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    • 6. 发明授权
    • Water-dispersed coating composition comprising an acrylic graft polymer
containing carboxyl groups, hydroxyl and/or amide groups
    • 包含含有羧基,羟基和/或酰胺基团的丙烯酸接枝聚合物的水分散涂料组合物
    • US4329266A
    • 1982-05-11
    • US186557
    • 1980-09-12
    • Yukio SuzukiNaozumi IwasawaTadashi Watanabe
    • Yukio SuzukiNaozumi IwasawaTadashi Watanabe
    • C08F290/12C09D151/00C08L61/28
    • C08F290/126C09D151/003
    • A water-dispersed coating composition comprising (1) a dispersion of a water-dispersible form of an acrylic graft polymer containing carboxyl groups and hydroxyl and/or amide groups in an aqueous medium containing 60 to 90% by weight of water, and (2) an amino resin. The water-dispersible form of this polymer is obtained by neutralizing at least 50% of the carboxyl groups of the polymer with a basic substance. Prior to neutralization, the polymer has an acid value of 15 to 40 and a glass transition temperature of -10.degree. C. to 70.degree. C., and is produced by polymerizing (A) an acrylic copolymer and (B) a mixture of an alpha,beta-ethylenically unsaturated carboxylic acid and another copolymerizable unsaturated monomer. The copolymer (A) and the mixture (B) is selected so that either one of them has hydroxyl and/or amide groups and the difference between the acid value of the copolymer (A) and that of the mixture (B) is from 25 to 200. The present invention also provides a water-dispersed coating composition comprising a dispersion of a water-dispersible form of a self-curable acrylic graft polymer without an amino resin.
    • 一种水分散涂料组合物,其包含(1)含水分散体形式的含羧基和羟基和/或酰胺基的丙烯酸接枝聚合物在含有60-90%重量水的水性介质中的分散体,和(2) )氨基树脂。 该聚合物的水分散形式通过用碱性物质中和聚合物的至少50%的羧基而获得。 在中和之前,聚合物的酸值为15至40,玻璃化转变温度为-10℃至70℃,并通过聚合(A)丙烯酸共聚物和(B)将 α,β-烯属不饱和羧酸和另一种可共聚的不饱和单体。 选择共聚物(A)和混合物(B),使得它们中的任一个具有羟基和/或酰胺基,并且共聚物(A)和混合物(B)的酸值之间的差异为25 本发明还提供一种水分散涂料组合物,其包含不具有氨基树脂的可分散自由基的丙烯酸接枝聚合物的分散体。
    • 9. 发明授权
    • Process for resist pattern formation using positive electrodeposition
photoresist compositions
    • 使用正电沉积光致抗蚀剂组合物的抗蚀剂图案形成方法
    • US5702872A
    • 1997-12-30
    • US610237
    • 1996-03-04
    • Genji ImaiNaozumi IwasawaTsuguo Yamaoka
    • Genji ImaiNaozumi IwasawaTsuguo Yamaoka
    • G03F7/004G03F7/039G03F7/16G03F7/027
    • G03F7/0045G03F7/039G03F7/164G03F7/168Y10S430/12Y10S430/122
    • A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxy-phenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.
    • 正型电沉积光致抗蚀剂组合物包括作为必要组分的(A)100重量份的具有羧基的聚合物,其量为每当所述聚合物为0.5至10当量,并且任选地具有羟基苯基 至少1当量/ kg聚合物或(A')含羧基聚合物和(A“)含羟基苯基的聚合物的量; (B)5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和(C)每100重量份聚合物(A)或聚合物(A')和聚合物(A“)和含乙烯基醚基化合物(B)的总量为0.1〜40重量份 ),当用光化射线照射时产生酸。 通过用碱性化合物中和聚合物(A)或(A')中的羧基,将组合物溶解或分散在水性介质中。 正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。 还公开了使用这种组合物的抗蚀剂图案形成方法。
    • 10. 发明授权
    • Positive type electrodeposition photoresist compositions
    • 正型电沉积光致抗蚀剂组合物
    • US5527656A
    • 1996-06-18
    • US233443
    • 1994-04-26
    • Genji ImaiNaozumi IwasawaTsuguo Yamaoka
    • Genji ImaiNaozumi IwasawaTsuguo Yamaoka
    • G03F7/004G03F7/039G03F7/16G03C1/73
    • G03F7/0045G03F7/039G03F7/164G03F7/168Y10S430/12Y10S430/122
    • A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxyphenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.
    • 正型电沉积光致抗蚀剂组合物包括作为必要组分的(A)100重量份的具有羧基的聚合物,其量为每当所述聚合物为0.5至10当量,并且任选地具有羟基苯基 或(A')含有羧基的聚合物和(A“)含羟基苯基的聚合物的量为每千克聚合物至少1当量; (B)5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和(C)每100重量份聚合物(A)或聚合物(A')和聚合物(A“)和含乙烯基醚基化合物(B)的总量为0.1〜40重量份 ),当用光化射线照射时产生酸。 通过用碱性化合物中和聚合物(A)或(A')中的羧基,将组合物溶解或分散在水性介质中。 正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。 还公开了使用这种组合物的抗蚀剂图案形成方法。