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    • 1. 发明公开
    • Eliminating unwanted material from a gas flow line
    • 从气体流动管线中消除未经处理的材料,从气体流动管线中消除未经处理的材料
    • EP0176295A3
    • 1988-01-07
    • EP85306540
    • 1985-09-16
    • Mundt, Randall
    • Mundt, Randall
    • B01D53/00B01D53/34B01J19/08F04F09/06
    • H01J37/32844B01D53/00H01J37/3244Y02C20/30Y10S423/08Y10S423/10
    • An apparatus and method for eliminating unwanted materials, such as corrosive gases, from an effluent gas flow line includes a reactive trap wherein chemical reaction between the unwanted materials, a reactant gas and a reactive element takes place under induced plasma conditions. A ballast gas may be added to adjust operating pressures and to aid in creating the plasma. The reactant gas and the reactive element are selected so that relative harmless by-products are produced. The reactive element is preferably maintained at a temperature of approximately 400°C and the chemical by-products are passed through a condensation element in the reactive trap which element is maintained at approximately 30 C. Preferably, the plasma is induced by a microwave transmitter in conjunction with a waveguide inserted into a reactive trap, and a control system automatically monitors and adjusts the temperature and pressure of the reaction as well as controls the ratio of effluent gas and ballast gas.
    • 用于从流出气体流动管线消除不需要的材料(例如腐蚀性气体)的装置和方法包括反应性阱,其中不需要的材料,反应气体和反应性元素之间的化学反应在诱导的等离子体条件下进行。 可以加入压载气体以调节操作压力并有助于产生等离子体。 选择反应气体和反应性元件,以产生相对无害的副产物。 反应元件优选保持在约400℃的温度,化学副产物通过反应性阱中的缩合元件,该元素保持在约30℃。优选地,等离子体由微波 发射器与插入到反应阱中的波导相结合,并且控制系统自动监测和调节反应的温度和压力,并且控制流出气体和压载气体的比例。
    • 2. 发明公开
    • Eliminating unwanted material from a gas flow line
    • Entfernung vonungewünschtem材料aus einer Gasleitung。
    • EP0176295A2
    • 1986-04-02
    • EP85306540.7
    • 1985-09-16
    • Mundt, Randall
    • Mundt, Randall
    • B01D53/00B01D53/34B01J19/08F04F9/06
    • H01J37/32844B01D53/00H01J37/3244Y02C20/30Y10S423/08Y10S423/10
    • An apparatus and method for eliminating unwanted materials, such as corrosive gases, from an effluent gas flow line includes a reactive trap wherein chemical reaction between the unwanted materials, a reactant gas and a reactive element takes place under induced plasma conditions. A ballast gas may be added to adjust operating pressures and to aid in creating the plasma. The reactant gas and the reactive element are selected so that relative harmless by-products are produced. The reactive element is preferably maintained at a temperature of approximately 400°C and the chemical by-products are passed through a condensation element in the reactive trap which element is maintained at approximately 30 C. Preferably, the plasma is induced by a microwave transmitter in conjunction with a waveguide inserted into a reactive trap, and a control system automatically monitors and adjusts the temperature and pressure of the reaction as well as controls the ratio of effluent gas and ballast gas.
    • 用于从流出气体流动管线消除不需要的材料(例如腐蚀性气体)的装置和方法包括反应性阱,其中不需要的材料,反应气体和反应性元素之间的化学反应在诱导的等离子体条件下进行。 可以加入压载气体以调节操作压力并有助于产生等离子体。 选择反应气体和反应性元件,以产生相对无害的副产物。 反应元件优选保持在约400℃的温度,化学副产物通过反应性阱中的缩合元件,该元素保持在约30℃。优选地,等离子体由微波 发射器与插入到反应阱中的波导相结合,并且控制系统自动监测和调节反应的温度和压力,并且控制流出气体和压载气体的比例。