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    • 7. 发明申请
    • Thin film magnetic head, method of manufacturing the same, and magnetic recording apparatus
    • 薄膜磁头,其制造方法和磁记录装置
    • US20050117251A1
    • 2005-06-02
    • US10996466
    • 2004-11-26
    • Naoto MatonoTatsuya HaradaShigeru Shoji
    • Naoto MatonoTatsuya HaradaShigeru Shoji
    • G11B5/31G11B5/127G11B5/147
    • G11B5/3116G11B5/1278G11B5/3163Y10T29/49032Y10T29/49041Y10T29/49043Y10T29/4906
    • The present invention provides a method of manufacturing a thin film magnetic head, capable of forming a magnetic pole layer as easily as possible. By etching a lower insulating layer and the upper insulating layer by RIE using a fluorine-based gas (CF4 or CHF3) or chlorine-based gas (Cl2 or BCl3), a magnetic pole formation space R1 is formed so as to have a uniform width in an upper insulating layer by and a magnetic pole formation space R2 is formed in the lower insulating layer so as to have a width gradually narrowed from width W1 to width W4 with distance from the magnetic pole formation space R1. After that, a plating film is grown in the magnetic pole formation spaces R1 and R2, thereby forming a main magnetic pole layer. Since the main magnetic pole layer is formed in one process by using the structural characteristics of the magnetic pole formation spaces R1 and R2, the process of forming the main magnetic pole layer is simplified and the number of processes required to form the main magnetic pole layer is reduced.
    • 本发明提供一种能够尽可能容易地形成磁极层的薄膜磁头的制造方法。 通过使用氟系气体(CF 3或CH 3 3)或氯系气体(Cl 2)蚀刻通过RIE的下绝缘层和上绝缘层, 2或BCl 3),磁极形成空间R 1形成为在上绝缘层中具有均匀的宽度,并且形成磁极形成空间R 2 下部绝缘层的宽度从宽度W1到宽度W4的宽度随着与磁极形成空间R 1的距离而逐渐变窄。 之后,在磁极形成空间R 1和R 2中生长电镀膜,从而形成主磁极层。 由于通过使用磁极形成空间R 1和R 2的结构特性在一个工序中形成主磁极层,所以形成主磁极层的过程被简化,并且形成主磁场所需的工艺数量 极层减少。