is CH.sub.2 CH.sub.2 XR.sup.6 or CH(XR.sup.6)CH.sub.2 XR.sup.6 (wherein X is O, S or NH.): ##STR1##
摘要翻译： PCT No.PCT / JP97 / 03184 Sec。 371日期：1998年5月6日 102（e）日期1998年5月6日PCT 1997年9月10日PCT公布。公开号WO98 / 11083 日本3月19日，由通式（I）表示的化合物及其盐作为非耐受性抗病毒剂，其中A为O，CH 2或S; R1是低级烷氧基羰基等; R2是H，OR6，F，Cl，Br，CN，NHR6或SR6（其中R是H，C1-C6低级烷基等; R3和R3之一是H，另一个是H，CN，基团如氨基等; R4是NHR6或N = CHR6; R5是CH2CH2XR6或CH（XR6）CH2XR6（其中X是O，S或NH）：

6. 发明授权

US07332628B2 Process for producing carbonyl fluoride 有权
标题翻译：生产碳酰氟的方法
公开(公告)号：US07332628B2
公开(公告)日：2008-02-19
申请号：US10548836
申请日：2004-03-12
申请人： Yuki Mitsui , Taisuke Yonemura , Yutaka Ohira , Akira Sekiya
发明人： Yuki Mitsui , Taisuke Yonemura , Yutaka Ohira , Akira Sekiya
IPC分类号： C07C51/58
CPC分类号： C01B32/80
摘要： The process for producing carbonyl fluoride according to the invention is a process for safely and easily producing high-purity carbonyl fluoride having a low content of carbon tetrafluoride, and comprises feeding carbon monoxide and fluorine to a reactor and allowing carbon monoxide to react with fluorine under the conditions of a reactor internal pressure of less than atmospheric pressure.
摘要翻译：根据本发明的制备碳酰氟的方法是安全和容易地生产具有低四氟化碳含量的高纯度碳酰氟的方法，并且包括将一氧化碳和氟进料到反应器中并允许一氧化碳与氟反应反应器内部压力小于大气压的条件。

7. 发明授权

US07322368B2 Plasma cleaning gas and plasma cleaning method 有权
标题翻译：等离子清洗气体和等离子体清洗方法
公开(公告)号：US07322368B2
公开(公告)日：2008-01-29
申请号：US10415101
申请日：2002-08-26
申请人： Akira Sekiya , Yuki Mitsui , Yutaka Ohira , Taisuke Yonemura
发明人： Akira Sekiya , Yuki Mitsui , Yutaka Ohira , Taisuke Yonemura
IPC分类号： B08B9/093 , B08B9/00 , B08B6/00 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： C23C16/4405 , B08B7/0035 , H01L21/3065 , Y10S438/905
摘要： A plasma cleaning gas for CVD chamber is a gas for cleaning silicon-containing deposits on the surface of a CVD chamber inner wall and the surfaces of members placed inside the CVD chamber after film forming treatment on a substrate by a plasma CVD apparatus. The cleaning gas includes 100% by volume of fluorine gas which gas can generate plasma by electric discharge. When 100% by volume of fluorine gas is plasma-generated by electric discharge and then used as a cleaning gas, an extremely excellent etching rate can be attained and further plasma can be stably generated even in the total gas flow rate of 1000 sccm and at a chamber pressure of 400 Pa. Further, the uniformity of cleaning can be also ensured in the above conditions. Additionally the fluorine gas concentration is 100% so that the apparatus is not complicated and thereby the cleaning gas has excellent practicability.
摘要翻译：用于CVD室的等离子体清洁气体是用于通过等离子体CVD装置在基板上进行成膜处理之后，清洁CVD室内壁表面上的含硅沉积物和置于CVD室内的构件表面的气体。清洁气体包括100体积％的氟气，气体可以通过放电产生等离子体。当通过放电等离子体产生100体积％的氟气，然后用作清洁气体时，即使在1000sccm的总气体流量下，也可以获得极好的蚀刻速率，并且甚至可以稳定地产生等离子体室压力为400Pa。此外，在上述条件下也可以确保清洁的均匀性。此外，氟气浓度为100％，使得该装置不复杂，因此清洁气体具有优异的实用性。

8. 发明申请

US20060194985A1 Process for producing carbonyl fluoride 有权
标题翻译：生产碳酰氟的方法
公开(公告)号：US20060194985A1
公开(公告)日：2006-08-31
申请号：US10548836
申请日：2004-03-12
申请人： Yuki Mitsui , Taisuke Yonemura , Yutaka Ohira , Akira Sekiya
发明人： Yuki Mitsui , Taisuke Yonemura , Yutaka Ohira , Akira Sekiya
IPC分类号： C07C51/58
CPC分类号： C01B32/80
摘要： The process for producing carbonyl fluoride according to the invention is a process for safely and easily producing high-purity carbonyl fluoride having a low content of carbon tetrafluoride, and comprises feeding carbon monoxide and fluorine to a reactor and allowing carbon monoxide to react with fluorine under the conditions of a reactor internal pressure of less than atmospheric pressure.
摘要翻译：根据本发明的制备碳酰氟的方法是安全和容易地生产具有低四氟化碳含量的高纯度碳酰氟的方法，并且包括将一氧化碳和氟进料到反应器中并允许一氧化碳与氟反应反应器内部压力小于大气压的条件。

9. 发明授权

US06787053B2 Cleaning gases and etching gases 有权
标题翻译：清洁气体和蚀刻气体
公开(公告)号：US06787053B2
公开(公告)日：2004-09-07
申请号：US10129115
申请日：2002-05-13
申请人： Akira Sekiya , Yuki Mitsui , Ginjiro Tomizawa , Katsuya Fukae , Yutaka Ohira , Taisuke Yonemura
发明人： Akira Sekiya , Yuki Mitsui , Ginjiro Tomizawa , Katsuya Fukae , Yutaka Ohira , Taisuke Yonemura
IPC分类号： C03C1500
CPC分类号： C23C16/4405 , H01L21/3065 , H01L21/31116 , Y02C20/30 , Y02P70/605
摘要： The first chamber cleaning gas and the first silicon-containing film-etching gas of the present invention comprise at least one compound selected from the group consisting of FCOF, CF3OCOF and CF3OCF2OCOF, and O2 in the specific amount, and optionally other gases. The second chamber cleaning gas and the second silicon-containing film-etching gas comprise CF3COF, C3F7COF or CF2(COF)2 and O2 in specific amounts, and optionally may comprise other gases. The chamber cleaning gases and silicon-containing film etching gases of the present invention have a low global warming potential and hardly generate substances in the exhaust gases such as CF4, etc, which are harmful to the environment and have been perceived as contributing to global warming. Therefore, the gases are friendly to the global environment, and have easy handling and excellent exhaust gas treating properties. Further, the chamber cleaning gases of the invention have excellent cleaning rate.
摘要翻译：本发明的第一室清洁气体和第一含硅膜蚀刻气体包含至少一种选自FCOF，CF 3 OCOF和CF 3 OCF 2 COOF的化合物，以及特定量的O 2和任选的其它气体。第二室清洁气体和第二含硅膜蚀刻气体包含CF 3 COF，C 3 F 7 COF或CF 2（COF）2和特定量的O 2，并且任选地可以包含其它气体。本发明的室清洁气体和含硅膜蚀刻气体具有低的全球变暖潜能，并且几乎不产生对环境有害并被认为有助于全球变暖的CF4等废气中的物质。因此，气体对于全球环境友好，具有易于处理和优异的废气处理性能。此外，本发明的室清洁气体具有优异的清洗率。

10. 发明授权

US5627290A 2,3-didehydrosialic acid substituted with fluorine at 7-position and synthetic intermediate thereof 失效
标题翻译：在7-位被氟取代的2,3-二脱氢唾液酸及其合成中间体
公开(公告)号：US5627290A
公开(公告)日：1997-05-06
申请号：US586908
申请日：1996-01-26
申请人： Takao Iida , Yutaka Ohira
发明人： Takao Iida , Yutaka Ohira
IPC分类号： C07D309/14 , C07D309/28 , C07D309/30 , C07H13/04 , C07H5/06 , C07H5/10
CPC分类号： C07H13/04 , C07D309/14 , C07D309/28 , C07D309/30
摘要： The invention pertains to 2,7-Deoxy-7-fluoro-2,3-didehydrosialic acid and an intermediate thereof which are useful for developing practical drugs, such as an antiviral agent, a preventing agent for viral diseases, etc. and for a clinical application. In addition, they are also useful as a carcinostatic agent and an immunomodulation agent.
摘要翻译： PCT No.PCT / JP95 / 00820 Sec。 371日期1996年1月26日 102（e）日期1996年1月26日PCT提交1995年4月26日PCT公布。出版物WO95 / 32955 日期1995年12月7日本发明涉及可用于开发实用药物的2,7-脱氧-7-氟-2,3-二脱氢唾液酸及其中间体，例如抗病毒剂，病毒性疾病的预防剂，等等和临床应用。此外，它们也可用作制癌剂和免疫调节剂。

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