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    • 3. 发明申请
    • REQUIREMENTS EXTRACTION FROM EXTERNAL SOURCES FOR SOFTWARE LIFECYCLE MANAGEMENT
    • 要求从软件生命管理的外部来源提取
    • US20130007010A1
    • 2013-01-03
    • US13171318
    • 2011-06-28
    • Michael E. BrowneNnaemeka I. EmejuluAndrew J. LaveryMario A. Maldari
    • Michael E. BrowneNnaemeka I. EmejuluAndrew J. LaveryMario A. Maldari
    • G06F17/30
    • G06Q10/101G06F8/10
    • Embodiments of the present invention provide a method, system and computer program product for software requirements extraction from external sources for software development. In an embodiment of the invention, a method for software requirements extraction from external sources for software development includes retrieving content from over a computer communications network pertaining to a product. The content can include by way of example, a Web page, e-mail message, instant message, blog posting or social network posting, to name only a few. Within the content, a modal verb can be identified and text extracted that is proximate to the modal verb. Thereafter, a requirement can be generated for a revision of the product based upon the extracted text. Optionally, the requirement can be ranked according to the modal verb, for example, an imperative modal verb can correspond to a higher ranking than a suggestive modal verb.
    • 本发明的实施例提供了用于从外部源提取用于软件开发的软件需求的方法,系统和计算机程序产品。 在本发明的一个实施例中,用于从外部源提取用于软件开发的软件需求的方法包括从与产品相关的计算机通信网络上检索内容。 内容可以包括例如网页,电子邮件消息,即时消息,博客发布或社交网络发布,仅举几个例子。 在内容中,可以识别模态动词,并且提取接近模态动词的文本。 此后,可以基于提取的文本产生对产品的修订的要求。 可选地,可以根据模态动词对要求进行排序,例如,命令式模态动词可以对应于比暗示模态动词更高的排名。
    • 4. 发明授权
    • Particle detection method and apparatus
    • 粒子检测方法及装置
    • US4895446A
    • 1990-01-23
    • US246464
    • 1988-09-19
    • Mario A. MaldariCharly Allemand
    • Mario A. MaldariCharly Allemand
    • G01N15/02G01N21/94
    • G01N21/94G01N15/0227
    • An apparatus and method are disclosed for detecting the presence of particles on the surface of an object such as the front side of a patterned semiconductor wafer. A collimated beam of light is directed onto an area on the surface of the object at a grazing angle of incidence. A detector positioned above the surface detects light scattered from any particles which may be present on the surface, but not specularly reflected light. The output of the detector is fed into a computer where the information is processed and then displayed on a display. The surface is prepositioned relative to the incident light beam so that the diffracted light from the surface and the pattern on the surface is at a minimum. The object is then moved translationally to expose another area to the incident light beam so that the entire surface of the object or selected portions thereof can be examined, an area at a time.
    • 公开了一种用于检测物体表面上诸如图案化半导体晶片的正面之间的颗粒的存在的装置和方法。 准直光束以掠射角被引导到物体表面上的区域上。 位于表面上方的检测器检测从表面上可能存在的任何颗粒散射的光,而不是镜面反射光。 检测器的输出被馈送到计算机中,其中处理信息,然后显示在显示器上。 表面相对于入射光束被预定位,使得来自表面的衍射光和表面上的图案处于最小。 然后将物体平移移动以将另一区域暴露于入射光束,使得物体的整个表面或其选定部分可以一次检查一个区域。
    • 5. 发明授权
    • Method and apparatus for detecting particles on a material
    • 用于检测材料上的颗粒的方法和装置
    • US4377340A
    • 1983-03-22
    • US200566
    • 1980-10-24
    • Gary P. GreenCharly D. AllemandDavid L. BrewerHitoshi IidaMario A. Maldari
    • Gary P. GreenCharly D. AllemandDavid L. BrewerHitoshi IidaMario A. Maldari
    • G01B11/24G01B11/30G01N21/01G01N21/47G01N21/88H01L21/66
    • G01N21/47
    • A method and apparatus for detecting and measuring the number and sizes of impurities on the surface of a material, such as a semiconductor wafer, wherein high intensity collimated light is directed onto the surface, in the absence of any extraneous light, through a collimating mirror, and employing a point source, whereat the particles will scatter the light, and wherein the surface is viewed by a highly light sensitive TV camera which picks up the scattered light and displays same on a viewing screen. The intensity of scattered light will indicate the size of the particles when compared with a calibrated model. Advantageously, a broad range of light waves is employed and thus enables a range of sizes of particles to be detected by the light scattered thereby. Also, advantageously, with the use of ordinarily available equipment, the system can inspect wafer surfaces for particles having sizes as small as 0.3 microns. The system also enables detection and identification of moving particles as distinguished from stationary particles.
    • 一种用于检测和测量诸如半导体晶片的表面上的杂质的数量和尺寸的方法和装置,其中高强度准直光通过准直镜在没有任何外来光的情况下被引导到表面上 并且使用点源,其中颗粒将散射光,并且其中通过高度光敏的电视摄像机观察表面,该摄像机拾取散射光并将其显示在观看屏幕上。 当与校准模型相比时,散射光的强度将表示颗粒的大小。 有利地,采用宽范围的光波,因此能够通过由此散射的光来检测颗粒的尺寸范围。 此外,有利的是,通过使用通常可用的设备,该系统可以检查尺寸小至0.3微米的颗粒的晶片表面。 该系统还能够检测和识别与固定颗粒不同的移动颗粒。
    • 6. 发明授权
    • Particle detection method and apparatus
    • 粒子检测方法及装置
    • US4772126A
    • 1988-09-20
    • US922478
    • 1986-10-23
    • Charly D. AllemandHitoshi IidaMario A. Maldari
    • Charly D. AllemandHitoshi IidaMario A. Maldari
    • H01L21/66G01N15/02G01N21/88G01N21/94G01N21/956
    • G01N21/94G01N15/0227
    • An apparatus and method are disclosed for detecting the presence of particles on the surface of an object such as the front side of a patterned semiconductor wafer. A vertically expanded, horizontally scanning, beam of light is directed onto an area on the surface of the object at a grazing angle of incidence. A video camera positioned above the surface detects light scattered from any particles which may be present on the surface, but not specularly reflected light. The surface is angularly prepositioned (rotated) relative to the incident light beam so that the diffracted light from the surface and the pattern of lines on the surface is at a minimum. The object is then moved translationally to expose another area to the incident light beam so that the entire surface of the object or selected portions thereof can be examined, an area at a time.
    • 公开了一种用于检测物体表面上诸如图案化半导体晶片的正面之间的颗粒的存在的装置和方法。 垂直扩展的水平扫描的光束以掠射入射角度被引导到物体表面上的区域上。 位于表面上方的摄像机检测从表面上可能存在的任何颗粒散射的光,但不会反射镜面反射光。 该表面相对于入射光束角度地预定位(旋转),使得来自表面的衍射光和表面上的线图案处于最小。 然后将物体平移移动以将另一区域暴露于入射光束,使得物体的整个表面或其选定部分可以一次检查一个区域。