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1. 发明申请

WO0225723A2 LATERAL SHIFT MEASUREMENT USING AN OPTICAL TECHNIQUE 审中-公开
标题翻译：使用光学技术的横向移位测量
公开(公告)号：WO0225723A2
公开(公告)日：2002-03-28
申请号：PCT/IL0100884
申请日：2001-09-20
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , FINAROV MOSHE , SCHEINER DAVID
发明人： BRILL BOAZ , FINAROV MOSHE , SCHEINER DAVID
IPC分类号： H01L21/66
CPC分类号： G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
摘要： The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.
摘要翻译：用于控制多层样品（10）中的层对准的方法，这种半导体晶片基于检测从图案化结构（12,14）衍射的辐射的衍射效率，所述图案化结构（12,14）在样品的两个不同层中彼此上下。

2. 发明专利

AU2246402A A method ad system for measuring in patterned structures 未知
公开(公告)号：AU2246402A
公开(公告)日：2002-06-18
申请号：AU2246402
申请日：2001-12-07
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , FINAROV MOSHE
发明人： BRILL BOAZ , FINAROV MOSHE
IPC分类号： G01B15/00 , G01N21/47 , G01N21/956 , H01J37/28 , G01B11/02 , G01N23/225 , H01L21/66
摘要： A measurement method and system are presented for measuring parameters of a patterned structure. Scatterometry and SEM measurements are applied to the structure, measured data indicative of, respectively, the structure parameters and lateral pattern dimensions of the structure are generated. The entire measured data are analyzed so as to enable using measurement results of either one of the scatterometry and SEM measurements for optimizing the other measurement results.

3. 发明申请

WO2009078014A2 MEASUREMENT SYSTEM AND METHOD 审中-公开
标题翻译：测量系统和方法
公开(公告)号：WO2009078014A2
公开(公告)日：2009-06-25
申请号：PCT/IL2008001627
申请日：2008-12-16
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , SANDIK SHIMON
发明人： BRILL BOAZ , SANDIK SHIMON
IPC分类号： G06T7/40
CPC分类号： G01B21/047 , H01L21/67745 , H01L21/67769
摘要： A multi-station measurement system concept is presented, particularly based on an X-Y stage and plurality of horizontal load/unload units. The system allows loading/unloading of wafers from several load/unload units by the direct action of the X-Y stage, thus creating a buffer for wafers without actually requiring an additional buffer mechanism.
摘要翻译：提出了一种多站测量系统概念，特别是基于X-Y平台和多个水平加载/卸载单元。该系统允许通过X-Y平台的直接作用从多个加载/卸载单元加载/卸载晶片，从而为晶片创建缓冲器，而不需要额外的缓冲机构。

4. 发明申请

WO2009019690A3 METHOD AND SYSTEM FOR OPTICAL MEASUREMENTS 审中-公开
标题翻译：光学测量方法与系统
公开(公告)号：WO2009019690A3
公开(公告)日：2010-03-04
申请号：PCT/IL2008001073
申请日：2008-08-05
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , GOLBER RAFAEL , MUZIKOVSKY VLADIMIR
发明人： BRILL BOAZ , GOLBER RAFAEL , MUZIKOVSKY VLADIMIR
IPC分类号： G01J4/00
CPC分类号： G01N21/956 , G01J3/02 , G01J3/0208 , G01J3/0218 , G01J3/0237 , G01J3/0291 , G01J3/447 , G01J3/453 , G01J2003/1213
摘要： An optical measurement Method and System for spectroscopy are disclosed for evaluating the parameters of a sample. The device generally includes a broadband source for generating a light beam. Reflected light beam are simultaneously analyzed as a function of the position within the beam to provide information at multiple wavelengths and/or angular distribution. A Furier filter, comprising dispersion element and a two-dimensional photodetector array are used so that the beam may be simultaneously or consicuently analyzed at multiple angles of returned from the sample (diffracted) light at multiple wavelengths.
摘要翻译：公开了用于评估样品参数的光学测量方法和系统。该装置通常包括用于产生光束的宽带源。作为光束内的位置的函数同时分析反射光束，以提供多个波长和/或角度分布的信息。使用包括色散元件和二维光电检测器阵列的富尔滤光器，使得可以以从多个波长的样品（衍射）光返回的多个角度同时或仔细地分析光束。

5. 发明申请

WO2008149373A3 OPTICAL METHOD AND SYSTEM UTILIZING OPERATING WITH DEEP OR VACUUM UV SPECTRA 审中-公开
标题翻译：使用深度或真空紫外光谱的光学方法和系统
公开(公告)号：WO2008149373A3
公开(公告)日：2009-03-12
申请号：PCT/IL2008000780
申请日：2008-06-05
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , KORSHUNOV OLEG
发明人： BRILL BOAZ , KORSHUNOV OLEG
IPC分类号： G01N21/33 , G01N21/15
CPC分类号： G01N21/33 , G01N21/15 , G01N21/9501 , G01N2021/151 , G01N2021/335
摘要： An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.
摘要翻译：提供了用于制品的光学处理的装置和方法。该装置包括：一个或多个光学窗口，用于引导预定的电磁辐射通过其中以照亮感兴趣的区域并收集从照明区域返回的辐射; 以及两个或更多个端口，可操作用于在待处理的制品上从感兴趣区域附近输入或排出一种或多种气体，以在所述区域附近形成基本静态的环境状态，对于所述电磁辐射是不可吸收的，从而减少所述感兴趣区域附近的环境气体的量，并且能够在将物品保持在环境气体环境中的同时进行光学处理。

6. 发明申请

WO2012093400A1 METHOD AND SYSTEM FOR USE IN MEASURING IN COMPLEX PATTERNED STRUCTURES 审中-公开
标题翻译：用于测量复杂图案结构的方法和系统
公开(公告)号：WO2012093400A1
公开(公告)日：2012-07-12
申请号：PCT/IL2012050003
申请日：2012-01-03
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , SHERMAN BORIS
发明人： BRILL BOAZ , SHERMAN BORIS
IPC分类号： G01B11/24 , G01N21/47
CPC分类号： G06F17/50 , G01B11/24 , G01N21/4788
摘要： A method and system are presented for use in measuring in complex patterned structures. A full model and at least one approximate model are provided for the same measurement site in a structure, said at least one approximate model satisfying a condition that a relation between the full model and the approximate model is defined by a predetermined function. A library is created for simulated data calculated by the approximate model for the entire parametric space of the approximate model. Also provided is data corresponding to simulated data calculated by the full model in selected points of said parametric space. The library for the approximate model data and said data of the full model are utilized for creating a library of values of a correction term for said parametric space, the correction term being determined as said predetermined function of the relation between the full model and the approximate model. This enable to process measured data by fitting said measured data to the simulated data calculated by the approximate model corrected by a corresponding value of the correction term.
摘要翻译：提出了一种用于复杂图案结构测量的方法和系统。所述至少一个近似模型满足完全模型和近似模型之间的关系由预定功能定义的条件，为整个模型和至少一个近似模型提供了结构中的相同测量点。为近似模型的整个参数空间的近似模型计算的模拟数据创建库。还提供了对应于在所述参数空间的选定点中由完整模型计算的模拟数据的数据。用于近似模型数据的库和所述完整模型的所述数据用于创建用于所述参数空间的校正项的值的库，所述校正项被确定为所述完整模型和所述近似模型之间的关系的所述预定函数模型。这使得能够通过将所测量的数据拟合到由校正项的对应值校正的近似模型计算的模拟数据来处理测量数据。

7. 发明申请

WO03075042A2 OPTICAL MEASUREMENTS OF PATTERNED STRUCTURES 审中-公开
标题翻译：模式结构的光学测量
公开(公告)号：WO03075042A2
公开(公告)日：2003-09-12
申请号：PCT/IL0300168
申请日：2003-03-04
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , GOV SHAHAR
发明人： BRILL BOAZ , GOV SHAHAR
IPC分类号： G01B11/30 , G03F7/20 , G02B
CPC分类号： G03F7/70625 , G01B11/306
摘要： A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for generating incident radiation, a spectrophotometer arrangement (30) for detecting a spectral response of the structure to the incident radiation, and an optical arrangement (2) for directing the incident light to the structure and collecting the response of the structure, said optical arrangement (2) comprising a numerical aperture (32) selectively limiting the range of at least one of light incidence or collecting angles in direction substantially perpendicular to longitudinal axes of said elongated regions of the pattern.
摘要翻译：一种在结构中进行光学测量的方法和系统，其具有与所述区域之间的空间不同的光学性质的间隔开的平行细长区域形式的图案。该系统包括用于产生入射辐射的宽带照明器（8），用于检测结构对入射辐射的光谱响应的分光光度计装置（30），以及用于将入射光引导到结构并收集所述结构的响应，所述光学装置（2）包括数值孔径（32），其选择性地限制在基本上垂直于所述图案的所述细长区域的纵向轴线的方向上的入射光或收集角中的至少一个的范围。

8. 发明申请

WO2013011508A3 OPTICAL SYSTEM AND METHOD FOR MEASURING IN PATTERNED STUCTURES 审中-公开
标题翻译：光学系统和测绘方法
公开(公告)号：WO2013011508A3
公开(公告)日：2013-03-07
申请号：PCT/IL2012050253
申请日：2012-07-18
申请人： NOVA MEASURING INSTR LTD , BARAK GILAD , BRILL BOAZ
发明人： BARAK GILAD , BRILL BOAZ
IPC分类号： G03F7/20 , G01B11/22
CPC分类号： G01B11/22 , G01B11/24 , G01N21/27 , G01N21/9501 , G03F7/70625 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An optical system is presented for use in measuring in patterned structures having vias. The optical system comprises an illumination channel for propagating illuminated light onto the structure being measured; a detection channel for collecting light returned from the illuminated structure to a detection unit; and an attenuation assembly accommodated in the illumination and detection channels and being configured and operable for selectively attenuating light propagating along the detection channel, the attenuation creating a predetermined condition for the selectively attenuated light, said predetermined condition being defined by a predetermined ratio between a first light portion corresponding to a dark field condition and a second light portion corresponding to a bright field condition in said selectively attenuated light, detected selectively attenuated light being therefore indicative of at least one parameter of the via being illuminated.
摘要翻译：提供了一种用于在具有通孔的图案化结构中进行测量的光学系统。光学系统包括用于将照明光传播到所测量的结构上的照明通道; 用于将从照明结构返回的光聚集到检测单元的检测通道; 以及衰减组件，其容纳在所述照明和检测通道中并且被配置和可操作以选择性地衰减沿着所述检测通道传播的光，所述衰减产生用于所述选择性衰减的光的预定条件，所述预定条件由第一对应于暗场条件的光部分和对应于所述选择性衰减的光中的亮场条件的第二光部分，所检测的选择性衰减的光因此指示经过被照亮的至少一个参数。

9. 发明申请

WO2009107143A3 LINE EDGE ROUGHNESS MEASURING TECHNIQUE AND TEST STRUCTURE 审中-公开
标题翻译：线边缘粗糙度测量技术和测试结构
公开(公告)号：WO2009107143A3
公开(公告)日：2010-03-11
申请号：PCT/IL2009000233
申请日：2009-03-01
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ
发明人： BRILL BOAZ
IPC分类号： H01L23/544
CPC分类号： G03F7/70625 , G03F7/70616
摘要： A test structure is presented test structure on a substrate for monitoring a LER and/or LWR effect, said test structure comprising an array of features manufactured with amplified LER and/or LWR effect.
摘要翻译：测试结构呈现在用于监测LER和/或LWR效应的衬底上的测试结构，所述测试结构包括用扩增的LER和/或LWR效应制造的特征阵列。

10. 发明专利

AU2003209646A1 OPTICAL MEASUREMENTS OF LINE EDGE ROUGHNESS 未知
公开(公告)号：AU2003209646A1
公开(公告)日：2003-09-16
申请号：AU2003209646
申请日：2003-03-04
申请人： NOVA MEASURING INSTR LTD
发明人： BRILL BOAZ
IPC分类号： G01B11/00 , G01N21/956 , G03F7/20
摘要： A method and system for optical measurements of line edge roughness (LER) of patterned structures based on illuminating the structure with incident radiation and detecting a spectral response of the structure, and further applying software and/or hardware utilities for deriving information representative of said line edge roughness parameter/s from said spectral response of the structure.

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