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    • 1. 发明授权
    • Method and apparatus for detecting particles on a material
    • 用于检测材料上的颗粒的方法和装置
    • US4377340A
    • 1983-03-22
    • US200566
    • 1980-10-24
    • Gary P. GreenCharly D. AllemandDavid L. BrewerHitoshi IidaMario A. Maldari
    • Gary P. GreenCharly D. AllemandDavid L. BrewerHitoshi IidaMario A. Maldari
    • G01B11/24G01B11/30G01N21/01G01N21/47G01N21/88H01L21/66
    • G01N21/47
    • A method and apparatus for detecting and measuring the number and sizes of impurities on the surface of a material, such as a semiconductor wafer, wherein high intensity collimated light is directed onto the surface, in the absence of any extraneous light, through a collimating mirror, and employing a point source, whereat the particles will scatter the light, and wherein the surface is viewed by a highly light sensitive TV camera which picks up the scattered light and displays same on a viewing screen. The intensity of scattered light will indicate the size of the particles when compared with a calibrated model. Advantageously, a broad range of light waves is employed and thus enables a range of sizes of particles to be detected by the light scattered thereby. Also, advantageously, with the use of ordinarily available equipment, the system can inspect wafer surfaces for particles having sizes as small as 0.3 microns. The system also enables detection and identification of moving particles as distinguished from stationary particles.
    • 一种用于检测和测量诸如半导体晶片的表面上的杂质的数量和尺寸的方法和装置,其中高强度准直光通过准直镜在没有任何外来光的情况下被引导到表面上 并且使用点源,其中颗粒将散射光,并且其中通过高度光敏的电视摄像机观察表面,该摄像机拾取散射光并将其显示在观看屏幕上。 当与校准模型相比时,散射光的强度将表示颗粒的大小。 有利地,采用宽范围的光波,因此能够通过由此散射的光来检测颗粒的尺寸范围。 此外,有利的是,通过使用通常可用的设备,该系统可以检查尺寸小至0.3微米的颗粒的晶片表面。 该系统还能够检测和识别与固定颗粒不同的移动颗粒。