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1. 发明申请

WO0225723A2 LATERAL SHIFT MEASUREMENT USING AN OPTICAL TECHNIQUE 审中-公开
标题翻译：使用光学技术的横向移位测量
公开(公告)号：WO0225723A2
公开(公告)日：2002-03-28
申请号：PCT/IL0100884
申请日：2001-09-20
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , FINAROV MOSHE , SCHEINER DAVID
发明人： BRILL BOAZ , FINAROV MOSHE , SCHEINER DAVID
IPC分类号： H01L21/66
CPC分类号： G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
摘要： The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.
摘要翻译：用于控制多层样品（10）中的层对准的方法，这种半导体晶片基于检测从图案化结构（12,14）衍射的辐射的衍射效率，所述图案化结构（12,14）在样品的两个不同层中彼此上下。

2. 发明申请

WO03075099A2 METHOD AND SYSTEM FOR OVERLAY MEASUREMENT 审中-公开
标题翻译：用于覆盖测量的方法和系统
公开(公告)号：WO03075099A2
公开(公告)日：2003-09-12
申请号：PCT/IL0300176
申请日：2003-03-06
申请人： NOVA MEASURING INSTR LTD , FINAROV MOSHE , SCHEINER DAVID
发明人： FINAROV MOSHE , SCHEINER DAVID
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70633
摘要： An optical measurement method and system are presented for imaging two target structures T1, T2 in two parallel layers L1, L2, respectively, of a sample W, to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer L1. The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement 14, and the collected radiation response is split into two spatially separated radiation components B1res, B2res. The split radiation components are directed towards at least one imaging plane 24 or 26 along different optical channels characterized by optical paths of different lengths S1, S2, respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures.
摘要翻译：提出了一种光学测量方法和系统，用于分别对样本W的两个平行层L1，L2中的两个目标结构T1，T2进行成像，以便能够沿着层的两个相互垂直的轴确定两个目标结构之间的配准 L1。用入射辐射照射样品以产生样品的辐射响应。辐射响应由物镜装置14收集，并且收集的辐射响应被分成两个空间上分离的辐射分量B1res，B2res。分离的辐射分量被引导到沿着不同的光通道的至少一个成像平面24或26，其特征在于分别具有不同长度S1，S2的光路。在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。

3. 发明申请

WO03075099A8 METHOD AND SYSTEM FOR OVERLAY MEASUREMENT 审中-公开
标题翻译：用于覆盖测量的方法和系统
公开(公告)号：WO03075099A8
公开(公告)日：2005-02-17
申请号：PCT/IL0300176
申请日：2003-03-06
申请人： NOVA MEASURING INSTR LTD , FINAROV MOSHE , SCHEINER DAVID
发明人： FINAROV MOSHE , SCHEINER DAVID
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70633
摘要： An optical measurement method and system are presented for imaging two target structures (T1, T2) in two parallel layers (L1, L2), respectively, of a sample (W), to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer (L1). The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement (14), and the collected radiation response is split into two spatially separated radiation components (B(1)res, B(2)res). The split radiation components are directed towards at least one imaging plane (24 or 26) along different optical channels characterized by optical paths of different lengths (S1, S2), respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures.
摘要翻译：提出了一种光学测量方法和系统，用于分别对样本（W）的两个并联层（L1，L2）成像两个目标结构（T1，T2），以便确定两个目标结构之间的对准层（L1）的相互垂直的轴。用入射辐射照射样品以产生样品的辐射响应。辐射响应由物镜装置（14）收集，所收集的辐射响应被分成两个空间上分离的辐射分量（B（1）res，B（2）res）。沿着沿着不同长度的光路（S1，S2）分别表征的不同的光通道，分开的辐射分量指向至少一个成像平面（24或26）。在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。

4. 发明申请

WO2009074984A3 OPTICAL SYSTEM AND METHOD FOR MEASUREMENT OF ONE OR MORE PARAMETERS OF VIA-HOLES 审中-公开
标题翻译：用于测量一个或多个通道参数的光学系统和方法
公开(公告)号：WO2009074984A3
公开(公告)日：2010-03-11
申请号：PCT/IL2008001599
申请日：2008-12-10
申请人： NOVA MEASURING INSTR LTD , SCHEINER DAVID
发明人： SCHEINER DAVID
IPC分类号： G01B5/02
CPC分类号： G01B11/00 , G01B11/02 , G01B11/08 , G01B11/12 , G01B11/22 , G01B11/24 , G01B2210/56 , G01R31/2853 , G01R31/311 , G06T7/0004 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.
摘要翻译：本发明提供了一种用于通过非破坏性技术获得通孔的横截面轮廓，深度，宽度，斜率，底切和其它参数中的至少一个的新颖系统和方法。光学系统包括用于产生至少一个光束并将其引导到包含至少一个通孔的结构的区域中的样品的照明系统; 检测系统，被配置和可操作以收集从所述被照射区域反射的光的图案，所述光图案指示所述通孔的一个或多个参数; 以及连接到所述检测系统的控制系统，所述控制系统包括用于存储预定理论模型的存储器实用程序，所述预定理论模型包括表示描述通孔反射模式的一组参数的数据，以及数据处理和分析实用程序，接收和分析指示检测到的光图案的图像数据，并确定所述通孔的一个或多个参数。

5. 发明申请

WO0161746A3 TEST STRUCTURE FOR METAL CMP PROCESS CONTROL 审中-公开
标题翻译：金属CMP工艺控制测试结构
公开(公告)号：WO0161746A3
公开(公告)日：2002-02-21
申请号：PCT/IL0100159
申请日：2001-02-20
申请人： NOVA MEASURING INSTR LTD , RAVID AVI , MACHAVARIANI VLADIMIR , WEINGARTEN AMIT , SCHEINER DAVID
发明人： RAVID AVI , MACHAVARIANI VLADIMIR , WEINGARTEN AMIT , SCHEINER DAVID
IPC分类号： B24B37/04 , B24B49/12 , B24B49/14 , H01L21/321 , H01L23/544 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12 , B24B49/14 , H01L21/3212 , H01L22/34
摘要： A test structure is presented to be formed on a patterned structure and to be used for controlling a CMP process applied to the patterned structure, which has a pattern area formed by spaced-apart metal-containing regions representative of real features of the patterned structure. The test structure thus undergoes the same CMP processing as the pattern area. The test structure comprises at least one pattern zone in the form of a metal area with at least one region included in the metal area and made of a material relatively transparent with respect to incident light, as compared to that of the metal.
摘要翻译：呈现在图案化结构上形成的测试结构，并且用于控制施加到图案化结构的CMP工艺，其具有由表示图案化结构的实际特征的间隔开的含金属区域形成的图案区域。因此，测试结构经历与图案区域相同的CMP处理。测试结构包括金属区域形式的至少一个图案区域，其中至少一个区域包括在金属区域中并且由与金属相比相对于入射光相对透明的材料制成。

6. 发明申请

WO2006059330A3 REFLECTIVE OPTICAL SYSTEM 审中-公开
标题翻译：反射光学系统
公开(公告)号：WO2006059330A3
公开(公告)日：2006-08-03
申请号：PCT/IL2005001287
申请日：2005-12-01
申请人： NOVA MEASURING INSTR LTD , LYUBCHIK YAKOV , SCHEINER DAVID , WINIK MICHAEL
发明人： LYUBCHIK YAKOV , SCHEINER DAVID , WINIK MICHAEL
IPC分类号： G02B17/06 , G01B11/02 , G01N21/21 , G01N21/956 , G02B17/02 , H01L21/66
CPC分类号： G02B21/16 , G01J1/04 , G01J1/0411 , G01J1/0414 , G01J1/0429 , G01J1/044 , G01J1/0455 , G01J1/0462 , G01N21/956 , G02B17/06 , G02B17/061 , G02B21/04
摘要： A catoptric arrangement (10) is presented. The catoptric arrangement comprises a first element (12) having a concave reflective surface and an optical axis (OA) and a second substantially flat and at least partially reflective element (14) spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.
摘要翻译：提出了一个反射排列（10）。反射装置包括具有凹形反射表面和光轴（OA）的第一元件（12）和沿着光轴与第一元件间隔开的第二基本上平坦且至少部分反射的元件（14）。第二元件构造成允许光通过其并且相对于光轴和第一元件取向，使得在入射光束到第二元件上的预定入射角时，输入光束被反射到反射第一元件的表面并从其反射以穿过第二元件。

7. 发明申请

WO0161746A9 TEST STRUCTURE FOR METAL CMP PROCESS CONTROL 审中-公开
标题翻译：金属CMP过程控制的测试结构
公开(公告)号：WO0161746A9
公开(公告)日：2001-11-08
申请号：PCT/IL0100159
申请日：2001-02-20
申请人： NOVA MEASURING INSTR LTD , RAVID AVI , MACHAVARIANI VLADIMIR , WEINGARTEN AMIT , SCHEINER DAVID
发明人： RAVID AVI , MACHAVARIANI VLADIMIR , WEINGARTEN AMIT , SCHEINER DAVID
IPC分类号： B24B37/04 , B24B49/12 , B24B49/14 , H01L21/321 , H01L23/544 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12 , B24B49/14 , H01L21/3212 , H01L22/34
摘要： A test structure is presented to be formed on a patterned structure and to be used for controlling a CMP process applied to the patterned structure, which has a pattern area formed by spaced-apart metal-containing regions representative of real features of the patterned structure. The test structure thus undergoes the same CMP processing as the pattern area. The test structure comprises at least one pattern zone in the form of a metal area with at least one region included in the metal area and made of a material relatively transparent with respect to incident light, as compared to that of the metal.
摘要翻译：呈现测试结构以在图案化结构上形成并且用于控制施加到图案化结构的CMP工艺，其具有由代表图案化结构的真实特征的间隔开的含金属区域形成的图案区域。测试结构因此经历与图案区域相同的CMP处理。与金属相比，测试结构包括金属区域形式的至少一个图案区域，其中金属区域包括至少一个区域并且由相对于入射光相对透明的材料制成。

8. 发明申请

WO03060824A2 IMAGE ENHANCEMENT OF SUBSTANTIALLY COHERENT IMAGING SYSTEMS 审中-公开
标题翻译：大量相似成像系统的图像增强
公开(公告)号：WO03060824A2
公开(公告)日：2003-07-24
申请号：PCT/IL0300013
申请日：2003-01-05
申请人： NOVA MEASURING INSTR LTD , SCHEINER DAVID
发明人： SCHEINER DAVID
IPC分类号： G01N21/956 , G06T
CPC分类号： G01N21/956
摘要： A method of imaging a patterned sample comprising acquiring at least one image of the sample by illuminating the sample through an optical arrangement and collecting light reflected from the sample through said optical arrangement, wherein the optical arrangement has a predetermined numerical aperture NA and is located a predetermined distance from the sample. This predetermined distance being offset from a focal distance by an effective Talbot distance multiplied by a predetermined coefficient, the method thereby improving a smoothness of the image of the sample.
摘要翻译：一种对图案化样品进行成像的方法，包括通过光学装置照射样品并收集从样品反射的光通过所述光学装置获取样品的至少一个图像，其中光学装置具有预定的数值孔径NA，并且位于距样品预定距离。该预定距离通过有效的Talbot距离乘以预定系数而从焦距偏移，从而提高了样本的图像的平滑度。

9. 发明申请

WO03049150A2 METHOD AND SYSTEM FOR MONITORING A PROCESS OF MATERIAL REMOVAL FROM THE SURFACE OF A PATTERNED STRUCTURE 审中-公开
标题翻译：用于监测从图案结构表面去除材料的过程的方法和系统
公开(公告)号：WO03049150A2
公开(公告)日：2003-06-12
申请号：PCT/IL0200973
申请日：2002-12-04
申请人： NOVA MEASURING INSTR LTD , MACHAVARIANI VLADIMIR , SCHEINER DAVID , WEINGARTEN AMIT , RAVID AVI
发明人： MACHAVARIANI VLADIMIR , SCHEINER DAVID , WEINGARTEN AMIT , RAVID AVI
IPC分类号： G01N21/21 , G01N21/84 , G01N21/95 , H01L21/00
CPC分类号： G01N21/95623 , G01N21/21 , G01N21/8422 , G01N21/9501 , G01N21/95607
摘要： A method and system are presented for use in controlling a process of material removal from the surface of a patterned structure, by measuring at least one of residue, erosion, dishing and corrosion effects in the structure induced by this process. The structure is imaged utilizing phase modulation of light reflected from the structure, and a phase map of the structure is thereby obtained. This phase map is analyzed and data indicative of light reflective properties of layer stacks of the structure is utilized to determine a phase difference between light reflected from a selected measured site and at least one reference site spaced-apart from the selected site. The phase difference is thus indicative of the measured effect.
摘要翻译：提供了一种方法和系统，用于通过测量由该方法诱导的结构中的残留物，侵蚀，凹陷和腐蚀效应中的至少一种来控制从图案化结构的表面去除材料的过程。利用从结构反射的光的相位调制对该结构进行成像，从而获得该结构的相位图。分析该相位图，并且利用表示该结构的层叠层的光反射特性的数据来确定从所选择的测量部位反射的光与至少一个与选定部位间隔开的参考部位的相位差。因此，相位差表示测量的效果。

10. 发明申请

WO03014659A2 METHOD AND SYSTEM FOR MEASURING THE TOPOGRAPHY OF A SAMPLE 审中-公开
标题翻译：测量样品地形的方法和系统
公开(公告)号：WO03014659A2
公开(公告)日：2003-02-20
申请号：PCT/IL0200657
申请日：2002-08-08
申请人： NOVA MEASURING INSTR LTD , SCHEINER DAVID
发明人： SCHEINER DAVID
IPC分类号： G01B11/25 , G01B11/00
CPC分类号： G01B11/254
摘要： An imaging method and system are presented for detecting the topography of a sample's surface. Illuminating light is directed to the sample (S) by sequentially passing the illuminating light through a grating (20) and an objective lens arrangement (18). The grating (20) has a pattern formed by spaced-apart transparent regions (Rtr) spaced by non-transparent regions (Rop), and is specifically oriented with respect to the optical axis (OA) of the objective lens arrangement (18). Light, specularly reflected from the sample, is collected by the same objective lens arrangement (18) and is directed to an imaging detector (14) through the same grating (20), thereby enabling creation of an image of the illuminated sample (S) indicative of the topography of the sample's surface.
摘要翻译：提出了用于检测样品表面的形貌的成像方法和系统。通过依次使照射光通过光栅（20）和物镜装置（18），照明光被引导至样品（S）。光栅（20）具有由间隔开的透明区域（Rtr）形成的图案，间隔开的透明区域由非透明区域（Rop）隔开，并且相对于物镜装置（18）的光轴（OA）具体定向。从样品镜面反射的光被相同的物镜配置（18）收集并且通过相同的光栅（20）被引导到成像检测器（14），从而能够产生被照明样品（S）的图像，指示样品表面的形貌。

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