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1. 发明授权

US6084050A Thermo-optic devices 失效
标题翻译：热光器件
公开(公告)号：US6084050A
公开(公告)日：2000-07-04
申请号：US4079
申请日：1998-01-07
申请人： Naoki Ooba , Toshio Watanabe , Takashi Kurihara , Saburo Imamura , Shoichi Hayashida , Toshiaki Tamamura , Tetsuyoshi Ishii , Yasuyuki Inoue , Seiji Toyoda
发明人： Naoki Ooba , Toshio Watanabe , Takashi Kurihara , Saburo Imamura , Shoichi Hayashida , Toshiaki Tamamura , Tetsuyoshi Ishii , Yasuyuki Inoue , Seiji Toyoda
IPC分类号： G02B6/12 , G02B6/34 , G02F1/01 , G02F1/065 , G02F1/313 , C08G77/24 , C08G77/18 , G02B6/10
CPC分类号： G02F1/065 , G02B2006/12069 , G02B2006/12107 , G02B2006/12109 , G02B2006/12159 , G02B2006/12164 , G02B2006/12173 , G02B6/12023 , G02F1/0147 , G02F1/3137 , G02F2201/307
摘要： In a digital thermo-optic switch and an optical ADM filter of the present invention, functional components such as a splitter and a grating structure part formed in the course of an optical circuit as a component are composed of silicone materials which are superior in heat resistance, reduced loss, and low birefringence, thereby achieving sufficiently practical thermal stability, low loss at 1.55 to 1.58 .mu.m band, wavelength selectivity, and cost reduction.
摘要翻译：在本发明的数字热电开关和光学ADM滤波器中，作为光学电路的部件形成的分光器和光栅结构部件等功能部件由耐热性优异的有机硅材料构成，降低损耗和低双折射，从而实现足够实用的热稳定性，在1.55至1.58μm波段的低损耗，波长选择性和成本降低。

2. 发明授权

US06395447B1 Resist material and fabrication method thereof 有权
标题翻译：抗蚀材料及其制造方法
公开(公告)号：US06395447B1
公开(公告)日：2002-05-28
申请号：US09627786
申请日：2000-07-27
申请人： Tetsuyoshi Ishii , Toshiaki Tamamura , Hiroshi Nozawa , Kenji Kurihara
发明人： Tetsuyoshi Ishii , Toshiaki Tamamura , Hiroshi Nozawa , Kenji Kurihara
IPC分类号： G03F7023
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0085 , G03F7/0226 , G03F7/039 , G03F7/09 , Y10S427/102 , Y10S428/913 , Y10S430/143 , Y10S524/905 , Y10T428/25 , Y10T428/31511 , Y10T428/31855
摘要： A resist material having a resist and particles mixed into the resist, a major component of the particles being a cluster of carbon atoms, is provided. A method for fabricating a resist material is also provided, the method repeatedly performing: a first step of coating a substrate with a resist film; and a second step of depositing particles whose major component is a cluster of carbon atoms on the resist film. Accordingly, a resist film with high etching resistance can be obtained, and it is possible to realize a reduction in the thickness of the resist film, improvements of contrast of resist patterns; resist sensitivity; heat resistance of resist films; mechanical strength of resist patterns; and further, stabilization of resist sensitivity. Therefore, highly precise fine pattern fabrication can be realized.
摘要翻译：提供了具有抗蚀剂的抗蚀剂材料和混入抗蚀剂中的颗粒，颗粒的主要成分是碳原子簇。还提供了制造抗蚀剂材料的方法，该方法重复地进行：第一步骤，用抗蚀剂膜涂覆基底; 以及将主要成分为碳原子簇的粒子沉积在抗蚀剂膜上的第二步骤。因此，可以获得具有高耐腐蚀性的抗蚀剂膜，并且可以实现抗蚀剂膜的厚度的减小，抗蚀剂图案的对比度的改善; 抗敏性; 抗蚀剂膜的耐热性; 抗蚀剂图案的机械强度; 并进一步提高抗光敏度的稳定性。因此，可以实现高精度的精细图案制造。

3. 发明授权

US06177231B1 Resist material and fabrication method thereof 失效
标题翻译：抗蚀材料及其制造方法
公开(公告)号：US06177231B1
公开(公告)日：2001-01-23
申请号：US08870273
申请日：1997-06-06
申请人： Tetsuyoshi Ishii , Toshiaki Tamamura , Hiroshi Nozawa , Kenji Kurihara
发明人： Tetsuyoshi Ishii , Toshiaki Tamamura , Hiroshi Nozawa , Kenji Kurihara
IPC分类号： B32B2714
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0085 , G03F7/0226 , G03F7/039 , G03F7/09 , Y10S427/102 , Y10S428/913 , Y10S430/143 , Y10S524/905 , Y10T428/25 , Y10T428/31511 , Y10T428/31855
摘要： A resist material having a resist and particles mixed into the resist, a major component of the particles being a cluster of carbon atoms, is provided. A method for fabricating a resist material is also provided, the method repeatedly performing: a first step of coating a substrate with a resist film; and a second step of depositing particles whose major component is a cluster of carbon atoms on the resist film. Accordingly, a resist film with high etching resistance can be obtained, and it is possible to realize a reduction in the thickness of the resist film, improvements of contrast of resist patterns; resist sensitivity; heat resistance of resist films; mechanical strength of resist patterns; and further, stabilization of resist sensitivity. Therefore, highly precise fine pattern fabrication can be realized.
摘要翻译：提供了具有抗蚀剂的抗蚀剂材料和混入抗蚀剂中的颗粒，颗粒的主要成分是碳原子簇。还提供了制造抗蚀剂材料的方法，该方法重复地进行：第一步骤，用抗蚀剂膜涂覆基底; 以及将主要成分为碳原子簇的粒子沉积在抗蚀剂膜上的第二步骤。因此，可以获得具有高耐腐蚀性的抗蚀剂膜，并且可以实现抗蚀剂膜的厚度的减小，抗蚀剂图案的对比度的改善; 抗敏性; 抗蚀剂膜的耐热性; 抗蚀剂图案的机械强度; 并进一步提高抗光敏度的稳定性。因此，可以实现高精度的精细图案制造。

4. 发明授权

US06654532B1 Read-only laminated information recording medium and manufacturing method therefor 有权
标题翻译：只读层压信息记录介质及其制造方法
公开(公告)号：US06654532B1
公开(公告)日：2003-11-25
申请号：US09347275
申请日：1999-07-06
申请人： Satoru Tomaru , Makoto Hikita , Tadayuki Imai , Tetsuyoshi Ishii , Haruki Kozawaguchi , Saburo Imamura , Shogo Yagi
发明人： Satoru Tomaru , Makoto Hikita , Tadayuki Imai , Tetsuyoshi Ishii , Haruki Kozawaguchi , Saburo Imamura , Shogo Yagi
IPC分类号： G02B610
CPC分类号： G11B7/24012 , G03H1/0408 , G03H1/26 , G03H2001/2615 , G03H2260/12 , G11B7/0065 , G11B7/24038 , G11B2007/0013 , G11C13/042
摘要： A laminated optical medium for read-only information recording has ultra-high memory capacity and reliably extracts desired information from laminated memories. Methods for low-cost mass production of laminated read-only medium are demonstrated. The optical medium is a lamination of planar type waveguides made of polymeric materials, in which each waveguide has information recorded as periodic scattering factor to generate scattered light by injection of input light into a waveguide layer. Therefore, read-only information recording medium of ultra-high memory capacity, equivalent to the memory capacity achievable by volume holography, can be produced by using a low-cost planar holographic technique. The laminated medium is simple and energy conserving, because it does not require rotation mechanisms for reproduction of music and video holographic recordings. The medium is ideally suited as identification card, because the card is difficult to counterfeit and a high level of extra information can be stored conveniently for use in a wide range of potential applications.
摘要翻译：用于只读信息记录的叠层光学介质具有超高的存储容量并可靠地从叠层存储器中提取所需的信息。证明了用于低成本批量生产层压的只读介质的方法。光学介质是由聚合材料制成的平面型波导的叠层，其中每个波导具有记录为周期性散射因子的信息，以通过将输入光注入到波导层中来产生散射光。因此，可以通过使用低成本的平面全息技术来产生与通过体全息术可实现的存储容量相当的超高存储容量的只读信息记录介质。层压介质简单节能，因为它不需要用于再现音乐和视频全息记录的旋转机构。该介质非常适合作为识别卡，因为卡难以伪造，并且可以方便地存储高水平的额外信息以用于广泛的潜在应用。

5. 发明授权

US4634645A Method of forming resist micropattern 失效
标题翻译：形成抗蚀剂微图案的方法
公开(公告)号：US4634645A
公开(公告)日：1987-01-06
申请号：US721306
申请日：1985-04-09
申请人： Tadahito Matsuda , Katsuhiro Harada , Shigeru Moriya , Tetsuyoshi Ishii
发明人： Tadahito Matsuda , Katsuhiro Harada , Shigeru Moriya , Tetsuyoshi Ishii
IPC分类号： G03F7/00 , G03F7/40 , G03C5/00
CPC分类号： G03F7/40 , G03F7/0035 , Y10S430/143 , Y10S430/168
摘要： A resist pattern is formed on a substrate by forming a resist on a substrate and radiating an energy beam carrying predetermined pattern information onto the resist, thereby forming a recessed pattern in a surface portion of the resist so as not to extend through the resist. A flat mask layer is formed on the resist including the recessed pattern. The mask layer is uniformly etched along a direction of thickness thereof until at least a surface of the resist is exposed to allow the mask layer to remain on at least a bottom of the recessed pattern, thereby forming a mask pattern comprising the remaining residual mask layer. Finally, the resist is etched by using the mask pattern as an etching mask.
摘要翻译：通过在基板上形成抗蚀剂并将载有预定图案信息的能量束辐射到抗蚀剂上，从而在抗蚀剂的表面部分形成凹陷图形，从而在基板上形成抗蚀剂图案，以便不延伸通过抗蚀剂。在包括凹陷图案的抗蚀剂上形成平坦的掩模层。沿其厚度方向均匀地蚀刻掩模层，直到抗蚀剂的至少一个表面露出，以使掩模层保持在至少凹陷图案的底部，从而形成包括剩余的残留掩模层的掩模图案。最后，通过使用掩模图案作为蚀刻掩模蚀刻抗蚀剂。

6. 发明授权

US06456760B1 Optical signal processing apparatus and optical signal processing method 失效
标题翻译：光信号处理装置和光信号处理方法
公开(公告)号：US06456760B1
公开(公告)日：2002-09-24
申请号：US09512550
申请日：2000-02-24
申请人： Takashi Kurokawa , Hiroyuki Tsuda , Katsunari Okamoto , Kazunori Naganuma , Tetsuyoshi Ishii , Hirokazu Takenouchi
发明人： Takashi Kurokawa , Hiroyuki Tsuda , Katsunari Okamoto , Kazunori Naganuma , Tetsuyoshi Ishii , Hirokazu Takenouchi
IPC分类号： G02B626
CPC分类号： G02B6/12011 , G02B6/12007 , G02B6/12014 , G02B6/12021 , G02B6/12023 , G02B6/12033 , G02B6/2931 , G02B6/29394 , G02B6/4215 , G02B2006/12104 , G02B2006/12107 , G03H1/0005 , G03H1/0808 , G03H2222/33
摘要： An optical signal processing apparatus includes a first optical waveguide and a first slab waveguide configured to equally distribute an output light of the first optical waveguide. A first arrayed waveguide includes an aggregate of optical waveguides changing in optical length by a constant interval for dividing the output light. A second slab waveguide focuses the optical output of the first arrayed waveguide. A spatial filter receives incident light focused by the second slab waveguide and distributes the incident light on a straight line. The spatial filter also modulates the light into a desired amplitude according to the position on the straight line. The apparatus also includes a second arrayed waveguide and an aggregate of optical waveguides changing in optical length by a constant interval for applying light modulated by the spatial filter to the second arrayed waveguide. Structure is provided for converging the output light of said second arrayed waveguide to a single point. The resulting output light is then appiled to a second optical waveguide.
摘要翻译：光信号处理装置包括第一光波导和第一平板波导，其被配置为均匀分布第一光波导的输出光。第一阵列波导包括光学波长的聚集体，其以光学长度改变用于分割输出光的恒定间隔。第二平板波导将第一阵列波导的光输出聚焦。空间滤波器接收由第二平板波导聚焦的入射光并将入射光分布在直线上。空间滤波器还根据直线上的位置将光调制成所需的幅度。该装置还包括第二阵列波导和光波导的聚集体，其光学长度改变一定的间隔，以将由空间滤波器调制的光施加到第二阵列波导。提供了用于将所述第二阵列波导的输出光会聚到单个点的结构。然后将所得到的输出光吸引到第二光波导。

7. 发明授权

US6122419A Optical signal processing apparatus and optical signal processing method 失效
标题翻译：光信号处理装置和光信号处理方法
公开(公告)号：US6122419A
公开(公告)日：2000-09-19
申请号：US921844
申请日：1997-09-02
申请人： Takashi Kurokawa , Hiroyuki Tsuda , Katsunari Okamoto , Kazunori Naganuma , Tetsuyoshi Ishii , Hirokazu Takenouchi
发明人： Takashi Kurokawa , Hiroyuki Tsuda , Katsunari Okamoto , Kazunori Naganuma , Tetsuyoshi Ishii , Hirokazu Takenouchi
IPC分类号： G02B6/12 , G02B6/34 , G03H1/00 , G03H1/08 , G02B6/26
CPC分类号： G02B6/12011 , G02B6/12007 , G02B6/12014 , G02B6/12021 , G02B6/12023 , G02B6/12033 , G02B6/2931 , G02B6/29394 , G02B6/4215 , G03H1/0005 , G03H1/0808 , G02B2006/12104 , G02B2006/12107 , G03H2222/33
摘要： The present invention relates to an optical signal processing apparatus and optical signal processing method which enable generation, waveform shaping, waveform measurement, waveform recording, correlation processing, and the like of optical pulses of 1-10 ps. A basic construction of the optical signal processing apparatus includes an optical waveguide, a first structure for equally distributing output light of the optical waveguide, an optical waveguide comprising an aggregate of optical waveguides changing in optical length by a constant interval, a arrayed waveguide for dividing the output light, second structure for focusing optical output of the arrayed waveguide, and a mirror for receiving and reflecting incident light focused by the second structure. Or, the apparatus includes an optical waveguide, first structure for equally distributing output light of the optical waveguide, a arrayed waveguide comprising an aggregate of optical waveguides changing in optical length by a constant interval for dividing the output light, second structure for focusing optical output of the arrayed waveguide, and a spatial filter for receiving light focused by the second structure to distribute the incident light on a straight line and making desired amplitude or phase modulation of the light according to the position on the straight line and reflecting the light.
摘要翻译：光信号处理装置和光信号处理方法技术领域本发明涉及能够进行1-10ps光脉冲的生成，波形整形，波形测量，波形记录，相关处理等的光信号处理装置和光信号处理方法。光信号处理装置的基本结构包括：光波导，用于均匀分布光波导的输出光的第一结构;光波导，包括以恒定间隔在光长度上变化的光波导的集合;阵列波导，用于分割用于聚焦阵列波导的光输出的输出光，第二结构和用于接收和反射由第二结构聚焦的入射光的反射镜。或者，该装置包括：光波导，用于均匀地分配光波导的输出光的第一结构;阵列波导，包括光学波长的集合，光学波长的集合以恒定的间隔改变以分割输出光;第二结构，用于聚焦光输出以及用于接收由第二结构聚焦的光的空间滤光器，以将入射光分布在直线上，并根据直线上的位置并反射光来对光进行所需的幅度或相位调制。

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