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1. 发明申请

US20100028803A1 SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSITION, METHOD OF TREATING SURFACE OF RESIST PATTERN THEREWITH AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：用于电阻形成的表面处理剂，耐蚀组合物，处理耐蚀图案的表面的方法和形成耐蚀图案的方法
公开(公告)号：US20100028803A1
公开(公告)日：2010-02-04
申请号：US12533635
申请日：2009-07-31
申请人： Naoya SUGIMOTO , Shinji Tarutani , Sou Kamimura , Kazuto Shimada , Naoyuki Nishikawa , Tomotaka Tsuchimura , Yuko Tada
发明人： Naoya SUGIMOTO , Shinji Tarutani , Sou Kamimura , Kazuto Shimada , Naoyuki Nishikawa , Tomotaka Tsuchimura , Yuko Tada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/40 , G03F7/0046 , G03F7/0397 , G03F7/0757 , G03F7/2041
摘要： A surface treating agent for resist pattern formation comprises a compound having two or more nucleophilic functional groups in each of the molecules thereof, or its salt, and a solvent.
摘要翻译：用于抗蚀剂图案形成的表面处理剂包括在其每个分子中具有两个或更多个亲核官能团的化合物或其盐和溶剂。

2. 发明授权

US09217919B2 Photosensitive composition, pattern-forming method using the composition, and resin used in the composition 有权
标题翻译：使用组合物的感光组合物，图案形成方法和组合物中使用的树脂
公开(公告)号：US09217919B2
公开(公告)日：2015-12-22
申请号：US13062285
申请日：2009-08-26
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
IPC分类号： G03F7/004 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , G03F7/039 , C09D125/18
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F222/36 , C08F212/32 , C08F2220/1883
摘要： A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
摘要翻译：一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B），其具有至少一个酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用而离开的基团保护的基团，其中化合物中包含的部分结构（A）的离子结构位点（ P）是在通过光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。

3. 发明申请

US20110159433A1 PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION 有权
标题翻译：感光性组合物，使用该组合物的图案形成方法和在组合物中使用的树脂
公开(公告)号：US20110159433A1
公开(公告)日：2011-06-30
申请号：US13062285
申请日：2009-08-26
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
IPC分类号： G03F7/20 , C07C309/00 , C08F228/02 , G03F7/004 , C08F214/18 , C08F222/40
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F222/36 , C08F212/32 , C08F2220/1883
摘要： Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
摘要翻译：本发明提供一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B）至少一个酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用离开的基团保护，其中部分结构（A）的离子结构位点包含在化合物（P）是在用光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。

4. 发明授权

US08804145B2 Image processing apparatus, image processing method, and storage medium for realizing high-speed rendering processing 有权
标题翻译：用于实现高速渲染处理的图像处理装置，图像处理方法和存储介质
公开(公告)号：US08804145B2
公开(公告)日：2014-08-12
申请号：US13406222
申请日：2012-02-27
申请人： Naoyuki Nishikawa
发明人： Naoyuki Nishikawa
IPC分类号： G06F3/12
CPC分类号： G06K15/1894 , G06F3/1298 , G06K15/1822 , G06K15/1847 , G06K15/1849 , G06K15/1857 , G06T11/40
摘要： A method for image processing executed by an image processing apparatus includes sequentially receiving PDL data and transferring a figure included in the PDL data to processing in a subsequent stage, assigning edge extraction processing as a unit of processing for extracting edge information for each transferred figure, merging the edge information extracted from each figure, spooling the merged data in a tile format as intermediate data, and reading out the intermediate data in the tile format from spooling process and performing processing on each tile to generate a pixel from the intermediate data.
摘要翻译：由图像处理装置执行的图像处理方法包括顺序地接收PDL数据并将包括在PDL数据中的图像传送到后续处理中，分配边缘提取处理作为用于提取每个传送图形的边缘信息的处理单元，合并从每个图提取的边缘信息，以瓦片格式将合并的数据假脱机为中间数据，并从假脱机处理中读出瓦片格式的中间数据，并对每个瓦片执行处理以从中间数据生成像素。

5. 发明申请

US20100052196A1 OPTICALLY DRIVEN ACTUATOR AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：光驱驱动器及其制造方法
公开(公告)号：US20100052196A1
公开(公告)日：2010-03-04
申请号：US12161002
申请日：2007-01-19
申请人： Takayasu Yasuda , Naoyuki Nishikawa
发明人： Takayasu Yasuda , Naoyuki Nishikawa
IPC分类号： B29D7/01 , C08F20/00
CPC分类号： C08J5/18 , C07C245/08 , C08J2300/12 , F03G7/005
摘要： An optically driven actuator includes a crosslinked polymer obtained by crosslinking at least part of the side chains of a condensation polymer having, on its backbone chain, a photoisomerizable group that undergoes structural change under optical stimulation. The crosslinked polymer deforms reversibly depending on optical stimulation, thereby performing the function of an actuator.
摘要翻译：光学驱动致动器包括交联聚合物，该交联聚合物通过交联在其主链上具有在光刺激下经历结构变化的光可异构化基团的缩聚物的至少一部分侧链而交联。交联聚合物根据光刺激可逆地变形，由此执行致动器的功能。

6. 发明授权

US07261953B2 Organic electroluminescent device 有权
标题翻译：有机电致发光器件
公开(公告)号：US07261953B2
公开(公告)日：2007-08-28
申请号：US10912115
申请日：2004-08-06
申请人： Ryo Nishio , Naoyuki Nishikawa , Shinsuke Umegaki
发明人： Ryo Nishio , Naoyuki Nishikawa , Shinsuke Umegaki
IPC分类号： H05B33/12 , H01L51/54 , C09K11/06
CPC分类号： C09K11/06 , C09K19/3491 , C09K2211/1011 , C09K2211/1092 , H01L51/0052 , H01L51/0068 , H01L51/0076 , H01L51/0081 , H01L51/5012 , H01L51/529 , H01L2251/308 , H05B33/14 , Y10S428/917
摘要： An organic electroluminescent device including a pair of electrodes and a layer that is disposed between the pair of electrodes and includes a compound represented by the following formula (1): wherein each of A1, A2, B, C, n1 and n2 is given the definition as set forth in the specification and claims.
摘要翻译：一种有机电致发光器件，包括一对电极和设置在所述一对电极之间的层，并且包括由下式（1）表示的化合物：其中A 1，A 2， 2，B，C，n1和n2给出了在说明书和权利要求书中阐述的定义。

7. 发明申请

US20060286311A1 Composition for nonlinear optical material, optical element, nonlinear optical material, and process for producing the same 审中-公开
标题翻译：非线性光学材料，光学元件，非线性光学材料的组成及其制造方法
公开(公告)号：US20060286311A1
公开(公告)日：2006-12-21
申请号：US11448841
申请日：2006-06-08
申请人： Masaki Okazaki , Naoyuki Nishikawa
发明人： Masaki Okazaki , Naoyuki Nishikawa
IPC分类号： C09K19/38 , C09K19/52 , C09K19/54 , G02F1/361 , F21V9/00
CPC分类号： G02F1/3617 , C09K19/12 , C09K19/16 , C09K19/18 , C09K19/2007 , C09K19/2014 , C09K19/24 , C09K19/3483 , C09K19/3491 , C09K2019/0448 , C09K2019/0496 , Y10T428/10
摘要： A novel nonlinear optical material is disclosed. The nonlinear optical material comprises a nonlinear optically-responsive layer formed by exposing a layer of a composition to light under an external electric field or an external magnetic field. The composition comprises a liquid crystalline/nonlinear optically-responsive compound having a polymerizable group and a nonlinear optically-responsive group, and a compound having at least one photoresponsive isomerization group, or comprises a polymer having a nonlinear optically-responsive group and a photoresponsive isomerization group.
摘要翻译：公开了一种新型的非线性光学材料。非线性光学材料包括通过在外部电场或外部磁场下将组合物层曝光而形成的非线性光学响应层。该组合物包含具有可聚合基团和非线性光学响应性基团的液晶/非线性光学响应性化合物和具有至少一个光响应异构化基团的化合物，或包含具有非线性光学响应性基团和光响应异构化的聚合物组。

8. 发明授权

US5297877A Printer having color dumping function 失效
标题翻译：打印机具有颜色倾倒功能
公开(公告)号：US5297877A
公开(公告)日：1994-03-29
申请号：US813500
申请日：1991-12-26
申请人： Naoyuki Nishikawa
发明人： Naoyuki Nishikawa
IPC分类号： G06K15/00 , G06F13/00
CPC分类号： G06K15/00
摘要： An information generating apparatus by which selected code information is generated with a color that is different from that of other code information so as to highlight the selected code information. The apparatus includes a receiver which receives a group of code information, a selector which selects a desired piece of code information included in the code information group, and a detector which detects consumption amounts of coloring materials used when reproducing the code information group. The apparatus further includes a controller which controls operations so as to generate the selected code information by a color different from the color of the other code information when reproducing the code information group.
摘要翻译：一种信息生成装置，通过使用与其他代码信息不同的颜色生成所选择的代码信息，以便突出显示所选择的代码信息。该装置包括接收代码信息组的接收器，选择代码信息组中包含的期望代码信息的选择器，以及检测代码信息组再现时使用的着色材料的消耗量的检测器。该装置还包括控制器，其控制操作，以便在再现代码信息组时通过与其他代码信息的颜色不同的颜色生成所选择的代码信息。

9. 发明授权

US5221796A Glycerol derivatives 失效
标题翻译：甘油衍生物
公开(公告)号：US5221796A
公开(公告)日：1993-06-22
申请号：US833559
申请日：1992-02-11
申请人： Hideto Mori , Naoyuki Nishikawa
发明人： Hideto Mori , Naoyuki Nishikawa
IPC分类号： A61K9/127 , C07F9/10 , C07F9/117
CPC分类号： C07F9/117 , A61K9/127 , C07F9/10 , Y02P20/55
摘要： A glycerol derivative or a salt thereof is provided and the derivative is represented by the following general formula (I): ##STR1## wherein n is an integer ranging from 1 to 3; R.sup.1 represents a hydrogen atom or a group: --P(O)(OR.sup.2)(OR.sup.3) wherein R.sup.2 represents a hydrogen atom or a protective group for the phosphoric acid residue and R.sup.3 represents a hydrogen atom, a protective group for the phosphoric acid residue or a hydrophilic group; provided that the phosphoric acid residue represented by R.sup.1 may be in the form of a salt wih a proper counter ion; and, in respect of stereochemistry of asymmetric carbon atoms present in the molecule, the derivative or salt may be either an optically active isomer or a racemic isomer.These compounds are excellent in biological compatibility, dispersibility and chemical stability and that they can provide membranes having high flowability and high barrier properties as compared with conventional phospholipids.
摘要翻译：提供甘油衍生物或其盐，其衍生物由以下通式（I）表示：其中n为1至3的整数; R1表示氢原子或基团：-P（O）（OR2）（OR3）（OR3）其中R2表示氢原子或磷酸残基的保护基，R3表示氢原子，磷酸残基的保护基或亲水基团; 条件是由R1表示的磷酸残基可以是具有适当抗衡离子的盐的形式; 并且关于存在于分子中的不对称碳原子的立体化学，衍生物或盐可以是旋光异构体或外消旋异构体。这些化合物的生物相容性，分散性和化学稳定性优异，并且与常规磷脂相比，它们可以提供具有高流动性和高阻隔性的膜。

10. 发明授权

US08569513B2 Compound having a triptycene moiety 有权
标题翻译：具有三环类部分的化合物
公开(公告)号：US08569513B2
公开(公告)日：2013-10-29
申请号：US13073598
申请日：2011-03-28
申请人： Satoshi Tanaka , Masaki Okazaki , Naoyuki Nishikawa
发明人： Satoshi Tanaka , Masaki Okazaki , Naoyuki Nishikawa
IPC分类号： C07D327/04
CPC分类号： C07D339/06
摘要： A compound having a triptycene moiety represented by formula (1) is disclosed. In the formula, A1 and A2 represent —S—, —O—, —CO—, or —NR—; R1 and R3 represent a substituent; n is an integer from 0 to 2; R4 and R5 an electron-withdrawing group having a Hammett's substituent constant σp of equal to or more than 0; L11, L12, L21 and L22 represent a single bond or a divalent group selected from the group consisting of —O—, —S—, —S(═O)2—, —CO—, —OCO—, —COO—, —OCOO— and —NRA— where RA represents a C1-7 alkyl group or hydrogen atom, —CH2— and any combinations thereof; Z1 and Z2 represent a divalent 5- or 6-membered cyclic linking group; R21 and R22 represent a hydrogen atom or substituted or non-substituted alkyl group; and m1 and m2 each respectively represent an integer of from 0 to 2.
摘要翻译：公开了具有由式（1）表示的三联苯部分的化合物。在该式中，A1和A2表示-S-，-O - ， - CO-或-NR-; R1和R3表示取代基; n为0〜2的整数; R4和R5是具有等于或大于0的哈米特取代基常数sigmap的吸电子基团; L11，L12，L21和L22表示单键或选自-O - ， - S - ， - S（= O）2 - ， - CO - ， - OCO-，-COO-， -OCOO-和-NRA-，其中RA表示C1-7烷基或氢原子，-CH2-及其任何组合; Z 1和Z 2表示二价的5-或6-元环状连接基团; R 21和R 22表示氢原子或取代或未取代的烷基; m1和m2分别表示0〜2的整数。

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