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1. 发明授权

EP1352211B1 A METHOD AND SYSTEM FOR MEASURING IN PATTERNED STRUCTURES 有权
公开(公告)号：EP1352211B1
公开(公告)日：2019-10-16
申请号：EP01999783.2
申请日：2001-12-07
申请人： Nova Measuring Instruments Limited , Brill, Boaz , Finarov, Moshe
发明人： BRILL, Boaz , FINAROV, Moshe
IPC分类号： G01B15/00 , G01N21/956 , G03F7/20 , G01N21/47 , G01N23/225 , H01J37/28

2. 发明公开

EP1352211A1 A METHOD AND SYSTEM FOR MEASURING IN PATTERNED STRUCTURES 有权
标题翻译：方法系统ZUR MESSUNG AN MUSTERSTRUKTUREN
公开(公告)号：EP1352211A1
公开(公告)日：2003-10-15
申请号：EP01999783.2
申请日：2001-12-07
申请人： Nova Measuring Instruments Limited , Brill, Boaz , Finarov, Moshe
发明人： BRILL, Boaz , FINAROV, Moshe
IPC分类号： G01B11/02 , G01N21/47 , G01N23/225 , H01J37/28 , H01L21/66
摘要： A measurement method and system are presented for measuring parameters of a patterned structure. Scatterometry and SEM measurements are applied to the structure, measured data indicative of, respectively, the structure parameters and lateral pattern dimensions of the structure are generated. The entire measured data are analyzed so as to enable using measurement results of either one of the scatterometry and SEM measurements for optimizing the other measurement results.
摘要翻译：提出了一种用于测量图案结构参数的测量方法和系统。对结构进行散射测量和SEM测量，产生分别表示结构参数和结构的横向图形尺寸的测量数据。分析整个测量数据，以便能够使用散射测量和SEM测量中的任一个的测量结果来优化其他测量结果。

3. 发明专利

IL213305D0 A SYSTEM AND METHOD FOR THIN FILM QUALITY ASSURANCE 未知
公开(公告)号：IL213305D0
公开(公告)日：2011-07-31
申请号：IL21330511
申请日：2011-06-02
申请人： NOAM NOY , BRIGHTVIEW SYSTEM LTD , LIPSON ARIEL , FINAROV MOSHE
IPC分类号： G01N20060101

4. 发明专利

AU2246402A A method ad system for measuring in patterned structures 未知
公开(公告)号：AU2246402A
公开(公告)日：2002-06-18
申请号：AU2246402
申请日：2001-12-07
申请人： NOVA MEASURING INSTR LTD , BRILL BOAZ , FINAROV MOSHE
发明人： BRILL BOAZ , FINAROV MOSHE
IPC分类号： G01B15/00 , G01N21/47 , G01N21/956 , H01J37/28 , G01B11/02 , G01N23/225 , H01L21/66
摘要： A measurement method and system are presented for measuring parameters of a patterned structure. Scatterometry and SEM measurements are applied to the structure, measured data indicative of, respectively, the structure parameters and lateral pattern dimensions of the structure are generated. The entire measured data are analyzed so as to enable using measurement results of either one of the scatterometry and SEM measurements for optimizing the other measurement results.

5. 发明专利

IL210104A Light induced patterning 未知
公开(公告)号：IL210104A
公开(公告)日：2015-05-31
申请号：IL21010410
申请日：2010-12-19
申请人： NOY AMIR , MATUSOVSKY MIKHAEL , FINAROV MOSHE , DISHON GIORA , UTILIGHT LTD
发明人： NOY AMIR , MATUSOVSKY MIKHAEL , FINAROV MOSHE , DISHON GIORA
IPC分类号： C23C20060101

6. 发明申请

WO03075099A2 METHOD AND SYSTEM FOR OVERLAY MEASUREMENT 审中-公开
标题翻译：用于覆盖测量的方法和系统
公开(公告)号：WO03075099A2
公开(公告)日：2003-09-12
申请号：PCT/IL0300176
申请日：2003-03-06
申请人： NOVA MEASURING INSTR LTD , FINAROV MOSHE , SCHEINER DAVID
发明人： FINAROV MOSHE , SCHEINER DAVID
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70633
摘要： An optical measurement method and system are presented for imaging two target structures T1, T2 in two parallel layers L1, L2, respectively, of a sample W, to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer L1. The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement 14, and the collected radiation response is split into two spatially separated radiation components B1res, B2res. The split radiation components are directed towards at least one imaging plane 24 or 26 along different optical channels characterized by optical paths of different lengths S1, S2, respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures.
摘要翻译：提出了一种光学测量方法和系统，用于分别对样本W的两个平行层L1，L2中的两个目标结构T1，T2进行成像，以便能够沿着层的两个相互垂直的轴确定两个目标结构之间的配准 L1。用入射辐射照射样品以产生样品的辐射响应。辐射响应由物镜装置14收集，并且收集的辐射响应被分成两个空间上分离的辐射分量B1res，B2res。分离的辐射分量被引导到沿着不同的光通道的至少一个成像平面24或26，其特征在于分别具有不同长度S1，S2的光路。在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。

7. 发明申请

WO2003014658A3 METHOD AND APPARATUS FOR PROCESS CONTROL IN THE SEMICONDUCTOR MANUFACTURING 审中-公开
公开(公告)号：WO2003014658A3
公开(公告)日：2003-02-20
申请号：PCT/IL2002/000656
申请日：2002-08-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G01B11/24
摘要： An optical system is presented for use in a measurement system (OS) for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises (OS) an illuminator unit (10) producing illuminating light to be directed to the structure to produce returned light, a detector unit comprising an imaging detector (26) and a spectrophotometer detector (30), and a light directing assembly (31). The light directing assembly (31) defines first and second optical paths for the light propagation. The optical elements accommodated in the first optical path affect the light to provide a relatively small measuring area of the structure's plane. The second optical path is located outside the first optical path, the light propagation through the second optical path providing a relatively large measuring area, as compared to that of the first optical path.

8. 发明申请

WO2010106533A2 A METHOD AND APPARATUS FOR ACCURATE DETERMINATION OF PARAMETERS OF A STACK OF THIN FILMS 审中-公开
标题翻译：准确确定薄膜叠层参数的方法和设备
公开(公告)号：WO2010106533A2
公开(公告)日：2010-09-23
申请号：PCT/IL2010/000174
申请日：2010-03-03
申请人： BRIGHTVIEW SYSTEMS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： G01B9/08
CPC分类号： G01B11/0625 , G01B11/303 , G01N21/55 , G01N21/8422
摘要： A method for accurate determination of optical parameters of a stack of thin films with at least one of the films being an opaque film. The method includes measurement of the reflected or transmitted through the stack illumination and mutual correlation of the determined thin film parameters.
摘要翻译：用于精确确定薄膜堆叠的光学参数的方法，其中至少一个薄膜是不透明薄膜。该方法包括测量通过堆叠照明的反射或透射以及所确定的薄膜参数的相互关联。

9. 发明申请

WO2010079474A1 A SYSTEM AND METHOD FOR THIN FILM QUALITY ASSURANCE 审中-公开
标题翻译：薄膜质量保证的系统和方法
公开(公告)号：WO2010079474A1
公开(公告)日：2010-07-15
申请号：PCT/IL2009/001211
申请日：2009-12-23
申请人： BRIGHTVIEW SYSTEMS LTD , NOY, Noam , LIPSON, Ariel , FINAROV, Moshe
发明人： NOY, Noam , LIPSON, Ariel , FINAROV, Moshe
IPC分类号： G01N21/84
CPC分类号： G01N21/8422 , H02S50/15
摘要： A method of a photovoltaic panel (104) quality control, said method comprising: enabling a relative movement in at least one direction (112) between the photovoltaic panel (104) and a low-resolution scanning imaging unit (132) and capturing successive two-dimensional frames of the scanned area; analyzing the aquired image frames for presence of thin film production defects (144) and communicating to a high resolution image scanning unit (136) locations of said production defects; enabling a relative movement (148) between the photovoltaic panel and the high resolution scanning unit said, movement following the low-resolution unit movement and at least one additional direction parallel to the photovoltaic panel movement direction to aquire and classify the thin film production defects communicated by the low resolution scanning unit; and wherein the low and high resolution scanning units move simultaneously with the same speed (124) across the photovoltaic panel and the speed of the high resolution scanning unit moving in the direction parallel to the thin film movement direction is different from the speed at which the photovoltaic panel moves.
摘要翻译：一种光伏面板（104）质量控制的方法，所述方法包括：实现光伏面板（104）和低分辨率扫描成像单元（132）之间的至少一个方向（112）的相对运动，并捕获连续的两个扫描区域的三维帧; 分析所述彩色图像帧以存在薄膜生产缺陷（144）并与所述生产缺陷的位置的高分辨率图像扫描单元（136）通信; 使得能够在光伏面板和高分辨率扫描单元之间进行相对运动（148），所述运动遵循低分辨率单元运动和平行于光伏面板运动方向的至少一个附加方向，以产生并分类所传播的薄膜生产缺陷由低分辨率扫描单元; 并且其中所述低分辨率和高分辨率扫描单元以相同的速度（124）同时移动穿过所述光伏面板，并且所述高分辨率扫描单元在与所述薄膜移动方向平行的方向上移动的速度不同于光伏面板移动。

10. 发明申请

WO2003017322A3 A METHOD AND SYSTEM FOR MEASUREMENTS IN PATTERNED STRUCTURES 审中-公开
公开(公告)号：WO2003017322A3
公开(公告)日：2003-02-27
申请号：PCT/IL2002/000655
申请日：2002-08-08
申请人： NOVA MEASURING INSTRUMENTS LTD. , FINAROV, Moshe
发明人： FINAROV, Moshe
IPC分类号： H01L21/00 , G01R31/02
摘要： A method and system are presented for measuring in a patterned structure to thereby enabling to control a process. An image of at least a region of patterned structure formed by light returned from the illuminated region is acquired and analysed to determine sites of the structure to which electrical measurements are to be applied. Electrical measurements to the predetermined sites of the structure are applied and measured data indicative of at least one parameter of the structure is generated for adjusting operating conditions of the process.

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