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1. 发明授权

US06231687B1 Lubrication treatment method for cold working of steel 失效
标题翻译：钢的冷加工润滑处理方法
公开(公告)号：US06231687B1
公开(公告)日：2001-05-15
申请号：US09413931
申请日：1999-10-07
申请人： Naoyuki Kobayashi , Masahiko Kawakami
发明人： Naoyuki Kobayashi , Masahiko Kawakami
IPC分类号： C23C2282
CPC分类号： B21J3/00 , C23C22/12 , C23C22/22 , C23C22/367 , C23C22/83
摘要： A phosphating solution that contains from 3 to 30 g/l of zinc ions, from 0.1 to 20 g/l of ferrous ions, from 5 to 60 g/l of phosphate ions, from 5 to 60 g/l of nitrate ions, and a source of hydroxylamine in a concentration corresponding stoichiometrically to from 0.5 to 4 g/l of hydroxylamine and in which there is a weight ratio of zinc to phosphate that is from 0.1:1 to 1:1 deposits on steel to be cold worked a phosphate conversion coating suitable as a lubricant carrier. This phosphating solution, which may optionally contain one or more of calcium, nickel, cobalt, and copper cations and simple and complex fluorine-containing anions, makes it possible to lower the temperature of the treatment solution, reduce the amount of sludge, improve the quality of the coating film, and allow single-liquid type replenishment to be used. Preferably the surface to be phosphated is immersed in the phosphating solution, maintained at a temperature of 35 to 80° C., for 2 to 20 minutes.
摘要翻译：含有3〜30g / l的锌离子，0.1〜20g / l的亚铁离子，5〜60g / l的磷酸盐离子，5〜60g / l的硝酸根离子的磷化液，以及羟胺浓度相当于0.5至4g / l羟胺的化学计量浓度，其中锌与磷酸盐的重量比为0.1：1至1：转化涂层适合作为润滑剂载体。该磷酸盐溶液可以任选地含有一种或多种钙，镍，钴和铜阳离子和简单和复杂的含氟阴离子，使得可以降低处理溶液的温度，减少污泥的量，改善涂膜的质量，并允许使用单液体补充。优选将要磷化的表面浸入磷酸盐溶液中，保持在35至80℃的温度下2至20分钟。

2. 发明授权

US06179934B2 Aqueous phosphating composition and process for metal surfaces 失效
标题翻译：水性磷化组合物及金属表面工艺
公开(公告)号：US06179934B2
公开(公告)日：2001-01-30
申请号：US09355050
申请日：1999-07-22
申请人： Masahiko Kawakami , Naoyuki Kobayashi , Kazuyuki Oyama
发明人： Masahiko Kawakami , Naoyuki Kobayashi , Kazuyuki Oyama
IPC分类号： C23C2207
CPC分类号： C23C22/17 , C23C22/12 , C23C22/184 , C23C22/362 , C23C22/365
摘要： An aqueous zinc phosphate conversion coating that contains 5 to 50 g/L of phosphate ions, 0.2 to 10 g/L of zinc ions, and 0.5 to 4.0 g/L as hydroxylamine of a hydroxylamine source, and also: (1) contains 0.01 to 5.0 g/L polycarboxylic acid or salt thereof and/or starch phosphate; or (2) has a zinc ions/phosphate ions weight ratio below 0.27 and a zinc ions concentration of at least 2.0 g/L forms high quality zinc phosphating coatings on metal surfaces even if the surfaces have not been previously conditioned by contact with a dispersion of colloidal titanium.
摘要翻译：磷酸盐离子含量为5〜50g / L，锌离子为0.2〜10g / L，羟胺源羟胺为0.5〜4.0g / L，（1）含有0.01 至5.0g / L聚羧酸或其盐和/或磷酸淀粉; 或（2）锌离子/磷酸根离子的重量比低于0.27，并且锌离子浓度至少为2.0g / L，即使表面未经预先通过与分散体接触进行调理，也能在金属表面上形成高品质的锌磷化涂层的胶体钛。

3. 发明授权

US08780327B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08780327B2
公开(公告)日：2014-07-15
申请号：US13064867
申请日：2011-04-21
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
摘要翻译：曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。该装置还包括清洁构件的清洁系统。

4. 发明申请

US20130300360A1 NON-CONTACT CHARGING MODULE AND NON-CONTACT CHARGER 有权
标题翻译：非接触式充电模块和非接触式充电器
公开(公告)号：US20130300360A1
公开(公告)日：2013-11-14
申请号：US13990901
申请日：2011-12-28
申请人： Naoyuki Kobayashi , Tokuji Nishino , Kenichiro Tabata
发明人： Naoyuki Kobayashi , Tokuji Nishino , Kenichiro Tabata
IPC分类号： H01F38/14 , H01F27/28
CPC分类号： H01F38/14 , H01F27/2804 , H01F27/2823 , H02J5/005 , H02J7/025 , H02J50/12 , H02J50/70
摘要： A non-contact charging module with which reduction in thickness can be achieved while reliable insulation is maintained between conducting wire and magnetic sheet. This non-contact charging module comprises: a planar coil section (2) constituted by coiling a conducting wire; a conductive magnetic sheet (3) having the planar coil section (2) arranged thereon, with an insulating sheet (4) therebetween; and a recess (33) or slit (34) provided in the conductive magnetic sheet (3) and extending to an edge of the conductive magnetic sheet (3) from the starting point of the winding of the planar coil section (2). The conducting wire of the planar coil section (2) is stored in the recess (33) or slit (34) by the insulating sheet (4) being pushed into the recess (33) or slit (34). The conducting wire of the planar coil section (2) is insulated from the conductive magnetic sheet (3) by the insulating sheet (4).
摘要翻译：一种非接触充电模块，可以在导线和磁性片之间保持可靠的绝缘的同时实现厚度的减小。该非接触充电模块包括：通过卷绕导线构成的平面线圈部分（2）; 具有布置在其上的平面线圈部分（2）的导电磁性片（3），其间具有绝缘片（4）; 以及设置在所述导电性磁性片（3）中并从所述平面线圈部（2）的绕组的起始点延伸到所述导电性磁性片（3）的边缘的凹部（33）或狭缝（34）。平面线圈部（2）的导线通过被推入凹部（33）或狭缝（34）的绝缘片（4）储存在凹部（33）或狭缝（34）中。平面线圈部（2）的导线通过绝缘片（4）与导电性磁性体（3）绝缘。

5. 发明授权

US08451424B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
标题翻译：曝光装置，制造装置的方法以及曝光装置的控制方法
公开(公告)号：US08451424B2
公开(公告)日：2013-05-28
申请号：US11338661
申请日：2006-01-25
申请人： Nobutaka Magome , Naoyuki Kobayashi , Yasuyuki Sakakibara , Hiroaki Takaiwa , Hisatsune Kadota
发明人： Nobutaka Magome , Naoyuki Kobayashi , Yasuyuki Sakakibara , Hiroaki Takaiwa , Hisatsune Kadota
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70525 , G03F7/70725 , G03F7/70858 , G03F7/709
摘要： An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.
摘要翻译：曝光装置（EX）通过投影光学系统（PL）和液体（1）将基板（P）上的图案的图像投射到基板（P）上。曝光装置（EX）具有在投影光学系统（PL）和基板（P）之间供给液体（1）的液体供给机构（10）。当检测到异常时，液体供给机构（10）停止供给液体（1）。这抑制了由于形成液浸区域的液体的泄漏而导致的衬底周边的器件和构件的影响，从而实现令人满意的曝光处理。

6. 发明授权

US08125612B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08125612B2
公开(公告)日：2012-02-28
申请号：US11603078
申请日：2006-11-22
申请人： Naoyuki Kobayashi , Yasushi Mizuno , Kenichi Shiraishi
发明人： Naoyuki Kobayashi , Yasushi Mizuno , Kenichi Shiraishi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

7. 发明授权

US07995187B2 Exposure apparatus and method for producing device 有权
公开(公告)号：US07995187B2
公开(公告)日：2011-08-09
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52 , G03B27/42
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.

8. 发明申请

US20080231825A1 Exposure Apparatus and method for producing device 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20080231825A1
公开(公告)日：2008-09-25
申请号：US12153234
申请日：2008-05-15
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
摘要翻译：曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。该装置还包括清洁构件的清洁系统。

9. 发明申请

US20070197770A1 Method Of Production And Apparatus For Producing Of Rubbery Polymer 审中-公开
标题翻译：橡胶聚合物生产方法及装置
公开(公告)号：US20070197770A1
公开(公告)日：2007-08-23
申请号：US10594757
申请日：2005-03-30
申请人： Kazuhiro Hikida , Hirotaka Kutami , Naoyuki Kobayashi , David Erbe
发明人： Kazuhiro Hikida , Hirotaka Kutami , Naoyuki Kobayashi , David Erbe
IPC分类号： C08F6/00
CPC分类号： C08C1/14 , B01F7/00766 , B01J2219/00006 , B29B7/402 , C08C1/15 , C08F6/22
摘要： A method of production of a rubbery polymer by adding a coagulating agent to a polymer latex to make the rubbery polymer ingredient coagulate, the method of production of a rubbery polymer having a step of using a crusher pump to make the rubbery polymer ingredient coagulate to obtain a crumb slurry, using as the crusher pump a pump having a head of 10 m or more. According to this invention, in a method of production of a rubbery polymer by adding a coagulating agent to a polymer latex to make the rubbery polymer ingredient coagulate, an improvement of the operation efficiency and a reduction of the production process and production equipment are made possible and a reduction of the equipment costs and a reduction of the production costs can be achieved.
摘要翻译：一种通过向聚合物胶乳中加入凝固剂以使橡胶状聚合物成分凝固而制备橡胶状聚合物的方法，制备橡胶状聚合物的方法，该橡胶状聚合物具有使用破碎机泵使凝胶化聚合物成分凝固的步骤使用具有10μm或更大的头的泵作为破碎泵使用的碎屑浆料。根据本发明，在通过向聚合物胶乳中添加凝结剂以使橡胶状聚合物成分凝固的橡胶状聚合物的制造方法中，可以提高操作效率和减少生产工艺和生产设备可以实现设备成本的降低和生产成本的降低。

10. 发明申请

US20070035711A1 Exposure apparatus and method for producing device 有权
公开(公告)号：US20070035711A1
公开(公告)日：2007-02-15
申请号：US11585824
申请日：2006-10-25
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

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