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    • 4. 发明申请
    • METHODS FOR NANOSTRUCTURE DOPING
    • 用于纳米结构的方法
    • WO2007038164A2
    • 2007-04-05
    • PCT/US2006036738
    • 2006-09-21
    • NANOSYS INCPAN YAOLINGCHEN JIANLEON FRANCISCOMOSTARSHED SHAHRIARROMANO LINDA TSAHI VIJENDRASTUMBO DAVID P
    • PAN YAOLINGCHEN JIANLEON FRANCISCOMOSTARSHED SHAHRIARROMANO LINDA TSAHI VIJENDRASTUMBO DAVID P
    • H01L29/06H01L21/225
    • H01L29/0665B81C1/00698B81C2201/0173B82Y10/00H01L21/2256H01L21/268H01L29/0673
    • Methods of doping nanostructures, such as nanowires, are disclosed. The methods provide a variety of approaches for improving existing methods of doping nanostructures. The embodiments include the use of a sacrificial layer to promote uniform dopant distribution within a nanostructure during post-nanostructure synthesis doping. In another embodiment, a high temperature environment is used to anneal nanostructure damage when high energy ion implantation is used. In another embodiment rapid thermal annealing is used to drive dopants from a dopant layer on a nanostructure into the nanostructure. In another embodiment a method for doping nanowires on a plastic substrate is provided that includes depositing a dielectric stack on a plastic substrate to protect the plastic substrate from damage during the doping process. An embodiment is also provided that includes selectively using high concentrations of dopant materials at various times in synthesizing nanostructures to realize novel crystallographic structures within the resulting nanostructure.
    • 公开了掺杂纳米结构的方法,例如纳米线。 该方法提供了改进现有的纳米结构掺杂方法的各种方法。 实施例包括在后纳米结构合成掺杂期间使用牺牲层来促进纳米结构内的均匀掺杂剂分布。 在另一个实施例中,当使用高能离子注入时,使用高温环境退火纳米结构损伤。 在另一个实施方案中,使用快速热退火来将掺杂剂从纳米结构上的掺杂剂层驱动到纳米结构中。 在另一个实施例中,提供了一种在塑料衬底上掺杂纳米线的方法,其包括在塑料衬底上沉积电介质叠层以保护塑料衬底免于在掺杂过程期间损坏。 还提供了一种实施方案,其包括在合成纳米结构中在不同时间选择性地使用高浓度的掺杂剂材料,以在所得纳米结构内实现新的晶体结构。
    • 10. 发明申请
    • NANOWIRE VARACTOR DIODE AND METHODS OF MAKING SAME
    • 纳米级变压器二极管及其制造方法
    • WO2005112122A2
    • 2005-11-24
    • PCT/US2005008891
    • 2005-03-17
    • NANOSYS INCSTUMBO DAVIDCHEN JIANHEALD DAVIDPAN YAOLING
    • STUMBO DAVIDCHEN JIANHEALD DAVIDPAN YAOLING
    • H01L29/06H01L29/93
    • B82Y10/00H01L29/0665H01L29/0673H01L29/068H01L29/93Y10S977/762
    • A nanowire varactor diode and methods of making the same are disclosed. The structure comprises a coaxial capacitor running the length of the semiconductor nanowire. In one embodiment, a semiconductor nanowire of a first conductivity type is deposited on a substrate. An insulator is formed on at least a portion of the nanowire's surface. A region of the nanowire is doped with a second conductivity type material. A first electrical contact is formed on at least part of the insulator and the doped region. A second electrical contact is formed on a non-doped potion of the nanowire. During operation, the conductivity type at the surface of the nanowire inverts and a depletion region is formed upon application of a voltage to the first and second electrical contacts. The varactor diode thereby exhibits variable capacitance as a function of the applied voltage.
    • 公开了一种纳米线变容二极管及其制造方法。 该结构包括运行半导体纳米线长度的同轴电容器。 在一个实施例中,第一导电类型的半导体纳米线沉积在衬底上。 在纳米线表面的至少一部分上形成绝缘体。 纳米线的区域掺杂有第二导电类型的材料。 在绝缘体和掺杂区域的至少一部分上形成第一电接触。 在纳米线的非掺杂药液上形成第二电接触。 在操作期间,纳米线表面的导电类型反转,并且在向第一和第二电触点施加电压时形成耗尽区。 因此,变容二极管作为施加电压的函数呈现可变电容。